Terminal
    1.
    发明授权
    Terminal 有权

    公开(公告)号:US12113321B1

    公开(公告)日:2024-10-08

    申请号:US18368200

    申请日:2023-09-14

    申请人: Napra Co., Ltd.

    发明人: Shigenobu Sekine

    IPC分类号: H01R4/58 H01B1/02 H01R13/03

    CPC分类号: H01R4/58 H01B1/026 H01R13/03

    摘要: According to this invention, provided is a terminal having a plating layer formed on a surface of a base, the plating layer having a structure in which an intermetallic compound crystal that contains Sn, Cu, Cr and Ni, is dispersed in a parent phase that contains Sn and an Sn—Cu alloy.

    METAL PARTICLE
    2.
    发明申请

    公开(公告)号:US20220219265A1

    公开(公告)日:2022-07-14

    申请号:US17145838

    申请日:2021-01-11

    申请人: NAPRA CO., LTD.

    发明人: Shigenobu SEKINE

    IPC分类号: B23K35/02 B23K35/26

    摘要: According to this invention, provided is a metal particle that includes an intermetallic compound composed of Sn, Cu and Ni, in a basal phase that contains Sn and an Sn—Cu alloy, and at least parts of the Sn—Cu alloy and the intermetallic compound in the basal phase form an endotaxial joint.

    METAL PARTICLE
    3.
    发明申请

    公开(公告)号:US20210078111A1

    公开(公告)日:2021-03-18

    申请号:US16571799

    申请日:2019-09-16

    申请人: NAPRA CO., LTD.

    发明人: Shigenobu SEKINE

    摘要: Disclosed is a metal particle that includes Cu and Sn, the metal particle having a metal matrix composed of Sn—Cu alloy, and a nano-sized intermetallic compound composed of Cu and Sn, and the metal particle having at least inside thereof an alloyed structure in which the metal matrix and the intermetallic compound form an endotaxial junction.

    ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREFOR
    10.
    发明申请
    ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREFOR 有权
    电子设备及其制造方法

    公开(公告)号:US20110284912A1

    公开(公告)日:2011-11-24

    申请号:US13106933

    申请日:2011-05-13

    IPC分类号: H01L33/62 H01L21/28

    摘要: An electronic device includes a semiconductor substrate, an insulating material-filled layer and a vertical conductor. The semiconductor substrate has a vertical hole extending in a thickness direction thereof. The insulating material-filled layer is a ring-shaped layer filled in the vertical hole for covering an inner periphery thereof and includes an organic insulating material or an inorganic insulating material mainly of a glass and a nanocomposite ceramic. The nanocomposite ceramic has a specific resistance of greater than 1014 Ω·cm at room temperature and a relative permittivity of 4 to 9. The vertical conductor is a solidified metal body filled in an area surrounded by the insulating material-filled layer.

    摘要翻译: 电子设备包括半导体衬底,绝缘材料填充层和垂直导体。 半导体衬底具有沿其厚度方向延伸的垂直孔。 绝缘材料填充层是填充在用于覆盖其内周的垂直孔中的环状层,并且包括主要由玻璃和纳米复合陶瓷组成的有机绝缘材料或无机绝缘材料。 纳米复合陶瓷在室温下的电阻率大于1014&OHgr·cm,相对介电常数为4〜9。垂直导体是填充在被绝缘材料填充层包围的区域中的凝固金属体。