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    Photoresist composition
    7.
    发明授权
    Photoresist composition 有权
    光刻胶组成

    公开(公告)号：US09507259B2

    公开(公告)日：2016-11-29

    申请号：US13482595

    申请日：2012-05-29

    申请人： Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    发明人： Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

    摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

    PHOTORESIST COMPOSITION
    8.
    发明申请
    PHOTORESIST COMPOSITION 有权
    光电组合物

    公开(公告)号：US20130137038A1

    公开(公告)日：2013-05-30

    申请号：US13482595

    申请日：2012-05-29

    申请人： Mingqi Li ,  Amad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    发明人： Mingqi Li ,  Amad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    IPC分类号： G03F7/004

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

    摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

    摘要翻译： 光致抗蚀剂组合物包含酸敏感性聚合物和具有下式的环状锍化合物：（Ra）1-（Ar）-S +（ - CH2-）m·-O3S-（CRb2）n-（L） R a独立地是取代或未取代的C 1-30烷基，C 6-30芳基，C 3-30芳烷基或包含至少一个前述的组合，Ar是单环，多环或稠合多环C 6-30芳基 ，每个R b独立地是H，F，直链或支链C 1-10氟代烷基或含有直链或支链含杂原子的C 1-10氟代烷基，L是任选地包含O，S，N，F 或包含至少一个前述杂原子的组合，X是取代或未取代的C5或更大单环，多环或稠合的多环脂环族基团，任选地包含包含O，S，N，F的杂原子，或包含在 上述中的至少一个，1为0〜4的整数，m为3〜20的整数，n为In 0〜4的整数，p为0〜2的整数。

    PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE
    9.
    发明申请
    PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE 有权
    包含光致发光组合物的光致发光组合物和包含它们的光电组合物，包含光电子的涂层物和制造方法

    公开(公告)号：US20140120471A1

    公开(公告)日：2014-05-01

    申请号：US13661553

    申请日：2012-10-26

    申请人： Emad Aqad ,  Cheng-Bai Xu ,  Cong Liu ,  Mingqi Li ,  Shintaro Yamada

    发明人： Emad Aqad ,  Cheng-Bai Xu ,  Cong Liu ,  Mingqi Li ,  Shintaro Yamada

    IPC分类号： C07C321/10 ,  G03F7/20 ,  G03F7/027

    CPC分类号： C07C381/12 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325

    摘要： A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfonamide, wherein R is H or C1-20 alkyl, and wherein the C1-20 alkylene group is structurally only carbon, or one or more structural carbon atoms in the C1-20 alkylene group is replaced by oxygen, carbonyl, ester, or a combination comprising at least one of the foregoing, Ar is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic cycloalkyl; or a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic aryl group, wherein the cycloalkyl or aryl is a carbocycle or comprises a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, each R1 is independently a substituted C5-40 aryl, substituted C5-40 heteroaryl, C1-40 alkyl, a C3-40 cycloalkyl, wherein when x is 1, the two groups R1 are separate or bonded to each other to form a C4-40 ring structure, and Z− is a carboxylate, sulfate, sulfonate, sulfamate, or the anion of a sulfonimide, wherein when Y is a single bond, Z− is not sulfonate.

    摘要翻译： 具有式（I）的化合物：其中a是1至10的整数，x是1至3的整数，X 1包括氟代醇，氟化酯或氟化酐，Y是单键，C1 -20亚烷基，O，S，NR，酯，碳酸酯，磺酸酯，砜或磺酰胺，其中R是H或C 1-20烷基，其中C 1-20亚烷基在结构上仅为碳，或一个或多个结构 C 1-20亚烷基中的碳原子被氧，羰基，酯或包含至少一个前述的组合代替，Ar是取代或未取代的C5或更大单环，多环或稠合的多环环烷基; 或取代或未取代的C5或更大单环，多环或稠合多环芳基，其中环烷基或芳基是碳环或包含含O，S，N，F的杂原子，或包含至少一个上述 ，每个R 1独立地为取代的C 5-40芳基，取代的C 5-40杂芳基，C 1-40烷基，C 3-40环烷基，其中当x为1时，两个基团R1彼此分离或键合形成C4 -40环结构，Z-是羧酸盐，硫酸盐，磺酸盐，氨基磺酸盐或磺酰亚胺的阴离子，其中当Y是单键时，Z-不是磺酸盐。