公开(公告)号：US5452119A

公开(公告)日：1995-09-19

申请号：US141648

申请日：1993-10-26

申请人： Akira Morimoto ,  Masaaki Aoyama

发明人： Akira Morimoto ,  Masaaki Aoyama

IPC分类号： G02B26/12 ,  G02B27/00 ,  G02B26/08

CPC分类号： G02B27/0018 ,  G02B26/12

摘要： The laser beam emitted by a laser light source is first brought to an image in an auxiliary scanning plane, and reflected by a slit mirror provided in a prism block. The arrangement is such that this laser light is incident on the scanning deflector along the optic axis of the scanning lens, and a screen is provided for obstructing ghosting in the vicinity of the scanning surface. Further, either the side of the prism block on which the light is incident or the side from which it emerges is curved, or both are curved, or one side of the prism block is treated to prevent reflection. Further, a screen is provided between the laser light source and the slit mirror so as to obstruct that part of the light incident on the mirror which is reflected by the mirror after being reflected by the scanning deflector.

摘要翻译： 由激光光源发射的激光束首先被带到辅助扫描平面中的图像，并由设置在棱镜块中的狭缝镜反射。 这种布置使得该激光沿着扫描透镜的光轴入射到扫描偏转器上，并且提供了用于阻止扫描表面附近的重影的屏幕。 此外，光入射的棱镜块的一侧或其出现的一侧弯曲，或者两者都是弯曲的，或者棱镜块的一侧被处理以防止反射。 此外，在激光光源和狭缝镜之间设置有屏幕，以便阻挡由扫描偏转器反射后入射到反射镜上的被反射镜反射的光的那部分。

公开(公告)号：US5299050A

公开(公告)日：1994-03-29

申请号：US821782

申请日：1992-01-16

申请人： Akira Morimoto ,  Masaaki Aoyama

发明人： Akira Morimoto ,  Masaaki Aoyama

IPC分类号： G02B26/12 ,  G02B27/00 ,  G02B26/10

CPC分类号： G02B27/0018 ,  G02B26/12

摘要： A scanning optical system for preventing ghosting is provided wherein a laser beam emitted by a laser light source is first brought to an image in an auxiliary scanning plane, and reflected by a slit mirror provided in a prism block. The laser beam is incident on the scanning deflector along the optical axis of the scanning lens, and a screen is provided for obstructing ghosting in the vicinity of the scanning surface. Further, at least one side of the prism block on which the light is incident from which the light emerges is curved, or one side of the prism block is treated to prevent reflection. Further, the screen is disposed between the laser light source and the slit mirror so as to obstruct the part of the light beam incident on the mirror which is reflected by the mirror after being reflected by the scanning deflector.

摘要翻译： 提供一种用于防止重影的扫描光学系统，其中由激光光源发射的激光束首先被带到辅助扫描平面中的图像，并由设置在棱镜块中的狭缝镜反射。 激光束沿着扫描透镜的光轴入射在扫描偏转器上，并且设置有用于阻挡扫描表面附近的重影的屏幕。 此外，光入射的棱镜块的至少一侧弯曲，或者棱镜块的一侧被处理以防止反射。 此外，屏幕设置在激光光源和狭缝镜之间，以便在被扫描偏转器反射之后阻挡入射到反射镜上的反射镜的部分光束。

公开(公告)号：US5218461A

公开(公告)日：1993-06-08

申请号：US582155

申请日：1990-09-14

申请人： Masaaki Aoyama ,  Akira Morimoto

发明人： Masaaki Aoyama ,  Akira Morimoto

IPC分类号： G02B26/08 ,  G02B26/12 ,  H05K3/00

CPC分类号： G02B26/08 ,  G02B26/12 ,  H05K3/0082

摘要： A scanning optical apparatus has a laser beam source for emitting a laser beam, a scanning deflector for deflecting and scanning the laser beam in a principal scanning plane, a scanning lens for imaging the deflected laser beam on a scanning surface to form a spot thereon, an imaging lens for forming the laser beam from the laser beam source into a line spread function image in an auxiliary scanning plane that is perpendicular to the principal scanning plane before the laser beam is made incident to the scanning deflector, a static deflector which is located on the line spread function image and which is adapted to guide the beam from the light source to the scanning deflector and guide the reflected beam from the scanning deflector to the scanning lens, and a holding member for holding at least the laser beam source, the imaging lens and the static deflector separately from other optical elements.

摘要翻译： 扫描光学装置具有用于发射激光束的激光束源，用于在主扫描平面中偏转和扫描激光束的扫描偏转器，用于在扫描表面上成像偏转的激光束以在其上形成斑点的扫描透镜， 用于在激光束入射到扫描偏转器之前垂直于主扫描平面的辅助扫描平面中将来自激光束源的激光束形成激光束的成像透镜，定位的静电偏转器 在线扩散函数图像上，并且适于将光束从光源引导到扫描偏转器，并将来自扫描偏转器的反射光束引导到扫描透镜，以及用于保持至少激光束源的保持部件， 成像透镜和静电偏转器与其他光学元件分开。

公开(公告)号：US06713492B1

公开(公告)日：2004-03-30

申请号：US09831898

申请日：2001-05-24

申请人： Osamu Itoh ,  Heitaro Obara ,  Hidekatsu Yokoyama ,  Masaaki Aoyama

发明人： Osamu Itoh ,  Heitaro Obara ,  Hidekatsu Yokoyama ,  Masaaki Aoyama

IPC分类号： A01N4390

CPC分类号： C07D211/94 ,  A61K31/40 ,  A61K31/445 ,  A61K31/4468 ,  C07D207/46

摘要： Drugs or reagents containing as the active ingredient N-acyloxylated cycloalkyl compounds represented by general formula (I): wherein A is optionally substituted C4 or C5 cycloalkyl which may have one double bond in the ring; and R is C1-C3 alkyl or phenyl). The above compounds are hydroxyamine derivatives functioning as spin trapping agents and can rapidly react with free radicals or active oxygen in an objective organ in spite of their being excellent in stability during the preparation or administration thereof.

摘要翻译： 含有作为活性成分的由通式（I）表示的N-酰氧基化环烷基化合物的药物或试剂：其中A是在环中可以具有一个双键的任选取代的C 4或C 5环烷基; 和R是C 1 -C 3烷基或苯基）。 上述化合物是用作自旋捕获剂的羟胺衍生物，尽管它们在制备或给药期间的稳定性优异，但可以与客观器官中的自由基或活性氧快速反应。

公开(公告)号：US06707528B1

公开(公告)日：2004-03-16

申请号：US09348234

申请日：1999-07-06

申请人： Masaaki Aoyama ,  Hiroyasu Fujita

发明人： Masaaki Aoyama ,  Hiroyasu Fujita

IPC分类号： G03B2700

CPC分类号： G03F7/70808 ,  G03B27/42 ,  G03F7/70933 ,  Y10S414/137

摘要： An exposure apparatus is made so as to have respective chambers in which a main exposure system, a substrate carrying system, and a mask carrying system are housed. The apparatus is structured so that the respective environments in the chambers are substantially independently maintained from each other. Substrate processing can be facilitated by incorporating photoelectric detection of the substrate center in association with handing-over of the substrate from one substrate carrying member to another, and/or storage of a cleaning substrate in a storage member which also holds substrates being processed by the apparatus.

摘要翻译： 制造曝光装置，以便容纳主曝光系统，基板传送系统和掩模传送系统的各个室。 该装置的结构使得腔室中的各个环境基本上独立地保持彼此。 通过结合基板中心的光电检测与衬底从一个衬底承载构件的移交到另一个衬底承载构件，和/或将清洁衬底存储在存储构件中并且还保持基板正在被处理的衬底而可以促进衬底处理 仪器。

公开(公告)号：US5837334A

公开(公告)日：1998-11-17

申请号：US710401

申请日：1996-09-17

申请人： Kiyoshi Yokokawa ,  Masaaki Aoyama ,  Gerhart Vilsmeier

发明人： Kiyoshi Yokokawa ,  Masaaki Aoyama ,  Gerhart Vilsmeier

IPC分类号： C03B37/022 ,  B24B19/22 ,  B28D1/04 ,  C03B23/047 ,  C03B37/012

CPC分类号： C03B37/01228 ,  B24B19/226 ,  B28D1/041 ,  C03B23/047 ,  C03B37/01205 ,  C03B37/01211 ,  C03B37/01231 ,  C03B37/0124 ,  C03B2201/23 ,  Y02P40/57 ,  Y10S65/08 ,  Y10T428/131 ,  Y10T428/24942 ,  Y10T428/26

摘要： A quartz glass tube, produced by mechanically processing a natural/synthetic quartz glass mother material, having 50-300 mm.phi. in outer diameter, from. 1 to 7 in outer to inner diameter ratio, 10 mm or more in thickness and 2% or less in thickness error; a large-scale quartz glass preform integrally combining the large-sized quartz glass tube with a core glass rod for an optical fiber using a rod-in-tube technique; and a method for manufacturing a large-scale quartz glass preform performing the mechanical processing with a high precision machine, i.e., integrating a core rod for an optical fiber under a rod in process with a quartz glass tube, a tube diameter of which is controlled by heating, hot drawing or hot drawing with pressure by using a tool-free drawing method.

摘要翻译： 通过机械加工天然/合成石英玻璃母材制成的石英玻璃管，其外径为50-300毫米。 外径比为1〜7，厚度为10mm以上，厚度误差为2％以下。 大尺寸石英玻璃预制件，使用管棒技术将大型石英玻璃管与用于光纤的芯玻璃棒整体结合; 以及制造用高精度机械进行机械加工的大规模石英玻璃预制件的方法，即将石英玻璃管内的光纤纤维的芯棒与石英玻璃管一体化，其管径被控制 通过使用无工具的拉伸方法通过加热，热拉伸或压力拉伸。

公开(公告)号：US5651827A

公开(公告)日：1997-07-29

申请号：US583774

申请日：1996-01-11

申请人： Masaaki Aoyama ,  Hiroyuki Miyazawa

发明人： Masaaki Aoyama ,  Hiroyuki Miyazawa

IPC分类号： C03B19/09 ,  C03C3/06 ,  C23C16/44 ,  C30B25/10 ,  C30B31/10 ,  C30B35/00 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01L21/67115 ,  C03B19/095 ,  C03C3/06 ,  C23C16/44 ,  C30B25/10 ,  C30B31/10 ,  C30B35/002 ,  C03C2201/80 ,  C03C2203/10 ,  Y02P40/57

摘要： A reactor vessel includes a quartz glass body having sidewalls and a ceiling formed as a single unit without welds. Translucent or opaque portions are formed by bubbles in the glass where heat insulation is desired and transparent portions are formed by absence of bubbles where heat transmission and visibility are desired. The body is formed by adding quartz glass powder to a mold which is rotated about a central axis so that centrifugal force causes a layer of powder to form on the inside of the mold. The layer is then heated until it melts.

摘要翻译： 反应堆容器包括具有侧壁的石英玻璃体和形成为没有焊接的单个单元的天花板。 半透明或不透明部分由玻璃中的气泡形成，其中期望隔热，并且通过不需要传热和可视性的气泡形成透明部分。 通过将石英玻璃粉末添加到围绕中心轴线旋转的模具中形成主体，使得离心力在模具内部形成一层粉末。 然后将该层加热至其熔化。

公开(公告)号：US5194743A

公开(公告)日：1993-03-16

申请号：US679251

申请日：1991-04-02

申请人： Masaaki Aoyama ,  Naomasa Shiraishi ,  Ken Hattori ,  Atsushi Yamaguchi ,  Kesayoshi Amano

发明人： Masaaki Aoyama ,  Naomasa Shiraishi ,  Ken Hattori ,  Atsushi Yamaguchi ,  Kesayoshi Amano

IPC分类号： G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70716 ,  H01L21/681

摘要： A device for positioning a circular substrate having a cut portion, comprising: a first rotational stage which is finely rotated around the origin of a rectangular coordinate system; an X-Y stage on the first rotational stage which is two-dimensionally moved in the coordinate system; a second rotational stage on the X-Y stage which is rotated while holding the substrate; a first detecting device for detecting information about the displacement change of the periphery of the substrate from the rotational center during the rotation of the second rotational stage; a first positioning controlling device for controlling the rotation of the second rotational stage in accordance with information detected by the first detecting device so that the cut portion is placed in a predetermined direction on the coordinate system; a second detecting device having three or more detecting points in the coordinate system so as to detect the three or more positions of the periphery, the second detecting device generating information about a detection at each of the three or more detecting points; and a second positioning controlling device for controlling the X-Y stage and the first rotational stage in accordance with the detection information from the second detecting device after the cut portion has been placed in the predetermined direction.

摘要翻译： 一种用于定位具有切割部分的圆形基底的装置，包括：围绕所述直角坐标系的原点精细旋转的第一旋转台; 在坐标系中二维移动的第一旋转台上的X-Y平台; 在X-Y平台上的第二旋转台，其在保持基板的同时旋转; 第一检测装置，用于在所述第二旋转台的旋转期间从所述旋转中心检测关于所述基板的周边的位移变化的信息; 第一定位控制装置，用于根据由第一检测装置检测的信息来控制第二旋转台的旋转，使得切割部分沿坐标系上的预定方向放置; 所述第二检测装置在所述坐标系中具有三个以上的检测点，以检测所述周边的三个以上的位置，所述第二检测装置生成关于所述三个以上检测点中的每一个的检测的信息; 以及第二定位控制装置，用于在切割部分被放置在预定方向之后，根据来自第二检测装置的检测信息来控制X-Y级和第一旋转级。

公开(公告)号：US06884670B2

公开(公告)日：2005-04-26

申请号：US10028429

申请日：2001-12-28

申请人： Koichi Hashimoto ,  Daisuke Matsunaga ,  Masaaki Aoyama

发明人： Koichi Hashimoto ,  Daisuke Matsunaga ,  Masaaki Aoyama

IPC分类号： H01L21/033 ,  H01L21/28 ,  H01L21/302 ,  H01L21/3213 ,  H01L21/335 ,  H01L21/336 ,  H01L21/461 ,  H01L21/768 ,  H01L21/8234 ,  H01L21/8238

CPC分类号： H01L21/0332 ,  H01L21/28123 ,  H01L21/32136 ,  H01L21/76838 ,  Y10S438/926

摘要： A method of manufacturing a semiconductor device having an insulated gate type field effect transistor. A gate insulating film, a gate electrode layer having a predetermined area and facing the semiconductor substrate with the gate insulating film being interposed therebetween, an interlayer insulating film, and a wiring layer connected to the gate electrode layer, are formed on a semiconductor substrate in the order recited. A conductive material layer and a resist layer are formed on the wiring layer. The resist layer is patterned to form a resist mask forming a wiring pattern having an antenna ratio of about ten times or more of the predetermined area of the gate electrode layer. At least the conductive material layer is plasma-etched by using the resist mask as an etching mask, and thereafter, the resist mask is removed and the wiring layer is plasma-etched.

摘要翻译： 一种制造具有绝缘栅型场效应晶体管的半导体器件的方法。 栅极绝缘膜，具有预定面积的面对半导体衬底的栅电极层，栅极绝缘膜插入其间，层间绝缘膜和连接到栅极电极层的布线层形成在半导体衬底上 命令叙述。 在布线层上形成导电材料层和抗蚀剂层。 对抗蚀剂层进行图案化以形成抗蚀剂掩模，形成天线比为栅电极层的预定面积的大约十倍或更多的布线图案。 至少通过使用抗蚀剂掩模作为蚀刻掩模来等离子体蚀刻导电材料层，然后去除抗蚀剂掩模，并且对该布线层进行等离子体蚀刻。

公开(公告)号：US6044850A

公开(公告)日：2000-04-04

申请号：US961242

申请日：1997-10-30

申请人： Soichiro Ozawa ,  Satoru Mihara ,  Kunihiko Nagase ,  Masaaki Aoyama ,  Naoki Nishida

发明人： Soichiro Ozawa ,  Satoru Mihara ,  Kunihiko Nagase ,  Masaaki Aoyama ,  Naoki Nishida

IPC分类号： C23F4/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/3205 ,  H01L21/3213 ,  H01L23/52 ,  B08B6/00

CPC分类号： H01L21/02071

摘要： Ashing process of a resist pattern used in a semiconductor device manufacturing method is conducted by exposing the resist, the wirings, and their peripheral regions to a first atmosphere which includes a first product obtained by plasmanizing a gas containing water at a rate of more than 30 flow rate %, and placing the resist in a second atmosphere which includes a second product obtained by plasmanizing an oxygen mixed gas which contains an oxygen gas as a principal component before or after or before and after the exposing step.

摘要翻译： 在半导体器件制造方法中使用的抗蚀剂图案的灰化处理通过将抗蚀剂，布线及其周边区域暴露于第一气氛来进行，该第一气氛包括通过使含有水的气体以大于30的比例等离子化而获得的第一产物 流量％，并将抗蚀剂置于第二气氛中，该第二气氛包括在暴露步骤之前或之后或之前或之后使包含氧气的氧气混合气体作为主要组分而得到的第二产物。