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    Energy savings and global gas emissions monitoring and display
    1.
    发明授权
    Energy savings and global gas emissions monitoring and display 有权
    节能和全球气体排放监测和显示

    公开(公告)号：US09075408B2

    公开(公告)日：2015-07-07

    申请号：US12945869

    申请日：2010-11-14

    Applicant: Youssef A. Loldj ,  Maxime Cayer ,  Jay J. Jung ,  Shaun Crawford ,  Dana Tribula ,  Daniel O. Clark

    Inventor： Youssef A. Loldj ,  Maxime Cayer ,  Jay J. Jung ,  Shaun Crawford ,  Dana Tribula ,  Daniel O. Clark

    IPC: G06F19/00 ,  G05B19/042 ,  G05B19/045

    CPC classification number: G05B19/042 ,  G05B19/045 ,  G05B2219/23316 ,  G05B2219/2612

    Abstract: Methods and apparatus for enhanced control, monitoring and recording of incoming chemical and power use, and emissions of electronic device manufacturing systems are provided. In some embodiments, integrated sub-fab system systems may monitor the energy usage of the sub-fab equipment. The tool can enter many different depths of energy savings modes such as idle (shallow energy savings where production equipment can recover to normal production with no quality or throughput impact in seconds), sleep (deeper energy savings where production equipment can recover in minutes), or hibernate (where production equipment may require hours to recover not to have impact on quality, or throughput) for the system. In some embodiments, the system may monitor and display all gas emissions in a sub-fab as well as the Semi S23 method reporting of CO2 equivalent emission. The system may monitor effluent process gases and energy use from the process tool and sub-fab equipment.

    Abstract translation: 提供了用于增强控制，监控和记录进入的化学和电力使用以及电子设备制造系统的排放的方法和装置。 在一些实施例中，集成子晶圆厂系统系统可以监视子晶圆厂设备的能量使用。 该工具可以进入许多不同深度的节能模式，例如空闲（生产设备可以恢复到正常生产，质量或吞吐量影响在几秒钟内）的轻微节能，睡眠（生产设备可以在几分钟内恢复更深的节能）， 或休眠（生产设备可能需要几个小时才能恢复，不影响质量或吞吐量）。 在一些实施例中，系统可以监测和显示子晶圆中的所有气体排放以及报告二氧化碳当量排放的半S23方法。 该系统可以从过程工具和辅助设备设备监测废气处理气体和能源使用。

    Apparatus for manufacturing a process abatement reactor
    2.
    发明授权
    Apparatus for manufacturing a process abatement reactor 失效
    用于制造工艺消除反应器的装置

    公开(公告)号：US07736600B2

    公开(公告)日：2010-06-15

    申请号：US11555056

    申请日：2006-10-31

    Applicant: Daniel O. Clark ,  Sebastien Raoux ,  Robbert M. Vermeulen ,  Shaun W. Crawford

    Inventor： Daniel O. Clark ,  Sebastien Raoux ,  Robbert M. Vermeulen ,  Shaun W. Crawford

    IPC: B01D50/00

    CPC classification number: B01D53/38 ,  B01D53/68 ,  B01D53/74 ,  B01D53/79 ,  B01D53/8659 ,  B01D53/8662 ,  B01D2251/104 ,  B01D2251/106 ,  B01D2251/2062 ,  B01D2258/0216 ,  C23C16/4412 ,  F23C7/02 ,  F23D2900/00016 ,  F23G7/065 ,  F23M5/00

    Abstract: A thermal reactor for use during the abatement of a semiconductor manufacturing process is provided, including a thermal reaction unit having: an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked porous sections; at least one gas inlet in fluid communication with the central chamber and adapted to introduce gaseous waste stream to the central chamber; a thermal mechanism positioned within the central chamber and adapted to decompose the gaseous waste stream within the central chamber, thereby forming reaction products; and a fluid delivery system adapted to provide a fluid to the central chamber through the interior porous wall at a sufficient force to reduce deposition of reaction products on an inner surface of the interior porous wall of the central chamber; wherein at least one of the porous sections has one or more of: a property that varies within the porous section; and a property that differs from a property of at least one other porous section of the interior porous wall.

    Abstract translation: 提供了一种在减少半导体制造过程中使用的热反应器，包括热反应单元，其具有限定中心室的内部多孔壁，所述内部多孔壁由多个堆叠的多孔部分形成; 至少一个气体入口与中心室流体连通并且适于将气体废物流引入中心室; 位于中心室内的热机构，其适于分解中心室内的气态废物流，从而形成反应产物; 以及流体输送系统，其适于通过内部多孔壁以足够的力向中心室提供流体，以减少反应产物在中心室的内部多孔壁的内表面上的沉积; 其中所述多孔部分中的至少一个具有以下一种或多种：在所述多孔部分内变化的性质; 以及与内部多孔壁的至少另一个多孔部分的性质不同的性质。

    METHODS AND APPARATUS FOR RECOVERING HEAT FROM PROCESSING SYSTEMS
    3.
    发明申请
    METHODS AND APPARATUS FOR RECOVERING HEAT FROM PROCESSING SYSTEMS 审中-公开
    从加工系统回收热量的方法和装置

    公开(公告)号：US20100096110A1

    公开(公告)日：2010-04-22

    申请号：US12579472

    申请日：2009-10-15

    Applicant: Andreas Neuber ,  Daniel O. Clark

    Inventor： Andreas Neuber ,  Daniel O. Clark

    IPC: F28D15/00 ,  F25B30/00

    CPC classification number: H01L21/67017 ,  Y02P70/605

    Abstract: Methods and apparatus for recovering heat from disposed effluents are disclosed herein. In some embodiments, an apparatus may include a first process chamber configured for gaseous or liquid processes; a second process chamber configured for liquid processes; and a heat pump having a compressor and a first heat exchanger, wherein the compressor is configured to use a first effluent exhausted from the first process chamber and wherein the first heat exchanger having first and second sides configured to transfer heat therebetween, wherein the first side is configured to flow a liquid reagent therethrough and into the second process chamber, and wherein the second side is configured to flow the pressurized first effluent from the first process chamber therethrough. In some embodiments, a heater may be disposed between the heat pump and the second process chamber to further heat the liquid reagent prior to entering the second process chamber.

    Abstract translation: 本文公开了从处置的废水中回收热量的方法和装置。 在一些实施例中，装置可以包括被配置用于气态或液体过程的第一处理室; 配置用于液体处理的第二处理室; 以及具有压缩机和第一热交换器的热泵，其中所述压缩机构造成使用从所述第一处理室排出的第一流出物，并且其中所述第一热交换器具有被配置为在其间传热的第一和第二侧，其中所述第一侧 被配置为使液体试剂流过其中并进入第二处理室，并且其中第二侧构造成使来自第一处理室的加压的第一流出物流过其中。 在一些实施例中，加热器可以设置在热泵和第二处理室之间，以在进入第二处理室之前进一步加热液体试剂。

    METHODS AND APPARATUS FOR HEATING REAGENTS AND EFFLUENTS IN ABATEMENT SYSTEMS
    4.
    发明申请
    METHODS AND APPARATUS FOR HEATING REAGENTS AND EFFLUENTS IN ABATEMENT SYSTEMS 审中-公开
    在加热系统中加热试剂和废水的方法和装置

    公开(公告)号：US20090252664A1

    公开(公告)日：2009-10-08

    申请号：US12372729

    申请日：2009-02-17

    Applicant: Robbert M. Vermeulen ,  Daniel O. Clark

    Inventor： Robbert M. Vermeulen ,  Daniel O. Clark

    IPC: B01D53/75 ,  B01J19/00 ,  A62D3/40

    CPC classification number: H01L21/67103

    Abstract: In some aspects, an apparatus for abating effluent from an electronic device manufacturing process tool is provided, including: a reaction chamber adapted to receive an effluent; and a reagent heating apparatus in fluid connection with the reaction chamber; wherein the reagent heating apparatus is adapted to heat a reagent and to introduce the heated reagent into a heated reagent reaction zone of the reaction chamber; and wherein the reaction chamber is further adapted to mix the effluent and the heated reagent in the heated reagent reaction zone. Other apparatus and methods are disclosed.

    Abstract translation: 在一些方面，提供了一种用于减轻来自电子设备制造工艺工具的流出物的设备，包括：适于接收流出物的反应室; 以及与所述反应室流体连接的试剂加热装置; 其中所述试剂加热装置适于加热试剂并将加热的试剂引入反应室的加热试剂反应区; 并且其中所述反应室还适于将所述流出物和所述加热的试剂混合在所述加热的试剂反应区中。 公开了其他装置和方法。

    METHODS AND APPARATUS FOR A COGENERATION ABATEMENT SYSTEM FOR ELECTRONIC DEVICE MANUFACTURING
    5.
    发明申请
    METHODS AND APPARATUS FOR A COGENERATION ABATEMENT SYSTEM FOR ELECTRONIC DEVICE MANUFACTURING 审中-公开
    用于电子设备制造的加密系统的方法和装置

    公开(公告)号：US20080310975A1

    公开(公告)日：2008-12-18

    申请号：US12126925

    申请日：2008-05-25

    Applicant: Phil Chandler ,  Daniel O. Clark ,  Robbert M. Vermeulen ,  James L. Smith

    Inventor： Phil Chandler ,  Daniel O. Clark ,  Robbert M. Vermeulen ,  James L. Smith

    IPC: F04B17/00

    CPC classification number: G05B9/02 ,  Y02P80/15

    Abstract: The present invention provides systems, methods, and apparatus for abating effluent from an electronic device manufacturing system using cogeneration. The invention includes a pump adapted to couple to a processing chamber and adapted to draw effluent from the processing chamber; a reaction chamber coupled to the pump and adapted to receive the effluent from the pump; and a turbine coupled to the reaction chamber and adapted to be driven by combustion gases from the reaction chamber. The turbine is adapted to generate power which is applied to operate the pump. Numerous additional aspects are disclosed.

    Abstract translation: 本发明提供了用于减少来自使用热电联产的电子装置制造系统的流出物的系统，方法和装置。 本发明包括适于联接到处理室并适于从处理室抽出流出物的泵; 反应室，其耦合到所述泵并适于从所述泵接收流出物; 以及联接到反应室并适于由来自反应室的燃烧气体驱动的涡轮机。 涡轮机适于产生用于操作泵的动力。 公开了许多附加方面。

    Method of fabricating chemical-mechanical polishing pad providing polishing uniformity
    6.
    发明授权
    Method of fabricating chemical-mechanical polishing pad providing polishing uniformity 失效
    制造提供抛光均匀性的化学机械抛光垫的方法

    公开(公告)号：US5584146A

    公开(公告)日：1996-12-17

    申请号：US605316

    申请日：1996-02-08

    Applicant: Shamouil Shamouillan ,  Daniel O. Clark

    Inventor： Shamouil Shamouillan ,  Daniel O. Clark

    IPC: B24B37/26 ,  B24D3/00

    CPC classification number: B24B37/26

    Abstract: In accordance with the present invention, a polishing pad useful for polishing a semiconductor-comprising substrate is disclosed. The polishing pad is constructed to include conduits which pass through at least a portion of and preferably through the entire thickness of the polishing pad. The conduits, preferably tubulars, are constructed from a first material which is different from a second material used as a support matrix. The conduits are positioned within the support matrix such that the longitudinal centerline of the conduit forms an angle ranging from about 60.degree. to about 120.degree. with the working surface of the polishing pad. One preferred method of fabrication the polishing pad is pultrusion, where the tubulars are pulled through a resin bath to apply a coating of resin and then through a series of dies in which the resin is cured to provide a support matrix around the tubulars. The composite of tubulars and surrounding matrix, which Would typically be cylindrical in form with the tubulars perpendicular to the end faces of the cylinder, is then sliced into polishing pads of the desired thickness.A second method of forming the polishing pad is by casting or injection molding into a mold which has fibers or hollow fibers in place within the mold at the position in which an opening through the polishing pad matrix is desired. After the matrix has been cast or molded, the fibers are removed to create the openings through the matrix, or the hollow fibers are left in place to provide a conduit lining within the matrix material.

    Abstract translation: 根据本发明，公开了一种用于抛光含半导体衬底的抛光垫。 抛光垫被构造成包括穿过抛光垫的至少一部分并且优选穿过抛光垫的整个厚度的导管。 导管（优选管状）由与用作支撑基体的第二材料不同的第一材料构成。 导管定位在支撑基体内，使得导管的纵向中心线与抛光垫的工作表面形成约60°至约120°的角度。 制造抛光垫的一种优选方法是拉挤成型，其中管状物被拉动通过树脂浴以施加树脂涂层，然后通过一系列模具，其中树脂被固化以在管状物周围提供支撑基体。 然后将通常为垂直于圆柱体的端面的管状的圆柱形的管状和周围基质的复合材料切成希望厚度的抛光垫。 形成抛光垫的第二种方法是通过铸造或注塑成型到具有纤维或中空纤维的模具中，在模具中的位于需要通过抛光垫基质的开口的位置处。 在基体被铸造或模制之后，去除纤维以通过基体形成开口，或者中空纤维留在原位以在基体材料内提供导管衬里。

    Systems and methods for treating flammable effluent gases from manufacturing processes
    7.
    发明授权
    Systems and methods for treating flammable effluent gases from manufacturing processes 有权
    用于处理来自制造过程的易燃废气的系统和方法

    公开(公告)号：US09387428B2

    公开(公告)日：2016-07-12

    申请号：US12365886

    申请日：2009-02-04

    Applicant: Daniel O. Clark ,  Mehran Moalem ,  Robbert M. Vermeulen ,  Phil Chandler

    Inventor： Daniel O. Clark ,  Mehran Moalem ,  Robbert M. Vermeulen ,  Phil Chandler

    IPC: B01D53/00 ,  B01D53/40

    CPC classification number: B01D53/005 ,  B01D53/40 ,  B01D2257/108 ,  B01D2258/0216

    Abstract: A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust conduit which is an operative responsive to the monitoring system, and a source of second gas to be mixed with the effluent gas diverted from the abatement unit when the bypass valve is operating in a bypass mode to provide a mixed gas having a flammability lower than the effluent gas. Methods of the invention as well as numerous other aspects are provided.

    Abstract translation: 提供了一种处理易燃废气的系统。 该系统包括用于将可燃性流出气体运送到减排单元的排气管道，耦合到减排单元以确定减排单元的操作参数的控制系统;联接到排气管道的旁通阀，该旁通阀是响应于 监测系统，以及当旁通阀以旁通模式操作时与从减排单元转移的废气混合的第二气体源，以提供具有低于废气的可燃性的混合气体。 提供了本发明的方法以及许多其它方面。

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