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    Boundary layer disruptive preconditioning in atmospheric-plasma process
    2.
    发明申请
    Boundary layer disruptive preconditioning in atmospheric-plasma process 审中-公开
    大气等离子体工艺中边界层破坏性预处理

    公开(公告)号：US20100062176A1

    公开(公告)日：2010-03-11

    申请号：US12283114

    申请日：2008-09-09

    申请人： Xin Dai ,  Richard Ellwanger ,  Angelo Yializis

    发明人： Xin Dai ,  Richard Ellwanger ,  Angelo Yializis

    IPC分类号： B05D3/14 ,  B05C9/08

    CPC分类号： B29C59/14 ,  B05D3/0486 ,  B05D3/144 ,  B29C2059/145 ,  B41M5/0011 ,  H05H1/48 ,  H05H2001/485

    摘要： The boundary layer of a substrate is exposed to a low-energy inert-gas atmospheric plasma that disrupts the layer's bonds, thereby permitting the removal of most oxygen from the surface of the substrate. The substrate is then passed through an exhaust section to remove the disrupted boundary layer prior to conventional plasma treatment. The subsequent plasma treatment is carried out in conventional manner in a substantially oxygen-free environment. As a result of the invention, the high surface-energy levels provided by plasma treatment are more lasting and plasma applications requiring a substantially oxygen-free environment are more efficient.

    摘要翻译： 衬底的边界层暴露于破坏层的键的低能惰性气体大气等离子体，从而允许从衬底的表面去除大部分氧。 然后在常规等离子体处理之前，将衬底通过排气部分以去除破裂的边界层。 随后的等离子体处理在常规方式中在基本上无氧的环境中进行。 作为本发明的结果，通过等离子体处理提供的高表面能级更持久，并且需要基本上无氧环境的等离子体应用更有效。

    Conductive flakes manufactured by combined sputtering and vapor deposition
    4.
    发明申请
    Conductive flakes manufactured by combined sputtering and vapor deposition 有权
    通过组合溅射和​​气相沉积制造的导电薄片

    公开(公告)号：US20060226399A1

    公开(公告)日：2006-10-12

    申请号：US11448362

    申请日：2006-06-07

    申请人： Michael Mikhael ,  Angelo Yializis

    发明人： Michael Mikhael ,  Angelo Yializis

    IPC分类号： H01B1/12

    CPC分类号： G09C1/00 ,  B22F9/08 ,  B22F9/16 ,  C01P2004/20 ,  C01P2006/40 ,  C09C1/00 ,  C09D7/61 ,  C09D11/52 ,  C23C14/0005 ,  H01B1/08 ,  Y10T428/256

    摘要： A release agent is flash evaporated and deposited onto a support substrate under conventional vapor-deposition conditions and a conductive metal oxide, such as ITO, is subsequently sputtered or deposited by reactive electron beam onto the resulting release layer in the same process chamber to form a very thin film of conductive material. The resulting multilayer product is separated from the support substrate, crushed to brake up the metal-oxide film into flakes, and heated or mixed in a solvent to separate the soluble release layer from the metallic flakes. Thus, by judiciously controlling the deposition of the ITO on the release layer, transparent flakes may be obtained with the desired optical and physical characteristics.

    摘要翻译： 在常规气相沉积条件下，将释放剂快速蒸发并沉积到支撑衬底上，然后将诸如ITO的导电金属氧化物随后通过反应性电子束溅射或沉积到相同处理室中的所得释放层上，形成 非常薄的导电材料。 将得到的多层产品与支撑基材分离，粉碎以将金属氧化物膜制成薄片，并在溶剂中加热或混合以将可溶性脱离层与金属薄片分离。 因此，通过明智地控制ITO在剥离层上的沉积，可以获得具有期望的光学和物理特性的透明薄片。

    Atmospheric glow discharge with concurrent coating deposition
    5.
    发明授权
    Atmospheric glow discharge with concurrent coating deposition 有权
    大气辉光放电同时进行涂层沉积

    公开(公告)号：US07067405B2

    公开(公告)日：2006-06-27

    申请号：US10883167

    申请日：2004-07-01

    申请人： Michael G. Mikhael ,  Angelo Yializis ,  Richard E. Ellwanger

    发明人： Michael G. Mikhael ,  Angelo Yializis ,  Richard E. Ellwanger

    IPC分类号： H01L21/20

    CPC分类号： C23C16/30 ,  B05D1/62 ,  B05D3/0263 ,  B05D3/067 ,  B05D3/068 ,  C23C16/509 ,  H01J37/32009 ,  H01J37/32018 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32532 ,  H01J37/32724 ,  H01J37/32825 ,  H05H1/24 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/2431

    摘要： A plasma is produced in a treatment space by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes separated by a dielectric material, a precursor material is mixed with the plasma, and a substrate film or web is coated by vapor deposition of the vaporized substance at atmospheric pressure in the plasma field. The deposited precursor is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being-deposited. Plasma pre-treatment and post-treatment steps are used to enhance the properties of the resulting coated products. Similar results are obtained by atomizing and spraying the liquid precursor in the plasma field.

    摘要翻译： 通过在大气压下扩散等离子体气体并在由电介质材料分离的两个金属电极产生的电场中产生等离子体，将前体材料与等离子体混合，并且将基材膜或纤维网 通过在等离子体场中的大气压下汽化物质的气相沉积来涂覆。 沉积的前体通过电子束，红外光，可见光或紫外光辐射固化，最适合于被沉积的特定材料。 使用等离子体预处理和后处理步骤来增强所得涂覆产品的性能。 通过在等离子体场中雾化和喷射液体前体获得类似的结果。

    Large-area electroluminescent light-emitting devices
    7.
    发明申请
    Large-area electroluminescent light-emitting devices 审中-公开
    大面积电致发光器件

    公开(公告)号：US20050264179A1

    公开(公告)日：2005-12-01

    申请号：US11137823

    申请日：2005-05-25

    申请人： Michael Mikhael ,  Angelo Yializis

    发明人： Michael Mikhael ,  Angelo Yializis

    IPC分类号： B05D5/12 ,  H05B33/10 ,  H05B33/22

    CPC分类号： H05B33/22 ,  H05B33/10

    摘要： An electroluminescent light-emitting device is manufactured in a semi-continuous process using vapor deposition technology to reduce the thickness of the dielectric layers. The phosphor, dielectric and electrode layers are deposited sequentially on a flexible web substrate, preferably PET coated with conductive ITO, which is passed through the deposition sections on a continuous basis. By depositing the dielectric layers in vacuum, very thin layers are possible, which yields increased transparency and electrical capacitance. Accordingly the resulting multi-layer structure is suitable for the manufacture of large-area EL devices.

    摘要翻译： 采用蒸镀技术的半连续工艺制造电致发光发光器件，以减小电介质层的厚度。 磷光体，介电层和电极层依次沉积在柔性幅材基材上，优选地涂覆有导电ITO的PET，其连续地通过沉积部分。 通过在真空中沉积介电层，可以实现非常薄的层，这增加了透明度和电容。 因此，所得到的多层结构适用于大面积EL器件的制造。

    Barrier film for limiting transmission of oxygen and moisture therethrough
    8.
    发明授权
    Barrier film for limiting transmission of oxygen and moisture therethrough 失效
    阻挡膜用于限制氧气和水分的透过

    公开(公告)号：US06706412B2

    公开(公告)日：2004-03-16

    申请号：US09792196

    申请日：2001-02-21

    申请人： Angelo Yializis

    发明人： Angelo Yializis

    IPC分类号： B32B1508

    CPC分类号： B05D1/60 ,  B05D3/144 ,  B05D3/147 ,  B32B27/00 ,  C23C14/20 ,  H01G4/20 ,  Y10T428/12569 ,  Y10T428/12576 ,  Y10T428/1462 ,  Y10T428/31515 ,  Y10T428/31533 ,  Y10T428/3154 ,  Y10T428/31678 ,  Y10T428/31681 ,  Y10T428/31692 ,  Y10T428/31699 ,  Y10T428/31855 ,  Y10T428/31935

    摘要： A hybrid film, comprising a first polymer film having a plasma-treated surface and a second polymer film having first and second surfaces, with the first surface of the second polymer film being disposed along the first plasma-treated surface of the first polymer film, has superior thermal and mechanical properties that improve performance in a number of applications, including food packaging, thin film metallized and foil capacitors, metal evaporated magnetic tapes, flexible electrical cables, and decorative and optically variable films. One or more metal layers may be deposited on either the plasma-treated surface of the substrate and/or the radiation-cured acrylate polymer. A ceramic layer may be deposited on the radiation-cured acrylate polymer to provide an oxygen and moisture barrier film. The hybrid film is produced using a high speed, vacuum polymer deposition process that is capable of forming thin, uniform, high temperature, cross-linked acrylate polymers on specific thermoplastic or thermoset films. Radiation curing is employed to cross-link the acrylate monomer. The hybrid film can be produced in-line with the metallization or ceramic coating process, in the same vacuum chamber and with minimal additional cost.

    摘要翻译： 一种混合膜，包括具有等离子体处理表面的第一聚合物膜和具有第一和第二表面的第二聚合物膜，第二聚合物膜的第一表面沿着第一聚合物膜的第一等离子体处理表面设置， 具有优异的热和机械性能，可在许多应用中提高性能，包括食品包装，薄膜金属化和箔电容器，金属蒸发磁带，柔性电缆以及装饰和光学可变膜。 一个或多个金属层可以沉积在基板的等离子体处理的表面和/或辐射固化的丙烯酸酯聚合物上。 可以将陶瓷层沉积在辐射固化的丙烯酸酯聚合物上以提供氧气和湿气阻挡膜。 使用能够在特定热塑性或热固性膜上形成薄的，均匀的，高温的交联的丙烯酸酯聚合物的高速真空聚合物沉积工艺来制备混合膜。 辐射固化用于交联丙烯酸酯单体。 可以在相同的真空室中以与金属化或陶瓷涂覆方法一致的方式生产混合膜并以最小的额外成本。