公开(公告)号：US20130014065A1

公开(公告)日：2013-01-10

申请号：US13542625

申请日：2012-07-05

申请人： Hanying Feng ,  Yu Cao ,  Jun Ye ,  Youping Zhang

发明人： Hanying Feng ,  Yu Cao ,  Jun Ye ,  Youping Zhang

IPC分类号： G06F17/50

CPC分类号： G03F7/706 ,  G03F7/70683

摘要： The present invention relates to methods and systems for designing gauge patterns that are extremely sensitive to parameter variation, and thus robust against random and repetitive measurement errors in calibration of a lithographic process utilized to image a target design having a plurality of features. The method may include identifying most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD (or other lithography response parameter) changes against lithography process parameter variations, such as wavefront aberration parameter variation. The method may also include designing gauges which have more than one test patterns, such that a combined response of the gauge can be tailored to generate a certain response to wavefront-related or other lithographic process parameters. The sensitivity against parameter variation leads to robust performance against random measurement error and/or any other measurement error.

摘要翻译： 本发明涉及用于设计对参数变化非常敏感的规格图案的方法和系统，因此对于用于对具有多个特征进行成像的目标设计的光刻工艺的校准中的随机和重复的测量误差是鲁棒的。 该方法可以包括以最佳辅助特征放置来识别最敏感的线宽/间距组合，其导致针对光刻过程参数变化（例如波前像差参数变化）的最敏感的CD（或其他光刻响应参数）变化。 该方法还可以包括设计具有多于一个测试图案的计量器，使得量规的组合响应可以被调整以产生对波前相关或其它光刻工艺参数的特定响应。 对参数变化的敏感性导致对随机测量误差和/或任何其他测量误差的鲁棒性能。

公开(公告)号：US08257840B2

公开(公告)日：2012-09-04

申请号：US12305966

申请日：2008-03-24

申请人： Xiaowei Li ,  Xinyu Li ,  Ce Li ,  Jing Yang ,  Feng Pan ,  Caixia Li ,  Yu Cao

发明人： Xiaowei Li ,  Xinyu Li ,  Ce Li ,  Jing Yang ,  Feng Pan ,  Caixia Li ,  Yu Cao

IPC分类号： B32B15/04

CPC分类号： B32B37/24 ,  B32B37/203 ,  B32B2037/246 ,  B32B2307/208 ,  B32B2309/105 ,  B32B2425/00 ,  B32B2429/00 ,  G09F3/0292 ,  G11B5/00808 ,  H01F10/132 ,  H01F41/18 ,  Y10T428/24802 ,  Y10T428/265 ,  Y10T428/325

摘要： The present invention provides a security functional thin film and a security product containing such a thin film. The security functional thin film is of an amorphous structure, and possesses soft magnetic characteristics. Large Barkhausen effect can be detected along the in-plane preferred direction of magnetization; and the Large Barkhausen effect significantly attenuates, or no such signal can be detected, in a direction perpendicular to the in-plane preferred direction of magnetization. The thin film has a thickness of 20-300 nm, and the thin film also possesses element encoding characteristics that can be authenticated by experts. The security functional thin film of the present invention can be fabricated by magnetron sputtering web coating process. The security product provided by the present invention has a security information layer formed of the security functional thin film, and can be combined with other security characteristics for use in fabricating security materials such as security threads, security tapes, paper security strip-like inserts, or security labels, and others. Compared with conventional anti-counterfeiting technologies, the instant security functional thin film has more hidden security information, and facilitates enhancement of safety performance of security products.

摘要翻译： 本发明提供一种安全功能薄膜和包含这种薄膜的安全产品。 安全功能薄膜为非晶结构，具有软磁特性。 沿着平面内优选的磁化方向可以检测到大的巴克豪森效应; 并且大巴克豪森效应在垂直于面内优选磁化方向的方向上显着衰减或不能检测到这样的信号。 该薄膜的厚度为20-300nm，薄膜还具有可由专家认证的元件编码特性。 本发明的安全功能薄膜可以通过磁控溅射网涂布法制造。 由本发明提供的安全产品具有由安全功能薄膜形成的安全信息层，并且可以与用于制造诸如安全螺纹，安全带，纸安全带状插入物等安全材料的其他安全特性组合， 或安全标签等。 与传统防伪技术相比，即时安全功能薄膜具有更多隐藏的安全信息，有利于提高安全产品的安全性能。

公开(公告)号：US08227708B2

公开(公告)日：2012-07-24

申请号：US12637104

申请日：2009-12-14

申请人： Xia Li ,  Wei Zhao ,  Yu Cao ,  Shiqun Gu ,  Seung H. Kang ,  Ming-Chu King

发明人： Xia Li ,  Wei Zhao ,  Yu Cao ,  Shiqun Gu ,  Seung H. Kang ,  Ming-Chu King

IPC分类号： H05K1/11

CPC分类号： H01L23/552 ,  H01L23/14 ,  H01L23/49827 ,  H01L23/645 ,  H01L23/66 ,  H01L2223/6616 ,  H01L2223/6622 ,  H01L2223/6638 ,  H01L2924/0002 ,  H01L2924/3011 ,  H05K1/0222 ,  H05K1/0245 ,  H05K3/4602 ,  H05K3/4644 ,  H05K2201/09809 ,  Y10T29/49117 ,  H01L2924/00

摘要： A system of via structures disposed in a substrate. The system includes a first via structure that comprises an outer conductive layer, an inner insulating layer, and an inner conductive layer disposed in the substrate. The outer conductive layer separates the inner insulating layer and the substrate and the inner insulating layer separates the inner conductive layer and the outer conductive layer. A first signal of a first complementary pair passes through the inner conductive layer and a second signal of the first complementary pair passes through the outer conductive layer. In different embodiments, a method of forming a via structure in an electronic substrate is provided.

摘要翻译： 设置在基板中的通孔结构的系统。 该系统包括第一通孔结构，其包括外导电层，内绝缘层和设置在基板中的内导电层。 外部导电层分离内部绝缘层和基板，内部绝缘层分离内部导电层和外部导电层。 第一互补对的第一信号通过内导电层，第一互补对的第二信号通过外导电层。 在不同的实施例中，提供了一种在电子衬底中形成通孔结构的方法。

公开(公告)号：US20120185330A1

公开(公告)日：2012-07-19

申请号：US13350201

申请日：2012-01-13

申请人： Leonard Kleinrock ,  Yu Cao ,  Louise Falevsky

发明人： Leonard Kleinrock ,  Yu Cao ,  Louise Falevsky

IPC分类号： G06Q30/02

CPC分类号： G06Q30/02 ,  G06Q30/0251 ,  G06Q30/0641

摘要： A framework for discovery and publishing among multiple sellers and multiple buyers leads to contemplated embodiments in planning online and shopping at local stores. Through the contemplated embodiments, sellers publish incentives and information to a platform, which matches, in a timely and personalized manner, buyers' purchase intentions that are often manifested as submitted and saved shopping lists or receipts.

摘要翻译： 用于在多个卖家和多个买家之间发现和发布的框架导致在本地商店规划在线和购物的预期实施例。 通过预期的实施例，卖方将平台上的激励和信息发布到平台中，并且以及时和个性化的方式将购买者的购买意图表现为经常表现为已提交和保存的购物清单或收据。

公开(公告)号：US08056028B2

公开(公告)日：2011-11-08

申请号：US12417559

申请日：2009-04-02

申请人： Yu Cao ,  James Norman Wiley ,  Jun Ye

发明人： Yu Cao ,  James Norman Wiley ,  Jun Ye

IPC分类号： G06F17/50

CPC分类号： G03F1/78 ,  G03F1/44 ,  G03F1/68 ,  G03F1/76

摘要： A model-based tuning method for tuning a first mask writer unit utilizing a reference mask writer unit, each of which has tunable parameters for controlling mask writing performance. The method includes the steps of defining a test pattern and a mask writing model; generating the test pattern utilizing the reference mask writer unit and measuring the mask writing results; generating the test pattern utilizing the first mask writer unit and measuring the mask writing results; calibrating the mask writing model utilizing the mask writing results corresponding to the reference mask writer unit, where the calibrated mask writing model has a first set of parameter values; tuning the calibrated mask writing model utilizing the mask writing results corresponding to the first mask writer unit, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first mask writer unit based on a difference between the first set of parameter values and the second set of parameter values.

摘要翻译： 一种基于模型的调谐方法，用于利用参考掩模写入器单元调整第一掩模写入器单元，每个参考掩码写入器单元具有用于控制掩模写入性能的可调参数。 该方法包括定义测试图案和掩模书写模型的步骤; 使用参考掩模写入器单元产生测试图案并测量掩模写入结果; 使用第一掩模写入器单元产生测试图案并测量掩模写入结果; 使用对应于参考掩模写入器单元的掩模写入结果来校准掩模写入模型，其中校准的掩模写入模型具有第一组参数值; 使用对应于第一掩模写入器单元的掩模写入结果调整校准的掩模写入模型，其中调谐的校准模型具有第二组参数值; 以及基于所述第一组参数值和所述第二组参数值之间的差来调整所述第一掩模写入器单元的参数。

公开(公告)号：US20110267597A1

公开(公告)日：2011-11-03

申请号：US13182416

申请日：2011-07-13

申请人： Jun Ye ,  Yu Cao

发明人： Jun Ye ,  Yu Cao

IPC分类号： G03B27/32

CPC分类号： G03F7/705 ,  G03F7/70125 ,  G03F7/70458 ,  G03F7/70516 ,  G03F7/70525

摘要： A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

摘要翻译： 一种基于模型的调谐方法，用于利用参考光刻系统调整第一光刻系统，每个参考光刻系统具有用于控制成像性能的可调参数。 该方法包括定义测试图案和成像模型的步骤; 使用参考光刻系统成像测试图案并测量成像结果; 使用第一光刻系统成像测试图案并测量成像结果; 使用对应于参考光刻系统的成像结果校准成像模型，其中校准的成像模型具有第一组参数值; 使用对应于第一光刻系统的成像结果来调整校准的成像模型，其中调整的校准模型具有第二组参数值; 以及基于第一组参数值和第二组参数值之间的差异来调整第一光刻系统的参数。

公开(公告)号：US20110264643A1

公开(公告)日：2011-10-27

申请号：US13176241

申请日：2011-07-05

申请人： Yu Cao

发明人： Yu Cao

IPC分类号： G06F17/30

CPC分类号： G06F17/30241 ,  Y10S707/99935

摘要： A system that automatically discerning the best combinations of a user query's geographical origin and language, retrieving and displaying search results accordingly. A record on the system are associated with a geographic location and a language. A record could be composed of two or more records, each of which associates with a location and a language. A record could be in rich media format.

摘要翻译： 自动识别用户查询的地理来源和语言的最佳组合的系统，相应地检索和显示搜索结果。 系统上的记录与地理位置和语言相关联。 记录可以由两个或多个记录组成，每个记录与位置和语言相关联。 记录可以是富媒体格式。

公开(公告)号：US20100220371A1

公开(公告)日：2010-09-02

申请号：US12305966

申请日：2008-03-24

申请人： Xiaowei Li ,  Xinyu Li ,  Ce Li ,  Jing Yang ,  Feng Pan ,  Caixia Li ,  Yu Cao

发明人： Xiaowei Li ,  Xinyu Li ,  Ce Li ,  Jing Yang ,  Feng Pan ,  Caixia Li ,  Yu Cao

IPC分类号： B42D15/10 ,  B32B5/00 ,  C23C14/34 ,  B32B9/04

CPC分类号： B32B37/24 ,  B32B37/203 ,  B32B2037/246 ,  B32B2307/208 ,  B32B2309/105 ,  B32B2425/00 ,  B32B2429/00 ,  G09F3/0292 ,  G11B5/00808 ,  H01F10/132 ,  H01F41/18 ,  Y10T428/24802 ,  Y10T428/265 ,  Y10T428/325

摘要： The present invention provides a security functional thin film and a security product containing such a thin film. The security functional thin film is of an amorphous structure, and possesses soft magnetic characteristics. Large Barkhausen effect can be detected along the in-plane preferred direction of magnetization; and the Large Barkhausen effect significantly attenuates, or no such signal can be detected, in a direction perpendicular to the in-plane preferred direction of magnetization. The thin film has a thickness of 20-300 nm, and the thin film also possesses element encoding characteristics that can be authenticated by experts. The security functional thin film of the present invention can be fabricated by magnetron sputtering web coating process. The security product provided by the present invention has a security information layer formed of the security functional thin film, and can be combined with other security characteristics for use in fabricating security materials such as security threads, security tapes, paper security strip-like inserts, or security labels, and others. Compared with conventional anti-counterfeiting technologies, the instant security functional thin film has more hidden security information, and facilitates enhancement of safety performance of security products.

摘要翻译： 本发明提供一种安全功能薄膜和包含这种薄膜的安全产品。 安全功能薄膜为非晶结构，具有软磁特性。 沿着平面内优选的磁化方向可以检测到大的巴克豪森效应; 并且大巴克豪森效应在垂直于面内优选磁化方向的方向上显着衰减或不能检测到这样的信号。 该薄膜的厚度为20-300nm，薄膜还具有可由专家认证的元件编码特性。 本发明的安全功能薄膜可以通过磁控溅射网涂布法制造。 由本发明提供的安全产品具有由安全功能薄膜形成的安全信息层，并且可以与用于制造诸如安全螺纹，安全带，纸安全带状插入物等安全材料的其他安全特性组合， 或安全标签等。 与传统防伪技术相比，即时安全功能薄膜具有更多隐藏的安全信息，有利于提高安全产品的安全性能。

公开(公告)号：US07747978B2

公开(公告)日：2010-06-29

申请号：US11461994

申请日：2006-08-02

申请人： Jun Ye ,  Yu Cao ,  Luoqi Chen ,  Hua-Yu Liu

发明人： Jun Ye ,  Yu Cao ,  Luoqi Chen ,  Hua-Yu Liu

IPC分类号： G06F17/50

CPC分类号： G03F7/70641 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70625

摘要： A system and a method for creating a focus-exposure model of a lithography process are disclosed. The system and the method utilize calibration data along multiple dimensions of parameter variations, in particular within an exposure-defocus process window space. The system and the method provide a unified set of model parameter values that result in better accuracy and robustness of simulations at nominal process conditions, as well as the ability to predict lithographic performance at any point continuously throughout a complete process window area without a need for recalibration at different settings. With a smaller number of measurements required than the prior-art multiple-model calibration, the focus-exposure model provides more predictive and more robust model parameter values that can be used at any location in the process window.

摘要翻译： 公开了一种用于创建光刻工艺的聚焦曝光模型的系统和方法。 系统和方法利用参数变化的多个维度的校准数据，特别是在曝光 - 散焦过程窗口空间内。 该系统和方法提供了一套统一的模型参数值，可在标称工艺条件下提供更好的模拟精度和鲁棒性，以及能够在整个过程窗口区域内连续预测任何点的光刻性能，而无需 重新校准在不同的设置。 与现有技术的多模型校准相比，要进行的测量数量要少一些，聚焦曝光模型提供了更多的预测性和更健壮的模型参数值，可以在过程窗口中的任何位置使用。

公开(公告)号：US20100162197A1

公开(公告)日：2010-06-24

申请号：US12642436

申请日：2009-12-18

申请人： Jun YE ,  Yu Cao ,  Hanying Feng

发明人： Jun YE ,  Yu Cao ,  Hanying Feng

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/144 ,  G03F7/70441 ,  G03F7/705 ,  G06F17/5081 ,  G06F2217/12

摘要： The present invention relates to an efficient OPC method of increasing imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and optimizing target gray level for each evaluation point in each OPC iteration based on this function. In one given embodiment, the function is approximated as a polynomial function of focus and exposure, R(ε, f)=P0+f2·Pb with a threshold of T+Vε for contours, where P0 represents image intensity at nominal focus, f represents the defocus value relative to the nominal focus, ε represents the exposure change, V represents the scaling of exposure change, and parameter “Pb” represents second order derivative images. In another given embodiment, the analytical optimal gray level is given for best focus with the assumption that the probability distribution of focus and exposure variation is Gaussian.

摘要翻译： 本发明涉及一种提高用于成像具有多个特征的目标设计的光刻工艺的成像性能的有效OPC方法。 该方法包括以下步骤：确定用于产生模拟图像的功能，其中该功能考虑到与光刻工艺相关联的工艺变化; 并基于此功能对每个OPC迭代中的每个评估点优化目标灰度级。 在一个给定的实施例中，函数近似为焦点和曝光的多项式函数，R（＆egr; f）= P0 + f2·Pb，阈值为T + V＆egr; 对于轮廓，其中P0表示标称焦点处的图像强度，f表示相对于标称焦点的散焦值， 表示曝光变化，V表示曝光变化的缩放，参数“Pb”表示二阶导数图像。 在另一个给定的实施例中，假设聚焦和曝光变化的概率分布为高斯，给出最佳聚焦的分析最佳灰度级。