摘要:
A substrate processing apparatus comprises a substrate processing chamber, a transfer chamber, a substrate mounting body having a through hole formed in a vertical direction and being provided in the substrate processing chamber, a substrate lifting member capable of vertically moving in the through hole, a first arm, capable of extending from the transfer chamber into the substrate processing chamber, for transferring the substrate in a horizontal direction, a second arm capable of extending from the transfer chamber into the substrate processing chamber, capable of moving in a vertical direction and separating the substrate upward from the substrate mounting body by moving the substrate lifting member upward, and a driving mechanism provided in the transfer chamber for extending the first and second arms from the transfer chamber into the substrate processing chamber and for moving the first arm in the horizontal direction and moving the second arm in the vertical direction.
摘要:
To provide a field-effect transistor having a large power conversion capacity and its fabrication method by decreasing the leakage current between the source and the drain of a semiconductor device made of hexagonal-system silicon carbide when the gate voltage of the semiconductor device is turned off and also decreasing the electrical resistance of the semiconductor device when the gate voltage of the semiconductor device is turned on. The main current path of the field-effect transistor is formed so that the current flowing between the source and the drain of, for example, a field-effect transistor flows in the direction parallel with the {0001} plane and a channel forming plane is parallel with the {1120} plane. �Selected Drawing!FIG. 1
摘要:
The vapor phase growth on semiconductor wafers is carried out by an apparatus in which a multiplicity of semiconductor wafers are held by a holder so that the semiconductor wafers lie one over another in a vertical direction, and are rotated together with the holder, the holder is placed in a heater disposed in a reaction vessel, a raw material gas supply nozzle and a raw material gas exhaust nozzle are provided within the heater so that the semiconductor wafers are interposed between the gas supply nozzle and the gas discharge nozzle, and the gas supply nozzle and the gas discharge nozzle have gas supply holes and gas discharge holes, respectively, so that a raw material gas can flow on each semiconductor wafer in horizontal directions. When the temperature of the heater is raised by a heating source to heat the semiconductor wafers, the raw material gas is supplied from the gas supply holes to each semiconductor wafer, and thus a uniform layer is grown on each semiconductor wafer from the raw material gas.
摘要:
A method of manufacturing a solar battery by serially connecting a plurality of solar battery elements arranged spaced from each other. A pair of flexible films are used to sandwich the arrangement of the solar battery elements, and each of the flexible films has a plurality of conductive members formed thereon at positions respectively corresponding to the solar battery elements. However, each conductive member has one end portion extended beyond the surface of the corresponding solar battery element in the direction of the alignment of the solar battery elements. Thus, when the pair of flexible films are disposed to sandwich the solar battery elements, the extended end portion of the conductive member on the side of the light receiving surface of one solar battery element is positioned in the space between adjacent solar battery elements opposite the end portion of the conductive member on the side of the back surface of the next solar battery element. By welding both end portions of the conductive members by, for example, a laser beam, the adjacent solar battery elements are successively connected in series.
摘要:
A method of forming by CVD technique a layer of material with good uniformity and reproducibility on the surfaces of a plurality of substrates supported within the reaction chamber. The feature of the invention is that a gaseous mixture containing a reaction gas is supplied into the reaction chamber from the inlet of the reaction chamber and the auxiliary gas nozzle provided between the inlet and the exhaust in a predetermined control manner. Moreover, part of the gaseous mixture within the reaction chamber is sampled from the gas flow for the measurement of the concentration of the reaction gas, and from the measured results is determined the rate of gas supply from the auxiliary gas nozzle.
摘要:
A four-roller type sizing mill apparatus for forming round steel rods, comprises two four-roller mills each having two pair of facing rollers. One pair of facing rollers is arranged in rolling direction perpendicular to the rolling direction of the other pair of rollers. The two four-roller mills are arranged in line, with the rolling direction of one of the two four-roller mills being shifted by 45.degree. from the rolling direction of the other four-roller mill. The two pair of rollers of a first four-roller mill positioned closer to the rolling material inlet are separated from each other by a distance which is greater than zero and not greater than five times the projected contact length of one of the pair of rollers positioned closer to the rolling material inlet. The distance is measured between a first standard straight line which passes through the centers of one of the pair of rollers and lies on a plane parallel to the side surfaces of the same pair of rollers and a second standard straight line obtained by projecting the axes of the other pair of rollers onto the above-mentioned plane.
摘要:
This invention relates to improvements in the SOS technology including the so-called laser annealing processing. According to this invention, a semiconductor layer of an SOS structure consists of the three layers of an interface layer made up of twins, a seed crystalline layer and a re-grown layer far thicker than the preceding two layers when viewed from the side of an insulating substrate. The re-grown layer is formed in such a way that a semiconductor layer deposited on the insulating substrate is irradiated with an electromagnetic wave, for example, pulsed ruby laser beam, which is absorbed substantially uniformly by a portion except the interface layer and the seed crystalline layer. According to this invention, the quality of the re-grown layer is improved, and the mobility of carriers is enhanced. As a result, the operating speed of a semiconductor device employing the SOS structure is raised, and the leakage current is reduced.
摘要:
The present invention relates to a macrolide compound expected to have a cell growth-inhibiting activity and a novel anticancer drug utilizing the compound. Specifically, the invention relates to a compound represented by Formula (I) or (II) or a pharmaceutically acceptable salt thereof and relates to a cell growth inhibitor and an anticancer drug each containing the compound or the salt as an active ingredient.