Printed circuit board multipole for ion focusing
    1.
    发明授权
    Printed circuit board multipole for ion focusing 有权
    用于离子聚焦的印刷电路板多极

    公开(公告)号:US09230789B2

    公开(公告)日:2016-01-05

    申请号:US12931272

    申请日:2011-01-27

    IPC分类号: H01J49/42 H01J49/06 H01J49/14

    摘要: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.

    摘要翻译: 公开了一种用于聚焦和存储离子的装置和用于将第一压力区域与第二压力区域分离的装置,特别是用于离子分析装置。 粒子束装置可以具有上述装置中的至少一个。 提供了用于保持离子和至少一个多极单元的容器。 多极单元具有纵向轴线的通孔以及多个电极。 第一组电极处于距纵向轴线的第一径向距离处。 在每种情况下,第二组电极距离纵向轴线的第二径向距离。 第一径向距离小于第二径向距离。 或者或另外,该装置可以具有径向范围的细长开口。 开口具有大于径向范围的纵向范围。

    Apparatus for focusing and for storage of ions and for separation of pressure areas
    2.
    发明申请
    Apparatus for focusing and for storage of ions and for separation of pressure areas 有权
    用于聚焦和存储离子和分离压力区域的装置

    公开(公告)号:US20110220788A1

    公开(公告)日:2011-09-15

    申请号:US12931272

    申请日:2011-01-27

    IPC分类号: H01J49/26 H01J3/14

    摘要: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.

    摘要翻译: 公开了一种用于聚焦和存储离子的装置和用于将第一压力区域与第二压力区域分离的装置,特别是用于离子分析装置。 粒子束装置可以具有上述装置中的至少一个。 提供了用于保持离子和至少一个多极单元的容器。 多极单元具有纵向轴线的通孔以及多个电极。 第一组电极处于距纵向轴线的第一径向距离处。 在每种情况下,第二组电极距离纵向轴线的第二径向距离。 第一径向距离小于第二径向距离。 或者或另外,该装置可以具有径向范围的细长开口。 开口具有大于径向范围的纵向范围。

    Particle beam microscope
    4.
    发明授权
    Particle beam microscope 有权
    粒子束显微镜

    公开(公告)号:US08476589B2

    公开(公告)日:2013-07-02

    申请号:US13539291

    申请日:2012-06-29

    IPC分类号: H01J37/244

    摘要: A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β1 between a first straight line 551 extending through the point of intersection 51 and a center of the first substrate 351 and the object plane 19 differs from a second elevation angle β2 between a second straight line 552 extending through the point of intersection 51 and a center of the second substrate 352 and the object plane 19 by more than 14°.

    摘要翻译: 粒子束显微镜包括具有光轴53和极片21的磁透镜3.被检查物5安装在光轴53与物面19之间的交点51处。第一和第二X射线 射线检测器33具有第一和第二辐射敏感基板35,其布置成使得延伸穿过交点51的第一直线551与第一基板351的中心与物平面19之间的第一仰角β1与第二 延伸穿过交点51的第二直线552与第二基板352的中心和物平面19之间的仰角β2超过14°。

    Scanning charged particle beams
    5.
    发明授权
    Scanning charged particle beams 有权
    扫描带电粒子束

    公开(公告)号:US08304750B2

    公开(公告)日:2012-11-06

    申请号:US12744152

    申请日:2008-12-12

    IPC分类号: H01J37/302

    摘要: Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size f at the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least d in the first direction, and a ratio d/f being 2 or more.

    摘要翻译: 公开的方法包括将样品的表面的一部分直接暴露于带电粒子束,样品表面的部分在第一方向上形成一行,带电粒子束具有平均斑点大小f 在样品的表面,每个部分与其相邻部分间隔至少在第一方向上的d,d / f的比例为2或更大。

    SCANNING CHARGED PARTICLE BEAMS
    6.
    发明申请
    SCANNING CHARGED PARTICLE BEAMS 有权
    扫描充电粒子

    公开(公告)号:US20100294930A1

    公开(公告)日:2010-11-25

    申请号:US12744152

    申请日:2008-12-12

    IPC分类号: G21K5/00 G01N23/00

    摘要: Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size fat the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least din the first direction, and a ratio d/f being 2 or more.

    摘要翻译: 公开的方法包括直接连续地将样品的表面的一部分暴露于带电粒子束,样品表面的部分在第一方向上形成一行,带电粒子束具有平均斑点大小脂肪 样品的表面,每个部分与其相邻部分间隔至少在第一方向上的距离,并且比率d / f为2或更大。

    PARTICLE BEAM DEVICE WITH DEFLECTION SYSTEM
    8.
    发明申请
    PARTICLE BEAM DEVICE WITH DEFLECTION SYSTEM 有权
    具有偏转系统的粒子束装置

    公开(公告)号:US20120138814A1

    公开(公告)日:2012-06-07

    申请号:US13306529

    申请日:2011-11-29

    IPC分类号: H01J3/26 H01J3/14

    摘要: A particle beam device includes a particle beam generator, an objective lens, and first and second deflection systems for deflecting the particle beam in an object plane defined by the objective lens. In a first operating mode, the first deflection system generates a first deflection field and the second deflection system generates a second deflection field. In a second operating mode, the first deflection system generates a third deflection field and the second deflection system generates a fourth deflection field.

    摘要翻译: 粒子束装置包括粒子束发生器,物镜,以及用于使粒子束偏转在由物镜限定的物平面中的第一和第二偏转系统。 在第一操作模式中,第一偏转系统产生第一偏转场,而第二偏转系统产生第二偏转场。 在第二操作模式中,第一偏转系统产生第三偏转场,第二偏转系统产生第四偏转场。

    Particle beam device and method for operation of a particle beam device
    9.
    发明申请
    Particle beam device and method for operation of a particle beam device 审中-公开
    粒子束装置和粒子束装置的操作方法

    公开(公告)号:US20110215242A1

    公开(公告)日:2011-09-08

    申请号:US12931356

    申请日:2011-01-27

    申请人: Dirk Preikszas

    发明人: Dirk Preikszas

    IPC分类号: H01J37/28

    摘要: A particle beam device and a method for operation of a particle beam device are disclosed. The particle beam device has a sample chamber, a sample arranged in the sample chamber, a first particle beam column, a second particle beam column and at least one detector arranged in a first cavity in a first hollow body. The first cavity has a first inlet opening. The first particle beam column and the second particle beam column are arranged on one plane, while the detector is not arranged on that plane. At least one control electrode is arranged on the first particle beam column. The second particle beam column has a terminating electrode. A first hollow body voltage, a control electrode voltage and/or a terminating electrode voltage are/is chosen such that first interaction particles and/or second interaction particles enter the first cavity in the first hollow body through the first inlet opening.

    摘要翻译: 公开了一种粒子束装置及其操作方法。 粒子束装置具有样品室,布置在样品室中的样品,第一粒子束柱,第二粒子束柱和布置在第一中空体中的第一腔中的至少一个检测器。 第一腔具有第一入口开口。 第一粒子束柱和第二粒子束列布置在一个平面上,而检测器未布置在该平面上。 至少一个控制电极设置在第一粒子束柱上。 第二粒子束柱具有端接电极。 选择第一中空体电压,控制电极电压和/或端接电极电压,使得第一相互作用颗粒和/或第二相互作用颗粒通过第一入口进入第一中空体中的第一空腔。

    PARTICLE OPTICAL ARRANGEMENT
    10.
    发明申请
    PARTICLE OPTICAL ARRANGEMENT 有权
    颗粒光学布置

    公开(公告)号:US20090309025A1

    公开(公告)日:2009-12-17

    申请号:US12448229

    申请日:2007-11-23

    申请人: Dirk Preikszas

    发明人: Dirk Preikszas

    IPC分类号: G01N23/00

    摘要: A particle optical arrangement providing an electron microscopy system 3 and an ion beam processing system 7 comprises an objective lens 43 of the electron microscopy system having an annular electrode 59 being a component of the electron microscopy system arranged closest to a position 11 of an object to be examined. Between the annular electrode and a principal axis 9 of the ion beam processing system 7 a shielding electrode 81 is arranged.

    摘要翻译: 提供电子显微镜系统3和离子束处理系统7的粒子光学装置包括电子显微镜系统的物镜43,其具有环形电极59,该环形电极是最靠近物体的位置11布置的电子显微镜系统的部件, 被检查。 在环形电极和离子束处理系统7的主轴9之间设置有屏蔽电极81。