Scanning charged particle beams
    1.
    发明授权
    Scanning charged particle beams 有权
    扫描带电粒子束

    公开(公告)号:US08304750B2

    公开(公告)日:2012-11-06

    申请号:US12744152

    申请日:2008-12-12

    IPC分类号: H01J37/302

    摘要: Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size f at the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least d in the first direction, and a ratio d/f being 2 or more.

    摘要翻译: 公开的方法包括将样品的表面的一部分直接暴露于带电粒子束,样品表面的部分在第一方向上形成一行,带电粒子束具有平均斑点大小f 在样品的表面,每个部分与其相邻部分间隔至少在第一方向上的d,d / f的比例为2或更大。

    SCANNING CHARGED PARTICLE BEAMS
    2.
    发明申请
    SCANNING CHARGED PARTICLE BEAMS 有权
    扫描充电粒子

    公开(公告)号:US20100294930A1

    公开(公告)日:2010-11-25

    申请号:US12744152

    申请日:2008-12-12

    IPC分类号: G21K5/00 G01N23/00

    摘要: Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size fat the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least din the first direction, and a ratio d/f being 2 or more.

    摘要翻译: 公开的方法包括直接连续地将样品的表面的一部分暴露于带电粒子束,样品表面的部分在第一方向上形成一行,带电粒子束具有平均斑点大小脂肪 样品的表面,每个部分与其相邻部分间隔至少在第一方向上的距离,并且比率d / f为2或更大。

    Electron-beam device and detector system
    5.
    发明申请
    Electron-beam device and detector system 有权
    电子束装置和检测器系统

    公开(公告)号:US20070120071A1

    公开(公告)日:2007-05-31

    申请号:US11594691

    申请日:2006-11-08

    IPC分类号: G21G5/00

    摘要: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.

    摘要翻译: 一种具有用于产生电子束的光束发生器,用于将电子束聚焦在物体上的物镜的电子束装置,以及用于检测物体上分散的或被物体发射的电子的至少一个检测器。 此外,描述了用于检测电子的检测器系统。 利用具有根据本发明的检测器系统的电子束装置,可以以简单的方式进行选择,特别是根据反向散射和二次电子。 同时,使用检测器系统可以检测尽可能多的电子。 为此目的,电子束装置表现出至少一个分配给检测器的可调节膜片。 检测器系统呈现一个检测器,在该检测器上容纳用于将电子反射到检测器上的反射器。

    Objective lens for an electron microscopy system and electron microscopy system
    6.
    发明授权
    Objective lens for an electron microscopy system and electron microscopy system 有权
    用于电子显微镜系统和电子显微镜系统的物镜

    公开(公告)号:US06855938B2

    公开(公告)日:2005-02-15

    申请号:US10619475

    申请日:2003-07-16

    摘要: An objective lens with magnetic and electrostatic focusing for an electron microscopy system is provided whose at least partially conical outer shape allows orienting an object to be imaged at a large angle range in respect of an electron beam, said objective lens exhibiting, at the same time, good optical parameters. This is enabled by a specific geometry of the lens elements. Furthermore, an examination for the simultaneous imaging and processing of an object is proposed which comprises, besides an electron microscopy system with the above-mentioned objective lens, also an ion beam processing system and an object support.

    摘要翻译: 提供了一种用于电子显微镜系统的具有磁性和静电聚焦的物镜,其至少部分为圆锥形的外部形状允许相对于电子束以大角度范围定向要成像的物体,所述物镜同时展现 ,光学参数好。 这可以通过镜头元件的特定几何形状来实现。 此外,提出了一种用于同时成像和处理物体的检查,除了具有上述物镜的电子显微镜系统之外,还包括离子束处理系统和物体支撑。

    Particle beam microscope
    7.
    发明授权
    Particle beam microscope 有权
    粒子束显微镜

    公开(公告)号:US08476589B2

    公开(公告)日:2013-07-02

    申请号:US13539291

    申请日:2012-06-29

    IPC分类号: H01J37/244

    摘要: A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β1 between a first straight line 551 extending through the point of intersection 51 and a center of the first substrate 351 and the object plane 19 differs from a second elevation angle β2 between a second straight line 552 extending through the point of intersection 51 and a center of the second substrate 352 and the object plane 19 by more than 14°.

    摘要翻译: 粒子束显微镜包括具有光轴53和极片21的磁透镜3.被检查物5安装在光轴53与物面19之间的交点51处。第一和第二X射线 射线检测器33具有第一和第二辐射敏感基板35,其布置成使得延伸穿过交点51的第一直线551与第一基板351的中心与物平面19之间的第一仰角β1与第二 延伸穿过交点51的第二直线552与第二基板352的中心和物平面19之间的仰角β2超过14°。

    Apparatus for focusing and for storage of ions and for separation of pressure areas
    8.
    发明申请
    Apparatus for focusing and for storage of ions and for separation of pressure areas 有权
    用于聚焦和存储离子和分离压力区域的装置

    公开(公告)号:US20110220788A1

    公开(公告)日:2011-09-15

    申请号:US12931272

    申请日:2011-01-27

    IPC分类号: H01J49/26 H01J3/14

    摘要: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.

    摘要翻译: 公开了一种用于聚焦和存储离子的装置和用于将第一压力区域与第二压力区域分离的装置,特别是用于离子分析装置。 粒子束装置可以具有上述装置中的至少一个。 提供了用于保持离子和至少一个多极单元的容器。 多极单元具有纵向轴线的通孔以及多个电极。 第一组电极处于距纵向轴线的第一径向距离处。 在每种情况下,第二组电极距离纵向轴线的第二径向距离。 第一径向距离小于第二径向距离。 或者或另外,该装置可以具有径向范围的细长开口。 开口具有大于径向范围的纵向范围。

    Printed circuit board multipole for ion focusing
    9.
    发明授权
    Printed circuit board multipole for ion focusing 有权
    用于离子聚焦的印刷电路板多极

    公开(公告)号:US09230789B2

    公开(公告)日:2016-01-05

    申请号:US12931272

    申请日:2011-01-27

    IPC分类号: H01J49/42 H01J49/06 H01J49/14

    摘要: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.

    摘要翻译: 公开了一种用于聚焦和存储离子的装置和用于将第一压力区域与第二压力区域分离的装置,特别是用于离子分析装置。 粒子束装置可以具有上述装置中的至少一个。 提供了用于保持离子和至少一个多极单元的容器。 多极单元具有纵向轴线的通孔以及多个电极。 第一组电极处于距纵向轴线的第一径向距离处。 在每种情况下,第二组电极距离纵向轴线的第二径向距离。 第一径向距离小于第二径向距离。 或者或另外,该装置可以具有径向范围的细长开口。 开口具有大于径向范围的纵向范围。

    PARTICLE BEAM DEVICE WITH DEFLECTION SYSTEM
    10.
    发明申请
    PARTICLE BEAM DEVICE WITH DEFLECTION SYSTEM 有权
    具有偏转系统的粒子束装置

    公开(公告)号:US20120138814A1

    公开(公告)日:2012-06-07

    申请号:US13306529

    申请日:2011-11-29

    IPC分类号: H01J3/26 H01J3/14

    摘要: A particle beam device includes a particle beam generator, an objective lens, and first and second deflection systems for deflecting the particle beam in an object plane defined by the objective lens. In a first operating mode, the first deflection system generates a first deflection field and the second deflection system generates a second deflection field. In a second operating mode, the first deflection system generates a third deflection field and the second deflection system generates a fourth deflection field.

    摘要翻译: 粒子束装置包括粒子束发生器,物镜,以及用于使粒子束偏转在由物镜限定的物平面中的第一和第二偏转系统。 在第一操作模式中,第一偏转系统产生第一偏转场,而第二偏转系统产生第二偏转场。 在第二操作模式中,第一偏转系统产生第三偏转场,第二偏转系统产生第四偏转场。