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公开(公告)号:USD1027120S1
公开(公告)日:2024-05-14
申请号:US29762536
申请日:2020-12-17
Applicant: Applied Materials, Inc.
Designer: Yao-Hung Yang , Eric Ruhland , Saurabh M. Chaudhari , Dien-Yeh Wu , Philip Wayne Nagle , Aniruddha Pal , Sudhir R. Gondhalekar , Siamak Salimian , Scott Lin , Boon Sen Chan
Abstract: FIG. 1 is top perspective view of a seal for an assembly in a vapor deposition chamber.
FIG. 2 is a bottom perspective view of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1.
FIG. 3 is a top plan view of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1.
FIG. 4 is a bottom plan view of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1.
FIG. 5 is a front view of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1.
FIG. 6 is a rear view of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1.
FIG. 7 is a right side view of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1.
FIG. 8 is a left side view of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1.
FIG. 9 is an enlarged sectional view of a portion of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1 showing details of an outer segment of the seal.
FIG. 10 is an enlarged sectional view of a portion of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1 showing details of a central segment of the seal.
FIG. 11 is an enlarged sectional view of a portion of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 1 showing details of an outer segment of the seal.
FIG. 12 is an enlarged sectional view of a portion of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 2 showing details of an outer segment of the seal.
FIG. 13 is an enlarged sectional view of a portion of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 3 showing details of a central segment of the seal.
FIG. 14 is an enlarged sectional view of a portion of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 4 showing details of a central segment of the seal.
FIG. 15 is an enlarged sectional view of a portion of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 6 showing details of an outer segment of the seal.
FIG. 16 is an enlarged sectional view of a portion of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 7 showing details of an outer segment of the seal; and,
FIG. 17 is a top plan view of the seal for an assembly in a vapor deposition chamber illustrated in FIG. 3 shown in a portion of an assembly (in phantom).
The broken and phantom lines in the Figures illustrate unclaimed parts of the seal for an assembly in a vapor deposition chamber and form no part of the claimed design.-
公开(公告)号:US08911151B2
公开(公告)日:2014-12-16
申请号:US13648082
申请日:2012-10-09
Applicant: Applied Materials, Inc.
Inventor: Tao Hou , Jeonghoon Oh , Tom K. Cho , Andrzej Matlosz , Frank F. Hooshdaran , Yao-Hung Yang
IPC: F16C29/02 , C23C16/458 , C23C16/505 , H01L21/687
CPC classification number: C23C16/4586 , C23C16/505 , F16C29/02 , H01L21/68742
Abstract: A bushing assembly for supporting a substrate within a processing chamber is generally provided. In one aspect, the bushing assembly comprises a tubular body having an outer perimeter and an aperture extending therethrough, a first ring having a first inner edge, the first ring disposed in the aperture in an upper portion of the tubular body, and a second ring having a second inner edge, the second ring disposed in the aperture in a lower portion of the tubular body. In another aspect, the first inner edge has a first radius of curvature, and the second inner edge has a second radius of curvature. In another aspect, a first inner edge diameter, a second inner edge diameter, the first radius of curvature, and the second radius of curvature are selected such that a support pin extending through the aperture contacts the bushing assembly on at most two points.
Abstract translation: 通常提供用于在处理室内支撑衬底的衬套组件。 在一个方面,套管组件包括具有外周边和延伸穿过其的孔的管状体,第一环具有第一内边缘,第一环设置在管状体的上部中的孔中,第二环 具有第二内边缘,所述第二环设置在所述管状体的下部中的所述孔中。 在另一方面,第一内边缘具有第一曲率半径,并且第二内边缘具有第二曲率半径。 在另一方面,选择第一内边缘直径,第二内边缘直径,第一曲率半径和第二曲率半径,使得延伸穿过孔的支撑销在最多两点处接触衬套组件。
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公开(公告)号:US12148607B2
公开(公告)日:2024-11-19
申请号:US18412127
申请日:2024-01-12
Applicant: Applied Materials, Inc.
Inventor: Yao-Hung Yang , Shantanu Rajiv Gadgil , Kaushik Rao , Vincent Joseph Kirchhoff , Sagir Kadiwala , Munirah Mahyudin , Daniel Chou
Abstract: A lamp and epitaxial processing apparatus are described herein. In one example, the lamp includes a bulb, a filament, and a plurality of filament supports disposed in spaced-apart relation to the filament, each of the filament supports having a hook support and a hook. The hook includes a connector configured to fasten the hook to the hook support, a first vertical portion extending from the connector toward the filament, and a rounded portion extending from an end of the first vertical portion distal from the connector and configured to wrap around the filament. A second vertical portion extends from an end of the rounded portion distal from the first vertical portion and the second vertical portion has a length between 60% and 100% of the length of the first vertical portion.
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公开(公告)号:US11856706B2
公开(公告)日:2023-12-26
申请号:US16702031
申请日:2019-12-03
Applicant: Applied Materials, Inc.
Inventor: Hsui Yang , Yao-Hung Yang , Jeevan Shanbhag , Chien-Min Liao , Earl Hunter , David Ganon , Mariana Luigi , Siamak Salimian , Tom K. Cho , Chun-Chung Chen
CPC classification number: H05K13/087 , H01L21/67276 , H01L21/67294
Abstract: The present disclosure is directed to a system and method to identify and track parts of a semiconductor processing chamber, as well as the status of the parts, and store status information in a centralized location as status changes over time.
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公开(公告)号:US11881392B2
公开(公告)日:2024-01-23
申请号:US18196341
申请日:2023-05-11
Applicant: Applied Materials, Inc.
Inventor: Yao-Hung Yang , Shantanu Rajiv Gadgil , Kaushik Rao , Vincent Joseph Kirchhoff , Sagir Kadiwala , Munirah Mahyudin , Daniel Chou
Abstract: A lamp and epitaxial processing apparatus are described herein. In one example, the lamp includes a bulb, a filament, and a plurality of filament supports disposed in spaced-apart relation to the filament, each of the filament supports having a hook support and a hook. The hook includes a connector configured to fasten the hook to the hook support, a first vertical portion extending from the connector toward the filament, and a rounded portion extending from an end of the first vertical portion distal from the connector and configured to wrap around the filament. A second vertical portion extends from an end of the rounded portion distal from the first vertical portion and the second vertical portion has a length between 60% and 100% of the length of the first vertical portion.
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公开(公告)号:US20230064637A1
公开(公告)日:2023-03-02
申请号:US17893430
申请日:2022-08-23
Applicant: Applied Materials, Inc.
Inventor: Kiran Shyam Honnavar , Srikantha Raju , Gangadhar Sheelavant , Aniruddha Pal , Yao-Hung Yang , Basavaraja Shankarappa Kengunti
IPC: H01J37/32 , B05B1/00 , B05B1/18 , C23C16/455 , C23C16/50
Abstract: Exemplary dual-channel showerheads may include an upper plate that defines a first plurality of apertures. The showerheads may include a base having a lower plate. The lower plate may define a second plurality of apertures and a third plurality of apertures. Each of the first plurality of apertures may be fluidly coupled with a respective one of the second plurality of apertures to define a fluid path extending from a top surface of the showerhead through a bottom surface of the showerhead. The base may define a gas inlet that is fluidly coupled with the third plurality of apertures. The base may be detachably coupled with the upper plate using one or more fastening mechanisms. The showerheads may include a compressible gasket positioned between the upper plate and the lower plate.
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公开(公告)号:US12209663B2
公开(公告)日:2025-01-28
申请号:US18215604
申请日:2023-06-28
Applicant: Applied Materials, Inc.
Inventor: Yao-Hung Yang , Chih-Yang Chang , Sam Hyungsam Kim
Abstract: A sealing member includes a monolithic body including a first portion adjoining a second portion. The first portion forms part of a circle. The second portion includes first and second lobes. Each lobe adjoins the first portion with a concave surface. In one example, each lobe includes a rounded tip, and a convex surface extends from one rounded tip to the other rounded tip.
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公开(公告)号:US12011731B2
公开(公告)日:2024-06-18
申请号:US17365727
申请日:2021-07-01
Applicant: APPLIED MATERIALS, INC.
Inventor: Yao-Hung Yang , Shantanu Rajiv Gadgil , Tanmay Pramod Gurjar , Sudhir R. Gondhalekar
IPC: B05B15/18 , B05B1/18 , C23C16/455
CPC classification number: B05B15/18 , B05B1/18 , C23C16/45565
Abstract: Embodiments of showerheads for use in a process chamber and methods of reducing drooping of a showerhead faceplate are provided herein. In some embodiments, a showerhead for use in a process chamber includes: a faceplate having a plurality of gas distribution holes disposed therethrough; and one or more cables that engage with the faceplate and configured to prestress the faceplate.
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公开(公告)号:US11532466B2
公开(公告)日:2022-12-20
申请号:US16933922
申请日:2020-07-20
Applicant: Applied Materials, Inc.
Inventor: Chien-Min Liao , Yao-Hung Yang , Tom K. Cho , Siamak Salimian , Hsiu Yang , Chun-Chung Chen
IPC: H01J37/32
Abstract: Certain embodiments provide a method and non-transitory computer readable medium having instructions that, when executed by a processor of a processing system, cause the processing system to perform a method for improving operation of a semiconductor processing system. The method of part life estimation generally includes obtaining a chamber part having a first surface portion and second surface portion. A data matrix in the first portion of the chamber part is read. The data matrix has raised features. The first portion of the chamber part is cleaned. Wear on the raised features is evaluated. The part is discarded in response to the wear on the raised feature.
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公开(公告)号:US11359722B2
公开(公告)日:2022-06-14
申请号:US16517299
申请日:2019-07-19
Applicant: Applied Materials, Inc.
Inventor: Shagun P. Maheshwari , Yao-Hung Yang , King F. Lee , Andrew Yu , Aniruddha Pal , Tom K. Cho , Chien-Min Liao
IPC: F16J15/02
Abstract: A sealing member is provided, including a plurality of nodes and a plurality of antinodes. Each sealing member can be rotated to expose nondamaged lobes for sealing, and prevents the sealing member from falling out of the lobed groove. A chamber is provided, including a groove that the sealing member is placed in. A method of rotating and placing the sealing member is provided, including a rotation to expose nondamaged portions of the sealing member.
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