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    PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE
    1.
    发明申请
    PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE 有权
    包含光致发光组合物的光致发光组合物和包含它们的光电组合物，包含光电子的涂层物和制造方法

    公开(公告)号：US20140120471A1

    公开(公告)日：2014-05-01

    申请号：US13661553

    申请日：2012-10-26

    申请人： Emad Aqad ,  Cheng-Bai Xu ,  Cong Liu ,  Mingqi Li ,  Shintaro Yamada

    发明人： Emad Aqad ,  Cheng-Bai Xu ,  Cong Liu ,  Mingqi Li ,  Shintaro Yamada

    IPC分类号： C07C321/10 ,  G03F7/20 ,  G03F7/027

    CPC分类号： C07C381/12 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325

    摘要： A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfonamide, wherein R is H or C1-20 alkyl, and wherein the C1-20 alkylene group is structurally only carbon, or one or more structural carbon atoms in the C1-20 alkylene group is replaced by oxygen, carbonyl, ester, or a combination comprising at least one of the foregoing, Ar is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic cycloalkyl; or a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic aryl group, wherein the cycloalkyl or aryl is a carbocycle or comprises a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, each R1 is independently a substituted C5-40 aryl, substituted C5-40 heteroaryl, C1-40 alkyl, a C3-40 cycloalkyl, wherein when x is 1, the two groups R1 are separate or bonded to each other to form a C4-40 ring structure, and Z− is a carboxylate, sulfate, sulfonate, sulfamate, or the anion of a sulfonimide, wherein when Y is a single bond, Z− is not sulfonate.

    摘要翻译： 具有式（I）的化合物：其中a是1至10的整数，x是1至3的整数，X 1包括氟代醇，氟化酯或氟化酐，Y是单键，C1 -20亚烷基，O，S，NR，酯，碳酸酯，磺酸酯，砜或磺酰胺，其中R是H或C 1-20烷基，其中C 1-20亚烷基在结构上仅为碳，或一个或多个结构 C 1-20亚烷基中的碳原子被氧，羰基，酯或包含至少一个前述的组合代替，Ar是取代或未取代的C5或更大单环，多环或稠合的多环环烷基; 或取代或未取代的C5或更大单环，多环或稠合多环芳基，其中环烷基或芳基是碳环或包含含O，S，N，F的杂原子，或包含至少一个上述 ，每个R 1独立地为取代的C 5-40芳基，取代的C 5-40杂芳基，C 1-40烷基，C 3-40环烷基，其中当x为1时，两个基团R1彼此分离或键合形成C4 -40环结构，Z-是羧酸盐，硫酸盐，磺酸盐，氨基磺酸盐或磺酰亚胺的阴离子，其中当Y是单键时，Z-不是磺酸盐。

    Photoresist composition
    3.
    发明授权
    Photoresist composition 有权
    光刻胶组成

    公开(公告)号：US09507259B2

    公开(公告)日：2016-11-29

    申请号：US13482595

    申请日：2012-05-29

    申请人： Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    发明人： Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

    摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

    NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS
    7.
    发明申请
    NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS 审中-公开
    新型聚合物和光电组合物

    公开(公告)号：US20110269074A1

    公开(公告)日：2011-11-03

    申请号：US13077947

    申请日：2011-03-31

    申请人： Emad Aqad ,  Cong Liu ,  Cheng-Bai Xu ,  Mingqi Li

    发明人： Emad Aqad ,  Cong Liu ,  Cheng-Bai Xu ,  Mingqi Li

    IPC分类号： G03F7/20 ,  C08F12/30

    摘要： New polymers are provided comprising (i) one or more covalently linked photoacid generator moieties and (ii) one or more photoacid-labile groups, wherein the one or more photoacid generator moieties are a component of one or more of the photoacid-labile groups. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-200 nm, particularly 193 nm.

    摘要翻译： 提供新的聚合物，其包含（i）一种或多种共价连接的光酸产生剂部分和（ii）一种或多种光致酸不稳定基团，其中所述一种或多种光酸产生剂部分是一种或多种光酸不稳定基团的组分。 本发明优选的聚合物适用于在短波长例如亚200nm，特别是193nm下成像的光致抗蚀剂。