公开(公告)号：US20190159458A1

公开(公告)日：2019-05-30

申请号：US16202269

申请日：2018-11-28

Applicant: Eugene Joseph Pancheri

Inventor： Eugene Joseph Pancheri

IPC: A01N59/00 ,  A01N59/12 ,  A01N25/02 ,  A61L2/18

Abstract: This disclosure provides a method of disinfecting a surface within an area, comprising the steps of: a) dispersing into the area a multiplicity of droplets of a first aqueous composition comprising a first iodine reactant compound that is either a peroxide compound or an iodine salt compound: b) allowing sufficient time for the first aqueous composition to distribute throughout the area, and to deposit and coalesce into a layer upon the surface: c) dispersing into the area a multiplicity of droplets of a second aqueous composition comprising a second iodine reactant compound that is the other of the first iodine reactant compound, and: d) again allowing sufficient time for the droplets of the second aqueous composition to deposit onto the coalesced layer of the first aqueous composition, thereby forming iodine and other iodine biocides in situ and disinfecting the surface.

公开(公告)号：US08629093B2

公开(公告)日：2014-01-14

申请号：US12873401

申请日：2010-09-01

Applicant: Regine Labeque ,  Eugene Joseph Pancheri

Inventor： Regine Labeque ,  Eugene Joseph Pancheri

IPC: C11D3/33 ,  C11D17/04

CPC classification number: C11D17/043 ,  C11D3/33 ,  C11D7/3245

Abstract: The present application relates to a compact liquid detergent composition comprising a mixture of chelants suitable for use in laundry cleaning.

Abstract translation: 本申请涉及一种紧凑的液体洗涤剂组合物，其包含适合用于洗衣清洁的螯合剂的混合物。

公开(公告)号：US08579197B2

公开(公告)日：2013-11-12

申请号：US13155813

申请日：2011-06-08

Applicant: Mehul M Patel ,  Duanfeng He ,  Howard Shepard ,  Eugene Joseph ,  Edward Barkan

Inventor： Mehul M Patel ,  Duanfeng He ,  Howard Shepard ,  Eugene Joseph ,  Edward Barkan

IPC: G06K7/10

CPC classification number: G06K7/10732 ,  G06K7/10693 ,  G06K7/1096

Abstract: A solid-state imager is mounted at a point-of-transaction workstation for capturing images of one- and two-dimensional indicia and is operated at high speed to resist image blurring due to relative movement between the target and the imager. Dedicated hardware assistance and computation resources are allocated to decode multiple, continuous and simultaneous video streams from multiple imagers at the workstation.

Abstract translation: 固态成像仪安装在交易点处，用于捕获一维和二维标记的图像，并且以高速操作以抵抗由于目标和成像器之间的相对移动而导致的图像模糊。 分配专用的硬件辅助和计算资源来解码来自工作站的多个成像器的多个，连续和同步的视频流。

公开(公告)号：US20130189853A1

公开(公告)日：2013-07-25

申请号：US13624190

申请日：2012-09-21

Applicant: Liu Yang ,  Xinjian Lei ,  Bing Han ,  Manchao Xiao ,  Eugene Joseph Karwacki, JR. ,  Kazuhide Hasebe ,  Masanobu Matsunaga ,  Masato Yonezawa ,  Hansong Cheng

Inventor： Liu Yang ,  Xinjian Lei ,  Bing Han ,  Manchao Xiao ,  Eugene Joseph Karwacki, JR. ,  Kazuhide Hasebe ,  Masanobu Matsunaga ,  Masato Yonezawa ,  Hansong Cheng

IPC: H01L21/02

CPC classification number: H01L21/02271 ,  C23C16/308 ,  C23C16/345 ,  C23C16/401 ,  C23C16/45536 ,  H01L21/02126 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/3145 ,  H01L21/31608 ,  H01L21/31633 ,  H01L21/3185

Abstract: This invention discloses the method of forming silicon nitride, silicon oxynitride, silicon oxide, carbon-doped silicon nitride, carbon-doped silicon oxide and carbon-doped oxynitride films at low deposition temperatures. The silicon containing precursors used for the deposition are monochlorosilane (MCS) and monochloroalkylsilanes. The method is preferably carried out by using plasma enhanced atomic layer deposition, plasma enhanced chemical vapor deposition, and plasma enhanced cyclic chemical vapor deposition.

Abstract translation: 本发明公开了在低沉积温度下形成氮化硅，氮氧化硅，氧化硅，碳掺杂氮化硅，碳掺杂氧化硅和碳掺杂氧氮化物膜的方法。 用于沉积的含硅前体是一氯硅烷（MCS）和一氯代烷基硅烷。 该方法优选通过使用等离子体增强原子层沉积，等离子体增强化学气相沉积和等离子体增强循环化学气相沉积来进行。

公开(公告)号：US20130019749A1

公开(公告)日：2013-01-24

申请号：US13359053

申请日：2012-01-26

Applicant: Jeffrey Raymond Hufton ,  Thomas Stephen Farris ,  Timothy Christopher Golden ,  Eugene Joseph Karwacki, JR.

Inventor： Jeffrey Raymond Hufton ,  Thomas Stephen Farris ,  Timothy Christopher Golden ,  Eugene Joseph Karwacki, JR.

IPC: B01D53/04

CPC classification number: B01D53/02 ,  B01D2253/108 ,  B01D2256/10 ,  B01D2256/16 ,  B01D2256/18 ,  B01D2257/108 ,  B01D2257/11 ,  B01D2258/0216 ,  B01D2259/40083 ,  B01D2259/455 ,  C01B23/0052 ,  C01B2210/0037 ,  C01B2210/0046

Abstract: Method for recovering a desired component from a waste gas comprising (a) at an operating facility, introducing a waste gas comprising the desired component and one or more undesired components into an adsorber containing adsorbent material selective for the desired component, adsorbing at least a portion of the desired component therein, (b) terminating flow of waste gas into the adsorber; and (c) recovering and concentrating the desired component by either (1) isolating the adsorber, transporting the adsorber to a central processing facility, or (2) withdrawing from the adsorber an intermediate gas enriched in the desired component, compressing the intermediate gas and storing it in a vessel, isolating the vessel, transporting the vessel to a central processing facility to provide a concentrated product further enriched in the desired component.

Abstract translation: 用于从废气中回收所需组分的方法，包括（a）在操作设施处，将包含所需组分的废气和一种或多种不需要的组分引入含有对所需组分有选择性的吸附材料的吸附剂中，吸附至少一部分 的（b）终止废气进入吸附器的流动; （c）通过（1）分离吸附器，将吸附器输送到中央处理设备来回收和浓缩所需组分，或者（2）从吸附器抽出富含所需组分的中间气体，压缩中间气体和 将其储存在容器中，分离容器，将容器运输到中央处理设备以提供进一步富集所需组分的浓缩产物。

公开(公告)号：US08298628B2

公开(公告)日：2012-10-30

申请号：US12476734

申请日：2009-06-02

Applicant: Liu Yang ,  Xinjian Lei ,  Bing Han ,  Manchao Xiao ,  Eugene Joseph Karwacki, Jr. ,  Kazuhide Hasebe ,  Masanobu Matsunaga ,  Masato Yonezawa ,  Hansong Cheng

Inventor： Liu Yang ,  Xinjian Lei ,  Bing Han ,  Manchao Xiao ,  Eugene Joseph Karwacki, Jr. ,  Kazuhide Hasebe ,  Masanobu Matsunaga ,  Masato Yonezawa ,  Hansong Cheng

IPC: C23C16/00 ,  H05H1/24

CPC classification number: H01L21/02271 ,  C23C16/308 ,  C23C16/345 ,  C23C16/401 ,  C23C16/45536 ,  H01L21/02126 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/3145 ,  H01L21/31608 ,  H01L21/31633 ,  H01L21/3185

Abstract: This invention discloses the method of forming silicon nitride, silicon oxynitride, silicon oxide, carbon-doped silicon nitride, carbon-doped silicon oxide and carbon-doped oxynitride films at low deposition temperatures. The silicon containing precursors used for the deposition are monochlorosilane (MCS) and monochloroalkylsilanes. The method is preferably carried out by using plasma enhanced atomic layer deposition, plasma enhanced chemical vapor deposition, and plasma enhanced cyclic chemical vapor deposition.

Abstract translation: 本发明公开了在低沉积温度下形成氮化硅，氮氧化硅，氧化硅，碳掺杂氮化硅，碳掺杂氧化硅和碳掺杂氧氮化物膜的方法。 用于沉积的含硅前体是一氯硅烷（MCS）和一氯代烷基硅烷。 该方法优选通过使用等离子体增强原子层沉积，等离子体增强化学气相沉积和等离子体增强循环化学气相沉积来进行。

公开(公告)号：US08129577B2

公开(公告)日：2012-03-06

申请号：US12554052

申请日：2009-09-04

Applicant: Timothy John Maykut ,  Suhas Narayan Ketkar ,  Benjamin James Arthur Inman ,  John Irven ,  Eugene Joseph Karwacki, Jr. ,  Neil Alexander Downie

Inventor： Timothy John Maykut ,  Suhas Narayan Ketkar ,  Benjamin James Arthur Inman ,  John Irven ,  Eugene Joseph Karwacki, Jr. ,  Neil Alexander Downie

IPC: B65B1/04

CPC classification number: C07C7/09 ,  C07C11/24

Abstract: A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to −50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.

Abstract translation: 用于提供乙炔的系统和方法，优选在高纯度水平（例如，包括100ppm（“ppm”）或10ppm，或1ppm，或100ppm（“ppb”）或10 ppb或1ppb或更少的溶剂），到本文中描述的诸如半导体制造工艺的使用点。 在一个方面，提供了一种方法，用于提供一种方法，该方法提供包含100ppm或更少溶剂的高纯度乙炔到使用点，包括：在20℃的温度下提供包含乙炔和溶剂的乙炔进料流 至-50℃。 并在-50℃至30℃的温度范围内将乙炔进料流引入净化器中以除去其中所含溶剂的至少一部分，并提供高纯度乙炔。

公开(公告)号：US20110257062A1

公开(公告)日：2011-10-20

申请号：US13084827

申请日：2011-04-12

Applicant: Robert Richard Dykstra ,  Eugene Joseph Pancheri

Inventor： Robert Richard Dykstra ,  Eugene Joseph Pancheri

IPC: C11D3/60 ,  C11D17/00

CPC classification number: C11D3/3947 ,  C11D3/30 ,  C11D3/3927

Abstract: The present invention relates to a non-unit dose liquid laundry detergent composition suitable for use in a single-compartment container comprising: (a) detersive surfactant; (b) from 0 wt % to 20 wt % water; (c) source of peracid; (d) optionally, from 0 wt % to 5 wt % citric acid; and (e) optionally, from 0 wt % to 5 wt % fatty acid, wherein the pH of the undiluted composition is at least 0.5 pH units higher than the pKa of the source of peracid, and wherein upon dilution in de-ionized water to a concentration of 1 g/L at 20° C., the composition forms a wash liquor, wherein the equilibrium pH of the wash liquor is at least 0.5 pH units lower than the pKa of the source of peracid.

Abstract translation: 本发明涉及适用于单室容器的非单位剂量液体衣物洗涤剂组合物，其包含：（a）去污表面活性剂; （b）0重量％至20重量％的水; （c）过酸的来源; （d）任选地，0重量％至5重量％的柠檬酸; 和（e）任选的0重量％至5重量％的脂肪酸​​，其中未稀释的组合物的pH比过酸源的pKa高至少0.5个pH单位，并且其中当在去离子水中稀释至 在20℃下浓度为1g / L，组合物形成洗涤液，其中洗涤液的平衡pH比过酸源的pKa低至少0.5个pH单位。

公开(公告)号：US08028913B2

公开(公告)日：2011-10-04

申请号：US11906092

申请日：2007-09-28

Applicant: Rong Liu ,  Mark Drzymala ,  Eugene Joseph ,  Roland W. F. Lee

Inventor： Rong Liu ,  Mark Drzymala ,  Eugene Joseph ,  Roland W. F. Lee

IPC: G06K7/10

CPC classification number: G06K7/10722

Abstract: Performance of an imaging reader for electro-optically reading direct part markings on workpieces is enhanced by uniformly illuminating the markings. An illuminator is operative for emitting illumination light of greater and lesser intensity toward the indicia. A diffuser is operative for diffusing the illumination light en route to the indicia. The diffuser includes a plurality of diffusing elements adjacent the illuminator for diffusing the illumination light of greater intensity more than the illumination light of lesser intensity.

Abstract translation: 通过均匀地照亮标记，增强了用于电工读取工件上的直接部件标记的成像读取器的性能。 照明器可操作以朝向标记发射更大和较小强度的照明光。 漫射器可操作用于将途中的照明光扩散到标记。 扩散器包括与照明器相邻的多个扩散元件，用于扩散比具有较小强度的照明光强度更大的照明光。

公开(公告)号：US20110171583A1

公开(公告)日：2011-07-14

申请号：US12959067

申请日：2010-12-02

Applicant: Peng Zhang ,  Danielle Megan King Curzi ,  Eugene Joseph Karwacki, JR. ,  Leslie Cox Barber

Inventor： Peng Zhang ,  Danielle Megan King Curzi ,  Eugene Joseph Karwacki, JR. ,  Leslie Cox Barber

IPC: G03F7/20 ,  G03F7/40

CPC classification number: G03F7/32 ,  G03F7/0048 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/3021 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40 ,  G03F7/425

Abstract: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain embodiments, the process solution may reduce post-development defects such as pattern collapse or line width roughness when employed as a rinse solution either during or after the development of the patterned photoresist layer. Also disclosed is a method for reducing the number of defects such as pattern collapse and/or line width roughness on a plurality of photoresist coated substrates employing the process solution of the present invention.

Abstract translation: 使用包含一种或多种表面活性剂的工艺溶液来减少半导体器件制造中的缺陷数量。 在某些实施方案中，当在图案化光致抗蚀剂层的显影期间或之后，当用作冲洗溶液时，所述工艺溶液可以减少显影后缺陷，例如图案塌陷或线宽粗糙度。 还公开了一种使用本发明的工艺溶液来减少多个光致抗蚀剂涂覆的基板上的图案塌陷和/或线宽粗糙度等缺陷的数量的方法。