HIGH-THROUGHPUT WORKPIECE HANDLING
    1.
    发明申请
    HIGH-THROUGHPUT WORKPIECE HANDLING 审中-公开
    高效率工作处理

    公开(公告)号:US20130108406A1

    公开(公告)日:2013-05-02

    申请号:US13470809

    申请日:2012-05-14

    IPC分类号: B66C17/00 B66C1/42 B66C1/02

    摘要: A system and method for receiving unprocessed workpieces, moving them, orienting them and placing them in a load lock, or other end point is disclosed. The system includes a gantry module for moving workpieces from a conveyor system to a swap module. The swap module is used to remove a carrier or matrix of processed workpieces from a load lock and place a carrier of matrix of unprocessed workpieces in its place. The processed workpieces are then moved by the gantry module back to the conveyor. The gantry module may have X, Y, Z and rotational actuators and include an end effector having multiple grippers. A method of aligning a plurality of workpieces on the end effector so that the plurality can be transported at the same time is also disclosed.

    摘要翻译: 公开了一种用于接收未加工的工件,移动它们,将它们定向并将它们放置在装载锁中或其它端点的系统和方法。 该系统包括用于将工件从传送系统移动到交换模块的台架模块。 交换模块用于从加载锁移除已处理工件的载体或矩阵,并将未加工工件的矩阵载体放置在其位置。 然后将经处理的工件通过台架模块移回到输送机。 台架模块可以具有X,Y,Z和旋转致动器,并且包括具有多个夹具的末端执行器。 还公开了一种使末端执行器上的多个工件对齐的方法,以便可以同时传送多个工件。

    PLATEN CLEANING
    2.
    发明申请
    PLATEN CLEANING 审中-公开
    板清洁

    公开(公告)号:US20120017938A1

    公开(公告)日:2012-01-26

    申请号:US13187078

    申请日:2011-07-20

    IPC分类号: B08B1/00

    摘要: To achieve cost efficiency, solar cells must be processed at a high throughput. Breakages, which may leave debris on the clamping surface of the platen, adversely affect this throughput. A plurality of embodiments are disclosed which may be used to remove debris from the clamping surface without breaking the vacuum condition within the processing station. In some embodiments, a brush is used to sweep the debris from the surface of the platen. In other embodiments, an adhesive material is used to collect the debris. In some embodiments, the automation equipment used to handle masks may also be used to handle the platen cleaning mechanisms. In still other embodiments, stream of gas or ion beams are used to clean debris from the clamping surface of the platen.

    摘要翻译: 为了实现成本效益,必须以高产量处理太阳能电池。 碎片可能会使碎片在压板的夹紧表面上产生不利影响。 公开了多个实施例,其可以用于从夹紧表面去除碎屑而不破坏处理站内的真空状况。 在一些实施例中,刷子用于从压板的表面扫掠碎屑。 在其他实施例中,使用粘合剂材料来收集碎屑。 在一些实施例中,用于处理掩模的自动化设备也可用于处理压板清洁机构。 在其它实施例中,气流或离子束用于从压板的夹紧表面清洁碎屑。

    IMPLANT MASK WITH MOVEABLE MASK SEGMENTS
    5.
    发明申请
    IMPLANT MASK WITH MOVEABLE MASK SEGMENTS 失效
    植物面膜与可移动的面膜部分

    公开(公告)号:US20100314559A1

    公开(公告)日:2010-12-16

    申请号:US12757616

    申请日:2010-04-09

    IPC分类号: G21K5/00

    摘要: This apparatus has two mask segments. Each mask segment has apertures that an ion beam may pass through. These mask segments can move between a first and second position using hinges. One or more workpieces are disposed behind the mask segments when these mask segments are in a second position. The two mask segments are configured to cover the one or more workpieces in one instance. Ions are implanted into the one or more workpieces through the apertures in the mask segments.

    摘要翻译: 该装置具有两个掩模段。 每个掩模段具有离子束可能通过的孔。 这些掩模段可以使用铰链在第一和第二位置之间移动。 当这些掩模段处于第二位置时,一个或多个工件设置在掩模段后面。 两个掩模段被配置为在一个实例中覆盖一个或多个工件。 离子通过掩模段中的孔注入到一个或多个工件中。

    Aligning successive implants with a soft mask
    9.
    发明授权
    Aligning successive implants with a soft mask 有权
    将连续的植入物与柔软的面罩对齐

    公开(公告)号:US08921149B2

    公开(公告)日:2014-12-30

    申请号:US13034354

    申请日:2011-02-24

    摘要: A first species selectively dopes a workpiece to form a first doped region. In one embodiment, a selective implant is performed using a mask with apertures. A soft mask is applied to the first doped region. A second species is implanted into the workpiece to form a second implanted region. The soft mask blocks a portion of the second species. Then the soft mask is removed. The first species and second species may be opposite conductivities such that one is p-type and the other is n-type.

    摘要翻译: 第一种类选择性地掺杂工件以形成第一掺杂区域。 在一个实施例中,使用具有孔的掩模进行选择性植入。 软掩模被施加到第一掺杂区域。 将第二物质植入工件以形成第二注入区域。 软掩模阻挡了第二种物质的一部分。 然后去除软面膜。 第一种和第二种可能是相反的电导率,一个是p型,另一个是n型。