公开(公告)号：US09156785B2

公开(公告)日：2015-10-13

申请号：US13296949

申请日：2011-11-15

申请人： Emad Aqad ,  Mingqi Li ,  Cheng-Bai Xu ,  Deyan Wang ,  Cong Liu ,  Joon Seok Oh ,  Shintaro Yamada

发明人： Emad Aqad ,  Mingqi Li ,  Cheng-Bai Xu ,  Deyan Wang ,  Cong Liu ,  Joon Seok Oh ,  Shintaro Yamada

IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C303/32 ,  C07C309/19 ,  C07C309/24 ,  C08F220/22 ,  C08F228/02 ,  C07C309/04 ,  C07C309/08 ,  C07C309/06 ,  C07C309/12 ,  C07C309/20 ,  C07C309/23 ,  C07C381/12 ,  G03F7/38 ,  C07C63/72 ,  C07C309/17 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

CPC分类号： C07C381/12 ,  C07C63/72 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/08 ,  C07C309/12 ,  C07C309/17 ,  C07C309/19 ,  C07C309/20 ,  C07C309/23 ,  C07C309/24 ,  C07C2602/42 ,  C08F220/22 ,  C08F228/02 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38

摘要： This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.

摘要翻译： 本发明涉及包含这些化合物的新的光酸产生剂化合物和光致抗蚀剂组合物。 特别地，本发明涉及包含可碱基裂解基团的光酸产生剂化合物。

公开(公告)号：US09436082B2

公开(公告)日：2016-09-06

申请号：US13341067

申请日：2011-12-30

申请人： Deyan Wang ,  Shintaro Yamada ,  Cong Liu ,  Mingqi Li ,  Joon-Seok Oh ,  Chunyi Wu ,  Doris Kang ,  Cheng-Bai Xu

发明人： Deyan Wang ,  Shintaro Yamada ,  Cong Liu ,  Mingqi Li ,  Joon-Seok Oh ,  Chunyi Wu ,  Doris Kang ,  Cheng-Bai Xu

IPC分类号： G03F7/004 ,  G03F7/30 ,  G03F7/039 ,  G03F7/11

CPC分类号： G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/30

摘要： New photoresist compositions are provided that comprise one or more materials that have base-reactive groups and are particularly useful for dry lithography. Particularly preferred photoresists of the invention can exhibit reduced defects following development of a coating layer of the resist.

摘要翻译： 提供新的光致抗蚀剂组合物，其包含一种或多种具有碱反应性基团并且特别用于干式光刻的材料。 本发明的特别优选的光致抗蚀剂可以在抗蚀剂的涂层开发之后表现出减少的缺陷。

公开(公告)号：US20120171626A1

公开(公告)日：2012-07-05

申请号：US13341067

申请日：2011-12-30

申请人： Deyan WANG ,  Shintaro Yamada ,  Cong Liu ,  Mingqi Li ,  Joon-Seok Oh ,  Chunyi Wu ,  Doris Kang ,  Cheng-Bai Xu

发明人： Deyan WANG ,  Shintaro Yamada ,  Cong Liu ,  Mingqi Li ,  Joon-Seok Oh ,  Chunyi Wu ,  Doris Kang ,  Cheng-Bai Xu

IPC分类号： G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/30

摘要： New photoresist compositions are provided that comprise one or more materials that have base-reactive groups and are particularly useful for dry lithography. Particularly preferred photoresists of the invention can exhibit reduced defects following development of a coating layer of the resist.

摘要翻译： 提供新的光致抗蚀剂组合物，其包含一种或多种具有碱反应性基团并且特别用于干式光刻的材料。 本发明的特别优选的光致抗蚀剂可以在抗蚀剂的涂层开发之后表现出减少的缺陷。

公开(公告)号：US20140120471A1

公开(公告)日：2014-05-01

申请号：US13661553

申请日：2012-10-26

申请人： Emad Aqad ,  Cheng-Bai Xu ,  Cong Liu ,  Mingqi Li ,  Shintaro Yamada

发明人： Emad Aqad ,  Cheng-Bai Xu ,  Cong Liu ,  Mingqi Li ,  Shintaro Yamada

IPC分类号： C07C321/10 ,  G03F7/20 ,  G03F7/027

CPC分类号： C07C381/12 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325

摘要： A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfonamide, wherein R is H or C1-20 alkyl, and wherein the C1-20 alkylene group is structurally only carbon, or one or more structural carbon atoms in the C1-20 alkylene group is replaced by oxygen, carbonyl, ester, or a combination comprising at least one of the foregoing, Ar is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic cycloalkyl; or a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic aryl group, wherein the cycloalkyl or aryl is a carbocycle or comprises a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, each R1 is independently a substituted C5-40 aryl, substituted C5-40 heteroaryl, C1-40 alkyl, a C3-40 cycloalkyl, wherein when x is 1, the two groups R1 are separate or bonded to each other to form a C4-40 ring structure, and Z− is a carboxylate, sulfate, sulfonate, sulfamate, or the anion of a sulfonimide, wherein when Y is a single bond, Z− is not sulfonate.

摘要翻译： 具有式（I）的化合物：其中a是1至10的整数，x是1至3的整数，X 1包括氟代醇，氟化酯或氟化酐，Y是单键，C1 -20亚烷基，O，S，NR，酯，碳酸酯，磺酸酯，砜或磺酰胺，其中R是H或C 1-20烷基，其中C 1-20亚烷基在结构上仅为碳，或一个或多个结构 C 1-20亚烷基中的碳原子被氧，羰基，酯或包含至少一个前述的组合代替，Ar是取代或未取代的C5或更大单环，多环或稠合的多环环烷基; 或取代或未取代的C5或更大单环，多环或稠合多环芳基，其中环烷基或芳基是碳环或包含含O，S，N，F的杂原子，或包含至少一个上述 ，每个R 1独立地为取代的C 5-40芳基，取代的C 5-40杂芳基，C 1-40烷基，C 3-40环烷基，其中当x为1时，两个基团R1彼此分离或键合形成C4 -40环结构，Z-是羧酸盐，硫酸盐，磺酸盐，氨基磺酸盐或磺酰亚胺的阴离子，其中当Y是单键时，Z-不是磺酸盐。

公开(公告)号：US09507259B2

公开(公告)日：2016-11-29

申请号：US13482595

申请日：2012-05-29

申请人： Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

发明人： Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

公开(公告)号：US20130137038A1

公开(公告)日：2013-05-30

申请号：US13482595

申请日：2012-05-29

申请人： Mingqi Li ,  Amad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

发明人： Mingqi Li ,  Amad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

IPC分类号： G03F7/004

CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

摘要翻译： 光致抗蚀剂组合物包含酸敏感性聚合物和具有下式的环状锍化合物：（Ra）1-（Ar）-S +（ - CH2-）m·-O3S-（CRb2）n-（L） R a独立地是取代或未取代的C 1-30烷基，C 6-30芳基，C 3-30芳烷基或包含至少一个前述的组合，Ar是单环，多环或稠合多环C 6-30芳基 ，每个R b独立地是H，F，直链或支链C 1-10氟代烷基或含有直链或支链含杂原子的C 1-10氟代烷基，L是任选地包含O，S，N，F 或包含至少一个前述杂原子的组合，X是取代或未取代的C5或更大单环，多环或稠合的多环脂环族基团，任选地包含包含O，S，N，F的杂原子，或包含在 上述中的至少一个，1为0〜4的整数，m为3〜20的整数，n为In 0〜4的整数，p为0〜2的整数。

公开(公告)号：US07680443B2

公开(公告)日：2010-03-16

申请号：US11673221

申请日：2007-02-09

申请人： Shin Murayama ,  Shuuichi Nakagawa ,  Ryuji Inoue ,  Shintaro Yamada

发明人： Shin Murayama ,  Shuuichi Nakagawa ,  Ryuji Inoue ,  Shintaro Yamada

IPC分类号： G03G15/08

CPC分类号： G03G15/0808

摘要： A developing device is provided with which the increase in torque of a supply roller, unevenness of image density, and wear to the supply roller caused by the formation of an aggregated block of toner in the gap between the supply roller and the opposing side wall of a supply developer holding chamber can be suppressed. This developing device comprises a developing roller for developing an electrostatic latent image supported on a photoconductive member, a supply developer holding chamber for holding toner to be supplied to the developing roller, a supply roller for supplying the toner supported on the peripheral face thereof to the developing roller, a hopper that is disposed above the supply developer holding chamber and used to hold toner for replenishing the supply developer holding chamber, and a communication opening for allowing the hopper to communicate with the supply agent holding chamber, wherein a canopy member is provided directly above the gap to impede the advance of the toner on the supply roller into the gap between the supply roller and the opposing side wall of the supply developer holding chamber.

摘要翻译： 提供了一种显影装置，其中供应辊的扭矩增加，图像密度的不均匀性以及由供应辊和相对的侧壁之间的间隙中形成聚集的调色剂块而导致的供应辊的磨损 可以抑制供应显影剂保持室。 该显影装置包括用于显影负载在感光体上的静电潜像的显影辊，用于保持供给到显影辊的调色剂的供给显影剂保持室，供给辊，用于将支撑在其外周面上的调色剂供给到 显影辊，设置在供应显影剂保持室上方并用于保持用于补充供给显影剂保持室的调色剂的料斗;以及用于允许料斗与供应剂容纳室连通的连通开口，其中设置有顶盖构件 直接在间隙上方阻止供给辊上的调色剂进入供给辊和供给显影剂保持室的相对侧壁之间的间隙。

公开(公告)号：US20080131174A1

公开(公告)日：2008-06-05

申请号：US11947369

申请日：2007-11-29

申请人： Ryuji INOUE ,  Shuuichi Nakagawa ,  Shin Murayama ,  Rumi Konishi ,  Shintaro Yamada ,  Kazushige Oonishi

发明人： Ryuji INOUE ,  Shuuichi Nakagawa ,  Shin Murayama ,  Rumi Konishi ,  Shintaro Yamada ,  Kazushige Oonishi

IPC分类号： G03G15/08

CPC分类号： G03G15/0812

摘要： A developer regulating member capable of stably regulating the thickness of a developer even when used for a long time, while preventing the increase in the production cost, a developing device having the developer regulating member, an image forming apparatus having the developing device, a process cartridge, and a method of producing the developer regulating member. The average crystal particle diameter D [μm] of a plate-like member provided in a layer-thinning blade which functions as the developer regulating member and which abuts against a developing roller functioning as a developer carrier, and the curvature radius R [μm] of a bent portion satisfy the relationship of D≦60.53×R×10−3−12.61.

摘要翻译： 即使长时间使用也能够稳定地调节显影剂的厚度，同时防止制造成本的增加，具有显影剂调节部件的显影装置，具有显影装置的图像形成装置的显影剂调节部件， 墨盒，以及制造显影剂调节件的方法。 设置在用作显影剂调节构件并与用作显影剂载体的显影辊邻接的薄层叶片中的板状构件的平均晶粒直径D [μm]，曲率半径R [mum] 的弯曲部分满足D <= 60.53×R×10 -3 -12.61的关系。

公开(公告)号：US20070189812A1

公开(公告)日：2007-08-16

申请号：US11673221

申请日：2007-02-09

申请人： Shin Murayama ,  Shuuichi Nakagawa ,  Ryuji Inoue ,  Shintaro Yamada

发明人： Shin Murayama ,  Shuuichi Nakagawa ,  Ryuji Inoue ,  Shintaro Yamada

IPC分类号： G03G15/08

CPC分类号： G03G15/0808

摘要： A developing device is provided with which the increase in torque of a supply roller, unevenness of image density, and wear to the supply roller caused by the formation of an aggregated block of toner in the gap between the supply roller and the opposing side wall of a supply developer holding chamber can be suppressed. This developing device comprises a developing roller for developing an electrostatic latent image supported on a photoconductive member, a supply developer holding chamber for holding toner to be supplied to the developing roller, a supply roller for supplying the toner supported on the peripheral face thereof to the developing roller, a hopper that is disposed above the supply developer holding chamber and used to hold toner for replenishing the supply developer holding chamber, and a communication opening for allowing the hopper to communicate with the supply agent holding chamber, wherein a canopy member is provided directly above the gap to impede the advance of the toner on the supply roller into the gap between the supply roller and the opposing side wall of the supply developer holding chamber.

摘要翻译： 提供了一种显影装置，其中供应辊的扭矩增加，图像密度的不均匀性以及由供应辊和相对侧壁之间的间隙中形成聚集的调色剂块而导致的供应辊的磨损 可以抑制供应显影剂保持室。 该显影装置包括用于显影负载在感光体上的静电潜像的显影辊，用于保持供给到显影辊的调色剂的供给显影剂保持室，供给辊，用于将支撑在其外周面上的调色剂供给到 显影辊，设置在供应显影剂保持室上方并用于保持用于补充供给显影剂保持室的调色剂的料斗;以及用于允许料斗与供应剂容纳室连通的连通开口，其中设置有顶盖构件 直接在间隙上方阻止供给辊上的调色剂进入供给辊和供给显影剂保持室的相对侧壁之间的间隙。

公开(公告)号：US07215896B2

公开(公告)日：2007-05-08

申请号：US10901187

申请日：2004-07-29

申请人： Shintaro Yamada ,  Akira Shimada ,  Tatsunari Sato ,  Nobuaki Fukasawa ,  Satoshi Narita

发明人： Shintaro Yamada ,  Akira Shimada ,  Tatsunari Sato ,  Nobuaki Fukasawa ,  Satoshi Narita

IPC分类号： G03G15/00

CPC分类号： G03G15/5058 ,  G03G15/0131 ,  G03G2215/00042 ,  G03G2215/00059 ,  G03G2215/00063 ,  G03G2215/0161

摘要： An image forming apparatus is able to form steady test-pattern toner images for calibration of reflection density detection characteristics with ample toner. The operation consists of forming a test-pattern toner image for calibration of the reflection density detection characteristics, which is formed of a plurality of toner images of different colors aside from a reference test-pattern toner image for controlling image forming conditions, detecting the detection characteristics of a reflection density sensor from the result of detection of the quantity of toner attached to the test-pattern toner image for calibration of the reflection density detection characteristics, and calibrating the output characteristics of the reflection density sensor.

摘要翻译： 图像形成装置能够形成稳定的测试图案调色剂图像，用于通过充足的调色剂校准反射浓度检测特性。 该操作包括形成用于校准反射浓度检测特性的测试图案调色剂图像，该图像由用于控制图像形成条件的基准测试图案调色剂图像之外的多个不同颜色的调色剂图像形成，检测检测 根据检测附着在测试图案调色剂图像上的调色剂量的调色剂的结果，反射浓度传感器的特性，校正反射浓度检测特性，并校准反射浓度传感器的输出特性。