公开(公告)号：USRE38878E1

公开(公告)日：2005-11-15

申请号：US08993893

申请日：1997-12-18

申请人： Masayoshi Hirose ,  Manabu Tsujimura ,  Seiji Ishikawa ,  Norio Kimura ,  You Ishii

发明人： Masayoshi Hirose ,  Manabu Tsujimura ,  Seiji Ishikawa ,  Norio Kimura ,  You Ishii

IPC分类号： B24B7/22 ,  B24B37/04

CPC分类号： B24B37/107 ,  B24B37/30

摘要： A workpiece such as a semiconductor wafer is supported on a top ring and polished by an abrasive cloth on a turntable while the top ring is being pressed against the turntable and the turntable and the top ring are being rotated. The top ring is coupled to a top ring drive shaft, coupled to a pressure cylinder for pressing the top ring, and to a motor for rotating the top ring. A spherical bearing is interposed between the top ring and the top ring drive shaft for allowing the top ring to align with the upper surface of the moving turntable. A torque transmitting mechanism is operatively coupled between the top ring and the top ring drive shaft for rotating the top ring in synchronization with the top ring drive shaft.

摘要翻译： 诸如半导体晶片的工件被支撑在顶环上并且通过研磨布在转盘上抛光，同时顶环被压靠在转台上，并且转台和顶环正在旋转。 顶环联接到顶环驱动轴，联接到用于按压顶环的压力缸，以及用于旋转顶环的电动机。 在顶环和顶环驱动轴之间插入有球面轴承，用于允许顶环与活动转台的上表面对准。 扭矩传递机构可操作地联接在顶环和顶环驱动轴之间，用于与顶环驱动轴同步地旋转顶环。

公开(公告)号：US5476414A

公开(公告)日：1995-12-19

申请号：US124550

申请日：1993-09-22

申请人： Masayoshi Hirose ,  Manabu Tsujimura ,  Seiji Ishikawa ,  Norio Kimura ,  You Ishii

发明人： Masayoshi Hirose ,  Manabu Tsujimura ,  Seiji Ishikawa ,  Norio Kimura ,  You Ishii

IPC分类号： B24B37/10 ,  B24B37/30 ,  H01L21/304 ,  B24B7/22

CPC分类号： H01L21/02024 ,  B24B37/107 ,  B24B37/30

摘要： A workpiece such as a semiconductor wafer is supported on a top ring and polished by an abrasive cloth on a turntable while the top ring is being pressed against the turntable and the turntable and the top ring are being rotated. The top ring is coupled to a top ring drive shaft, coupled to a pressure cylinder for pressing the top ring, and to a motor for rotating the top ring. A spherical bearing is interposed between the top ring and the top ring drive shaft for allowing the top ring to align with the upper surface of the moving turntable. A torque transmitting mechanism is operatively coupled between the top ring and the top ring drive shaft for rotating the top ring in synchronization with the top ring drive shaft.

摘要翻译： 诸如半导体晶片的工件被支撑在顶环上并且通过研磨布在转盘上抛光，同时顶环被压靠在转台上，并且转台和顶环正在旋转。 顶环联接到顶环驱动轴，联接到用于按压顶环的压力缸，以及用于旋转顶环的电动机。 在顶环和顶环驱动轴之间插入有球面轴承，用于允许顶环与活动转台的上表面对准。 扭矩传递机构可操作地联接在顶环和顶环驱动轴之间，用于与顶环驱动轴同步地旋转顶环。

公开(公告)号：USRE38228E1

公开(公告)日：2003-08-19

申请号：US08789304

申请日：1997-01-30

申请人： Masayoshi Hirose ,  Seiji Ishikawa ,  Norio Kimura ,  Kiyotaka Kawashima ,  You Ishii

发明人： Masayoshi Hirose ,  Seiji Ishikawa ,  Norio Kimura ,  Kiyotaka Kawashima ,  You Ishii

IPC分类号： B24B100

CPC分类号： B24B53/017 ,  B24B37/26

摘要： A turntable with an abrasive cloth mounted thereon and a top ring positioned above the turntable are independently rotatably provided. The top ring holds a workpiece to be polished and presses the workpiece against the abrasive cloth. The turntable and the top ring are rotated to polish the surface of the workpiece to a flat mirror finish on the abrasive cloth. A rotatable brush pressed against the abrasive cloth is rotated about an axis substantially perpendicularly to the plane of the abrasive cloth, and oscillated substantially radially between radially inner and outer positions over the abrasive cloth. A cleaning solution is sprayed from a nozzle onto the abrasive cloth. The turntable has a bank along an outer circumferential edge thereto for preventing a protective solution, which is supplied to the abrasive cloth to keep the abrasive cloth wet and prevent it, from flowing off the turntable when the turntable is stationary.

公开(公告)号：US5384986A

公开(公告)日：1995-01-31

申请号：US124648

申请日：1993-09-22

申请人： Masayoshi Hirose ,  Seiji Ishikawa ,  Norio Kimura ,  Kiyotaka Kawashima ,  You Ishii

发明人： Masayoshi Hirose ,  Seiji Ishikawa ,  Norio Kimura ,  Kiyotaka Kawashima ,  You Ishii

IPC分类号： B24B37/26 ,  B24B53/007 ,  B24B53/017 ,  B41J11/62

CPC分类号： B24B53/017 ,  B24B37/26

摘要： A turntable with an abrasive cloth mounted thereon and a top ring positioned above the turntable are independently rotatably provided. The top ring holds a workpiece to be polished and presses the workpiece against the abrasive cloth. The turntable and the top ring are rotated to polish the surface of the workpiece to a flat mirror finish on the abrasive cloth. A rotatable brush pressed against the abrasive cloth is rotated about an axis substantially perpendicularly to the plane of the abrasive cloth, and oscillated substantially radially between radially inner and outer positions over the abrasive cloth. A cleaning solution is sprayed from a nozzle onto the abrasive cloth. The turntable has a bank along an outer circumferential edge thereof for preventing a protective solution, which is supplied to the abrasive cloth to keep the abrasive cloth wet and prevent it, from flowing off the turntable when the turntable is stationary.

摘要翻译： 安装有研磨布的转盘和位于转盘上方的顶环可独立地可旋转地设置。 顶环保持要抛光的工件，并将工件压在研磨布上。 转盘和顶环旋转以将工件的表面抛光到研磨布上的平整镜面上。 压在研磨布上的可旋转刷子围绕基本上垂直于研磨布平面的轴线旋转，并且在磨料布的径向内部和外部位置之间基本径向摆动。 将清洁溶液从喷嘴喷射到研磨布上。 转台沿其外圆周边缘具有一个堤，用于防止当转台静止时供给磨料以保持磨料湿润并防止磨损的保护溶液流出转台。

公开(公告)号：US5716264A

公开(公告)日：1998-02-10

申请号：US683424

申请日：1996-07-18

申请人： Norio Kimura ,  Ritsuo Kikuta ,  You Ishii ,  Masayoshi Hirose

发明人： Norio Kimura ,  Ritsuo Kikuta ,  You Ishii ,  Masayoshi Hirose

IPC分类号： B24B37/00 ,  B24B53/007 ,  B24B21/18

CPC分类号： B24B53/017

摘要： A polishing apparatus is employed to polish an object to be polished by urging the surface of the object to be polished against the surface of a polishing cloth and causing a relative movement therebetween, while supplying a polishing liquid into an area between the object to be polished and the polishing cloth. A plurality of nozzles spray respective fluid jets to strike against the surface of the cloth. The plurality of nozzles include more than one type of nozzle which vary flow velocity, flow rate, angle of spray, and cross-sectional configuration of a jet. The plurality of nozzles have axes positioned at a location at different distances from the rotation axis of the polishing cloth.

摘要翻译： 抛光装置用于通过将待抛光物体的表面推压在抛光布的表面上并在其之间相对移动，同时将抛光液体提供到待抛光对象之间的区域中来抛光待抛光物体 和抛光布。 多个喷嘴喷射相应的流体射流以抵靠布的表面。 多个喷嘴包括不止一种类型的喷嘴，其改变流速，流速，喷射角度和射流的横截面构造。 多个喷嘴具有位于与抛光布的旋转轴线不同的距离处的轴线。

公开(公告)号：US5398459A

公开(公告)日：1995-03-21

申请号：US156641

申请日：1993-11-24

申请人： Katsuya Okumura ,  Tohru Watanabe ,  Riichirou Aoki ,  Hiroyuki Yano ,  Masako Kodera ,  Atsushi Shigeta ,  You Ishii ,  Norio Kimura ,  Masayoshi Hirose ,  Yukio Ikeda

发明人： Katsuya Okumura ,  Tohru Watanabe ,  Riichirou Aoki ,  Hiroyuki Yano ,  Masako Kodera ,  Atsushi Shigeta ,  You Ishii ,  Norio Kimura ,  Masayoshi Hirose ,  Yukio Ikeda

IPC分类号： B24B37/10 ,  B24B37/30 ,  B24B1/00

CPC分类号： B24B37/102 ,  B24B37/30

摘要： A workpiece such as a semiconductor wafer is positioned between a turntable and a top ring and polished by an abrasive cloth on the turntable while the top ring is being pressed against the turntable. The top ring has a retaining ring for preventing the workpiece from deviating from the lower surface of the top ring, and the retaining ring has an inside diameter larger than an outside diameter of the workpiece. The rotation of the turntable imparts a pressing force in a direction parallel to the upper surface of the turntable to the workpiece so that an outer periphery of the workpiece contacts an inner periphery of the retaining ring, and the rotation of the retaining ring imparts a rotational force to the workpiece so that the workpiece performs a planetary motion relative to the top ring in the retaining ring.

摘要翻译： 诸如半导体晶片的工件位于转盘和顶环之间，并且当顶环被压靠在转盘上时，其通过研磨布在转盘上抛光。 顶环具有用于防止工件偏离顶环的下表面的保持环，并且保持环的内径大于工件的外径。 转台的转动使平台于转台上表面的方向向工件施加压力，使得工件的外周与保持环的内周接触，并且保持环的旋转赋予转动 使工件相对于保持环中的顶环执行行星运动。

公开(公告)号：US5643056A

公开(公告)日：1997-07-01

申请号：US550117

申请日：1995-10-30

申请人： Masayoshi Hirose ,  Seiji Ishikawa ,  Norio Kimura ,  Yoshimi Sasaki ,  Kouki Yamada ,  Fujio Aoyama ,  Noburu Shimizu ,  Katsuya Okumura

发明人： Masayoshi Hirose ,  Seiji Ishikawa ,  Norio Kimura ,  Yoshimi Sasaki ,  Kouki Yamada ,  Fujio Aoyama ,  Noburu Shimizu ,  Katsuya Okumura

IPC分类号： B24B7/22 ,  B24B29/02 ,  B24B37/07 ,  B24B37/10 ,  H01L21/304 ,  B24B1/00

CPC分类号： B24B7/228 ,  B24B29/02 ,  B24B37/04

摘要： A drum-type polishing apparatus for producing a flat mirror polish on an object such as a semiconductor wafer, is capable of three degrees of freedom of movement of a drum member with respect to the wafer. The relative movements can be made, successively or simultaneously, at right angles to an axis of the drum, parallel to the surface of the wafer, as well as at any desired angular orientations. Combined with a follower device to provide automatic compensation for unevenness in pressing pressure applied to the wafer during polishing, the polishing apparatus offers outstanding uniformity in polishing quality and high productivity, even for large diameter wafers, with a comparatively modest investment in both facility space and equipment cost.

摘要翻译： 用于在诸如半导体晶片的物体上制造平面镜抛光的滚筒式抛光装置能够使鼓构件相对于晶片具有三个自由度的移动。 相对运动可以连续或同时地与滚筒的轴线成直角，平行于晶片的表面以及任何期望的角度取向。 结合跟随装置，为抛光期间对晶片施加的压力压力的不均匀性提供自动补偿，抛光装置即使对于大直径晶片也具有优异的抛光质量均匀性和高生产率，在设备空间和 设备成本

公开(公告)号：US5616063A

公开(公告)日：1997-04-01

申请号：US309193

申请日：1994-09-20

申请人： Katsuya Okumura ,  Riichirou Aoki ,  Hiromi Yajima ,  Masako Kodera ,  Shirou Mishima ,  Atsushi Shigeta ,  Masayoshi Hirose ,  Norio Kimura ,  Seiji Ishikawa

发明人： Katsuya Okumura ,  Riichirou Aoki ,  Hiromi Yajima ,  Masako Kodera ,  Shirou Mishima ,  Atsushi Shigeta ,  Masayoshi Hirose ,  Norio Kimura ,  Seiji Ishikawa

IPC分类号： H01L21/302 ,  B08B1/04 ,  B24B27/00 ,  B24B37/04 ,  B24B37/34 ,  B24B51/00 ,  B24B55/12 ,  H01L21/00 ,  H01L21/677 ,  B24B49/00

CPC分类号： H01L21/67167 ,  B08B1/04 ,  B08B13/00 ,  B24B27/0023 ,  B24B37/04 ,  B24B37/345 ,  B24B51/00 ,  B24B55/12 ,  H01L21/67028 ,  H01L21/67046 ,  H01L21/67057 ,  H01L21/67161 ,  H01L21/67219 ,  H01L21/67745

摘要： A polishing apparatus is a cluster type of apparatus having a plurality of units which perform various operations. The polishing apparatus includes a universal transfer robot having at least one arm for transferring a workpiece, a plurality of units disposed around the universal transfer robot and including a loading unit for receiving the workpiece to be polished, at least one polishing unit for polishing the workpiece, at least one washing unit for washing the workpiece which has been polished and an unloading unit for receiving the cleaned workpiece. Discrete mechanisms respectively transfer a clean workpiece and a dirty workpiece amongst the units.

摘要翻译： 抛光装置是具有执行各种操作的多个单元的集群类型的装置。 抛光装置包括具有用于传送工件的至少一个臂的通用传送机器人，设置在通用传送机器人周围的多个单元，并且包括用于接收被抛光工件的装载单元，用于抛光工件的至少一个抛光单元 至少一个用于清洗已经被抛光的工件的洗涤单元和用于接收清洁的工件的卸载单元。 离散机构分别在单元之间传送清洁的工件和脏工件。

公开(公告)号：US6102786A

公开(公告)日：2000-08-15

申请号：US234633

申请日：1999-01-21

申请人： Masayoshi Hirose ,  Yoshimi Sasaki ,  Akira Ogata ,  Seiji Ishikawa ,  Tamami Takahashi ,  Hirokuni Hiyama ,  Yutaka Wada

发明人： Masayoshi Hirose ,  Yoshimi Sasaki ,  Akira Ogata ,  Seiji Ishikawa ,  Tamami Takahashi ,  Hirokuni Hiyama ,  Yutaka Wada

IPC分类号： B24B37/005 ,  B24D13/14 ,  H01L21/304 ,  B24B29/02

CPC分类号： B24B37/26 ,  B24B37/042 ,  B24B37/24

摘要： A polishing apparatus includes a turntable with an abrasive cloth mounted on an upper surface thereof, and a top ring disposed above the turntable for supporting a workpiece to be polished and pressing the workpiece against the abrasive cloth under a predetermined pressure. The turntable and the top ring are movable relatively to each other to polish a surface of the workpiece supported by the top ring with the abrasive cloth. The abrasive cloth has a projecting region on a surface thereof for more intensive contact with the workpiece than other surface of the abrasive cloth. The projecting region has a smaller dimension in a radial direction of the turntable than a diameter of the workpiece when the projecting region is held in contact with the workpiece. A position of the projecting region is determined on the basis of an area in which the projecting region acts on the workpiece.

摘要翻译： 抛光装置包括：转盘，其具有安装在其上表面上的研磨布;以及顶环，其设置在所述转台上方，用于支撑待抛光的工件，并在预定压力下将所述工件压靠所述研磨布。 转盘和顶环彼此相对移动，用研磨布抛光由顶环支撑的工件的表面。 研磨布在其表面上具有突出区域，用于与研磨布的其它表面更加紧密地接触工件。 当突出区域与工件保持接触时，突出区域在转台的径向上具有比工件的直径更小的尺寸。 基于突出区域作用在工件上的区域来确定突出区域的位置。

公开(公告)号：US5641054A

公开(公告)日：1997-06-24

申请号：US362451

申请日：1995-03-07

申请人： Satoshi Mori ,  Masao Matsumura ,  Yoichi Kanemitsu ,  Takeshi Yoshioka ,  Masaaki Kajiyama ,  Fumio Kondo ,  Yuji Shirao ,  Masato Eguchi ,  Hiroyuki Shinozaki ,  Yukio Ikeda ,  Masayoshi Hirose ,  Masaru Nakaniwa ,  Norio Kimura ,  Katsuaki Usui ,  Katsuyuki Aoki

发明人： Satoshi Mori ,  Masao Matsumura ,  Yoichi Kanemitsu ,  Takeshi Yoshioka ,  Masaaki Kajiyama ,  Fumio Kondo ,  Yuji Shirao ,  Masato Eguchi ,  Hiroyuki Shinozaki ,  Yukio Ikeda ,  Masayoshi Hirose ,  Masaru Nakaniwa ,  Norio Kimura ,  Katsuaki Usui ,  Katsuyuki Aoki

IPC分类号： H01L21/00 ,  H01L21/677 ,  B65G35/00

CPC分类号： H01L21/67167 ,  H01L21/67184 ,  H01L21/67709 ,  H01L21/67736

摘要： A magnetic levitation conveyor apparatus has levitation electromagnets, linear motors, and displacement sensors which are disposed outside of a tunnel, and a carriage of simple structure which is movable in the tunnel. The carriage is of canned structure for preventing gases from being generated. The carriage of canned structure allows the tunnel to have a reduced cross-sectional area and to be filled with a highly purified atmosphere such as of a high vacuum. The tunnel has substantially orthogonal branches at a branched point. In the branched point, the carriage can move, while being lifted out of contact with the tunnel partition, with a directional change from a main conveyor passage into a branched conveyor passage. The magnetic levitation conveyor apparatus is highly practical as it can control the carriage to be lifted and moved as described above.

摘要翻译： PCT No.PCT / JP93 / 00930 Sec。 371日期：1995年3月7日 102（e）1995年3月7日PCT PCT 1993年7月6日PCT公布。 第WO94 / 01354号公报 日期1994年1月20日磁悬浮输送装置具有设置在隧道外部的悬浮电磁体，线性电动机和位移传感器，以及可在隧道中移动的简单结构的滑架。 滑架是用于防止产生气体的罐头结构。 罐头结构的支架允许隧道具有减小的横截面积，并且填充有高度净化的气氛，例如高真空。 隧道在分支点处具有大致正交的分支。 在分支点，托架可以在与主输送机通道分支输送通道的方向改变的同时被提升而不与隧道隔板接触。 磁悬浮输送装置是高度实用的，因为它可以如上所述地控制滑架被提升和移动。