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公开(公告)号：US08541477B2
公开(公告)日：2013-09-24
申请号：US13040550
申请日：2011-03-04
申请人： Abdullah M Alabdulrahman , Hamid A Almegren , Fares D Alsewailem , Phillip Joe Brock , Daniel Joseph Coady , Kazuki Fukushima , James Lupton Hedrick , Hans Werner Horn , Julia Elizabeth Rice
发明人： Abdullah M Alabdulrahman , Hamid A Almegren , Fares D Alsewailem , Phillip Joe Brock , Daniel Joseph Coady , Kazuki Fukushima , James Lupton Hedrick , Hans Werner Horn , Julia Elizabeth Rice
IPC分类号： C08J11/04
摘要： A method comprises forming a reaction mixture comprising a terephthalate polyester, a glycol comprising 2 to 5 carbons, and an amidine organocatalyst; and heating the reaction mixture at a temperature of about 120° C. or more to depolymerize the terephthalate polyester, thereby forming a terephthalate reaction product comprising a monomeric dihydroxy terephthalate diester; wherein the terephthalate reaction product contains terephthalate oligomers in an amount less than the amount of terephthalate oligomers that would result from i) substituting the amidine organocatalyst with an equimolar amount of a guanidine catalyst and ii) depolymerizing the terephthalate polyester under otherwise identical reaction conditions.
摘要翻译： 一种方法包括形成包含对苯二甲酸酯聚酯，含有2-5个碳原子的二醇和脒有机催化剂的反应混合物; 在约120℃以上的温度下加热反应混合物以使对苯二甲酸酯聚酯解聚，从而形成包含单体二羟基对苯二酸酯二酯的对苯二甲酸酯反应产物; 其中对苯二甲酸酯反应产物含有对苯二甲酸酯低聚物的量小于由i）用等摩尔量的胍催化剂代替脒有机催化剂而产生的对苯二甲酸酯低聚物的量，和ii）在其它相同的反应条件下使对苯二甲酸酯聚酯解聚。
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公开(公告)号：US20120223270A1
公开(公告)日：2012-09-06
申请号：US13040550
申请日：2011-03-04
申请人： Abdullah M. Alabdulrahman , Hamid A. Almegren , Fares D. Alsewailem , Phillip Joe Brock , Daniel Joseph Coady , Kazuki Fukushima , James Lupton Hedrick , Hans Werner Horn , Julia Elizabeth Rice
发明人： Abdullah M. Alabdulrahman , Hamid A. Almegren , Fares D. Alsewailem , Phillip Joe Brock , Daniel Joseph Coady , Kazuki Fukushima , James Lupton Hedrick , Hans Werner Horn , Julia Elizabeth Rice
IPC分类号： C07C67/333 , C09K3/00
摘要： A method comprises forming a reaction mixture comprising a terephthalate polyester, a glycol comprising 2 to 5 carbons, and an amidine organocatalyst; and heating the reaction mixture at a temperature of about 120° C. or more to depolymerize the terephthalate polyester, thereby forming a terephthalate reaction product comprising a monomeric dihydroxy terephthalate diester; wherein the terephthalate reaction product contains terephthalate oligomers in an amount less than the amount of terephthalate oligomers that would result from i) substituting the amidine organocatalyst with an equimolar amount of a guanidine catalyst and ii) depolymerizing the terephthalate polyester under otherwise identical reaction conditions.
摘要翻译： 一种方法包括形成包含对苯二甲酸酯聚酯，含有2-5个碳原子的二醇和脒有机催化剂的反应混合物; 在约120℃以上的温度下加热反应混合物以使对苯二甲酸酯聚酯解聚，从而形成包含单体二羟基对苯二酸酯二酯的对苯二甲酸酯反应产物; 其中对苯二甲酸酯反应产物含有对苯二甲酸酯低聚物的量小于由i）用等摩尔量的胍催化剂代替脒有机催化剂而产生的对苯二甲酸酯低聚物的量，和ii）在其它相同的反应条件下使对苯二甲酸酯聚酯解聚。
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公开(公告)号：US09851639B2
公开(公告)日：2017-12-26
申请号：US13436881
申请日：2012-03-31
IPC分类号： G03F7/004 , C08F228/02 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： G03F7/0397 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/11 , G03F7/2041
摘要： A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L′-C(CF3)2(OH). L′ is a divalent linking group comprising at least one carbon and the starred bond of L′ is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.
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4.发明申请PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC MATERIALS, FORMULATIONS, PRECURSORS AND METHODS OF USE THEREOF 有权适用于多孔电介质材料，制剂，前驱物及其使用方法的光致电介质材料公开(公告)号：US20110083887A1
公开(公告)日：2011-04-14
申请号：US12575515
申请日：2009-10-08
申请人： Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Jitendra Singh Rathore , Ratnam Sooriyakumaran
发明人： Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Jitendra Singh Rathore , Ratnam Sooriyakumaran
CPC分类号： H01L23/5329 , C07F7/21 , C08G77/50 , C08L83/14 , G03F7/0045 , G03F7/0755 , G03F7/0757 , G03F7/40 , H01L21/02126 , H01L21/02137 , H01L21/02203 , H01L21/02282 , H01L21/31 , H01L21/76802 , H01L21/76808 , H01L21/76814 , H01L2221/1031 , H01L2924/0002 , Y10T428/31663 , H01L2924/00
摘要： Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
摘要翻译： 固化到多孔倍半硅氧烷聚合物的倍半硅氧烷聚合物，在负色调可光图案化电介质配方中固化成多孔倍半硅氧烷聚合物的倍半硅氧烷聚合物，使用含有倍半硅氧烷聚合物的负色调可光图案化介电制剂形成结构的方法，其固化成多孔倍半硅氧烷聚合物， 多孔倍半硅氧烷聚合物和单体以及制备用于聚合多孔倍半硅氧烷聚合物的倍半硅氧烷聚合物的单体的方法。
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5.发明申请LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS 失效低激活能量溶解剂用于光电子学应用的改性剂公开(公告)号：US20080153034A1
公开(公告)日：2008-06-26
申请号：US12019676
申请日：2008-01-25
申请人： Robert David Allen , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
发明人： Robert David Allen , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , C07J9/005 , C07J17/00 , G03F7/0392 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/115
摘要： A dissolution modification agent suitable for use in a photoresist composition including a polymer, a photoacid generator and casting solvent. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to actinic radiation, whereupon the dissolution modifying agent, at a suitable temperature, becomes soluble in the developer and allows the polymer to dissolve in the developer. The DMAs are glucosides, cholates, citrates and adamantanedicarboxylates protected with acid-labile ethoxyethyl, tetrahydrofuranyl, and angelicalactonyl groups.
摘要翻译： 适用于包含聚合物，光致酸产生剂和浇铸溶剂的光致抗蚀剂组合物的溶解改性剂。 溶解改性剂不溶于含水碱性显影剂中，并且抑制聚合物在显影剂中的溶解，直至酸被光致酸性发生剂暴露于光化辐射为止，因此溶解改性剂在合适的温度下变得可溶于显影剂， 允许聚合物溶解在显影剂中。 DMA是用酸不稳定的乙氧基乙基，四氢呋喃基和天竺葵酰基保护的葡糖苷，胆酸盐，柠檬酸盐和金刚烷二羧酸盐。
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6.发明授权Stable encapsulant fluid capable of undergoing reversible Diels-Alder polymerization 有权稳定的密封剂流体能够进行可逆的Diels-Alder聚合公开(公告)号：US07309754B2
公开(公告)日：2007-12-18
申请号：US10673052
申请日：2003-09-26
申请人： Phillip Joe Brock , Michael W. Chaw , Dan Dawson , Craig Hawker , James L. Hedrick , Teddie P. Magbitang , Dennis McKean , Robert D. Miller , Richard I. Palmisano , Willi Volksen
发明人： Phillip Joe Brock , Michael W. Chaw , Dan Dawson , Craig Hawker , James L. Hedrick , Teddie P. Magbitang , Dennis McKean , Robert D. Miller , Richard I. Palmisano , Willi Volksen
CPC分类号： G11B5/102
摘要： An encapsulant fluid is provided comprising a mixture of a diene-containing compound and a dienophilic compound. At least one of the diene-containing and the dienophilic compounds is protected so that the compounds do not substantially react with each other at room temperature. The diene-containing and the dienophilic compounds undergo a reversible Diels-Alder polymerization reaction at a polymerization temperature above room temperature to form a solid debondable polymeric encapsulant. Also provided are methods for forming slider assemblies and methods for patterning a slider surface using the encapsulant.
摘要翻译： 提供了包含含二烯的化合物和二亲性化合物的混合物的密封剂流体。 至少一种含二烯和二亲性化合物被保护，使得化合物在室温下基本上不会彼此反应。 含二烯和二亲性化合物在聚合温度高于室温的条件下进行可逆的狄尔斯 - 阿尔德聚合反应，形成固体可分散的聚合物密封剂。 还提供了用于形成滑块组件的方法和使用该密封剂来构图滑块表面的方法。
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公开(公告)号：US06730452B2
公开(公告)日：2004-05-04
申请号：US09771261
申请日：2001-01-26
IPC分类号： G03F7039
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0382 , G03F7/0397 , Y10S430/108
摘要： A lithographic photoresist composition is provided that can be used as a chemical amplification photoresist. In a preferred embodiment, the composition is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and has improved sensitivity and resolution. The composition comprises a fluorinated vinylic polymer, particularly a fluorinated methacrylate, a fluorinated methacrylonitrile, or a fluorinated methacrylic acid, and a photoacid generator. The polymer may be a homopolymer or a copolymer. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
摘要翻译： 提供可用作化学扩增光致抗蚀剂的平版光刻胶组合物。 在优选的实施方案中，组合物对深紫外辐射即波长小于250nm（包括157nm，193nm和248nm辐射）的辐射基本上是透明的，并具有改进的灵敏度和分辨率。 组合物包含氟化乙烯基聚合物，特别是氟化甲基丙烯酸酯，氟化甲基丙烯腈或氟化甲基丙烯酸，以及光酸产生剂。 聚合物可以是均聚物或共聚物。 还提供了使用该组合物在衬底上产生抗蚀剂图像的方法，即在集成电路等的制造中。
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公开(公告)号：US08945808B2
公开(公告)日：2015-02-03
申请号：US11380731
申请日：2006-04-28
申请人： Robert Allen David , Phillip Joe Brock , Carl E Larson , Daniel Paul Sanders , Ratnam Sooriyakumaran , Linda Karin Sundberg , Hoa D Truong , Gregory Michael Wallraff
发明人： Robert Allen David , Phillip Joe Brock , Carl E Larson , Daniel Paul Sanders , Ratnam Sooriyakumaran , Linda Karin Sundberg , Hoa D Truong , Gregory Michael Wallraff
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/0757
摘要： Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the resist composition is also disclosed.
摘要翻译： 公开了可用于浸没式光刻中而不使用另外的顶涂层的抗蚀剂组合物。 抗蚀剂组合物包含光致抗蚀剂聚合物，至少一种光致酸产生剂，溶剂; 和自 - 面漆抗蚀剂添加剂。 还公开了使用抗蚀剂组合物在衬底上形成图案化材料层的方法。
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9.发明授权Photopatternable dielectric materials for BEOL applications and methods for use 有权用于BEOL应用的光图案介电材料和使用方法公开(公告)号：US07919225B2
公开(公告)日：2011-04-05
申请号：US12126287
申请日：2008-05-23
申请人： Robert D. Allen , Phillip Joe Brock , Blake W. Davis , Geraud Jean-Michel Dubois , Qinghuang Lin , Robert D. Miller , Alshakim Nelson , Sampath Purushothaman , Ratnam Sooriyakumaran
发明人： Robert D. Allen , Phillip Joe Brock , Blake W. Davis , Geraud Jean-Michel Dubois , Qinghuang Lin , Robert D. Miller , Alshakim Nelson , Sampath Purushothaman , Ratnam Sooriyakumaran
CPC分类号： G03F7/0757 , C08L83/14 , G03F7/0758 , G03F7/38 , G03F7/40 , Y10S430/106 , Y10S430/108 , Y10S430/12 , Y10S430/122 , Y10S430/126 , C08L83/00
摘要： A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted silsesquioxane polymers. The carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The coating is exposed to radiation, resulting in generating a latent pattern in the coating. The exposed coating is baked at a first temperature less than about 150° C. The baked coating is developed, resulting in forming a latent image from the latent pattern in the baked coating. The latent image is cured at a second temperature less than about 500° C.
摘要翻译： 方法和组成。 该组合物包括在酸存在下交联的至少一种碳硅烷取代的倍半硅氧烷聚合物。 所述至少一种碳硅烷取代的倍半硅氧烷聚合物可溶于碱水溶液。 该方法包括在基底上形成涂层。 涂层包括一种或多种碳硅烷取代的倍半硅氧烷聚合物。 碳硅烷取代的倍半硅氧烷聚合物可溶于碱水溶液。 涂层暴露于辐射，导致在涂层中产生潜在图案。 暴露的涂层在小于约150℃的第一温度下烘烤。烘烤的涂层被显影，从而在烘烤涂层中从潜在图案形成潜像。 潜像在低于约500℃的第二温度下固化
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10.发明申请PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE 有权用于BEOL应用的光电介质材料和使用方法公开(公告)号：US20090291389A1
公开(公告)日：2009-11-26
申请号：US12126287
申请日：2008-05-23
申请人： Robert D. Allen , Phillip Joe Brock , Blake W. Davis , Geraud Jean-Michel Dubois , Qinghuang Lin , Robert D. Miller , Alshakim Nelson , Sampath Purushothaman , Ratnam Sooriyakumaran
发明人： Robert D. Allen , Phillip Joe Brock , Blake W. Davis , Geraud Jean-Michel Dubois , Qinghuang Lin , Robert D. Miller , Alshakim Nelson , Sampath Purushothaman , Ratnam Sooriyakumaran
CPC分类号： G03F7/0757 , C08L83/14 , G03F7/0758 , G03F7/38 , G03F7/40 , Y10S430/106 , Y10S430/108 , Y10S430/12 , Y10S430/122 , Y10S430/126 , C08L83/00
摘要： A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted silsesquioxane polymers. The carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The coating is exposed to radiation, resulting in generating a latent pattern in the coating. The exposed coating is baked at a first temperature less than about 150° C. The baked coating is developed, resulting in forming a latent image from the latent pattern in the baked coating. The latent image is cured at a second temperature less than about 500° C.
摘要翻译： 方法和组成。 该组合物包括在酸存在下交联的至少一种碳硅烷取代的倍半硅氧烷聚合物。 所述至少一种碳硅烷取代的倍半硅氧烷聚合物可溶于碱水溶液。 该方法包括在基底上形成涂层。 涂层包括一种或多种碳硅烷取代的倍半硅氧烷聚合物。 碳硅烷取代的倍半硅氧烷聚合物可溶于碱水溶液。 涂层暴露于辐射，导致在涂层中产生潜在图案。 暴露的涂层在小于约150℃的第一温度下烘烤。烘烤的涂层被显影，从而在烘烤涂层中从潜在图案形成潜像。 潜像在低于约500℃的第二温度下固化
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