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    METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES
    3.
    发明申请
    METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES 有权
    使用空位获取模板变形的力组合的方法和方法优化技术

    公开(公告)号：US20070287081A1

    公开(公告)日：2007-12-13

    申请号：US11695469

    申请日：2007-04-02

    申请人： Anshuman Cherala ,  Sidlgata Sreenivasan ,  Byung-Jin Choi ,  Ecron Thompson

    发明人： Anshuman Cherala ,  Sidlgata Sreenivasan ,  Byung-Jin Choi ,  Ecron Thompson

    IPC分类号： G03F9/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/703 ,  G03F7/70633 ,  G03F7/70783 ,  G03F9/7003 ,  G03F9/7092

    摘要： The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero.

    摘要翻译： 本发明涉及一种用于确定图案化装置将经历以使其上的记录图案与参考图案之间的尺寸变化最小化的变形参数的方法，该方法尤其包括将记录图案的特征与相对于 参考图案的相应特征; 以及确定施加到所述图案化装置上的变形力以衰减所述尺寸变化，其中所述力具有预定的约束，其中所述力的大小的总和基本上为零，并且所述力的力矩的总和基本上为零。

    Apparatus to vary dimensions of a substrate during nano-scale manufacturing
    4.
    发明申请
    Apparatus to vary dimensions of a substrate during nano-scale manufacturing 有权
    用于在纳米级制造期间改变衬底尺寸的装置

    公开(公告)号：US20060001857A1

    公开(公告)日：2006-01-05

    申请号：US11142839

    申请日：2005-06-01

    申请人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    发明人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    IPC分类号： G03B27/58

    CPC分类号： G03F7/0002 ,  B82Y10/00

    摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.

    摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。

    System for magnification and distortion correction during nano-scale manufacturing
    5.
    发明申请
    System for magnification and distortion correction during nano-scale manufacturing 审中-公开
    纳米尺寸制造中的放大和失真校正系统

    公开(公告)号：US20050270516A1

    公开(公告)日：2005-12-08

    申请号：US10999898

    申请日：2004-11-30

    申请人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    发明人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    IPC分类号： B29C43/02 ,  B81C99/00 ,  G03B27/58 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03B27/58

    摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.

    摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。

    System for varying dimensions of a substrate during nanoscale manufacturing
    7.
    发明申请
    System for varying dimensions of a substrate during nanoscale manufacturing 有权
    在纳米级制造期间用于改变衬底尺寸的系统

    公开(公告)号：US20060001194A1

    公开(公告)日：2006-01-05

    申请号：US11142808

    申请日：2005-06-01

    申请人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    发明人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    IPC分类号： B29C59/02

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03B27/58

    摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting Forces sensed by the substrate chuck generated in response to the compressive forces.

    摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的衬底卡盘感测到的结果力的大小。