公开(公告)号：US09768450B2

公开(公告)日：2017-09-19

申请号：US14653730

申请日：2013-12-17

申请人： APPLIED MATERIALS, INC.

发明人： Daoying Song ,  Chong Jiang ,  Byung-Sung Leo Kwak

IPC分类号： B44C1/22 ,  H01M6/40 ,  C23C14/08 ,  C23C14/34 ,  H01M4/04 ,  H01M10/0585 ,  H01M10/04

CPC分类号： H01M6/40 ,  C23C14/088 ,  C23C14/34 ,  H01M4/0426 ,  H01M10/0436 ,  H01M10/0585

摘要： A method of fabricating a thin film battery may comprise: depositing a first stack of blanket layers on a substrate, the first stack comprising a cathode current collector, a cathode, an electrolyte, an anode and an anode current collector; laser die patterning the first stack to form one or more second stacks, each second stack forming the core of a separate thin film battery; blanket depositing an encapsulation layer over the one or more second stacks; laser patterning the encapsulation layer to open up contact areas to the anode current collectors on each of the one or more second stacks; blanket depositing a metal pad layer over the encapsulation layer and the contact areas; and laser patterning the metal pad layer to electrically isolate the anode current collectors of each of the one or more thin film batteries. For electrically non-conductive substrates, cathode contact areas are opened-up through the substrate.

公开(公告)号：US09765426B1

公开(公告)日：2017-09-19

申请号：US13867865

申请日：2013-04-22

申请人： APPLIED MATERIALS, INC.

发明人： Byung-Sung Leo Kwak ,  Lizhong Sun ,  Jan Isidorsson ,  Chong Jiang

IPC分类号： C23C14/35 ,  C23C14/34 ,  H01J37/34

CPC分类号： C23C14/3414 ,  H01J37/3426 ,  H01J37/3429

摘要： The present invention relates to sputter targets for electrochemical device layer deposition comprising a lithium-containing target material with near-metallic electrical conductivity which includes (a) at least one metal and (b) a lithium-containing material, the lithium-containing material being selected from the group consisting of lithium metal and a lithium-containing salt, wherein the at least one metal and the lithium-containing material are formed into the lithium-containing target material and wherein the lithium-containing target material is configured with a composition sufficient for physical vapor deposition of a lithium-containing electrode of the electrochemical device in a single step, the lithium-containing electrode as deposited requiring no further lithium doping. Furthermore, the composition of the metallic lithium-containing target material may be configured to provide a low enough electrical resistance to permit DC sputtering. Chambers and tools including the sputter target and process flows for fabricating electrochemical devices including steps utilizing the sputter target are also described.

公开(公告)号：US09356316B2

公开(公告)日：2016-05-31

申请号：US13865447

申请日：2013-04-18

申请人： APPLIED MATERIALS, INC.

发明人： Lizhong Sun ,  Chong Jiang ,  Byung-Sung Leo Kwak

IPC分类号： H01M10/0562 ,  H01M6/18 ,  H01M2/16 ,  H01M6/14 ,  B05D5/12 ,  H01G11/56 ,  G02F1/15 ,  H01L49/02 ,  H01M10/04 ,  H01M10/052 ,  H01M10/0585

CPC分类号： H01M10/0562 ,  G02F1/1508 ,  H01G11/56 ,  H01L28/40 ,  H01M10/0436 ,  H01M10/052 ,  H01M10/0585 ,  H01M2300/0068 ,  Y02E60/13

摘要： The present invention relates to vacuum-deposited solid state electrolyte layers with high ionic conductivity in electrochemical devices, and methods and tools for fabricating said electrolyte layers. An electrochemical device may comprise solid state electrolytes with incorporated thin layers and/or particles of transition metal oxides, silicon, silicon oxide, or other suitable materials that will induce an increase in ionic conductivity of the electrolyte stack (for example, materials with which lithium is able to intercalate), or mixtures thereof. An improvement in ionic conductivity of the solid state electrolyte is expected which is proportional to the number of incorporated layers or a function of the distribution uniformity and density of the particles within the electrolyte. Embodiments of the present invention are applicable to solid state electrolytes in a broad range of electrochemical devices including thin film batteries, electrochromic devices and ultracapacitors. The solid state electrolyte layers may be nominally pinhole-free.

摘要翻译： 本发明涉及电化学装置中具有高离子传导性的真空沉积固态电解质层，以及用于制造所述电解质层的方法和工具。 电化学装置可以包括固体电解质，其具有掺入的薄层和/或过渡金属氧化物，硅，氧化硅或其它合适的材料的颗粒，其将引起电解质堆叠的离子导电性的增加（例如，锂 能插入），或其混合物。 期望固体电解质的离子导电性的改善，其与引入的层的数量成比例，或电解质内的颗粒的分布均匀性和密度的函数。 本发明的实施例可应用于包括薄膜电池，电致变色器件和超级电容器在内的宽范围的电化学装置中的固态电解质。 固态电解质层可以标称无针孔。

公开(公告)号：US09252308B2

公开(公告)日：2016-02-02

申请号：US14673345

申请日：2015-03-30

申请人： APPLIED MATERIALS, INC.

发明人： Daoying Song ,  Chong Jiang ,  Byung-Sung Leo Kwak ,  Joseph G. Gordon, II

IPC分类号： H01L21/302 ,  H01L21/461 ,  H01L31/0463 ,  H01L31/024 ,  H01L31/0216

CPC分类号： H01L31/1876 ,  H01L31/02164 ,  H01L31/02167 ,  H01L31/024 ,  H01L31/0463 ,  H01L31/18 ,  H01M4/0471 ,  H01M6/40 ,  H01M10/0436

摘要： Selective removal of specified layers of thin film structures and devices, such as solar cells, electrochromics, and thin film batteries, by laser direct patterning is achieved by including heat and light blocking layers in the device/structure stack immediately adjacent to the specified layers which are to be removed by laser ablation. The light blocking layer is a layer of metal that absorbs or reflects a portion of the laser energy penetrating through the dielectric/semiconductor layers and the heat blocking layer is a conductive layer with thermal diffusivity low enough to reduce heat flow into underlying metal layer(s), such that the temperature of the underlying metal layer(s) does not reach the melting temperature, Tm, or in some embodiments does not reach (Tm)/3, of the underlying metal layer(s) during laser direct patterning.

公开(公告)号：US20150314417A1

公开(公告)日：2015-11-05

申请号：US14266543

申请日：2014-04-30

申请人： Applied Materials, Inc.

发明人： Lizhong Sun ,  Byung-Sung Leo Kwak

IPC分类号： B24B53/017 ,  B24B53/007 ,  B24B55/06

CPC分类号： B24B53/017 ,  B24B53/007 ,  B24B55/06

摘要： A system for use in substrate polishing includes a conditioner system for conditioning a surface of a polishing pad and a vacuum system having a vacuum port. The conditioner system includes a conditioner head constructed to receive an abrasive conditioner component. The vacuum system is configured to apply suction through the vacuum port to the surface of the polishing pad in a direction away from the surface to remove material on the surface.

摘要翻译： 用于基板抛光的系统包括用于调节抛光垫表面的调节系统和具有真空端口的真空系统。 调节器系统包括构造成接收研磨调理器部件的调节头。 真空系统构造成通过真空端口沿着远离表面的方向将吸力施加到抛光垫的表面以去除表面上的材料。

公开(公告)号：US10199660B2

公开(公告)日：2019-02-05

申请号：US15076523

申请日：2016-03-21

申请人： Applied Materials, Inc.

发明人： Byung-Sung Leo Kwak ,  Stefan Bangert ,  Ralf Hofmann ,  Michael Koenig

IPC分类号： H01M6/40 ,  H01M4/13 ,  H01M4/139 ,  H01M4/58 ,  H01M4/62 ,  H01M4/66 ,  C23C14/04 ,  H01M4/02

摘要： A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.

公开(公告)号：US09828669B2

公开(公告)日：2017-11-28

申请号：US14853551

申请日：2015-09-14

申请人： Applied Materials, Inc.

发明人： Daoying Song ,  Chong Jiang ,  Byung-Sung Leo Kwak

IPC分类号： C23C14/58 ,  C23C16/56 ,  H01M4/04 ,  H01M4/1391 ,  H01M4/525 ,  H01M10/0585 ,  H01M6/40 ,  H01M10/0525 ,  H01M14/00 ,  C23C14/08 ,  C23C14/24 ,  C23C14/34 ,  G02F1/155 ,  H01M4/131

CPC分类号： C23C14/5806 ,  C23C14/08 ,  C23C14/24 ,  C23C14/34 ,  C23C14/3485 ,  C23C16/56 ,  G02F1/155 ,  H01M4/0404 ,  H01M4/0423 ,  H01M4/0426 ,  H01M4/131 ,  H01M4/1391 ,  H01M4/525 ,  H01M6/40 ,  H01M10/0525 ,  H01M10/0585 ,  H01M14/005 ,  Y02E60/122 ,  Y02P70/54

摘要： Microwave radiation may be applied to electrochemical devices for rapid thermal processing (RTP) (including annealing, crystallizing, densifying, forming, etc.) of individual layers of the electrochemical devices, as well as device stacks, including bulk and thin film batteries and thin film electrochromic devices. A method of manufacturing an electrochemical device may comprise: depositing a layer of the electrochemical device over a substrate; and microwave annealing the layer, wherein the microwave annealing includes selecting annealing conditions with preferential microwave energy absorption in the layer. An apparatus for forming an electrochemical device may comprise: a first system to deposit an electrochemical device layer over a substrate; and a second system to microwave anneal the layer, wherein the second system is configured to provide preferential microwave energy absorption in the device layer.

公开(公告)号：US20140342229A1

公开(公告)日：2014-11-20

申请号：US14363023

申请日：2012-12-12

申请人： APPLIED MATERIALS, INC. ,  INDUSTRY-UNIVERSITY COOPERATION FOUNDATION-HANYANG UNIVERSITY (IUCF-HYU)

发明人： Byung-Sung Leo Kwak ,  Joseph G. Gordon, II ,  Omkaram Nalamasu ,  Yangkook Sun ,  Wongi Kim ,  Seugmin Oh

IPC分类号： H01M4/36 ,  H01M4/04 ,  H01M4/58 ,  H01M10/0525 ,  H01M4/587 ,  H01M4/136

CPC分类号： H01M4/366 ,  C01B25/45 ,  C01B25/455 ,  H01M4/0471 ,  H01M4/136 ,  H01M4/5815 ,  H01M4/582 ,  H01M4/5825 ,  H01M4/587 ,  H01M10/052 ,  H01M10/0525 ,  H01M2004/028

摘要： Disclosed are a cathode active material for a lithium secondary battery, and a lithium secondary battery including the same. The disclosed cathode active material includes a core including a compound represented by Formula 1; and a shell including a compound represented by Formula 2, in which the core and the shell have different material compositions.

摘要翻译： 公开了一种锂二次电池用正极活性物质和包含该二次电池的锂二次电池。 所公开的阴极活性材料包括包含由式1表示的化合物的核; 和包含由式2表示的化合物的壳，其中核和壳具有不同的材料组成。

公开(公告)号：US20170149093A1

公开(公告)日：2017-05-25

申请号：US15389050

申请日：2016-12-22

申请人： Applied Materials, Inc.

发明人： Lizhong Sun ,  Byung-Sung Leo Kwak ,  Miaojun Wang ,  Dimitrios Argyris ,  Daoying Song

IPC分类号： H01M10/0585 ,  H01M10/0562 ,  H01M10/42 ,  H01M10/04

CPC分类号： H01M10/0585 ,  H01M10/0404 ,  H01M10/0436 ,  H01M10/0562

摘要： A solid state thin film battery may comprise: an adhesion promotion and intermixing barrier layer on a substrate, the layer comprising an electrically insulating material having a thickness in the range of 50 nm to 5,000 nm; a metal adhesion layer on the adhesion promotion and intermixing barrier layer; a current collector layer on the metal adhesion layer; a cathode layer on the current collector layer; an electrolyte layer on the cathode layer; and an anode layer on the electrolyte layer; wherein the device layers form a stack on the thin substrate; and wherein the adhesion promotion layer prevents cracking of the stack and delamination from the thin substrate of the stack during fabrication of the stack, including annealing of the cathode at a temperature in the range of 500° C. to 800° C., and/or intermixing of the current collector and cathode layers during annealing of the cathode layer.

公开(公告)号：US09375825B2

公开(公告)日：2016-06-28

申请号：US14266543

申请日：2014-04-30

申请人： Applied Materials, Inc.

发明人： Lizhong Sun ,  Byung-Sung Leo Kwak

IPC分类号： B24B53/017 ,  B24B55/06 ,  B24B53/007

CPC分类号： B24B53/017 ,  B24B53/007 ,  B24B55/06

摘要： A system for use in substrate polishing includes a conditioner system for conditioning a surface of a polishing pad and a vacuum system having a vacuum port. The conditioner system includes a conditioner head constructed to receive an abrasive conditioner component. The vacuum system is configured to apply suction through the vacuum port to the surface of the polishing pad in a direction away from the surface to remove material on the surface.

摘要翻译： 用于基板抛光的系统包括用于调节抛光垫表面的调节系统和具有真空端口的真空系统。 调节器系统包括构造成接收研磨调理器部件的调节头。 真空系统构造成通过真空端口沿着远离表面的方向将吸力施加到抛光垫的表面以去除表面上的材料。