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    Systems for curing deposited material using feedback control
    1.
    发明授权
    Systems for curing deposited material using feedback control 有权
    使用反馈控制固化沉积材料的系统

    公开(公告)号：US08463116B2

    公开(公告)日：2013-06-11

    申请号：US12165892

    申请日：2008-07-01

    申请人： Edwin Hirahara ,  David L Lee

    发明人： Edwin Hirahara ,  David L Lee

    IPC分类号： F26B19/00

    CPC分类号： H05K3/1283 ,  H05K1/0269 ,  H05K1/095 ,  H05K2203/107 ,  H05K2203/163

    摘要： Systems are provided for curing a deposited curable material film using a light source and feedback system for monitoring the degree of curing using detected optical properties of the film. Operational parameters of the light source (e.g., power) are adjusted by a control system in response to the detected optical properties of the film. In certain embodiments, the curing system includes at least one light source in optical communication with an uncured material, a detector for monitoring an optical property of the curing material, and a feedback system for controlling the light emitted from the light source in response to the detector.

    摘要翻译： 提供了使用光源固化沉积的可固化材料膜的系统和用于使用检测到的膜的光学性质来监测固化程度的反馈系统。 响应于检测到的膜的光学性质，通过控制系统来调节光源的操作参数（例如功率）。 在某些实施例中，固化系统包括与未固化材料光学连通的至少一个光源，用于监测固化材料的光学性质的检测器，以及用于响应于该光源控制从光源发射的光的反馈系统 探测器。

    Systems and methods for curing deposited material using feedback control
    2.
    发明申请
    Systems and methods for curing deposited material using feedback control 有权
    使用反馈控制固化沉积物的系统和方法

    公开(公告)号：US20100003021A1

    公开(公告)日：2010-01-07

    申请号：US12165892

    申请日：2008-07-01

    申请人： EDWIN HIRAHARA ,  DAVID L. LEE

    发明人： EDWIN HIRAHARA ,  DAVID L. LEE

    IPC分类号： F26B3/28

    CPC分类号： H05K3/1283 ,  H05K1/0269 ,  H05K1/095 ,  H05K2203/107 ,  H05K2203/163

    摘要： Methods and systems are provided for optimally curing a deposited curable material film using a light source and feedback system for monitoring the degree of curing using detected optical properties of the film. Operational parameters of the light source (e.g., power) are adjusted by a control system in response to the detected optical properties of the film. The curing system includes at least one light source in optical communication with an uncured material, a detector for monitoring an optical property of the curing material, and a feedback system for controlling the light emitted from the light source in response to the detector.

    摘要翻译： 提供了使用光源和用于使用检测到的膜的光学性质来监测固化程度的反馈系统来优化固化沉积的可固化材料膜的方法和系统。 响应于检测到的膜的光学性质，通过控制系统来调整光源的操作参数（例如功率）。 固化系统包括与未固化材料光学连通的至少一个光源，用于监测固化材料的光学性质的检测器，以及用于响应于检测器控制从光源发射的光的反馈系统。

    Systems and methods for curing a deposited layer on a substrate
    4.
    发明申请
    Systems and methods for curing a deposited layer on a substrate 审中-公开
    用于固化衬底上的沉积层的系统和方法

    公开(公告)号：US20090004368A1

    公开(公告)日：2009-01-01

    申请号：US11771722

    申请日：2007-06-29

    申请人： Edwin Hirahara ,  David L. Lee

    发明人： Edwin Hirahara ,  David L. Lee

    IPC分类号： B28B19/00 ,  B29C65/00

    CPC分类号： B23K26/0622 ,  B05D3/06 ,  B23K26/03 ,  B23K26/082 ,  B23K2101/40 ,  H01L51/0027 ,  H05K1/095 ,  H05K3/0008 ,  H05K3/1283 ,  H05K3/22 ,  H05K2203/107

    摘要： Curing systems are provided that include a planar support surface for supporting a substrate having at least one layer deposited thereon, at least one curing device for curing the at least one deposited layer, and a control system for controlling the overall curing process. The curing device includes at least one laser, a lens module, and an optional modulator. During curing, the beam of light emitted from the laser may be directed onto the deposited layer by 1) controlling the position of an X-Y beam deflecting module to direct the focused beam of laser light onto a desired illumination area of the deposited layer; 2) controlling the position of the laser via an X-Y table, or 3) controlling the position of the substrate via an X-Y table.

    摘要翻译： 提供固化系统，其包括用于支撑其上沉积有至少一层的基材的平面支撑表面，用于固化至少一个沉积层的至少一个固化装置，以及用于控制整个固化过程的控制系统。 固化装置包括至少一个激光器，透镜模块和可选的调制器。 在固化期间，从激光器发射的光束可以通过以下步骤被引导到沉积层上：1）控制X-Y光束偏转模块的位置，以将聚焦的激光束引导到沉积层的期望的照明区域上; 2）通过X-Y工作台控制激光器的位置，或3）通过X-Y工作台控制衬底的位置。

    Certain 7-(2-substituted benzoyl)-1-heterospiro-(4,5)decane-(6,8)-diones
    9.
    发明授权
    Certain 7-(2-substituted benzoyl)-1-heterospiro-(4,5)decane-(6,8)-diones 失效
    某些7-（2-取代苯甲酰基）-1-杂螺 - （4,5）癸烷 - （6,8） - 二酮

    公开(公告)号：US4925479A

    公开(公告)日：1990-05-15

    申请号：US274068

    申请日：1988-11-21

    申请人： David L. Lee

    发明人： David L. Lee

    IPC分类号： A01N43/12 ,  C07D307/94 ,  C07D333/50

    CPC分类号： C07D333/50 ,  A01N43/12 ,  C07D307/94

    摘要： Compounds of the formula ##STR1## wherein X is oxy, thio, sulfinyl or sulonyl;R is halogen; C.sub.1 -C.sub.2 alkyl; C.sub.1 -C.sub.2 alkoxy; trifluoromethoxy; difluoromethoxy; nitro;cyano; C.sub.1 -C.sub.2 haloalkyl; R.sup.a SO.sub.n -- wherein n is 0 or 2 and R.sup.a is C.sub.1 -C.sub.2 alkyl, trifluoromethyl or difluoromethyl;R.sup.1 is hydrogen, C.sub.1 -C.sub.4 alkyl, phenyl or substituted phenyl;R.sup.2 is hydrogen or C.sub.1 -C.sub.4 alkyl; orR.sup.1 and R.sup.2 together are C.sub.2 -C.sub.5 alkylene;R.sup.3 is hydrogen, C.sub.1 -C.sub.4 alkyl, phenyl or substituted phenyl with the proviso that R.sup.1 and R.sup.3 are not both phenyl or substituted phenyl;R.sup.4 is hydrogen or C.sub.1 -C.sub.4 alkyl; andR.sup.5 and R.sup.6 independently are (1) hydrogen; (2) halogen; (3) C.sub.1 -C.sub.4 alkyl; (4) C.sub.1 -C.sub.4 alkoxy; (5) trifluoromethoxy; (6) cyano; (7) nitro; (8) C.sub.1 -C.sub.4 aloalkyl; (9) R.sup.b SO.sub.n -- wherein n is the integer 0, 1 or 2; and R.sup.b is (a) C.sub.1 -C.sub.4 alkyl; (b) C.sub.1 -C.sub.4 alkyl substituted with halogen or cyano; (c) phenyl; or (d) benzyl; (10) --NR.sup.c R.sup.d wherein R.sup.c and R.sup.d independently are hydrogen or C.sub.1 -C.sub.4 alkyl; (11) R.sup.e C(O)-- wherein R.sup.e is C.sub.1 -C.sub.4 alkyl or C.sub.1 -C.sub.4 alkoxy; or (12) --SO.sub.2 NR.sup.c R.sup.d wherein R.sup.c and R.sup.d are as defined; and (13) --N(R.sup.c)C(O)R.sup.d wherein R.sup.c and R.sup.d are as defined; and their salts.

    摘要翻译： 其中X为氧基，硫基，亚磺酰基或磺酰基的式IMAMA的化合物; R是卤素; C1-C2烷基; C1-C2烷氧基; 三氟甲氧基 二氟甲氧基 硝基;氰基; C1-C2卤代烷基; RaSO n-，其中n为0或2，Ra为C 1 -C 2烷基，三氟甲基或二氟甲基; R1是氢，C1-C4烷基，苯基或取代的苯基; R2是氢或C1-C4烷基; 或者R 1和R 2一起是C 2 -C 5亚烷基; R 3是氢，C 1 -C 4烷基，苯基或取代的苯基，条件是R 1和R 3不是苯基或取代的苯基; R4是氢或C1-C4烷基; 和R 5和R 6独立地为（1）氢; （2）卤素; （3）C 1 -C 4烷基; （4）C1-C4烷氧基; （5）三氟甲氧基; （6）氰基; （7）硝基; （8）C1-C4芳烷基; （9）RbSO n-，其中n是整数0,1或2; 并且R b是（a）C 1 -C 4烷基; （b）被卤素或氰基取代的C 1 -C 4烷基; （c）苯基; 或（d）苄基; （10）-NRcRd其中Rc和Rd独立地是氢或C1-C4烷基; （11）ReC（O） - 其中Re为C1-C4烷基或C1-C4烷氧基; 或（12）-SO 2 NR c R d其中R c和R d如所定义; 和（13）-N（R c）C（O）R d，其中R c和R d如所定义; 和它们的盐。