Frame cell for shot layout flexibility
    1.
    发明授权
    Frame cell for shot layout flexibility 有权
    帧单元,用于拍摄布局灵活性

    公开(公告)号:US08843860B2

    公开(公告)日:2014-09-23

    申请号:US13409517

    申请日:2012-03-01

    IPC分类号: G06F17/50 G03F7/20

    CPC分类号: G03F7/70433

    摘要: A method includes establishing an initial shot layout in which a number of shots are arranged in vertically aligned columns and horizontally aligned rows to cover a semiconductor wafer. At least one of a row of shots or a column of shots is shifted relative to an adjacent row or column of shots to establish at least one additional shot layout that differs from the initial shot layout in that shots in the at least one shifted row or column of shots are not aligned with the shots in the adjacent row or column of shots with which they were aligned in the initial shot layout. One of the initial shot layout and the at least one additional shot layout is selected as a final shot layout. The wafer is exposed to light using the final shot layout.

    摘要翻译: 一种方法包括建立初始照片布局,其中多个照片布置在垂直排列的列和水平排列的行中以覆盖半导体晶片。 一排照片或一列照片中的至少一列相对于相邻的行或列发射位移,以建立与至少一个移位行中的拍摄中的初始镜头布局不同的至少一个附加镜头布局,或 一列照片不与在初始镜头布局中对齐的相邻行或照片列中的镜头对齐。 选择初始镜头布局和至少一个附加镜头布局之一作为最终镜头布局。 使用最终镜头布局将晶片曝光。

    FRAME CELL FOR SHOT LAYOUT FLEXIBILITY
    2.
    发明申请
    FRAME CELL FOR SHOT LAYOUT FLEXIBILITY 有权
    用于拍摄布局灵活性的框架单元

    公开(公告)号:US20120181669A1

    公开(公告)日:2012-07-19

    申请号:US13409517

    申请日:2012-03-01

    IPC分类号: H01L23/544 G06F17/50

    CPC分类号: G03F7/70433

    摘要: A method includes establishing an initial shot layout in which a number of shots are arranged in vertically aligned columns and horizontally aligned rows to cover a semiconductor wafer. At least one of a row of shots or a column of shots is shifted relative to an adjacent row or column of shots to establish at least one additional shot layout that differs from the initial shot layout in that shots in the at least one shifted row or column of shots are not aligned with the shots in the adjacent row or column of shots with which they were aligned in the initial shot layout. One of the initial shot layout and the at least one additional shot layout is selected as a final shot layout. The wafer is exposed to light using the final shot layout.

    摘要翻译: 一种方法包括建立初始照片布局,其中多个照片布置在垂直排列的列和水平排列的行中以覆盖半导体晶片。 一排照片或一列照片中的至少一列相对于相邻的行或列发射位移,以建立与至少一个移位行中的拍摄中的初始镜头布局不同的至少一个附加镜头布局,或 一列照片不与在初始镜头布局中对齐的相邻行或照片列中的镜头对齐。 选择初始镜头布局和至少一个附加镜头布局之一作为最终镜头布局。 使用最终镜头布局将晶片曝光。

    Enhanced scanner throughput system and method
    3.
    发明授权
    Enhanced scanner throughput system and method 有权
    增强扫描仪吞吐量系统和方法

    公开(公告)号:US08906599B2

    公开(公告)日:2014-12-09

    申请号:US13473695

    申请日:2012-05-17

    IPC分类号: G03F7/20

    CPC分类号: G03F7/70358

    摘要: A method and system to improve scanner throughput is provided. An image from a reticle is projected onto a substrate using a continuous linear scanning procedure in which an entire column of die or cells of die is scanned continuously, i.e. without stepping to a different location. Each scan includes translating a substrate with respect to a fixed beam. While the substrate is translated, the reticle is also translated. When a first die or cell of die is projected onto the substrate, the reticle translates along a direction opposite the scan direction and as the scan continues along the same direction, the reticle then translates in the opposite direction of the substrate thereby forming an inverted pattern on the next die or cell. The time associated with exposing the substrate is minimized as the stepping operation only occurs after a complete column of cells is scanned.

    摘要翻译: 提供了一种提高扫描仪吞吐量的方法和系统。 使用连续线性扫描程序将来自掩模版的图像投影到基板上,其中连续扫描整列管芯或裸片的单元,即不进入不同的位置。 每个扫描包括相对于固定光束平移衬底。 当底物被翻译时,掩模版也被翻译。 当模具的第一裸片或裸片投影到衬底上时,标线沿着与扫描方向相反的方向平移,并且随着扫描沿着相同的方向继续,标线片然后沿着衬底的相反方向平移,从而形成倒置图案 在下一个死亡或细胞。 与曝光底物相关的时间最小化,因为步进操作仅在扫描完整的单元格列之后才发生。

    DISPLAY DEVICE AND METHOD OF MEASURING SURFACE STRUCTURE THEREOF
    4.
    发明申请
    DISPLAY DEVICE AND METHOD OF MEASURING SURFACE STRUCTURE THEREOF 有权
    显示装置及其表面结构的测量方法

    公开(公告)号:US20110128481A1

    公开(公告)日:2011-06-02

    申请号:US12779915

    申请日:2010-05-13

    摘要: A display device and a method of measuring a surface structure of the same are provided. The display device includes first and second substrates, first and second patterned light-shielding layers, and first and second pixel units. The first patterned light-shielding layer disposed on a surface of the first substrate includes first openings. The second patterned light-shielding layer disposed on the surface of the first substrate in the first patterned light-shielding layer includes second openings. The first pixel unit includes first and second protrusions. The first protrusion correspondingly covers the first openings and a portion of the first patterned light-shielding layer. The second protrusion is disposed in the first and second patterned light-shielding layers. The second pixel unit includes a third protrusion correspondingly covering the second openings and a portion of the second patterned light-shielding layer, wherein sizes of the second openings are smaller than sizes of the first openings.

    摘要翻译: 提供显示装置和测量其表面结构的方法。 显示装置包括第一和第二基板,第一和第二图案化遮光层以及第一和第二像素单元。 设置在第一基板的表面上的第一图案化遮光层包括第一开口。 设置在第一图案化遮光层中的第一基板的表面上的第二图案遮光层包括第二开口。 第一像素单元包括第一和第二突起。 第一突起相应地覆盖第一开口和第一图案化遮光层的一部分。 第二突起设置在第一和第二图案化的遮光层中。 第二像素单元包括对应地覆盖第二开口的第三突起和第二图案化遮光层的一部分,其中第二开口的尺寸小于第一开口的尺寸。

    Display device and method of measuring surface structure thereof
    5.
    发明授权
    Display device and method of measuring surface structure thereof 有权
    显示装置及其表面结构的测量方法

    公开(公告)号:US08605235B2

    公开(公告)日:2013-12-10

    申请号:US12779915

    申请日:2010-05-13

    IPC分类号: G02F1/1335

    摘要: A display device and a method of measuring a surface structure of the same are provided. The display device includes first and second substrates, first and second patterned light-shielding layers, and first and second pixel units. The first patterned light-shielding layer disposed on a surface of the first substrate includes first openings. The second patterned light-shielding layer disposed on the surface of the first substrate in the first patterned light-shielding layer includes second openings. The first pixel unit includes first and second protrusions. The first protrusion correspondingly covers the first openings and a portion of the first patterned light-shielding layer. The second protrusion is disposed in the first and second patterned light-shielding layers. The second pixel unit includes a third protrusion correspondingly covering the second openings and a portion of the second patterned light-shielding layer, wherein sizes of the second openings are smaller than sizes of the first openings.

    摘要翻译: 提供显示装置和测量其表面结构的方法。 显示装置包括第一和第二基板,第一和第二图案化遮光层以及第一和第二像素单元。 设置在第一基板的表面上的第一图案化遮光层包括第一开口。 设置在第一图案化遮光层中的第一基板的表面上的第二图案遮光层包括第二开口。 第一像素单元包括第一和第二突起。 第一突起相应地覆盖第一开口和第一图案化遮光层的一部分。 第二突起设置在第一和第二图案化的遮光层中。 第二像素单元包括对应地覆盖第二开口的第三突起和第二图案化遮光层的一部分,其中第二开口的尺寸小于第一开口的尺寸。

    Frame cell for shot layout flexibility
    6.
    发明授权
    Frame cell for shot layout flexibility 有权
    帧单元,用于拍摄布局灵活性

    公开(公告)号:US08239788B2

    公开(公告)日:2012-08-07

    申请号:US12537836

    申请日:2009-08-07

    IPC分类号: G06F17/50 G03C5/00

    CPC分类号: G03F7/70433

    摘要: A method includes receiving an integrated circuit chip size and determining a frame structure segment size based on the chip size. The frame structure segment size is less than the chip size. An initial shot layout having a chip count is established in which a number of shots, each including at least one frame structure segment and at least one chip, are arranged in vertically and horizontally aligned columns and rows. At least one additional shot layout is established in which at least one of a row or column of shots is offset from an adjacent row or column of shots. The initial shot layout is compared to the at least one additional shot layout, and a final shot layout is selected based in part on the total number of shots in the shot layout and has a final chip count that is greater than or equal to the initial chip count.

    摘要翻译: 一种方法包括接收集成电路芯片尺寸并基于芯片尺寸确定帧结构段大小。 帧结构段大小小于芯片大小。 建立具有芯片数量的初始照片布局,其中每个包括至少一个框架结构段和至少一个芯片的镜头排列在垂直和水平排列的列和行中。 建立至少一个额外的镜头布局,其中一列或一列镜头中的至少一个从相邻的行或镜头列偏移。 将初始照片布局与至少一个附加镜头布局进行比较,并且部分地基于镜头布局中的总镜头数量选择最终镜头布局,并且具有大于或等于初始镜头布局的最终​​裁片数量 芯片数量

    FRAME CELL FOR SHOT LAYOUT FLEXIBILITY
    7.
    发明申请
    FRAME CELL FOR SHOT LAYOUT FLEXIBILITY 有权
    用于拍摄布局灵活性的框架单元

    公开(公告)号:US20110033787A1

    公开(公告)日:2011-02-10

    申请号:US12537836

    申请日:2009-08-07

    IPC分类号: G03F7/20 G06F17/50

    CPC分类号: G03F7/70433

    摘要: A method includes receiving an integrated circuit chip size and determining a frame structure segment size based on the chip size. The frame structure segment size is less than the chip size. An initial shot layout having a chip count is established in which a number of shots, each including at least one frame structure segment and at least one chip, are arranged in vertically and horizontally aligned columns and rows. At least one additional shot layout is established in which at least one of a row or column of shots is offset from an adjacent row or column of shots. The initial shot layout is compared to the at least one additional shot layout, and a final shot layout is selected based in part on the total number of shots in the shot layout and has a final chip count that is greater than or equal to the initial chip count.

    摘要翻译: 一种方法包括接收集成电路芯片尺寸并基于芯片尺寸确定帧结构段大小。 帧结构段大小小于芯片大小。 建立具有芯片数量的初始照片布局,其中每个包括至少一个框架结构段和至少一个芯片的镜头排列在垂直和水平排列的列和行中。 建立至少一个额外的镜头布局,其中一列或一列镜头中的至少一个从相邻的行或列的镜头偏移。 将初始照片布局与至少一个附加镜头布局进行比较,并且部分地基于镜头布局中的总镜头数量选择最终镜头布局,并且具有大于或等于初始镜头布局的最终​​裁片数量 芯片数量