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    STRUCTURE WITH SUB-LITHOGRAPHIC RANDOM CONDUCTORS AS A PHYSICAL UNCLONABLE FUNCTION
    3.
    发明申请
    STRUCTURE WITH SUB-LITHOGRAPHIC RANDOM CONDUCTORS AS A PHYSICAL UNCLONABLE FUNCTION 有权
    具有次平面随机导体作为物理不可靠函数的结构

    公开(公告)号：US20140042628A1

    公开(公告)日：2014-02-13

    申请号：US13570972

    申请日：2012-08-09

    申请人： Daniel C. Edelstein ,  Gregory M. Fritz ,  Stephen M. Gates ,  Dirk Pfeiffer

    发明人： Daniel C. Edelstein ,  Gregory M. Fritz ,  Stephen M. Gates ,  Dirk Pfeiffer

    IPC分类号： H01L23/52 ,  H01L21/768

    CPC分类号： H01L23/5228 ,  H01L21/0332 ,  H01L21/32139 ,  H01L23/52 ,  H01L23/522 ,  H01L23/576 ,  H01L2924/0002 ,  H04L9/3278 ,  H04L2209/12 ,  H01L2924/00

    摘要： A secure electronic structure including a plurality of sub-lithographic conductor features having non-repeating random shapes as a physical unclonable function (PUF) and an integrated circuit including the same are provided. Some of the conductor features of the plurality of conductor features form ohmic electrical contact to a fraction of regularly spaced array of conductors that are located above or beneath the plurality of conductor features having the non-repeating shapes, while other conductor features of the plurality of conductor features do not form ohmic electrical contact with any of the regularly spaced array of conductors. Thus, a unique signature of electrical continuity is provided which can be used as a PUF within an integrated circuit.

    摘要翻译： 提供一种包括具有非重复随机形状作为物理不可克隆功能（PUF）的多个亚光刻导体特征的安全电子结构以及包括该非亚光刻导体特征的集成电路。 多个导体特征中的一些导体特征形成欧姆电接触到位于具有非重复形状的多个导体特征的上方或下方的规则间隔的导体阵列的一部分，而多个导体特征的其它导体特征 导体特征不与任何规则间隔的导体阵列形成欧姆电接触。 因此，提供了可以在集成电路内用作PUF的电连续性的唯一签名。

    Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
    7.
    发明申请
    Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties 审中-公开
    具有内置抗反射特性的自分离多层成像叠层

    公开(公告)号：US20110300483A1

    公开(公告)日：2011-12-08

    申请号：US13190252

    申请日：2011-07-25

    申请人： Joy Cheng ,  Dario L. Goldfarb ,  David R. Medeiros ,  Daniel P. Sanders ,  Dirk Pfeiffer ,  Libor Vyklicky

    发明人： Joy Cheng ,  Dario L. Goldfarb ,  David R. Medeiros ,  Daniel P. Sanders ,  Dirk Pfeiffer ,  Libor Vyklicky

    IPC分类号： G03F7/004 ,  G03F7/075

    CPC分类号： G03F7/091 ,  G03F7/0752 ,  Y10S430/136 ,  Y10S438/952 ,  Y10T428/24802

    摘要： A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer. Any optional top coat material and a portion of the photoresist layer can be simultaneously removed from the coated substrate to form a patterned photoresist layer on the substrate.

    摘要翻译： 涂覆方法包括使用包含聚合物光致抗蚀剂材料和包含在单一溶液中的抗反射涂层材料的自分离聚合物组合物在基材上形成图案化材料层。 当将该溶液沉积在基材上并除去溶剂时，两种材料自分离成两层。 这产生了具有单轴双层涂层的涂覆基材，该单轴双层涂层在垂直于基板的方向上具有顶部光刻胶涂层和底部抗反射涂层。 将经涂覆的基底图案地曝光成成像辐射并使涂覆的基底与显影剂接触，产生图案化的材料层。 任何可选的表面涂层材料和光致抗蚀剂层的一部分可以同时从涂覆的基底上移除，以在基底上形成图案化的光致抗蚀剂层。