Photosensitive compositions based on polycyclic polymers for low stress, high temperature films
    7.
    发明申请
    Photosensitive compositions based on polycyclic polymers for low stress, high temperature films 审中-公开
    基于用于低应力,高温膜的多环聚合物的光敏组合物

    公开(公告)号:US20060020068A1

    公开(公告)日:2006-01-26

    申请号:US11105494

    申请日:2005-04-14

    IPC分类号: C08G18/66 C08F132/08

    摘要: Vinyl addition polymer compositions, methods for forming such compositions, methods for using such compositions to form microelectronic and optoelectronic devices are provided. The vinyl addition polymer encompassed by such compositions has a polymer backbone having two or more distinct types of repeat units derived from norbornene-type monomers independently selected from monomers of Formula I: wherein each of X, m, R1, R2, R3, and R4 is as defined herein and wherein a first type of repeat unit is derived from a glycidyl ether substituted norbornene monomer and a second type of repeat unit is derived from an aralkyl substituted norbornene monomer.

    摘要翻译: 提供乙烯基加成聚合物组合物,形成这种组合物的方法,使用这种组合物形成微电子和光电子器件的方法。 由这种组合物包含的乙烯基加成聚合物具有聚合物主链,其具有两种或更多种不同类型的衍生自独立地选自式I的单体的降冰片烯型单体的重复单元:其中X,m,R 1, >,R 2,R 3和R 4如本文所定义,并且其中第一类型的重复单元衍生自缩水甘油醚 取代的降冰片烯单体和第二类型的重复单元衍生自芳烷基取代的降冰片烯单体。