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108 条记录 (耗时 0.032 秒)

    Room temperature curable resin
    1.
    发明授权
    Room temperature curable resin 失效
    室温固化树脂

    公开(公告)号：US06204343B1

    公开(公告)日：2001-03-20

    申请号：US09319353

    申请日：1999-06-03

    申请人： Dieter Barucha ,  Dean M. Moren ,  Manfred Stepputtis ,  Frank Y. Xu

    发明人： Dieter Barucha ,  Dean M. Moren ,  Manfred Stepputtis ,  Frank Y. Xu

    IPC分类号： C08L6100

    CPC分类号： C08G65/3322 ,  C08F283/00 ,  C08F290/06

    摘要： A curable composition for electrical applications, the curable composition comprising (i) a compound having at least two &agr;,&bgr;-unsaturated groups and an equivalent weight of less than 250 g/mol, (ii) a catalyst capable of initiating a Michael reaction and (iii) a Michael donor having an equivalent weight of less than 250 g/mol, and a package for using this composition in electical splices.

    摘要翻译： 一种用于电气应用的可固化组合物，所述可固化组合物包含（i）具有至少两个α，β-不饱和基团和当量重量小于250g / mol的化合物，（ii）能够引发迈克尔反应的催化剂和 （iii）当量重量小于250g / mol的迈克尔供体，以及一种在电接头中使用该组合物的包装。

    Controlling template surface composition in nano-imprint lithography
    2.
    发明授权
    Controlling template surface composition in nano-imprint lithography 有权
    在纳米压印光刻中控制模板表面组成

    公开(公告)号：US09323143B2

    公开(公告)日：2016-04-26

    申请号：US12364979

    申请日：2009-02-03

    申请人： Frank Y. Xu ,  Weijun Liu

    发明人： Frank Y. Xu ,  Weijun Liu

    IPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/24802

    摘要： A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer.

    摘要翻译： 纳米压印光刻工艺包括在基本无机纳米压印光刻模板的表面上形成多个羟基，加热模板，并使模板表面上预选择的羟基百分数与单体 官能的非氟化合物，以在纳米压印光刻模板的表面上形成单层涂层。 涂布的模板可以与设置在纳米压印光刻基材上的可聚合组合物接触，并且可聚合组合物固化以形成图案化层。 将涂覆的模板与图案化层分离。

    Nanoimprint lithography processes for forming nanoparticles
    5.
    发明授权
    Nanoimprint lithography processes for forming nanoparticles 有权
    用于形成纳米颗粒的纳米压印光刻工艺

    公开(公告)号：US08802747B2

    公开(公告)日：2014-08-12

    申请号：US13017259

    申请日：2011-01-31

    申请人： Frank Y. Xu ,  Sidlgata V. Sreenivasan ,  Shuqiang Yang

    发明人： Frank Y. Xu ,  Sidlgata V. Sreenivasan ,  Shuqiang Yang

    IPC分类号： B29D11/00 ,  C08F20/06 ,  B23P15/00 ,  B29C35/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.

    摘要翻译： 用于形成纳米颗粒的光刻方法包括在多层基板上图案化牺牲材料。 在一些情况下，将图案转移到多层基板的可移除层或其中，并且将功能材料设置在多层基板的可移除层上并固化。 然后去除功能材料的至少一部分以暴露可移除层的突起，并且功能材料的柱从可除去的层释放以产生纳米颗粒。 在其他情况下，多层基板包括功能材料，并且图案被转移到多层基板的可移除层中或其中。 去除牺牲层，并且功能材料的柱从可除去的层中释放出来以产生纳米颗粒。

    Release agent partition control in imprint lithography
    7.
    发明授权
    Release agent partition control in imprint lithography 有权
    印版光刻中的脱模剂分区控制

    公开(公告)号：US08637587B2

    公开(公告)日：2014-01-28

    申请号：US13226635

    申请日：2011-09-07

    申请人： Frank Y. Xu ,  Weijun Liu

    发明人： Frank Y. Xu ,  Weijun Liu

    IPC分类号： C08F2/50

    CPC分类号： C07D237/24 ,  B82Y10/00 ,  B82Y40/00 ,  C07C233/18 ,  G03F7/0002

    摘要： Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.

    摘要翻译： 在纳米压印光刻工艺中将模板与固化的抗蚀剂分离期间，与纳米压印光刻模板表面的亲和性增加的脱模剂与模板相互作用强烈。 表面活性剂和模板表面之间的强相互作用减少了在压印光刻循环中将图案化层与模板分离期间从模板表面上拉出的表面活性剂的量。 在将图案化层与模板分离之后，维持与模板表面相关的更多表面活性剂可以减少液体抗蚀剂中所需的表面活性剂的量，以在压印光刻过程中从模板中实现固化的抗蚀剂的合适释放。 脱模剂与模板表面的强相关有助于在纳米压印光刻中形成超薄的残余层和致密的精细特征。

    Micro-conformal templates for nanoimprint lithography
    8.
    发明授权
    Micro-conformal templates for nanoimprint lithography 有权
    用于纳米压印光刻的微型适形模板

    公开(公告)号：US08616873B2

    公开(公告)日：2013-12-31

    申请号：US13014354

    申请日：2011-01-26

    申请人： Michael N. Miller ,  Frank Y. Xu ,  Nicholas A. Stacey

    发明人： Michael N. Miller ,  Frank Y. Xu ,  Nicholas A. Stacey

    IPC分类号： B28B7/36 ,  B29C59/00 ,  B29C59/16 ,  B29C33/38

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.

    摘要翻译： 微型共形纳米压印光刻模板包括背衬层和粘附到背衬层的纳米图案化层。 背衬层的弹性模量超过纳米图案层的弹性模量。 微型共形纳米压印光刻模板可以用于从基底上的抗蚀刻剂形成图案化层，该衬底具有微米级缺陷，使得从微米级缺陷的外表面到图案化的排除距离 由纳米压印光刻模板形成的层小于缺陷的高度。 纳米压印光刻模板可以用于形成多个压印，而不会降低特征保真度。

    Enhanced densification of silicon oxide layers
    9.
    发明授权
    Enhanced densification of silicon oxide layers 有权
    增强氧化硅层的致密化

    公开(公告)号：US08541053B2

    公开(公告)日：2013-09-24

    申请号：US13178057

    申请日：2011-07-07

    申请人： Marlon Menezes ,  Frank Y. Xu ,  Fen Wan

    发明人： Marlon Menezes ,  Frank Y. Xu ,  Fen Wan

    IPC分类号： B05D3/02 ,  B05D3/04 ,  B32B3/26

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/3105 ,  Y10T428/249953

    摘要： Densifying a multi-layer substrate includes providing a substrate with a first dielectric layer on a surface of the substrate. The first dielectric layer includes a multiplicity of pores. Water is introduced into the pores of the first dielectric layer to form a water-containing dielectric layer. A second dielectric layer is provided on the surface of the water-containing first dielectric layer. The first and second dielectric layers are annealed at temperature of 600° C. or less. In an example, the multi-layer substrate is a nanoimprint lithography template. The second dielectric layer may have a density and therefore an etch rate similar to that of thermal oxide, yet may still be porous enough to allow more rapid diffusion of helium than a thermal oxide layer.

    摘要翻译： 致密化多层基板包括在基板的表面上提供具有第一介电层的基板。 第一介电层包括多个孔。 将水引入第一介电层的孔中以形成含水介电层。 在含水的第一介电层的表面上设置有第二介质层。 第一和第二电介质层在600℃或更低的温度下退火。 在一个实例中，多层衬底是纳米压印光刻模板。 第二电介质层可以具有与热氧化物类似的密度，因此蚀刻速率可能仍然足够多孔以允许氦比热氧化物层更快速地扩散。