公开(公告)号：US11384648B2

公开(公告)日：2022-07-12

申请号：US16843358

申请日：2020-04-08

Applicant: Applied Materials, Inc.

Inventor： Yuriy Melnik ,  Sukti Chatterjee ,  Kaushal Gangakhedkar ,  Jonathan Frankel ,  Lance A. Scudder ,  Pravin K. Narwankar ,  David Alexander Britz ,  Thomas Knisley ,  Mark Saly ,  David Thompson

IPC: F01D5/28 ,  F01D9/02 ,  C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D25/12 ,  F01D25/28 ,  F23R3/28 ,  C07F11/00 ,  F01D25/14

Abstract: Protective coatings on an aerospace component are provided. An aerospace component includes a surface containing nickel, nickel superalloy, aluminum, chromium, iron, titanium, hafnium, alloys thereof, or any combination thereof, and a coating disposed on the surface, where the coating contains a nanolaminate film stack having two or more pairs of a first deposited layer and a second deposited layer. The first deposited layer contains chromium oxide, chromium nitride, aluminum oxide, aluminum nitride, or any combination thereof, the second deposited layer contains aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, silicon carbide, yttrium oxide, yttrium nitride, yttrium silicon nitride, hafnium oxide, hafnium nitride, hafnium silicide, hafnium silicate, titanium oxide, titanium nitride, titanium silicide, titanium silicate, or any combination thereof, and the first deposited layer and the second deposited layer have different compositions from each other.

公开(公告)号：US20250133965A1

公开(公告)日：2025-04-24

申请号：US18688260

申请日：2022-08-25

Applicant: Applied Materials, Inc.

Inventor： Vijay Bhan Sharma ,  Bharatwaj Ramakrishnan ,  Sukti Chatterjee

IPC: H10N30/082 ,  C09K13/04 ,  H10N30/853

Abstract: Exemplary substrate processing methods are described. The methods may include providing a scandium-doped aluminum nitride layer on a metal layer. They may further include etching a portion of the scandium-doped aluminum nitride layer with an etching composition. The etching composition may include greater than or about 80 wt. % phosphoric acid. The compositions may further be characterized by a temperature of greater than or about 90° C. during etching.

公开(公告)号：US11761094B2

公开(公告)日：2023-09-19

申请号：US17313847

申请日：2021-05-06

Applicant: Applied Materials, Inc.

Inventor： David Britz ,  Pravin K. Narwankar ,  David Thompson ,  Yuriy Melnik ,  Sukti Chatterjee

IPC: F01D5/28 ,  C23C28/00 ,  F01D5/18 ,  C23C16/455 ,  C23C16/52 ,  C23C28/04 ,  C23C16/40 ,  C23C14/08

CPC classification number: C23C28/3455 ,  C23C16/45525 ,  C23C16/52 ,  C23C28/3215 ,  C23C28/345 ,  F01D5/186 ,  F01D5/288 ,  C23C14/083 ,  C23C16/40 ,  C23C28/042 ,  F05D2230/31 ,  F05D2240/24 ,  F05D2260/95 ,  F05D2300/121 ,  F05D2300/132 ,  F05D2300/134 ,  Y10T428/2462

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof and can have a thickness from 1 nm to 3,000 nm.

公开(公告)号：US20220375723A1

公开(公告)日：2022-11-24

申请号：US17741228

申请日：2022-05-10

Applicant: Applied Materials, Inc.

Inventor： Lance A. Scudder ,  Sukti Chatterjee ,  David Masayuki Ishikawa ,  Yuriy V. Melnik ,  Vibhas Singh

IPC: H01J37/32 ,  C23C16/40 ,  C23C16/455

Abstract: Exemplary methods of forming a coating of material on a substrate may include forming a plasma of a first precursor and an oxygen-containing precursor. The first precursor and the oxygen-containing precursor may be provided in a first flow rate ratio. The methods may include depositing a first layer of material on the substrate. While maintaining the plasma, the methods may include adjusting the first flow rate ratio to a second flow rate ratio. The methods may include depositing a second layer of material on the substrate.

公开(公告)号：US20220372620A1

公开(公告)日：2022-11-24

申请号：US17741252

申请日：2022-05-10

Applicant: Applied Materials, Inc.

Inventor： Lance A. Scudder ,  Sukti Chatterjee ,  David Masayuki Ishikawa ,  Yuriy V. Melnik ,  Vibhas Singh

IPC: C23C16/455 ,  H01J37/32 ,  C23C16/50 ,  C23C16/40 ,  C23C16/34 ,  C23C16/02 ,  C23C16/44 ,  C23C16/54

Abstract: Exemplary methods of forming a coating of material on a substrate may include forming a plasma of a first precursor and an oxygen-containing precursor. The first precursor and the oxygen-containing precursor may be provided in a first flow rate ratio. The methods may include depositing a first layer of material on the substrate. While maintaining the plasma, the methods may include adjusting the first flow rate ratio to a second flow rate ratio. The methods may include depositing a second layer of material on the substrate.

公开(公告)号：US20230168139A1

公开(公告)日：2023-06-01

申请号：US17537807

申请日：2021-11-30

Applicant: Applied Materials, Inc.

Inventor： Sukti Chatterjee ,  David Masayuki Ishikawa ,  Yuriy V. Melnik ,  David A. Britz ,  Lance A. Scudder

IPC: G01L13/00

CPC classification number: G01L13/00 ,  B05B12/006

Abstract: Exemplary backpressure monitoring apparatuses may include a fluid supply source having a fluid port. The backpressure monitoring apparatuses may include a flow control mechanism fluidly coupled with the fluid port. The backpressure monitoring apparatuses may include a delivery tube fluidly coupled with the flow control mechanism and the fluid port. The backpressure monitoring apparatuses may include a pressure differential gauge fluidly coupled with the delivery tube. The pressure differential gauge may include an interface mechanism that is engageable with an outlet of a fluid flow device.

公开(公告)号：US11598000B2

公开(公告)日：2023-03-07

申请号：US16137797

申请日：2018-09-21

Applicant: Applied Materials, Inc.

Inventor： Ranga Rao Arnepalli ,  Colin Costano Neikirk ,  Yuriy Melnik ,  Suresh Chand Seth ,  Pravin K. Narwankar ,  Sukti Chatterjee ,  Lance A. Scudder

IPC: C23C14/02 ,  C23C16/02 ,  C23C16/50 ,  C23C16/455 ,  C23C16/56 ,  C23C16/40

Abstract: Methods of removing native oxide layers and depositing dielectric layers having a controlled number of active sites on MEMS devices for biological applications are disclosed. In one aspect, a method includes removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands in vapor phase to volatize the native oxide layer and then thermally desorbing or otherwise etching the volatized native oxide layer. In another aspect, a method includes depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate. In yet another aspect, a method includes both removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands and depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate.

公开(公告)号：US11519066B2

公开(公告)日：2022-12-06

申请号：US16921577

申请日：2020-07-06

Applicant: Applied Materials, Inc.

Inventor： David Alexander Britz ,  Lance A. Scudder ,  Yuriy Melnik ,  Sukti Chatterjee

IPC: C23C16/34 ,  C23C16/455 ,  C23C28/04 ,  C23C16/40 ,  C23C16/50

Abstract: Embodiments of the present disclosure generally relate to protective coatings on various substrates including aerospace components and methods for depositing the protective coatings. In one or more embodiments, a method of forming a protective coating on an aerospace component includes forming an aluminum oxide layer on a surface of the aerospace component and depositing a boron nitride layer on or over the aluminum oxide layer during a vapor deposition process. In some examples, the method includes depositing a metal-containing catalytic layer on the aluminum oxide layer before depositing the boron nitride layer. The boron nitride layer can include hexagonal boron nitride (hBN).

公开(公告)号：US11015252B2

公开(公告)日：2021-05-25

申请号：US16283567

申请日：2019-02-22

Applicant: Applied Materials, Inc.

Inventor： David Britz ,  Pravin K. Narwankar ,  David Thompson ,  Yuriy Melnik ,  Sukti Chatterjee

IPC: F01D5/28 ,  F01D5/18 ,  C23C28/00 ,  C23C16/455 ,  C23C28/04 ,  C23C16/40 ,  C23C14/08

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof, and is from 1 nm to 3 microns in thickness.

公开(公告)号：US10513778B2

公开(公告)日：2019-12-24

申请号：US16043998

申请日：2018-07-24

Applicant: Applied Materials, Inc.

Inventor： Sukti Chatterjee

IPC: C23C16/56 ,  C23C16/455 ,  C23C16/22 ,  C23C16/06 ,  C23C16/46 ,  C23C16/48 ,  C23C16/04 ,  C23C16/52

Abstract: Apparatus and methods are disclosed to provide arrays of substantially oxide-free structures, such as titanium nanotubes or microwells. In one aspect, a hot wire chemical vapor deposition (HWCVD) chamber includes a metal chamber liner manufactured from one or more of aluminum (Al), lithium (Li), magnesium (Mg), calcium (Ca), zirconium (Zr), strontium (Sr), cerium (Ce), barium (Ba), beryllium (Be), lanthanum (La), thorium (Th), and alloys thereof. In one aspect, a method includes positioning a substrate having an array of titanium oxide structures with an oxide layer on surfaces thereof in the HWCVD chamber having the metal chamber liner, exposing the titanium oxide structures with the oxide layer on surfaces thereof to hydrogen (H) radicals, and removing the oxide layer to form well-ordered titanium structures.