公开(公告)号：US20120242969A1

公开(公告)日：2012-09-27

申请号：US13414352

申请日：2012-03-07

申请人： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Emiel Jozef Melanie Eussen ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Frank Staals ,  Lukasz Jerzy Macht ,  William Peter Van Drent ,  Erik Willem Bogaart

发明人： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Emiel Jozef Melanie Eussen ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Frank Staals ,  Lukasz Jerzy Macht ,  William Peter Van Drent ,  Erik Willem Bogaart

IPC分类号： G03B27/58

CPC分类号： G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

摘要翻译： 一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。 衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。

公开(公告)号：US08232540B2

公开(公告)日：2012-07-31

申请号：US13184152

申请日：2011-07-15

申请人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders

发明人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.

摘要翻译： 公开了一种有助于防止液体到达衬底的方法，其包括在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液，有助于保持存在于顶部的浸没液体，以及 衬底的边缘远离衬底的底表面。

公开(公告)号：US20110199601A1

公开(公告)日：2011-08-18

申请号：US13022397

申请日：2011-02-07

申请人： Takeshi KANEKO ,  Joost Jeroen Ottens ,  Raymond Wilhelmus Louis Lafarre

发明人： Takeshi KANEKO ,  Joost Jeroen Ottens ,  Raymond Wilhelmus Louis Lafarre

IPC分类号： G03B27/58

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70775

摘要： A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

摘要翻译： 一种用于光刻设备的工作台，具有位于工作台上的编码器板的工作台，编码器板和工作台的顶表面之间的间隙，位于编码器板相对于工作台周边的径向内侧的间隙，以及 一种在间隙表面上具有开口以从间隙提取液体的流体提取系统。

公开(公告)号：US07978306B2

公开(公告)日：2011-07-12

申请号：US12216441

申请日：2008-07-03

申请人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders

发明人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

公开(公告)号：US07804577B2

公开(公告)日：2010-09-28

申请号：US11391683

申请日：2006-03-29

申请人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Johannes Petrus Maria Smeulers ,  Michel Riepen ,  Sergei Shulepov

发明人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Johannes Petrus Maria Smeulers ,  Michel Riepen ,  Sergei Shulepov

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.

摘要翻译： 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。

公开(公告)号：US07791709B2

公开(公告)日：2010-09-07

申请号：US12000100

申请日：2007-12-07

申请人： Pieter Renaat Maria Hennus ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Peter Paul Steijaert ,  Hubert Matthieu Richard Steijns ,  Peter Smits

发明人： Pieter Renaat Maria Hennus ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Peter Paul Steijaert ,  Hubert Matthieu Richard Steijns ,  Peter Smits

IPC分类号： G03B27/58 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/707

摘要： A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.

摘要翻译： 公开了一种用于支撑用于浸没式光刻处理的衬底的衬底支撑件。 基板支撑件具有围绕中心部分定位的中心部分和周边部分。 衬底支撑件还包括布置成减小中心部分和周边部分之间的热传递的热分离器。

公开(公告)号：US20100045950A1

公开(公告)日：2010-02-25

申请号：US12543011

申请日：2009-08-18

申请人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

发明人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

摘要翻译： 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US20080284995A1

公开(公告)日：2008-11-20

申请号：US12219606

申请日：2008-07-24

申请人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders

发明人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.

公开(公告)号：US20080212053A1

公开(公告)日：2008-09-04

申请号：US10962744

申请日：2004-10-13

申请人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G03B27/42 ,  G03F7/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.

摘要翻译： 公开了一种装置制造方法。 该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出 所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投射到所述衬底的内部目标部分上。

公开(公告)号：US07239368B2

公开(公告)日：2007-07-03

申请号：US10998179

申请日：2004-11-29

申请人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Adriaan Rudolf Van Empel ,  Leon Martin Levasier ,  Joost Jeroen Ottens ,  Koen Jacobus Johannes Maria Zaal ,  Koenraad Stephan Silvester Salden

发明人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Adriaan Rudolf Van Empel ,  Leon Martin Levasier ,  Joost Jeroen Ottens ,  Koen Jacobus Johannes Maria Zaal ,  Koenraad Stephan Silvester Salden

IPC分类号： G03B27/32 ,  G03B27/68

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： A lithographic system includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. Feed forward correction of non-flatness induced wafer grid distortion is allowed during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.

摘要翻译： 光刻系统包括用于提供投射辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上赋予图案的掩模，用于保持基板的基板台，以及 投影系统，用于将图案化的光束投影到基板的目标部分上。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 在对准和曝光期间允许非平坦度引起的晶片网格变形的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。