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公开(公告)号：US11665441B2
公开(公告)日：2023-05-30
申请号：US17260087
申请日：2019-07-19
申请人： BRUKER NANO GMBH
发明人： Daniel Radu Goran , Luca Bombelli , Paolo Trigilio
CPC分类号： H04N25/42 , G01J1/46 , H04N25/75 , G01J2001/446
摘要： A pixelated sensor comprises a semiconductor substrate chip with a plurality of sensor pixels and a detector chip with a plurality of detector pixels. Each of the sensor pixels is configured as a photodiode and is electrically connected to an input node of one of the detector pixels. The detector pixels are further configured to convert and output the sensor input to an analog to digital converter. The detector chip further comprises first and second macropixels and a plurality of second macropixels, wherein each first macropixel is formed by subset of detector pixels switchably interconnected via a first conducting grid and wherein each second macropixel is formed by a subset of first macropixels switchably interconnected via a second conducting grid.
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公开(公告)号：US11270867B2
公开(公告)日：2022-03-08
申请号：US17114202
申请日：2020-12-07
申请人： Bruker Nano GmbH
发明人： Thomas Schwager , Daniel Radu Goran
IPC分类号： H01J37/244 , H01J37/20 , G01N23/203
摘要： The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern (20b) of a sample (12) in an electron microscope (60) comprising at least one active electron lens (61) focusing an electron beam (80) in z-direction on a sample (12) positioned in distance D below the electron lens (61), the detected TKD (20b) pattern comprising a plurality of image points xD, yD and mapping each of the detected image points xD, yD to an image point of an improved TKD pattern (20a) with the coordinates x0, y0 by using and inverting generalized terms of the form xD=γ*A+(1−γ)*B and yD=γ*C+(1−γ)*D wherein γ = Z D with Z being an extension in the z-direction of a cylindrically symmetric magnetic field BZ of the electron lens (61), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x0, y0, with B and D defining a rotation around a symmetry axis of the magnetic field BZ, and with A and C defining a combined rotation and contraction operation with respect to the symmetry axis of the magnetic field BZ. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.
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公开(公告)号：US20210190818A1
公开(公告)日：2021-06-24
申请号：US16952579
申请日：2020-11-19
申请人： Bruker Nano GmbH
摘要： The invention relates to a measuring device for a scanning probe microscope that comprises the following: a sample receptacle which is configured to receive a measurement sample to be examined; a measuring probe which is arranged on a probe holder and has a probe tip with which the measurement sample can be measured; a displacement device which is configured to move the measuring probe and the sample receptacle relative to each other, in order to measure the measurement sample, such that the measuring probe, in order to measure the measurement sample, executes a raster movement relative to said measurement sample in at least one spatial direction; a control device which is connected to the displacement device and controls the relative movement between the measuring probe and the sample receptacle; and a sensor device that is configured to detect movement measurement signals for an actual movement of the measuring probe and/or of the sample receptacle that is executed during the relative movement between the measuring probe and the sample receptacle in order to measure the measurement sample, and to relay the movement measurement signals to the control device, the movement measurement signals indicating a first movement component in a first spatial direction that disrupts the raster movement and a second movement component in a second spatial direction that disrupts the raster movement, which second spatial direction extends transversely to the first spatial direction. The control device is configured to control the relative movement between the measuring probe and the sample receptacle in such a way that the displacement device is acted upon by the control device with compensating control signal components which cause a first countermovement which substantially compensates for the first disruptive movement component in the first spatial direction, and/or cause a second countermovement which substantially compensates for the second disruptive movement component in the second spatial direction. Furthermore, a scanning probe microscope comprising the measuring device and a method for scanning probe microscopic examination of a measurement sample by means of a scanning probe microscope are provided.
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公开(公告)号：US10908103B2
公开(公告)日：2021-02-02
申请号：US16182437
申请日：2018-11-06
申请人： Bruker Nano GmbH
IPC分类号： G01N23/223 , G21K1/04 , G21K1/06
摘要： The present invention relates to an X-ray fluorescence, XRF, spectrometer, for measuring X-ray fluorescence emitted by a target, wherein the XRF spectrometer comprises an X-ray tube with an anode to emit a divergent X-ray beam, a capillary lens that is configured to focus the divergent X-ray beam on the target, an aperture system that is positioned between the anode of the X-ray tube and the capillary lens and comprises at least one pinhole, and a detector that is configured for detecting X-ray fluorescence radiation emitted by the target, wherein the at least one pinhole is configured for being inserted into the divergent X-ray beam and for reducing a beam cross section of the divergent X-ray beam between the anode and the capillary lens. The present invention further relates to an aperture system for a spectrometer, to the use of an aperture system for adjusting the focal depth of a spectrometer and to a method for adjusting the focal depth of as spectrometer.
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5.发明申请LOW-INTERFERENCE SENSOR HEAD FOR A RADIATION DETECTOR, AS WELL AS A RADIATION DETECTOR WHICH CONTAINS THIS LOW-INTERFERENCE SENSOR HEAD 有权用于辐射检测器的低干扰传感器头，作为包含该低干扰传感器头的辐射检测器公开(公告)号：US20120132818A1
公开(公告)日：2012-05-31
申请号：US13378218
申请日：2010-06-15
申请人： Meiken Falke , Robert Kroemer
发明人： Meiken Falke , Robert Kroemer
CPC分类号： H01J37/244 , G01T1/24 , G01T1/244 , H01J37/256 , H01J37/28 , H01J2237/0264 , H01J2237/2442
摘要： The invention relates to a low interference sensor head for a radiation detector and a radiation detector containing said low interference sensor head. Preferably, the radiation detector according to the invention is an X-ray detector. The invention further relates to the use of the low interference sensor head or the radiation detector, in particular of the X-ray detector for radiation analysis, in particular for (energy dispersive) X-ray analysis in microscopy using optics for charged particles.
摘要翻译： 本发明涉及一种用于辐射检测器的低干扰传感器头和包含所述低干扰传感器头的辐射检测器。 优选地，根据本发明的辐射检测器是X射线检测器。 本发明还涉及使用低干涉传感器头或辐射检测器，特别是用于辐射分析的X射线检测器，特别是使用用于带电粒子的光学器件的显微镜中的（能量色散）X射线分析。
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6.发明授权公开(公告)号：US12106867B2
公开(公告)日：2024-10-01
申请号：US15325958
申请日：2015-08-13
申请人： BRUKER NANO GMBH
发明人： Ulrich Waldschläger
IPC分类号： G01N23/00 , G01N23/20008 , G01N23/20016 , G21K1/06 , G21K7/00
CPC分类号： G21K1/067 , G01N23/20008 , G01N23/20016 , G01N2223/33 , G21K7/00 , G21K2201/067
摘要： A method for scanning a sample by means of X-ray optics for irradiating the sample with X-rays, comprises the following steps:
(a) displacing a measuring point, defined by an optical exit point of the X-ray optics, in the sample in a first scanning direction by means of swiveling the X-ray optics about a first swivel axis;
(b) detecting radiation emanating from the sample at, at least, two measuring points along the first scanning direction;
(c) combining measured values correlating with the detected radiation to form an overall scan.-
公开(公告)号：US11579100B2
公开(公告)日：2023-02-14
申请号：US17095336
申请日：2020-11-11
申请人： BRUKER NANO GMBH
发明人： Ralf Terborg
IPC分类号： G01N23/2252 , G01J3/443 , G01B15/02
摘要： A method comprises the steps of: (a) Obtaining a measured X-ray spectrum for the coated sample, for determining characteristics for the sample and for a coating material; (b) Determining a simulated X-ray spectrum for the sample based on an initial sample composition; (c) Determining an adapted sample composition that improves a match between the characteristics of the sample and an adapted simulated X ray spectrum; (d) Determining an adapted coating thickness for the coating material based on the adapted sample composition and characteristics of the coating; and (e) Repeating the steps (b) to (d) using the adapted sample composition and the adapted coating thickness of the coating material instead of the initial values, wherein the coating thickness is used for determining an absorption of X-rays.
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公开(公告)号：US20210183612A1
公开(公告)日：2021-06-17
申请号：US17114202
申请日：2020-12-07
申请人： Bruker Nano GmbH
发明人： Thomas Schwager , Daniel Radu Goran
IPC分类号： H01J37/244 , H01J37/20
摘要： The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern (20b) of a sample (12) in an electron microscope (60) comprising at least one active electron lens (61) focussing an electron beam (80) in z-direction on a sample (12) positioned in distance D below the electron lens (61), the detected TKD (20b) pattern comprising a plurality of image points xD, yD and mapping each of the detected image points xD, yD to an image point of an improved TKD pattern (20a) with the coordinates x0, y0 by using and inverting generalized terms of the form xD=γ*A+(1−γ)*B and yD=γ*C+(1−γ)*D wherein γ = Z D with Z being an extension in the z-direction of a cylindrically symmetric magnetic field BZ of the electron lens (61), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x0, y0, with B and D defining a rotation around a symmetry axis of the magnetic field BZ, and with A and C defining a combined rotation and contraction operation with respect to the symmetry axis of the magnetic field BZ. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.
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公开(公告)号：US09971121B2
公开(公告)日：2018-05-15
申请号：US14765712
申请日：2014-02-13
申请人： BRUKER NANO GMBH
CPC分类号： G02B7/023 , G01N23/20016 , G01N23/223 , G01N2021/575 , G01N2223/076 , G01N2223/321 , G21K1/06 , H01J2235/167
摘要： The invention relates to a device (98) for the spatial alignment of X-ray optics (100) with an entry point (104) and an exit point (108). The device (98) comprises a parallel displacement mechanism (200) for gauging the entry point (104) of the X-ray optics (100) to a first predetermined point (100) by parallel displacement of the X-ray optics (100). Further, the device (98) comprises a goniometer mechanism (300) for gauging the exit point (108) of the X-ray optics (100) to a second predetermined point (106) by at least approximate pivoting of the X-ray optics (100) around the entry point (104). Further, the invention relates to an apparatus (96) which comprises the device (98) and X-ray optics (100).
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公开(公告)号：US09279779B2
公开(公告)日：2016-03-08
申请号：US14621580
申请日：2015-02-13
申请人： Bruker Nano GmbH
发明人： Thomas Schwager
IPC分类号： H01J37/26 , G01N23/207 , G01N23/203
CPC分类号： G01N23/207 , G01N23/203
摘要： According to the invention a method is provided for identifying a crystallographic candidate phase of a crystal in an EBSD diffraction pattern, which includes the following steps: Sorting and indexing of the bands of the diffraction pattern in order of decreasing intensity. Providing of indices of the diffraction bands of candidate phases, which are to be expected as a result of the EBSD pattern acquisition, in a database, wherein all the indices provided can, in each case, be assigned to a candidate phase. Identification of the expected bands with the bands measured in the diffraction pattern for each candidate phase. Comparison of the intensities of bands of the measured diffraction pattern with intensities which were predicted for the diffraction bands of the candidate phases, which are to be expected as a result of the EBSD pattern acquisition, the indices of said candidate phases being stored in the database. In addition, a corresponding computer program and a computer-readable storage medium are provided, on which a computer program according to the invention is stored.
摘要翻译： 根据本发明，提供了一种用于识别EBSD衍射图案中的晶体的晶体候选相的方法，其包括以下步骤：按照强度降低的顺序对衍射图案的带进行排序和索引。 在数据库中提供作为EBSD模式获取的结果的预期候选阶段的衍射带的索引，其中在每种情况下所提供的所有索引可以被分配给候选阶段。 用每个候选相的衍射图形测量的带的预期带的识别。 测量的衍射图谱的频带的强度与作为EBSD模式获取的结果预期的候选相的衍射频带预测的强度的比较，所述候选相位的索引被存储在数据库中 。 此外，提供了相应的计算机程序和计算机可读存储介质，其上存储有根据本发明的计算机程序。
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