Semiconductor device and manufacturing method thereof
    81.
    发明授权
    Semiconductor device and manufacturing method thereof 有权
    半导体装置及其制造方法

    公开(公告)号:US08373164B2

    公开(公告)日:2013-02-12

    申请号:US12613769

    申请日:2009-11-06

    摘要: A structure by which electric-field concentration which might occur between a source electrode and a drain electrode in a bottom-gate thin film transistor is relaxed and deterioration of the switching characteristics is suppressed, and a manufacturing method thereof. A bottom-gate thin film transistor in which an oxide semiconductor layer is provided over a source and drain electrodes is manufactured, and angle θ1 of the side surface of the source electrode which is in contact with the oxide semiconductor layer and angle θ2 of the side surface of the drain electrode which is in contact with the oxide semiconductor layer are each set to be greater than or equal to 20° and less than 90°, so that the distance from the top edge to the bottom edge in the side surface of each electrode is increased.

    摘要翻译: 下栅极薄膜晶体管中的源电极和漏电极之间可能发生的电场浓度被放宽并且抑制了开关特性的劣化的结构及其制造方法。 制造在源电极和漏电极上设置氧化物半导体层的底栅薄膜晶体管,与氧化物半导体层接触的源电极的侧表面的角度和角度;角度和角度; 与氧化物半导体层接触的漏电极的侧面的两个面积分别被设定为大于或等于20°且小于90°,​​使得从上边缘到下边缘的距离 每个电极的侧表面增加。

    Semiconductor device and method for manufacturing the same
    84.
    发明授权
    Semiconductor device and method for manufacturing the same 有权
    半导体装置及其制造方法

    公开(公告)号:US08129717B2

    公开(公告)日:2012-03-06

    申请号:US12511285

    申请日:2009-07-29

    IPC分类号: H01L29/22 H01L29/786

    摘要: It is an object to provide a semiconductor device including a thin film transistor with favorable electric properties and high reliability, and a method for manufacturing the semiconductor device with high productivity. In an inverted staggered (bottom gate) thin film transistor, an oxide semiconductor film containing In, Ga, and Zn is used as a semiconductor layer, and a buffer layer formed using a metal oxide layer is provided between the semiconductor layer and a source and drain electrode layers. The metal oxide layer is intentionally provided as the buffer layer between the semiconductor layer and the source and drain electrode layers, whereby ohmic contact is obtained.

    摘要翻译: 本发明的目的是提供一种包括具有良好的电性能和高可靠性的薄膜晶体管的半导体器件,以及一种以高生产率制造半导体器件的方法。 在倒置交错(底栅极)薄膜晶体管中,使用含有In,Ga和Zn的氧化物半导体膜作为半导体层,并且在半导体层和源之间设置使用金属氧化物层形成的缓冲层, 漏电极层。 有意地提供金属氧化物层作为半导体层与源极和漏极电极层之间的缓冲层,从而获得欧姆接触。

    LIGHT EMITTING ELEMENT, LIGHT EMITTING DEVICE AND SEMICONDUCTOR DEVICE
    85.
    发明申请
    LIGHT EMITTING ELEMENT, LIGHT EMITTING DEVICE AND SEMICONDUCTOR DEVICE 有权
    发光元件,发光元件和半导体器件

    公开(公告)号:US20120018771A1

    公开(公告)日:2012-01-26

    申请号:US13246894

    申请日:2011-09-28

    IPC分类号: H01L33/42 H01L27/15

    摘要: It is an object of the present invention to provide a semiconductor device, in particular, a light emitting element which can be easily manufactured with a wet method. One feature of the invention is a light emitting device including a transistor and a light emitting element. In the light emitting element, an organic layer, a light emitting layer, and a second electrode are sequentially formed over a first electrode, and the transistor is electrically connected to the light emitting element through a wiring. Here, the wiring contains aluminum, carbon, and titanium. The organic layer is formed by a wet method. The first electrode which is in contact with the organic layer is formed from indium tin oxide containing titanium oxide.

    摘要翻译: 本发明的目的是提供一种半导体器件,特别是可以容易地以湿法制造的发光元件。 本发明的一个特征是包括晶体管和发光元件的发光器件。 在发光元件中,在第一电极上顺序地形成有机层,发光层和第二电极,并且晶体管通过布线电连接到发光元件。 这里,布线包含铝,碳和钛。 有机层通过湿法形成。 与有机层接触的第一电极由含氧化钛的氧化铟锡形成。

    Manufacturing method of semiconductor device
    86.
    发明授权
    Manufacturing method of semiconductor device 有权
    半导体器件的制造方法

    公开(公告)号:US08043796B2

    公开(公告)日:2011-10-25

    申请号:US11957884

    申请日:2007-12-17

    申请人: Kengo Akimoto

    发明人: Kengo Akimoto

    IPC分类号: G03F7/26

    摘要: A light absorption layer is formed over a substrate, the light absorption layer is selectively irradiated with a laser beam, and a region of the light absorption layer, which is irradiated with the laser beam, is removed. By adding an impurity element imparting one conductivity type or an inert element to a remaining part of the light absorption layer, a tensile stress of the light absorption layer is made lower than that before irradiation with the laser beam.

    摘要翻译: 在基板上形成光吸收层,用激光束选择性地照射光吸收层,去除照射激光的光吸收层的区域。 通过向光吸收层的剩余部分添加赋予一种导电型或惰性元素的杂质元素,使得光吸收层的拉伸应力低于用激光束照射之前的拉伸应力。

    Light emitting element, light emitting device and semiconductor device
    87.
    发明授权
    Light emitting element, light emitting device and semiconductor device 有权
    发光元件,发光器件和半导体器件

    公开(公告)号:US08034646B2

    公开(公告)日:2011-10-11

    申请号:US12486785

    申请日:2009-06-18

    IPC分类号: H01L21/00

    摘要: It is an object of the present invention to provide a semiconductor device, in particular, a light emitting element which can be easily manufactured with a wet method. One feature of the invention is a light emitting device including a transistor and a light emitting element. In the light emitting element, an organic layer, a light emitting layer, and a second electrode are sequentially formed over a first electrode, and the transistor is electrically connected to the light emitting element through a wiring. Here, the wiring contains aluminum, carbon, and titanium. The organic layer is formed by a wet method. The first electrode which is in contact with the organic layer is formed from indium tin oxide containing titanium oxide.

    摘要翻译: 本发明的目的是提供一种半导体器件,特别是可以容易地以湿法制造的发光元件。 本发明的一个特征是包括晶体管和发光元件的发光器件。 在发光元件中,在第一电极上顺序地形成有机层,发光层和第二电极,并且晶体管通过布线电连接到发光元件。 这里,布线包含铝,碳和钛。 有机层通过湿法形成。 与有机层接触的第一电极由含氧化钛的氧化铟锡形成。

    Display device
    88.
    发明授权
    Display device 有权
    显示设备

    公开(公告)号:US07989815B2

    公开(公告)日:2011-08-02

    申请号:US12571552

    申请日:2009-10-01

    IPC分类号: H01L29/04

    摘要: The protective circuit is formed using a non-linear element which includes a gate insulating film covering a gate electrode; a first wiring layer and a second wiring layer which are over the gate insulating film and whose end portions overlap with the gate electrode; and an oxide semiconductor layer which is over the gate electrode and in contact with the gate insulating film and the end portions of the first wiring layer and the second wiring layer. The gate electrode of the non-linear element and a scan line or a signal line is included in a wiring, the first or second wiring layer of the non-linear element is directly connected to the wiring so as to apply the potential of the gate electrode.

    摘要翻译: 保护电路使用非线性元件形成,该非线性元件包括覆盖栅电极的栅极绝缘膜; 第一布线层和第二布线层,其在栅极绝缘膜上方并且其端部与栅电极重叠; 以及氧化物半导体层,其在所述栅电极的上方并与所述栅极绝缘膜和所述第一布线层和所述第二布线层的端部接触。 非线性元件的栅电极和扫描线或信号线包括在布线中,非线性元件的第一或第二布线层直接连接到布线,以施加栅极的电位 电极。

    Semiconductor Device and Method For Manufacturing Semiconductor Device
    89.
    发明申请
    Semiconductor Device and Method For Manufacturing Semiconductor Device 有权
    半导体器件及半导体器件制造方法

    公开(公告)号:US20110165740A1

    公开(公告)日:2011-07-07

    申请号:US13050002

    申请日:2011-03-17

    IPC分类号: H01L21/336 H01L21/20

    摘要: An object is to provide a semiconductor device including a microcrystalline semiconductor film with favorable quality and a method for manufacturing the semiconductor device. In a thin film transistor formed using a microcrystalline semiconductor film, yttria-stabilized zirconia having a fluorite structure is formed in the uppermost layer of a gate insulating film in order to improve quality of a microcrystalline semiconductor film to be formed in the initial stage of deposition. The microcrystalline semiconductor film is deposited on the yttria-stabilized zirconia, so that the microcrystalline semiconductor film around an interface with a base particularly has favorable crystallinity while by crystallinity of the base.

    摘要翻译: 目的在于提供一种具有质量好的微晶半导体膜的半导体装置及其制造方法。 在使用微晶半导体膜形成的薄膜晶体管中,在栅极绝缘膜的最上层形成具有萤石结构的氧化钇稳定的氧化锆,以提高在初始沉积时形成的微晶半导体膜的质量 。 微晶半导体膜沉积在氧化钇稳定的氧化锆上,使得与碱的界面周围的微晶半导体膜特别具有良好的结晶度,同时通过碱的结晶度。