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公开(公告)号：US11850653B2
公开(公告)日：2023-12-26
申请号：US17172522
申请日：2021-02-10
申请人： MAX CO., LTD.
CPC分类号： B21F15/04 , B21F7/00 , B21F11/00 , E04G21/123
摘要： A binding machine includes: a wire feeding unit; a curl forming unit; a cutting unit; a binding unit; a motor; and a control unit. The binding unit includes: a rotary shaft to be driven by the motor; a wire engaging body configured to engage the wire and to rotate together with the rotary shaft, thereby twisting the wire; and a rotation regulation part configured to regulate rotation of the wire engaging body. The control unit is configured to control stop of the motor rotating in a direction of twisting the wire, based on a position in a rotation direction of the wire engaging body and a position at which the rotation of the wire engaging body can be regulated by the rotation regulation part.
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公开(公告)号：USD1002356S1
公开(公告)日：2023-10-24
申请号：US29834041
申请日：2022-04-08
申请人： MAX CO., LTD.
设计人： Masatoshi Asai
摘要： FIG. 1 is a perspective view of a plant binding clip showing my new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left side view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a top view thereof;
FIG. 7 is a bottom view thereof; and,
FIG. 8 is a perspective view of a plant binding clip, shown with environment.
The broken line showing of the plant binding clip is for the purpose of illustrating portions of the article and forms no part of the claimed design. The broken line showing of environment in FIG. 8 forms no part of the claimed design.-
公开(公告)号：US11795710B2
公开(公告)日：2023-10-24
申请号：US16918452
申请日：2020-07-01
申请人： MAX CO., LTD.
发明人： Osamu Itagaki
CPC分类号： E04G21/123 , B21F15/04 , B21F23/00
摘要： A binding machine includes a wire feeding unit which feeds a wire, a curl guide which curls the fed wire around an object to be bound, a binding unit including a twisting shaft provided to be rotatable around an axis, a gripping part provided at one end of the twisting shaft and a drive unit provided to the other end of the twisting shaft, a control unit which controls the drive unit, and a binding machine main body which accommodates therein the binding unit and the control unit. When an inside of the binding machine main body is divided by a virtual plane perpendicular to the axis to be partitioned into a first space in which the gripping part is accommodated and a second space in which the drive unit is accommodated, the control unit is arranged in the second space in which the drive unit is accommodated.
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公开(公告)号：US11756808B2
公开(公告)日：2023-09-12
申请号：US17386645
申请日：2021-07-28
发明人： Takehiro Ueda
IPC分类号： H01L21/67 , H01L21/687 , H01L21/3065 , H01J37/32
CPC分类号： H01L21/67126 , H01J37/3244 , H01J37/32532 , H01L21/3065 , H01L21/68735 , H01L21/68742 , H01L21/68764
摘要： A plasma processing apparatus includes an insertion member having a first surface facing a vacuum space, a second surface facing a non-vacuum space, and an insertion hole penetrating through the first and second surfaces. A pin is inserted into the insertion hole and moved vertically. A movable member is provided in a recess formed on a wall surface of the insertion hole facing the pin. The movable member has an opening into which the pin is inserted and is movable along a surface of the recess. A first sealing member is provided between the movable member and the pin. A second sealing member is provided between the movable body and the surface of the recess and allows, when a pressing force of the pin that locally compresses the first sealing member acts on the first sealing member, the movable member to move in a direction to release the pressing force.
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5.发明授权公开(公告)号：US11735448B2
公开(公告)日：2023-08-22
申请号：US16809741
申请日：2020-03-05
IPC分类号： H01L21/67 , H01L21/673 , H01L21/687 , B65G47/90
CPC分类号： H01L21/6732 , B65G47/90 , H01L21/67167 , H01L21/67265 , H01L21/68707
摘要： A container for consumables includes multiple holding portions, a partition plate and a fixer. The multiple holding portions are configured to respectively accommodate the consumables, each of which is loaded into and unloaded from one direction. The partition plate includes a first portion formed to be disposed between a light emitting part and a light receiving part of a detector, and the partition plate is accommodated in one of the multiple holding portions. The fixer is configured to fix the container so that the consumables are arranged on a transfer path to be loaded into and unloaded from the multiple holding portions.
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公开(公告)号：US11735402B2
公开(公告)日：2023-08-22
申请号：US17843054
申请日：2022-06-17
发明人： Takashi Kubo , Kippei Sugita , Yuhei Shimatsu
CPC分类号： H01J37/32917 , G01J1/58 , H01J2237/24507
摘要： A measurement method includes: (a) measuring an emission intensity for each wavelength of light detected from a plasma generated in a plasma processing apparatus at each different exposure time by a light receiving element; (b) specifying, with respect to each of a plurality of different individual wavelength ranges that constitutes a predetermined wavelength range, a distribution of the emission intensity in the individual wavelength range measured at an exposure time at which an emission intensity of a predetermined wavelength included in the individual wavelength range becomes an emission intensity within a predetermined range; (c) selecting a distribution of the emission intensity in the individual wavelength range from the distribution of the emission intensity specified in (b); and (d) outputting the distribution of the emission intensity selected for each individual wavelength range.
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公开(公告)号：US11735392B2
公开(公告)日：2023-08-22
申请号：US17322241
申请日：2021-05-17
发明人： Daisuke Hayashi , Kengo Kaneko , Katsuyuki Koizumi
IPC分类号： H01J37/24 , H01L21/683 , H01L21/67 , H01J37/20 , H01J37/32
CPC分类号： H01J37/24 , H01J37/20 , H01J37/32577 , H01J37/32724 , H01J37/32908 , H01L21/67069 , H01L21/67103 , H01L21/67109 , H01L21/67248 , H01L21/6831 , H01L21/6833 , H01J2237/2001
摘要： A plasma processing apparatus includes an external circuit electrically connected through a line to an electrical component in a processing chamber and a filter provided on the line to attenuate or block noise introduced into the line from the electrical component toward the external circuit. The filter includes a coil having constant diameter and coil length; a tubular outer conductor accommodating the coil and forming a distributed constant line in which parallel resonance occurs at multiple frequencies in combination with the coil; and a movable member for changing each winding gap of the coil and provided in an effective section where a specific one or a plurality of parallel resonance frequencies is shifted to a higher frequency side or a lower frequency side in frequency-impedance characteristics of the filter by changing the winding gap of the coil in the effective section in a longitudinal direction of the coil.
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公开(公告)号：US11731308B2
公开(公告)日：2023-08-22
申请号：US17098093
申请日：2020-11-13
申请人： MAX CO., LTD.
发明人： Masashi Shimamura , Tatsuya Kenjo
摘要： An electric stapler includes: a binding part configured to bind a sheet bundle by striking out a staple having a crown portion and leg portions; and a first guide part configured to guide the sheet bundle to the binding part, and a second guide part facing the first guide part. The first guide part and the second guide part face each other at a distance. The first guide part and the second guide part are opened therebetween as both sides along a length direction of the crown portion, and one side away from the binding part are coupled each other. Lengths from end portions on one side, which are away from the binding part along the direction orthogonal to the length direction of the crown portion, of the first guide part and the second guide part to the binding part are 15 mm or longer.
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公开(公告)号：US11728135B2
公开(公告)日：2023-08-15
申请号：US14932057
申请日：2015-11-04
发明人： Jianping Zhao , Lee Chen , Merritt Funk , Zhiying Chen
IPC分类号： H01J37/32 , H01L21/3065 , H01L21/67
CPC分类号： H01J37/32009 , H01J37/3244 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32642 , H01J37/32697 , H01J37/32715 , H01L21/3065 , H01L21/67069
摘要： This disclosure relates to a plasma processing system for controlling plasma density near the edge or perimeter of a substrate that is being processed. The plasma processing system may include a plasma chamber that can receive and process the substrate using plasma for etching the substrate, doping the substrate, or depositing a film on the substrate. This disclosure relates to a plasma processing system for controlling plasma density near the edge or perimeter of a substrate that is being processed. In one embodiment, the plasma density may be controlled by reducing the rate of loss of ions to the chamber wall during processing. This may include biasing a dual electrode ring assembly in the plasma chamber to alter the potential difference between the chamber wall region and the bulk plasma region.
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公开(公告)号：US11721564B2
公开(公告)日：2023-08-08
申请号：US16842087
申请日：2020-04-07
发明人： Toshiaki Toyomaki
IPC分类号： H01L21/67 , H01L21/3065 , H01J37/305
CPC分类号： H01L21/67069 , H01L21/3065 , H01L21/67155 , H01L21/67173 , H01L21/67184 , H01L21/67196 , H01J37/305
摘要： A substrate processing system includes a first substrate processing chamber, a first substrate transfer chamber connected to the first substrate processing chamber, a second substrate processing chamber, and a second substrate transfer chamber connected to the second substrate processing chamber. The substrate processing system further includes a buffer chamber connected between the first substrate transfer chamber and the second substrate transfer chamber, the buffer chamber having at least one substrate holder. At least a part of the buffer chamber and at least one of the first substrate transfer chamber or the second substrate transfer chamber are vertically overlapped with each other.
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