公开(公告)号：US4993393A

公开(公告)日：1991-02-19

申请号：US559907

申请日：1990-07-30

申请人： Fumio Hosoda ,  Sachito Fujimoto ,  Hiroshi Ono ,  Katsushi Watanabe

发明人： Fumio Hosoda ,  Sachito Fujimoto ,  Hiroshi Ono ,  Katsushi Watanabe

IPC分类号： F02D41/14

CPC分类号： F02D41/1483 ,  F02D41/1487

摘要： A method of controlling air-fuel ratio of a mixture supplied to an internal combustion engine in a feedback manner responsive to an output signal from an exhaust gas concentration sensor. The air-fuel ratio of the mixture is controlled to a desired value by means of proportional control and integral control. The proportional control is inhibited, when the value of the output signal has changed from a lean side to a rich side with respect to a predetermined reference value while the engine is operating in one of a predetermined high load condition and a predetermined high rotational speed condition.

摘要翻译： 一种响应于来自排气浓度传感器的输出信号以反馈方式控制供给内燃机的混合物的空燃比的方法。 通过比例控制和积分控制将混合物的空燃比控制到所需的值。 当发动机在预定的高负载状态和预定的高转速条件之一下操作时，当输出信号的值相对于预定的参考值从稀薄侧变为富侧时，比例控制被禁止 。

公开(公告)号：US09817345B2

公开(公告)日：2017-11-14

申请号：US15352782

申请日：2016-11-16

申请人： Motoyoshi Yamano ,  Tetsuo Tokuda ,  Yoshikuni Sasaki ,  Hiroshi Ono ,  Hironori Yamaoka ,  Ryohhei Sugiyama ,  Kohichi Utsunomiya ,  Arinobu Yoshiura ,  Hideo Nagafuji

发明人： Motoyoshi Yamano ,  Tetsuo Tokuda ,  Yoshikuni Sasaki ,  Hiroshi Ono ,  Hironori Yamaoka ,  Ryohhei Sugiyama ,  Kohichi Utsunomiya ,  Arinobu Yoshiura ,  Hideo Nagafuji

IPC分类号： G03G15/20

CPC分类号： G03G15/2039 ,  G03G15/2032 ,  G03G15/2064

摘要： A fixing device includes a heater, a fixing rotator, a pressure rotator to press against the fixing rotator to form a fixing nip between the fixing rotator and the pressure rotator, through which a recording medium is conveyed, a moving device to move the pressure rotator in directions in which the pressure rotator comes into contact with and separates from the fixing rotator, a thermal expansion amount predictor to predict an amount of thermal expansion of the fixing rotator while the recording medium is conveyed, and a nip width adjuster to control a moving distance of the pressure rotator moved by the moving device toward the fixing rotator, depending on the amount of thermal expansion of the fixing rotator predicted by the thermal expansion amount predictor, so as to adjust a width of the fixing nip to maintain a substantially constant width of the fixing nip.

公开(公告)号：US09557693B2

公开(公告)日：2017-01-31

申请号：US14626168

申请日：2015-02-19

申请人： Hiroshi Ono

发明人： Hiroshi Ono

IPC分类号： G03G15/20

CPC分类号： G03G15/206 ,  G03G15/2028 ,  G03G15/2057 ,  G03G2215/2048

摘要： A fixing device includes a heating rotator and a pressure rotator pressed against the heating rotator to form a fixing nip therebetween, through which a recording medium bearing a toner image is conveyed. A plurality of first recesses is scattered on a circumferential face of the heating rotator. A plurality of second recesses is scattered on a circumferential face of the pressure rotator. Each of the second recesses is greater than each of the first recesses.

摘要翻译： 定影装置包括加热旋转器和压在加热旋转器上的压力旋转器，以在其间形成定影辊隙，通过该定影夹持器传送带有调色剂图像的记录介质。 多个第一凹部散布在加热旋转体的周面上。 多个第二凹部散布在压力旋转体的圆周面上。 每个第二凹部大于每个第一凹部。

公开(公告)号：US09543184B2

公开(公告)日：2017-01-10

申请号：US14373976

申请日：2012-06-27

申请人： Hiroshi Ono

发明人： Hiroshi Ono

IPC分类号： H01L21/683 ,  H02N13/00

CPC分类号： H01L21/6833 ,  H02N13/00

摘要： The present invention is an electrostatic chuck including a ceramic base body and an adsorption electrode provided inside of or on the lower surface of the ceramic base body and having a portion where a Mn content is 1×10−4% by mass or less in a region from the upper surface of the ceramic base body to the adsorption electrode.

摘要翻译： 本发明是一种静电吸盘，其包括陶瓷基体和设置在陶瓷基体的下表面的内侧或下表面的吸附电极，其具有Mn含量为1×10 -4质量％以下的部分 区域从陶瓷基体的上表面到吸附电极。

公开(公告)号：US09006013B2

公开(公告)日：2015-04-14

申请号：US13405634

申请日：2012-02-27

申请人： Toru Gotoda ,  Toshiyuki Oka ,  Shinya Nunoue ,  Kotaro Zaima ,  Hiroshi Ono ,  Hajime Nago

发明人： Toru Gotoda ,  Toshiyuki Oka ,  Shinya Nunoue ,  Kotaro Zaima ,  Hiroshi Ono ,  Hajime Nago

IPC分类号： H01L21/00 ,  H01L21/30 ,  H01L21/46 ,  H01L33/00 ,  H01L21/20 ,  H01L33/20 ,  H01S5/02 ,  H01S5/323

CPC分类号： H01L33/007 ,  H01L21/2011 ,  H01L33/0079 ,  H01L33/20 ,  H01S5/0213 ,  H01S5/0217 ,  H01S5/32341

摘要： According to one embodiment, a method is disclosed for manufacturing a semiconductor light emitting device. The method can include forming a nitride semiconductor layer including a light emitting layer on a first substrate having an unevenness, bonding the nitride layer to a second substrate, and separating the first substrate from the nitride layer by irradiating the nitride layer with light. The forming the nitride layer includes leaving a cavity in a space inside a depression of the unevenness while forming a thin film on the depression. The film includes a same material as part of the nitride layer. The separating includes causing the film to absorb part of the light so that intensity of the light applied to a portion of the nitride layer facing the depression is made lower than intensity of the light applied to a portion facing a protrusion of the unevenness.

摘要翻译： 根据一个实施例，公开了一种用于制造半导体发光器件的方法。 该方法可以包括在具有不平坦度的第一衬底上形成包括发光层的氮化物半导体层，将氮化物层接合到第二衬底，并且通过用光照射氮化物层将第一衬底与氮化物层分离。 形成氮化物层包括在凹凸的凹陷内的空间中留下空腔，同时在凹陷上形成薄膜。 该膜包括与氮化物层的一部分相同的材料。 分离包括使膜吸收部分光，使得施加到面向凹陷的氮化物层的一部分的光的强度低于施加到面对凹凸的突出部的部分的光的强度。

公开(公告)号：US08845915B2

公开(公告)日：2014-09-30

申请号：US13201518

申请日：2010-01-22

申请人： Hiroshi Ono ,  Takashi Shinoda ,  Yuuhei Okada

发明人： Hiroshi Ono ,  Takashi Shinoda ,  Yuuhei Okada

IPC分类号： C03C15/00 ,  H01L21/321 ,  C09G1/02 ,  H01L21/768 ,  C09K3/14

CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/7684 ,  H01L21/76898

摘要： A polishing agent which comprises a composition containing an inorganic acid, an amino acid, a protective film-forming agent, an abrasive, an oxidizing agent, an organic acid and water, adjusted to a pH of 1.5-4, wherein the amount of potassium hydroxide required to raise the pH of the composition without the organic acid to 4 is at least 0.10 mol with respect to 1 kg of the composition without the organic acid, and the organic acid contains at least two carboxyl groups, wherein the logarithm of the inverse of the first acid dissociation constant (pKa1) is no greater than 3.

摘要翻译： 一种抛光剂，其包含调节至pH为1.5-4的无机酸，氨基酸，保护膜形成剂，研磨剂，氧化剂，有机酸和水的组合物，其中钾的量 相对于1kg不含有机酸的组合物，无机有机物将组合物的pH升高至4所需的氢氧化物为至少0.10mol，有机酸含有至少两个羧基，其中反相的对数 的第一个酸解离常数（pKa1）不大于3。

公开(公告)号：US20140219696A1

公开(公告)日：2014-08-07

申请号：US14161078

申请日：2014-01-22

申请人： Ippei Fujimoto ,  Kazuhito Kishi ,  Masahiro Samei ,  Hiroshi Ono ,  Hiroshi Seo ,  Yasunori Ishigaya ,  Ryota Yamashina ,  Takumi Waida ,  Takeshi Yamamoto

发明人： Ippei Fujimoto ,  Kazuhito Kishi ,  Masahiro Samei ,  Hiroshi Ono ,  Hiroshi Seo ,  Yasunori Ishigaya ,  Ryota Yamashina ,  Takumi Waida ,  Takeshi Yamamoto

IPC分类号： G03G15/20

CPC分类号： G03G15/2042 ,  G03G2215/2035

摘要： A fixing device includes a fixing rotary body, an opposed member opposing the fixing rotary body to form a nipping portion, and a heater to heat the fixing rotary body. The heater includes heat generators arranged in a width direction of a recording medium and separately supplied with power. When an unfixed image on the medium has an image area and a non-image area, power supplied to each of the heat generators is controlled so that, of the heat generators, a first heat generator corresponding to the image area becomes a higher temperature and second heat generators corresponding to the non-image area becomes a lower temperature. When the second heat generators are adjacent to each other, power supplied to one of the second heat generators closer to the image area is set to be greater than power supplied to another of the second heat generators farther from the image area.

摘要翻译： 定影装置包括固定旋转体，与定影旋转体相对的相对构件以形成夹持部分，以及加热器来加热定影旋转体。 加热器包括沿记录介质的宽度方向布置并分开供电的发热体。 当介质上的未定影图像具有图像区域和非图像区域时，控制供应给每个发热体的功率，使得在发热体中，对应于图像区域的第一热发生器变得更高温度， 对应于非图像区域的第二热发生器变为较低温度。 当第二发热体彼此相邻时，供给到靠近图像区域的第二热发生器中的一个的功率被设定为大于向图像区域更远的另一个第二发热体提供的功率。

公开(公告)号：US08555858B2

公开(公告)日：2013-10-15

申请号：US13237132

申请日：2011-09-20

申请人： Harsha Badarinarayan ,  Akira Inoue ,  Takashi Yoshizawa ,  Atsushi Hohkita ,  Hiroaki Saeki ,  Hiroshi Ono ,  Masahiro Soma ,  William T. Harvey ,  Steven J. Miller ,  Su-Wei Sung

发明人： Harsha Badarinarayan ,  Akira Inoue ,  Takashi Yoshizawa ,  Atsushi Hohkita ,  Hiroaki Saeki ,  Hiroshi Ono ,  Masahiro Soma ,  William T. Harvey ,  Steven J. Miller ,  Su-Wei Sung

IPC分类号： F02M55/02 ,  F16L27/04

CPC分类号： F16L27/047 ,  F02M37/0017 ,  F02M55/005 ,  F02M55/02 ,  F02M55/04 ,  F02M2200/306 ,  F02M2200/8084 ,  F02M2200/9015

摘要： A high pressure fuel pipe construction for an internal combustion engine, such as a direct injection engine. A conduit for the fuel is open at each end and a ball having a throughbore is slidably positioned over one end of the conduit. A reinforcing sleeve is positioned inside the end of the conduit so that the sleeve extends entirely through the ball. The sleeve, ball and the end of the conduit are then brazed together to attach the ball and conduit together. A double chamfer is provided at one end of the ball throughbore to facilitate inspection of the brazing quality. Additionally, a loop is formed in the conduit and a dampener is attached to the loop.

摘要翻译： 用于内燃机的高压燃料管构造，例如直喷式发动机。 用于燃料的导管在每个端部是开放的，并且具有通孔的球可滑动地定位在导管的一端上。 加强套管定位在导管的端部内部，使得套筒完全延伸穿过球。 然后将套筒，球和导管的端部钎焊在一起，将球和导管连接在一起。 在球透孔的一端设有双倒角，以便检查钎焊质量。 另外，在导管中形成环，并且阻尼器附接到环路。

公开(公告)号：US08497672B2

公开(公告)日：2013-07-30

申请号：US12881765

申请日：2010-09-14

申请人： Takashi Kawakubo ,  Toshihiko Nagano ,  Michihiko Nishigaki ,  Hiroshi Ono

发明人： Takashi Kawakubo ,  Toshihiko Nagano ,  Michihiko Nishigaki ,  Hiroshi Ono

IPC分类号： G01P15/00

CPC分类号： G01P15/097 ,  G01P15/0888 ,  G01P15/18 ,  G01P2015/0817 ,  G01P2015/0845

摘要： The present embodiments provide an acceleration sensor, which enables highly accurate detection and has an extremely compact size. The acceleration sensor of the present embodiments is provided with a substrate, a anchor portion formed on the substrate, a support beam, which has one end connected to the anchor portion and extends across a space from the substrate, and a proof mass which is connected to the other end of the support beam and held across a space from the substrate. The acceleration sensor is further provided with first and second piezoelectric bending resonators, a comparison unit, and a calculation unit. The first and second piezoelectric bending resonators have one end connected to the anchor portion and the other end connected to the proof mass or the support beam and have a stack of a first electrode, a first piezoelectric film, and a second electrode. The first and second piezoelectric bending resonators extend on the both sides of the support beam and perform bending resonance motion in a direction perpendicular to the piezoelectric film. The comparison unit measures a difference of a resonance frequency between the first and second piezoelectric bending resonators. The calculation unit calculates an acceleration in a direction perpendicular to the extending direction of the support beam in the substrate surface from the difference of the resonance frequency.

摘要翻译： 本实施例提供加速度传感器，其能够进行高精度的检测并具有非常紧凑的尺寸。 本实施例的加速度传感器设置有基板，形成在基板上的锚固部分，支撑梁，其一端连接到锚定部分并且延伸穿过基板的空间，以及连接的检测质量块 到支撑梁的另一端并且保持在与基板的空间上。 加速度传感器还设置有第一和第二压电弯曲谐振器，比较单元和计算单元。 第一和第二压电弯曲谐振器的一端连接到锚定部分，另一端连接到检测质量块或支撑梁，并且具有第一电极，第一压电膜和第二电极的堆叠。 第一和第二压电弯曲谐振器在支撑梁的两侧延伸，并在垂直于压电薄膜的方向上进行弯曲共振运动。 比较单元测量第一和第二压电弯曲谐振器之间的谐振频率的差。 计算单元从谐振频率的差计算与基板表面中的支撑梁的延伸方向垂直的方向的加速度。

公开(公告)号：US08486837B2

公开(公告)日：2013-07-16

申请号：US12318376

申请日：2008-12-29

申请人： Hiroshi Ono ,  Katsuyuki Masuda ,  Masanobu Habiro

发明人： Hiroshi Ono ,  Katsuyuki Masuda ,  Masanobu Habiro

IPC分类号： H01L21/00 ,  H01L21/02019 ,  H01L21/02247 ,  H01L21/30 ,  C11D11/0047 ,  C11D3/3945

CPC分类号： B24B37/00 ,  B24B37/04 ,  B24B37/044 ,  C09G1/02 ,  C23F1/42 ,  C23F3/00 ,  C23F3/06 ,  H01L21/3212

摘要： A polishing slurry for metal comprises an oxidizer, a metal oxide dissolving agent, a metal inhibitor, and water, wherein the metal inhibitor is at least one of a compound having an amino-triazole skeleton and a compound having an imidazole skeleton. The use of the polishing slurry for metal makes it possible to raise the polishing speed sufficiently while keeping the etching speed low, restrain the generation of corrosion of the surface of a metal and dishing, and form a metal-film-buried pattern having a high reliability in the process of formation of wiring of semiconductor devices.