公开(公告)号：US5594079A

公开(公告)日：1997-01-14

申请号：US601473

申请日：1996-02-14

申请人： Daiji Hara ,  Masahiro Adachi ,  Mitsuhiro Mori

发明人： Daiji Hara ,  Masahiro Adachi ,  Mitsuhiro Mori

IPC分类号： C08F4/658 ,  C08F4/60 ,  C08F4/646 ,  C08F10/00 ,  C08F4/653 ,  C08F4/655 ,  C08F10/06

CPC分类号： C08F10/00

摘要： A method for producing a stereoregular polyolefin in the presence of a catalyst comprising a transition metal compound and an organometallic compound, which comprises polymerizing at least one olefin in the presence of a catalyst system comprising:(A) a solid catalyst component comprising Mg, Ti, halogen and an electron donative compound,(B) at least one member selected from the group consisting of organometallic compounds of metals of Groups IA, IIA, IIB, IIIB and IVB of the Periodic Table,(C) an electron donative compound, and(D) a boron compound of the formula R.sup.1.sub.n BX.sub.3-n wherein R.sup.1 is a hydrocarbon group and/or a halogenated hydrocarbon group, X is a halogen atom, and 0.ltoreq.n.ltoreq.3.

摘要翻译： 一种在包含过渡金属化合物和有机金属化合物的催化剂存在下制备立构规则聚烯烃的方法，其包括在催化剂体系存在下聚合至少一种烯烃，所述催化剂体系包含：（A）包含Mg，Ti ，卤素和给电子化合物，（B）选自元素周期表第IA，IIA，IIB，IIIB和IVB族金属的有机金属化合物中的至少一种，（C）给电子化合物，和 （D）式R1nBX3-n的硼化合物，其中R1是烃基和/或卤代烃基，X是卤素原子，且0

公开(公告)号：US08927962B2

公开(公告)日：2015-01-06

申请号：US13055690

申请日：2010-02-26

申请人： Masaki Ueno ,  Yusuke Yoshizumi ,  Yohei Enya ,  Takashi Kyono ,  Katsushi Akita ,  Takamichi Sumitomo ,  Masahiro Adachi ,  Shinji Tokuyama

发明人： Masaki Ueno ,  Yusuke Yoshizumi ,  Yohei Enya ,  Takashi Kyono ,  Katsushi Akita ,  Takamichi Sumitomo ,  Masahiro Adachi ,  Shinji Tokuyama

IPC分类号： H01L29/66 ,  H01L33/32 ,  H01S5/343 ,  B82Y20/00 ,  H01L33/16 ,  H01S5/32

CPC分类号： H01S5/34333 ,  B82Y20/00 ,  H01L33/16 ,  H01L33/32 ,  H01L33/325 ,  H01S5/3202

摘要： A group III nitride semiconductor optical device 11a has a group III nitride semiconductor substrate 13 having a main surface 13a forming a finite angle with a reference plane Sc orthogonal to a reference axis Cx extending in a c-axis direction of the group III nitride semiconductor and an active layer 17 of a quantum-well structure, disposed on the main surface 13a of the group III nitride semiconductor substrate 13, including a well layer 28 made of a group III nitride semiconductor and a plurality of barrier layers 29 made of a group III nitride semiconductor. The main surface 13a exhibits semipolarity. The active layer 17 has an oxygen content of at least 1×1017 cm−3 but not exceeding 8×1017 cm−3. The plurality of barrier layers 29 contain an n-type impurity other than oxygen by at least 1×1017 cm−3 but not exceeding 1×1019 cm−3 in an upper near-interface area 29u in contact with a lower interface 28Sd of the well layer 28 on the group III nitride semiconductor substrate side.

摘要翻译： III族氮化物半导体光学元件11a具有III族氮化物半导体衬底13，该III族氮化物半导体衬底13具有与在III族氮化物半导体的c轴方向上延伸的参考轴Cx正交的参考平面Sc形成有限角度的主表面13a; 设置在III族氮化物半导体衬底13的主表面13a上的量子阱结构的有源层17，包括由III族氮化物半导体制成的阱层28和由III族组成的多个势垒层29 氮化物半导体。 主表面13a具有半极性。 活性层17的氧含量至少为1×1017cm-3，但不超过8×1017cm-3。 多个势垒层29在上接近界面区域29u中含有除氧之外的至少1×1017cm-3但不超过1×1019cm-3的n型杂质，该上接近界面区29u与下界面28Sd接触 III族氮化物半导体衬底侧的阱层28。

公开(公告)号：US20110291673A1

公开(公告)日：2011-12-01

申请号：US13147798

申请日：2010-02-08

申请人： Yoshinori Shibata ,  Masahiro Adachi

发明人： Yoshinori Shibata ,  Masahiro Adachi

IPC分类号： G01R27/28 ,  H01L29/66

CPC分类号： G01N27/4145 ,  G01N27/4148

摘要： Provided is a chemical sensor requiring no ion-sensitive film. Specifically provided is a chemical sensor (1) for detecting a sample base material (19) to be detected in a sample, the chemical sensor (1) including: a sensor TFT (7) of sensor TFTs (7) each of which has a glass substrate (8) and, on the glass substrate (8), a gate electrode (10), a gate oxide film (11), a silicon layer (12), a source electrode (14), and a drain electrode (15), the silicon layer (12) having a channel region (18) at an opening portion between the source electrode (14) and the drain electrode (15); and extracting signal lines PAS1 to PASn and a sensor signal amplifying and extracting circuit (24) that extract a leak current that is generated in the channel region (18).

摘要翻译： 提供了不需要离子敏感膜的化学传感器。 具体地提供一种用于检测样品中要检测的样品基材（19）的化学传感器（1），所述化学传感器（1）包括：传感器TFT（7）的传感器TFT（7），每个传感器TFT具有 玻璃基板（8），并且在玻璃基板（8）上具有栅电极（10），栅极氧化膜（11），硅层（12），源电极（14）和漏电极（15） ），所述硅层（12）在所述源电极（14）和所述漏电极（15）之间的开口部分具有沟道区（18）; 以及提取信号线PAS1〜PASn和提取在通道区域（18）中产生的泄漏电流的传感器信号放大和提取电路（24）。

公开(公告)号：US20110221707A1

公开(公告)日：2011-09-15

申请号：US13129103

申请日：2009-06-25

申请人： Kei Oyobe ,  Masahiro Adachi

发明人： Kei Oyobe ,  Masahiro Adachi

IPC分类号： G06F3/042

CPC分类号： G06F3/0412 ,  G02F1/13338 ,  G06F3/042 ,  G09G3/3648 ,  G09G2354/00 ,  G09G2360/147

摘要： A plurality of pixel circuits are provided on a TFT-side substrate 11, light blocking layers 15 and light blocking layer openings 16 are provided between the pixel circuits, and optical sensors 17 are arranged at positions where the light blocking layers 15 are provided. Light blocking layers 18 are also provided at opposing portions of the opposite substrate 12, and light reflecting units 19 are provided correspondingly to the optical sensors 17. In the normal state, backlight BL that has passed through the TFT-side substrate 11 is reflected by the light reflecting unit 19 and falls on the optical sensor 17. When the front surface of the liquid crystal panel is pressed, the two substrates come close to each other, the light reflection direction in the light reflecting unit 19 changes, and the intensity of light detected by the optical sensor 17 changes. By subjecting the obtained sensor image to an image recognition process, it is possible to eliminate the effect of the external light and detect the touch position on the display screen with high accuracy.

摘要翻译： 在TFT侧基板11上设置多个像素电路，在像素电路之间设置有遮光层15和遮光层开口16，并且在设置有遮光层15的位置配置有光学传感器17。 遮光层18也设置在相对基板12的相对部分处，并且光反射单元19对应于光学传感器17设置。在正常状态下，已经通过TFT侧基板11的背光BL被 光反射单元19落在光学传感器17上。当按压液晶面板的前表面时，两个基板彼此靠近，光反射单元19中的光反射方向变化，并且强度 由光学传感器17检测到的光改变。 通过对获得的传感器图像进行图像识别处理，可以消除外部光的影响并且以高精度检测显示屏上的触摸位置。

公开(公告)号：US07960918B2

公开(公告)日：2011-06-14

申请号：US11992592

申请日：2008-02-04

申请人： Masahiro Adachi ,  Yutaka Hashimoto ,  Katsuhisa Kanzaki ,  Tomoki Abe ,  Hirofumi Kasada ,  Koshi Ando

发明人： Masahiro Adachi ,  Yutaka Hashimoto ,  Katsuhisa Kanzaki ,  Tomoki Abe ,  Hirofumi Kasada ,  Koshi Ando

IPC分类号： H05B41/30

CPC分类号： H05B33/0848 ,  H05B33/089

摘要： An electronic device, and a corresponding light emission control method for the electronic device, emit light by utilizing recombination of electrons and holes the device and method input a pulse-shaped driving signal having a duty ratio higher than or equal to 0.7 and lower than 1.0 and thereby causing light to be emitted intermittently. When an electron density is denoted by n, a hole density by p, a thermal velocity of electrons by Vth:n, a thermal velocity of holes by Vth:p, an electron capture cross section of a defect level by σn, a hole capture cross section of a defect level by σp, and a pulse width of the driving signal by W, the input driving signal has a pulse width W that satisfies W

摘要翻译： 电子设备和相应的电子设备的发光控制方法通过利用电子和空穴的复合来发光，该装置和方法输入占空比高于或等于0.7且低于1.0的脉冲驱动信号 从而间歇地发光。 当电子密度由n表示时，空穴密度为p，电子的热速度为Vth：n，空穴的热速度为Vth：p，缺陷水平的电子捕获截面为＆sgr; n，a 缺陷电平的孔捕获截面为＆sgr; p，驱动信号的脉冲宽度为W，输入驱动信号的脉冲宽度W满足W <1 / {n·vth：n·＆sgr; n· p·vth：p·＆sgr; p /（n·vth：n·＆sgr; n + p·vth：p·＆sgr; p）}。

公开(公告)号：US07248025B2

公开(公告)日：2007-07-24

申请号：US11117528

申请日：2005-04-29

申请人： Masahiro Adachi

发明人： Masahiro Adachi

IPC分类号： G05F1/565

CPC分类号： G05F1/575

摘要： In a voltage regulator, a reference voltage generating circuit generates a reference voltage. A drive transistor is connected between a first power supply terminal and an output terminal and has a control terminal. A voltage divider generates a feedback voltage which is an intermediate voltage between voltages at the output terminal and a first power supply terminal. A differential amplifier generates an error voltage in accordance with the feedback voltage of the voltage divider and the reference voltage, and transmits it to the control terminal of the drive transistor. An oscillation preventing capacitor is connected between the control of the drive transistor and the output terminal. A capacitor is connected between the first power supply terminal and the first input of the differential amplifier.

摘要翻译： 在电压调节器中，参考电压产生电路产生参考电压。 驱动晶体管连接在第一电源端子和输出端子之间，并且具有控制端子。 分压器产生作为输出端子和第一电源端子处的电压之间的中间电压的反馈电压。 差分放大器根据分压器的反馈电压和参考电压产生误差电压，并将其发送到驱动晶体管的控制端子。 在驱动晶体管的控制和输出端子之间连接防振电容器。 电容器连接在第一电源端子和差分放大器的第一输入端之间。

公开(公告)号：US07185366B2

公开(公告)日：2007-02-27

申请号：US10084238

申请日：2002-02-27

申请人： Toru Mukai ,  Akira Ishida ,  Masahiro Adachi ,  Hideki Koike ,  Tetsuji Takada ,  Eiji Tameda

发明人： Toru Mukai ,  Akira Ishida ,  Masahiro Adachi ,  Hideki Koike ,  Tetsuji Takada ,  Eiji Tameda

IPC分类号： G06F11/00 ,  G06F11/22 ,  G06F11/30 ,  G06F11/32 ,  G06F11/34 ,  G06F11/36 ,  G06F12/14

CPC分类号： H04L63/1425 ,  H04L63/20

摘要： A security administration server providing various security services in the LAN and a host server operating in connection thereto are provided. There is installed a security administration server (S) having a function for collecting various log information managed in various devices to be monitored (C) operating in the LAN, a function for generating an image by extracting information useful for security management of the LAN from collected log information and visualizing such information to a form easy for a person to use, and a function for sending the image to another monitoring device (C). Further, the security administration server (S) provides various security services in connection with a host server (H) operating in an external network.

摘要翻译： 提供了一种在LAN中提供各种安全服务的安全管理服务器以及与其连接的主机服务器。 安装有一个安全管理服务器（S），该​​安全管理服务器具有收集在各种待监控的设备（C）中管理的各种日志信息的功能，该功能用于通过提取对LAN的安全管理有用的信息来生成图像 收集日志信息并将这些信息可视化为易于使用的表格，以及将图像发送到另一个监视设备（C）的功能。 此外，安全管理服务器（S）提供与在外部网络中操作的主机服务器（H）相关的各种安全服务。

公开(公告)号：US06765249B2

公开(公告)日：2004-07-20

申请号：US10621845

申请日：2003-07-16

申请人： Apostolos T. Voutsas ,  John W. Hartzell ,  Masahiro Adachi

发明人： Apostolos T. Voutsas ,  John W. Hartzell ,  Masahiro Adachi

IPC分类号： H01L31119

CPC分类号： H01L27/1262 ,  G11C13/0007 ,  G11C2213/31 ,  H01L27/1214 ,  H01L27/1218 ,  H01L27/3244 ,  H01L27/3262 ,  H01L29/4908 ,  H01L29/66757 ,  H01L29/78603 ,  H01L51/0097 ,  H01L2251/5315 ,  H01L2251/5338 ,  Y02E10/549 ,  Y02P70/521

摘要： A method for is provided forming a thin-film transistor (TFT) on a flexible substrate. The method comprises: supplying a metal foil substrate such as titanium (Ti), Inconel alloy, stainless steel, or Kovar, having a thickness in the range of 10 to 500 microns; depositing and annealing amorphous silicon to form polycrystalline silicon; and, thermally growing a gate insulation film overlying the polycrystalline. The silicon annealing process can be conducted at a temperature greater than 700 degrees C. using a solid-phase crystallization (SPC) annealing process. Thermally growing a gate insulation film includes: forming a polycrystalline silicon layer having a thickness in the range of 10 to 100 nanometers (nm); and, thermally oxidizing the film at temperature in the range of 900 to 1150 degrees for a period of time in the range of 2 to 60 minutes. Alternately, a plasma oxide layer is deposited over a thinner thermally oxidized layer.

公开(公告)号：US06727125B2

公开(公告)日：2004-04-27

申请号：US10124853

申请日：2002-04-17

申请人： Masahiro Adachi ,  Apostolos T. Voutsas

发明人： Masahiro Adachi ,  Apostolos T. Voutsas

IPC分类号： H01L2100

CPC分类号： H01L21/268 ,  B23K26/066 ,  H01L21/324 ,  H01L27/1285 ,  H01L29/6675

摘要： A multi-pattern shadow mask, shadow mask laser annealing system, and a multi-pattern shadow mask method for laser annealing are provided. The method comprises: supplying a silicon substrate; supplying a multi-pattern shadow mask with a plurality of aperture patterns; creating substrate alignment marks; with respect to the alignment marks, laser annealing a substrate region in a plurality of aperture patterns; forming a corresponding plurality of polysilicon regions; and, forming a corresponding plurality of transistor channel regions in the plurality of polysilicon regions. Typically, the shadow mask includes a plurality of sections, with each section having at least one aperture pattern. A shadow mask section can be selected to create a corresponding aperture pattern. If the mask section includes a plurality of aperture patterns, the selection of a section creates all the corresponding aperture patterns in the selected section.

摘要翻译： 提供多模式荫罩，荫罩激光退火系统和用于激光退火的多图案荫罩方法。 该方法包括：提供硅衬底; 提供具有多个孔径图案的多图案荫罩; 产生衬底对准标记; 相对于对准标记，激光退火多个孔径图案中的基板区域; 形成相应的多个多晶硅区域; 以及在所述多个多晶硅区域中形成相应的多个晶体管沟道区。 通常，荫罩包括多个部分，每个部分具有至少一个孔径图案。 可以选择荫罩部分以创建相应的孔径图案。 如果掩模部分包括多个孔径图案，则部分的选择创建所选部分中的所有对应的孔径图案。

公开(公告)号：US06709910B1

公开(公告)日：2004-03-23

申请号：US10273549

申请日：2002-10-18

申请人： Mark A. Crowder ,  Apostolos T. Voutsas ,  Masahiro Adachi

发明人： Mark A. Crowder ,  Apostolos T. Voutsas ,  Masahiro Adachi

IPC分类号： H01L21336

CPC分类号： H01L21/02675 ,  H01L21/2022 ,  H01L21/2026

摘要： A system and method are provided for reducing film surface protrusions in the fabrication of LILAC films. The method comprises: forming an amorphous film with a first thickness; annealing the film using a LILAC process, with beamlets having a width in the range of 3 to 10 microns; in response to annealing, forming protrusions on the film surface; optionally oxidizing the film surface; thinning the film; and, in response to thinning the film, smoothing the film surface. Typically, the film surface is smoothed to a surface flatness of 300 Å, or less. In some aspects of the method, oxidizing the film surface includes oxidizing the film surface to a depth. Then, thinning the film includes thinning the film to a third thickness equal to the first thickness minus the depth.

摘要翻译： 提供了一种用于在LILAC膜的制造中减少膜表面突起的系统和方法。 该方法包括：形成具有第一厚度的非晶膜; 使用LILAC工艺对膜进行退火，其中子束的宽度在3至10微米的范围内; 响应于退火，在膜表面上形成突起; 可选地氧化膜表面; 弄薄膜; 并且，为了使薄膜变薄，平滑膜表面。 通常，膜表面平滑至300或更小的表面平坦度。 在该方法的一些方面，氧化膜表面包括将膜表面氧化至深度。 然后，使薄膜变薄包括将薄膜变薄至等于第一厚度减去深度的第三厚度。