MANUFACTURING METHOD FOR SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE

    公开(公告)号:US20180286752A1

    公开(公告)日:2018-10-04

    申请号:US16000603

    申请日:2018-06-05

    摘要: A method for manufacturing a solid-state imaging device comprises a first step of preparing an imaging element having a second principal surface having an electrode arranged thereon, and a photoelectric converter part configured to photoelectrically convert the incident energy line so as to generate a signal charge; a second step of preparing a support substrate, provided with a through hole extending in a thickness direction thereof, having a third principal surface; a third step of aligning the imaging element and the support substrate with each other so that the electrode is exposed out of the through hole while the second and third principal surfaces oppose each other and joining the imaging element and the support substrate to each other; and a fourth step of arranging a conductive ball-shaped member in the through hole and electrically connecting the ball-shaped member to the electrode after the third step.

    BACKSIDE INCIDENCE TYPE SOLID-STATE IMAGE PICKUP DEVICE

    公开(公告)号:US20170301722A1

    公开(公告)日:2017-10-19

    申请号:US15505993

    申请日:2015-08-04

    IPC分类号: H01L27/148 H01L27/146

    摘要: A back-illuminated solid-state imaging device includes a semiconductor substrate, a shift register, and a light-shielding film. The semiconductor substrate includes a light incident surface on the back side and a light receiving portion generating a charge in accordance with light incidence. The shift register is disposed on the side of a light-detective surface opposite to the light incident surface of the semiconductor substrate. The light-shielding film is disposed on the side of the light-detective surface of the semiconductor substrate. The light-shielding film includes an uneven surface opposing the light-detective surface.

    SOLID-STATE IMAGE PICKUP DEVICE AND METHOD FOR MANUFACTURING SOLID-STATE IMAGE PICKUP DEVICE
    5.
    发明申请
    SOLID-STATE IMAGE PICKUP DEVICE AND METHOD FOR MANUFACTURING SOLID-STATE IMAGE PICKUP DEVICE 有权
    固态图像拾取装置和制造固态图像拾取装置的方法

    公开(公告)号:US20150365613A1

    公开(公告)日:2015-12-17

    申请号:US14766788

    申请日:2014-02-12

    IPC分类号: H04N5/369 H04N5/353

    摘要: A solid-state imaging device includes a light receiving section formed by such exposure as to stitch a plurality of patterns in a first direction on a semiconductor substrate. The light receiving section includes a plurality of pixels disposed in a two-dimensional array in the first direction and a second direction perpendicular to the first direction. Electric charges are transferred in the second direction in each of pixel columns consisting of a plurality of pixels disposed in the second direction, among the plurality of pixels.

    摘要翻译: 固态成像装置包括通过这种曝光形成的光接收部分,以在半导体衬底上沿着第一方向缝合多个图案。 光接收部分包括在第一方向上以二维阵列设置的多个像素和垂直于第一方向的第二方向。 在多个像素之中,在由设置在第二方向上的多个像素组成的每个像素列中,在第二方向上传送电荷。

    METHOD OF MANUFACTURING OPTICAL SEMICONDUCTOR DEVICE

    公开(公告)号:US20180286899A1

    公开(公告)日:2018-10-04

    申请号:US15942759

    申请日:2018-04-02

    IPC分类号: H01L27/146

    摘要: A method of manufacturing an optical semiconductor device includes preparing a semiconductor substrate having a plurality of photoelectric conversion parts, forming a trench in the semiconductor substrate to separate the plurality of photoelectric conversion parts from each other, forming a boron layer on an inner surface of the trench by a vapor phase growth method, and forming an accumulation layer in the semiconductor substrate along the inner surface of the trench by performing a thermal diffusion treatment on the boron layer.

    BACKSIDE-ILLUMINATED ENERGY RAY DETECTION ELEMENT
    8.
    发明申请
    BACKSIDE-ILLUMINATED ENERGY RAY DETECTION ELEMENT 审中-公开
    背光照明能源检测元件

    公开(公告)号:US20150380580A1

    公开(公告)日:2015-12-31

    申请号:US14766778

    申请日:2014-01-24

    IPC分类号: H01L31/0352 H01L31/10

    摘要: A back-illuminated energy ray detecting element 1 includes a semiconductor substrate and a protective film. The semiconductor substrate has a first principal surface as an energy ray incident surface and a second principal surface opposite to the first principal surface, and a charge generating region configured to generate an electric charge according to incidence of an energy ray is disposed on the second principal surface side. The protective film is disposed on the second principal surface side of the semiconductor substrate to cover at least the charge generating region, and includes silicon nitride or silicon nitride oxide. The protective film has a stress alleviating section configured to alleviate stress generated in the protective film.

    摘要翻译: 背照式能量射线检测元件1包括半导体衬底和保护膜。 半导体衬底具有作为能量射线入射表面的第一主表面和与第一主表面相对的第二主表面,并且被配置为根据能量射线的入射产生电荷的电荷产生区域被布置在第二校准体上 表面 保护膜设置在半导体基板的第二主面侧,至少覆盖电荷产生区域,并且包括氮化硅或氮氧化硅。 保护膜具有减轻由保护膜产生的应力的应力消除部。

    PHOTODETECTOR
    10.
    发明申请

    公开(公告)号:US20220344520A1

    公开(公告)日:2022-10-27

    申请号:US17762847

    申请日:2020-08-28

    摘要: The photodetector includes a light receiving element and a package. The package has an accommodation member formed of a ceramic, a wiring including a pad connected to a terminal of the light receiving element by a wire, and a light transmitting member. A bottom wall of the accommodation member has a placement surface to which the light receiving element is attached by an adhesive member. The bottom wall or a side wall of the accommodation member has a pad surface on which the pad is disposed, the pad surface positioned on an opening side of the accommodation member with respect to the placement surface. The side wall has a through hole. At least a portion of an inner end portion of the through hole is positioned on the opening side with respect to a surface of the light receiving element on the opening side.