公开(公告)号：US20150123284A1

公开(公告)日：2015-05-07

申请号：US14470366

申请日：2014-08-27

Applicant: Chajea JO ,  Taeje CHO ,  Hyunsoo CHUNG

Inventor： Chajea JO ,  Taeje CHO ,  Hyunsoo CHUNG

IPC: H01L23/538 ,  H01L25/065 ,  H01L21/768

CPC classification number: H01L23/5384 ,  H01L21/76879 ,  H01L21/76898 ,  H01L23/481 ,  H01L25/0657 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2924/15311

Abstract: A semiconductor device having through-electrodes and methods for fabricating the same are provided. The semiconductor device may include a first semiconductor chip including a first active surface on which a first top pad is provided; a second semiconductor chip including a second active surface on which a second top pad is provided and a second inactive surface on which a second bottom pad is provided, the second semiconductor chip being stacked on the first semiconductor chip with the second active surface facing the first active surface; and a conductive interconnection configured to electrically connect the chips. The conductive interconnection includes a first through-electrode that penetrates the second semiconductor chip and electrically connects the second bottom pad to the second top pad; and a second through-electrode that passes through the second top pad without contacting the second top pad, and electrically connects the second bottom pad to the first top pad.

Abstract translation: 提供了具有贯通电极的半导体器件及其制造方法。 半导体器件可以包括第一半导体芯片，其包括第一有源表面，第一有源表面上设置有第一顶部焊盘; 包括第二有源表面的第二半导体芯片，其上设置有第二顶焊盘，第二非活性表面设置有第二底焊盘，第二半导体芯片堆叠在第一半导体芯片上，第二有源表面面向第一 活性表面 以及被配置为电连接芯片的导电互连。 导电互连包括穿透第二半导体芯片并将第二底部焊盘电连接到第二顶部焊盘的第一贯通电极; 以及第二贯通电极，其穿过所述第二顶部焊盘而不接触所述第二顶部焊盘，并且将所述第二底部焊盘电连接到所述第一顶部焊盘。

公开(公告)号：US20130210222A1

公开(公告)日：2013-08-15

申请号：US13758239

申请日：2013-02-04

Applicant: Ho-Jin LEE ,  Kyu-ha LEE ,  Gilheyun CHOI ,  YongSoon CHOI ,  Pil-Kyu KANG ,  Byung-Lyul PARK ,  Hyunsoo CHUNG

Inventor： Ho-Jin LEE ,  Kyu-ha LEE ,  Gilheyun CHOI ,  YongSoon CHOI ,  Pil-Kyu KANG ,  Byung-Lyul PARK ,  Hyunsoo CHUNG

IPC: H01L21/768 ,  H01L23/00

CPC classification number: H01L21/768 ,  H01L21/02271 ,  H01L21/6836 ,  H01L21/76898 ,  H01L23/3192 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/13 ,  H01L25/0657 ,  H01L2221/68372 ,  H01L2224/02372 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/05027 ,  H01L2224/05548 ,  H01L2224/05567 ,  H01L2224/05568 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/06181 ,  H01L2224/13006 ,  H01L2224/13009 ,  H01L2224/13022 ,  H01L2224/13023 ,  H01L2224/13025 ,  H01L2224/13076 ,  H01L2224/13082 ,  H01L2224/131 ,  H01L2224/14181 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/06565 ,  H01L2924/00014 ,  H01L2924/181 ,  H01L2924/351 ,  H01L2924/00012 ,  H01L2924/014 ,  H01L2224/05552 ,  H01L2924/00

Abstract: In one embodiment, the method includes forming a conductive via structure in a base layer. The base layer has a first surface and a second surface, and the second surface is opposite the first surface. The method further includes removing the second surface of the base layer to expose the conductive via structure such that the conductive via structure protrudes from the second surface, and forming a first lower insulating layer over the second surface such that an end surface of the conductive via structure remains exposed by the first lower insulating layer.

Abstract translation: 在一个实施例中，该方法包括在基层中形成导电通孔结构。 基层具有第一表面和第二表面，并且第二表面与第一表面相对。 该方法还包括去除基底层的第二表面以暴露导电通路结构，使得导电通孔结构从第二表面突出，并且在第二表面上形成第一下绝缘层，使得导电通孔的端表面 结构保持由第一下绝缘层暴露。