RECEPTION APPARATUS USED BY BEING COUPLED TO A NECK OF A CONTAINER
    1.
    发明申请
    RECEPTION APPARATUS USED BY BEING COUPLED TO A NECK OF A CONTAINER 审中-公开
    通过与集装箱的连接使用的接收装置

    公开(公告)号:US20140144864A1

    公开(公告)日:2014-05-29

    申请号:US14122080

    申请日:2011-11-15

    Inventor: Seong-Jae Lee

    Abstract: A reception apparatus to be coupled to container necks having different sizes has a main body in which a reception unit comprising a storage space is formed, and a lower side having a threaded part. Threads fitted to the sizes of the container necks are formed within the thread portion of the reception apparatus. The threads are formed to be capable of being coupled to a plurality of container necks, or formed of elastic threads integrally or separately produced.

    Abstract translation: 要连接到具有不同尺寸的容器颈部的接收装置具有形成包括存储空间的接收单元和具有螺纹部分的下侧的主体。 在接收装置的螺纹部分内形成有适合容器颈部尺寸的螺纹。 螺纹形成为能够联接到多个容器颈部,或者由整体地或单独地制造的弹性线形成。

    Flat panel display device with oxide thin film transistor and method for fabricating the same
    7.
    发明授权
    Flat panel display device with oxide thin film transistor and method for fabricating the same 有权
    具有氧化物薄膜晶体管的平板显示装置及其制造方法

    公开(公告)号:US08853686B2

    公开(公告)日:2014-10-07

    申请号:US13587611

    申请日:2012-08-16

    CPC classification number: H01L27/1225 H01L27/1288 H01L27/3276 H01L2227/323

    Abstract: A flat panel display device with an oxide thin film transistor and a fabricating method thereof are disclosed. The fabricating method of the flat panel display device includes: preparing a substrate defined into a pixel region and a pad contact region; forming a gate electrode and a link line; forming a pixel electrode within the pixel region; forming an oxide layer on the substrate provided with the pixel electrode; forming a passivation layer on the substrate and performing a formation process of contact holes to expose the link line; and forming a second transparent conductive material film on the substrate.

    Abstract translation: 公开了一种具有氧化物薄膜晶体管的平板显示装置及其制造方法。 平板显示装置的制造方法包括:准备限定为像素区域和衬垫接触区域的衬底; 形成栅电极和连接线; 在所述像素区域内形成像素电极; 在设置有像素电极的基板上形成氧化物层; 在所述基板上形成钝化层,并进行接触孔的形成处理以暴露所述连接线; 以及在所述基板上形成第二透明导电材料膜。

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