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公开(公告)号:US20130108406A1
公开(公告)日:2013-05-02
申请号:US13470809
申请日:2012-05-14
申请人: Jason Schaller , Robert Vopat , Charles T. Carlson , Malcolm N. Daniel, JR. , Aaron Webb , William T. Weaver
发明人: Jason Schaller , Robert Vopat , Charles T. Carlson , Malcolm N. Daniel, JR. , Aaron Webb , William T. Weaver
CPC分类号: B65G49/00 , B65G47/918 , B65G49/061 , B65G2203/041 , H01L21/67213 , H01L21/67733 , H01L21/67736 , H01L21/67754
摘要: A system and method for receiving unprocessed workpieces, moving them, orienting them and placing them in a load lock, or other end point is disclosed. The system includes a gantry module for moving workpieces from a conveyor system to a swap module. The swap module is used to remove a carrier or matrix of processed workpieces from a load lock and place a carrier of matrix of unprocessed workpieces in its place. The processed workpieces are then moved by the gantry module back to the conveyor. The gantry module may have X, Y, Z and rotational actuators and include an end effector having multiple grippers. A method of aligning a plurality of workpieces on the end effector so that the plurality can be transported at the same time is also disclosed.
摘要翻译: 公开了一种用于接收未加工的工件,移动它们,将它们定向并将它们放置在装载锁中或其它端点的系统和方法。 该系统包括用于将工件从传送系统移动到交换模块的台架模块。 交换模块用于从加载锁移除已处理工件的载体或矩阵,并将未加工工件的矩阵载体放置在其位置。 然后将经处理的工件通过台架模块移回到输送机。 台架模块可以具有X,Y,Z和旋转致动器,并且包括具有多个夹具的末端执行器。 还公开了一种使末端执行器上的多个工件对齐的方法,以便可以同时传送多个工件。
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公开(公告)号:US20120017938A1
公开(公告)日:2012-01-26
申请号:US13187078
申请日:2011-07-20
申请人: William T. Weaver , Kevin M. Daniels , Dale K. Stone , Russell J. Low , Benjamin B. Riordon , Jeffrey Blahnik
发明人: William T. Weaver , Kevin M. Daniels , Dale K. Stone , Russell J. Low , Benjamin B. Riordon , Jeffrey Blahnik
IPC分类号: B08B1/00
CPC分类号: H01L21/67028 , B08B1/008 , H01J2237/31711 , H01L21/67046
摘要: To achieve cost efficiency, solar cells must be processed at a high throughput. Breakages, which may leave debris on the clamping surface of the platen, adversely affect this throughput. A plurality of embodiments are disclosed which may be used to remove debris from the clamping surface without breaking the vacuum condition within the processing station. In some embodiments, a brush is used to sweep the debris from the surface of the platen. In other embodiments, an adhesive material is used to collect the debris. In some embodiments, the automation equipment used to handle masks may also be used to handle the platen cleaning mechanisms. In still other embodiments, stream of gas or ion beams are used to clean debris from the clamping surface of the platen.
摘要翻译: 为了实现成本效益,必须以高产量处理太阳能电池。 碎片可能会使碎片在压板的夹紧表面上产生不利影响。 公开了多个实施例,其可以用于从夹紧表面去除碎屑而不破坏处理站内的真空状况。 在一些实施例中,刷子用于从压板的表面扫掠碎屑。 在其他实施例中,使用粘合剂材料来收集碎屑。 在一些实施例中,用于处理掩模的自动化设备也可用于处理压板清洁机构。 在其它实施例中,气流或离子束用于从压板的夹紧表面清洁碎屑。
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公开(公告)号:US20110315899A1
公开(公告)日:2011-12-29
申请号:US13170815
申请日:2011-06-28
申请人: Russell J. LOW , Atul GUPTA , William T. WEAVER
发明人: Russell J. LOW , Atul GUPTA , William T. WEAVER
IPC分类号: G21K5/10
CPC分类号: H01J37/20 , G21K5/10 , H01J37/304 , H01J37/3045 , H01J37/3171 , H01J2237/20285 , H01J2237/31703 , H01L31/18 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要: Glitches during ion implantation of a workpiece, such as a solar cell, can be compensated for. In one instance, a workpiece is implanted during a first pass at a first speed. This first pass results in a region of uneven dose in the workpiece. The workpiece is then implanted during a second pass at a second speed. This second speed is different from the first speed. The second speed may correspond to the entire workpiece or just the region of uneven dose in the workpiece.
摘要翻译: 可以补偿工件(例如太阳能电池)的离子注入期间的毛刺。 在一种情况下,在第一速度的第一次通过期间植入工件。 该第一次通过导致工件中不均匀剂量的区域。 然后在第二次通过期间以第二速度植入工件。 第二速度与第一速度不同。 第二速度可以对应于整个工件或者对应于工件中不均匀剂量的区域。
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公开(公告)号:US20110027463A1
公开(公告)日:2011-02-03
申请号:US12814748
申请日:2010-06-14
CPC分类号: H01L21/67213 , C23C14/48 , H01J37/20 , H01J37/3171 , H01J2237/2001 , H01J2237/2007 , H01J2237/20292 , H01J2237/204 , H01J2237/31711 , H01L21/266 , H01L21/67769 , H01L31/022425 , H01L31/022441 , H01L31/068 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要: A workpiece handling system includes a process chamber configured to support a workpiece for ion implantation, a first mask stored outside the process chamber in a mask station, and a robot system configured to retrieve the first mask from the mask station, and position the first mask upstream of the workpiece so the workpiece receives a first selective implant through the first mask. A method includes storing a first mask outside a process chamber in a mask station, retrieving the first mask from the mask station, positioning the first mask upstream of a workpiece positioned in the process chamber for ion implantation, and performing a first selective implant through the first mask.
摘要翻译: 工件处理系统包括被配置为支撑用于离子注入的工件的处理室,存储在掩模工位中的处理室外部的第一掩模以及被配置为从掩模工位取回第一掩模的机器人系统,并且将第一掩模 在工件的上游,使得工件通过第一掩模接收第一选择性植入物。 一种方法包括将处理室外的第一掩模存储在掩模站中,从掩模站取回第一掩模,将第一掩模定位在位于处理室中的用于离子注入的工件的上游,以及通过第 第一个面具
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公开(公告)号:US20100314559A1
公开(公告)日:2010-12-16
申请号:US12757616
申请日:2010-04-09
IPC分类号: G21K5/00
CPC分类号: H01L21/266 , H01J37/3171 , H01J2237/31711
摘要: This apparatus has two mask segments. Each mask segment has apertures that an ion beam may pass through. These mask segments can move between a first and second position using hinges. One or more workpieces are disposed behind the mask segments when these mask segments are in a second position. The two mask segments are configured to cover the one or more workpieces in one instance. Ions are implanted into the one or more workpieces through the apertures in the mask segments.
摘要翻译: 该装置具有两个掩模段。 每个掩模段具有离子束可能通过的孔。 这些掩模段可以使用铰链在第一和第二位置之间移动。 当这些掩模段处于第二位置时,一个或多个工件设置在掩模段后面。 两个掩模段被配置为在一个实例中覆盖一个或多个工件。 离子通过掩模段中的孔注入到一个或多个工件中。
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公开(公告)号:US07819079B2
公开(公告)日:2010-10-26
申请号:US11530297
申请日:2006-09-08
申请人: Eric A. Englhardt , Michael R. Rice , Jeffrey C. Hudgens , Steve Hongkham , Jay D. Pinson , Mohsen Salek , Charles Carlson , William T Weaver , Helen R. Armer
发明人: Eric A. Englhardt , Michael R. Rice , Jeffrey C. Hudgens , Steve Hongkham , Jay D. Pinson , Mohsen Salek , Charles Carlson , William T Weaver , Helen R. Armer
IPC分类号: B05C13/02 , H01L21/677 , C23C14/00
CPC分类号: G03F7/70991 , H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/67742 , H01L21/67745
摘要: The present invention generally provides an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that is easily configurable, has an increased system throughput, increased system reliability, improved device yield performance, a more repeatable wafer processing history (or wafer history), and a reduced footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, and then certain portions of the photosensitive material are removed in a developing process completed in the cluster tool.
摘要翻译: 本发明总体上提供了一种用于使用容易配置的多室处理系统(例如,集群工具)处理衬底的装置和方法,具有增加的系统吞吐量,增加的系统可靠性,改进的器件产量性能,更可重复的晶片 处理历史(或晶圆历史),减少占地面积。 在一个实施例中,簇工具适于执行其中衬底被感光材料涂覆的轨道光刻工艺,然后转移到步进/扫描器,其将感光材料暴露于某种形式的辐射以形成图案 感光材料,然后在簇组工具中完成的显影过程中去除感光材料的某些部分。
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公开(公告)号:US08455847B2
公开(公告)日:2013-06-04
申请号:US13428682
申请日:2012-03-23
IPC分类号: H01J37/317 , H01J37/244 , H01J3/07
CPC分类号: H01J37/3171 , H01J2237/24507 , H01J2237/24528 , H01J2237/31711 , H01L21/26513 , H01L21/2658 , H01L21/266 , H01L31/0288 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要: In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen. The ion current measurement device is translated across the ion beam. The current of the ion beam directed through a plurality of apertures of the mask is measured using the ion current measurement device. In this manner, the position of the mask with respect to the ion beam as well as the condition of the mask may be determined based on the ion current profile measured by the ion current measurement device.
摘要翻译: 在离子注入机中,离子电流测量装置相对于目标基板的表面共面设置在掩模的后面,如同所述目标基板位于压板上一样。 离子电流测量装置通过离子束平移。 使用离子电流测量装置测量引导通过掩模的多个孔的离子束的电流。 以这种方式,掩模相对于离子束的位置以及掩模的条件可以基于由离子电流测量装置测量的离子电流分布来确定。
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公开(公告)号:US20120227233A1
公开(公告)日:2012-09-13
申请号:US13415411
申请日:2012-03-08
CPC分类号: H01L21/68 , B65G49/07 , H01L21/67769 , H01L21/67775 , H01L21/67781 , H01L21/681 , Y10T29/49764 , Y10T29/49829 , Y10T29/53022 , Y10T29/53539
摘要: An alignment device has a carriage, two rails on the carriage that are configured for a workpiece to pass therebetween, and a finger that protrudes a distance from the carriage. The finger is configured to be disposed on a carrier for the workpieces. The workpieces may be solar cells and may pass through the rails on a conveyor belt. The alignment device may move in order to align the workpieces as the workpieces are loaded into a carrier.
摘要翻译: 对准装置具有滑架,滑架上的两个轨道,其构造成用于工件通过它们;以及从滑架突出一定距离的手指。 手指被配置为设置在用于工件的载体上。 工件可以是太阳能电池,并且可以通过传送带上的轨道。 当工件装载到载体中时,对准装置可以移动以便对齐工件。
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公开(公告)号:US08921149B2
公开(公告)日:2014-12-30
申请号:US13034354
申请日:2011-02-24
IPC分类号: H01L21/266 , H01L21/265 , H01L31/068
CPC分类号: H01L21/266 , H01L21/26513 , H01L31/0682 , Y02E10/547
摘要: A first species selectively dopes a workpiece to form a first doped region. In one embodiment, a selective implant is performed using a mask with apertures. A soft mask is applied to the first doped region. A second species is implanted into the workpiece to form a second implanted region. The soft mask blocks a portion of the second species. Then the soft mask is removed. The first species and second species may be opposite conductivities such that one is p-type and the other is n-type.
摘要翻译: 第一种类选择性地掺杂工件以形成第一掺杂区域。 在一个实施例中,使用具有孔的掩模进行选择性植入。 软掩模被施加到第一掺杂区域。 将第二物质植入工件以形成第二注入区域。 软掩模阻挡了第二种物质的一部分。 然后去除软面膜。 第一种和第二种可能是相反的电导率,一个是p型,另一个是n型。
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公开(公告)号:US08912082B2
公开(公告)日:2014-12-16
申请号:US13070206
申请日:2011-03-23
IPC分类号: H01L21/265 , H01L31/0224 , H01L21/266 , H01L31/18 , H01L31/068
CPC分类号: H01L21/266 , H01L31/022441 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要: Methods to form complementary implant regions in a workpiece are disclosed. A mask may be aligned with respect to implanted or doped regions on the workpiece. The mask also may be aligned with respect to surface modifications on the workpiece, such as deposits or etched regions. A masking material also may be deposited on the implanted regions using the mask. The workpiece may be a solar cell.
摘要翻译: 公开了在工件中形成互补植入区域的方法。 掩模可以相对于工件上的注入或掺杂区域排列。 掩模也可以相对于工件上的表面改性(例如沉积物或蚀刻区域)对准。 掩模材料也可以使用掩模沉积在注入区域上。 工件可以是太阳能电池。
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