Process for producing printed circuit board by electroless plating
    3.
    发明授权
    Process for producing printed circuit board by electroless plating 失效
    通过化学镀制造印刷电路板的工艺

    公开(公告)号:US4378384A

    公开(公告)日:1983-03-29

    申请号:US297565

    申请日:1981-08-31

    摘要: A process for producing a printed circuit board which comprises forming a plating film forming adhesive layer on the whole exposed surface of an insulating board, roughening said adhesive layer surface, depositing a catalyst for electroless copper plating on said adhesive layer surface from a catalyst solution, masking the thus treated insulating board surface excepting the part where a circuit is to be formed, and then performing the electroless copper plating on the catalyst of the board to form a circuit thereon, wherein an improvement comprises treating the roughened adhesive layer surface with an alkaline solution before depositing the catalyst thereon and treating the masked insulating board with an aqueous solution containing a surfactant before performing the electroless copper plating. The above process assures a higher copper utilization and a large adhesive strength of the copper plating to the board.

    摘要翻译: 一种制造印刷电路板的方法,包括在绝缘板的整个暴露表面上形成镀膜形成粘合剂层,使所述粘合剂层表面粗糙化,在所述粘合剂层表面上从催化剂溶液沉积无电镀铜催化剂, 掩蔽除了形成电路的部分之外的如此处理的绝缘板表面,然后在板的催化剂上进行无电镀铜以在其上形成电路,其中改进包括用碱性处理粗糙化的粘合剂层表面 在将催化剂沉积在其上并在进行化学镀铜之前用含有表面活性剂的水溶液处理掩蔽的绝缘板。 上述方法确保了铜的铜利用率和电镀铜的较大的粘合强度。

    Process for electroless copper plating
    4.
    发明授权
    Process for electroless copper plating 失效
    化学镀铜工艺

    公开(公告)号:US4632852A

    公开(公告)日:1986-12-30

    申请号:US746099

    申请日:1985-06-18

    IPC分类号: C23C18/40 H05K3/18 C23C3/02

    CPC分类号: H05K3/187 C23C18/40

    摘要: In a process for electroless copper plating in an electroless copper plating solution containing a copper salt, a complexing agent for the copper salt, a reducing agent for the copper salt, and a pH-adjusting agent, a plating film having distinguished mechanical properties can be obtained by adding at least one of soluble inorganic silicon compounds and soluble inorganic germanium compounds and conducting the electroless copper plating by injecting an oxygen-containing gas into the plating solution or by adding an oxidizing agent to the plating solution or by both injection or the oxygen-containing gas and addition of the oxidizing agent thereto. The stability of the electroless copper plating solution can be maintained better thereby and substantially thick plating is possible.

    摘要翻译: 在含有铜盐,铜盐络合剂,铜盐还原剂和pH调节剂的化学镀铜溶液中的无电镀铜方法中,具有显着的机械性能的镀膜可以是 通过添加可溶性无机硅化合物和可溶性无机锗化合物中的至少一种而进行无电镀铜,通过将含氧气体注入镀液中或者通过向镀液中添加氧化剂,或者通过注入或氧气 并且向其中加入氧化剂。 可以更好地保持化学镀铜溶液的稳定性,并且可以实现基本上厚的镀覆。