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    Reduction of orientation dependent oxidation for vertical sidewalls of semiconductor substrates
    1.
    发明授权
    Reduction of orientation dependent oxidation for vertical sidewalls of semiconductor substrates 失效
    减少半导体衬底的垂直侧壁的取向依赖氧化

    公开(公告)号：US06362040B1

    公开(公告)日：2002-03-26

    申请号：US09501502

    申请日：2000-02-09

    申请人： Helmut Horst Tews ,  Brian S. Lee ,  Ulrike Gruening ,  Raj Jammy ,  John Faltermeier

    发明人： Helmut Horst Tews ,  Brian S. Lee ,  Ulrike Gruening ,  Raj Jammy ,  John Faltermeier

    IPC分类号： H01L218242

    CPC分类号： H01L27/10864 ,  H01L21/02238 ,  H01L21/02255 ,  H01L21/02299 ,  H01L21/31662 ,  H01L27/10876

    摘要： A method for growing a dielectric layer on a substrate, in accordance with the present invention, includes the steps of providing a substrate having at least two crystallographic planes which experience different dielectric layer growth rates due to the at least two crystallographic planes. A first dielectric layer is grown on the at least two crystallographic planes such that the first dielectric layer has a first thickness on a first crystallographic plane and a second thickness on a second crystallographic plane. The first thickness is thicker than the second thickness for the first dielectric layer. Dopants are implanted through the first dielectric layer. A greater number of dopants are implanted in the substrate through the second thickness than through the first thickness of the first dielectric layer. The first dielectric layer is then removed. A second dielectric layer is grown at a same location as the removed first dielectric layer. The second dielectric layer has a first thickness on a first crystallographic plane and a second thickness on a second crystallographic plane. The first thickness and the second thickness of the second dielectric layer are closer in thickness than the first thickness and the second thickness of the first dielectric layer due to the implantation of the dopants.

    摘要翻译： 根据本发明的用于在衬底上生长电介质层的方法包括以下步骤：提供具有至少两个结晶面的衬底，所述晶体面由于至少两个晶面而具有不同的介电层生长速率。 在至少两个晶面上生长第一介电层，使得第一介电层在第一结晶平面上具有第一厚度，在第二结晶平面上具有第二厚度。 第一厚度比第一电介质层的第二厚度厚。 通过第一介电层注入掺杂剂。 通过第二厚度将更多数量的掺杂剂注入到衬底中，而不是通过第一介电层的第一厚度。 然后去除第一介电层。 在与去除的第一介电层相同的位置处生长第二介电层。 第二电介质层在第一结晶平面上具有第一厚度，在第二结晶平面上具有第二厚度。 由于掺杂剂的注入，第二介电层的第一厚度和第二厚度比第一厚度和第一介电层的第二厚度更厚。

    Control of oxide thickness in vertical transistor structures
    2.
    发明授权
    Control of oxide thickness in vertical transistor structures 有权
    垂直晶体管结构中氧化物厚度的控制

    公开(公告)号：US06372567B1

    公开(公告)日：2002-04-16

    申请号：US09553708

    申请日：2000-04-20

    申请人： Helmut Horst Tews ,  Brian S. Lee ,  Ulrike Gruening

    发明人： Helmut Horst Tews ,  Brian S. Lee ,  Ulrike Gruening

    IPC分类号： H01L218238

    CPC分类号： H01L21/28211 ,  H01L21/2236 ,  H01L21/26506 ,  H01L21/26586 ,  H01L21/2822 ,  H01L21/28238 ,  H01L27/10864 ,  H01L27/10873 ,  H01L29/045

    摘要： Improved process for preparing vertical transistor structures in DRAMs, in which the trench top oxide separates the bottom storage capacitor from the switching transistor, and in which the upper part of the trench contains the vertical transistor at its side wall, to obtain homogeneous gate oxidation at all different crystal planes inside the trench so that homogeneous thickness is independent of crystal orientation comprising: a) subjecting a wafer trench side wall to ion bombardment for a period sufficient to generate an amorphous layer of oxide side wall; and b) heating the wafer resulting from step (a) in an oxidizing atmosphere to cause oxidation and recrystallization of the amorphous layer.

    摘要翻译： 在DRAM中制备垂直晶体管结构的改进方法，其中沟槽顶部氧化物将底部存储电容器与开关晶体管分离，并且其中沟槽的上部在其侧壁处包含垂直晶体管，以获得均匀的栅极氧化 沟槽内的所有不同的晶面，使得均匀的厚度与晶体取向无关，包括：a）使晶片沟槽侧壁进行离子轰击足以产生氧化物侧壁的非晶层的时间; 和b）在氧化气氛中加热由步骤（a）得到的晶片，以引起非晶层的氧化和重结晶。

    Method of forming a vertically oriented device in an integrated circuit
    3.
    发明授权
    Method of forming a vertically oriented device in an integrated circuit 有权
    在集成电路中形成垂直取向器件的方法

    公开(公告)号：US06426253B1

    公开(公告)日：2002-07-30

    申请号：US09576465

    申请日：2000-05-23

    申请人： Helmut Horst Tews ,  Alexander Michaelis ,  Brian S. Lee ,  Uwe Schroeder ,  Stephan Kudelka

    发明人： Helmut Horst Tews ,  Alexander Michaelis ,  Brian S. Lee ,  Uwe Schroeder ,  Stephan Kudelka

    IPC分类号： H01L218242

    CPC分类号： H01L27/10864 ,  H01L21/76237 ,  H01L21/823487 ,  H01L27/10841 ,  H01L27/10867

    摘要： A system and method of forming an electrical connection (142) to the interior of a deep trench (104) in an integrated circuit utilizing a low-angle dopant implantation (114) to create a self-aligned mask over the trench. The electrical connection preferably connects the interior plate (110) of a trench capacitor to a terminal of a vertical trench transistor. The low-angle implantation process, in combination with a low-aspect ratio mask structure, generally enables the doping of only a portion of a material overlying or in the trench. The material may then be subjected to a process step, such as oxidation, with selectivity between the doped and undoped regions. Another process step, such as an etch process, may then be used to remove a portion of the material (120) overlying or in the trench, leaving a self-aligned mask (122) covering a portion of the trench, and the remainder of the trench exposed for further processing. Alternatively, an etch process alone, with selectivity between the doped and undoped regions, may be used to create the mask. The self-aligned mask then allows for the removal of selective portions of the materials in the trench so that a vertical trench transistor and a buried strap may be formed on only one side of the trench.

    摘要翻译： 使用低角度掺杂剂注入（114）在集成电路中形成到深沟槽（104）的内部的电连接（142）的系统和方法，以在沟槽上产生自对准掩模。 电连接优选地将沟槽电容器的内板（110）连接到垂直沟槽晶体管的端子。 低角度注入工艺与低纵横比掩模结构相结合，通常能够仅掺杂覆盖或在沟槽中的材料的一部分。 然后可以在掺杂区域和未掺杂区域之间选择性地对材料进行处理步骤，例如氧化。 然后可以使用诸如蚀刻工艺的另一工艺步骤来去除覆盖在沟槽中或在沟槽中的部分材料（120），留下覆盖沟槽的一部分的自对准掩模（122），并且其余部分 沟槽暴露进一步加工。 或者，可以使用仅在掺杂区域和未掺杂区域之间具有选择性的蚀刻工艺来产生掩模。 自对准掩模然后允许去除沟槽中的材料的选择性部分，使得可以仅在沟槽的一侧上形成垂直沟槽晶体管和掩埋带。

    Integrated circuit vertical trench device and method of forming thereof
    4.
    发明授权
    Integrated circuit vertical trench device and method of forming thereof 有权
    集成电路垂直沟槽器件及其形成方法

    公开(公告)号：US06335247B1

    公开(公告)日：2002-01-01

    申请号：US09597389

    申请日：2000-06-19

    申请人： Helmut Horst Tews ,  Alexander Michaelis ,  Stephan Kudelka ,  Uwe Schroeder ,  Brian S. Lee

    发明人： Helmut Horst Tews ,  Alexander Michaelis ,  Stephan Kudelka ,  Uwe Schroeder ,  Brian S. Lee

    IPC分类号： H01L21336

    CPC分类号： H01L27/10864 ,  H01L27/10876

    摘要： A method of forming a vertically-oriented device in an integrated circuit using a selective wet etch to remove only a part of the sidewalls in a deep trench, and the device formed therefrom. While a portion of the trench perimeter (e.g., isolation collar 304) is protected by a mask (e.g., polysilicon 318), the exposed portion is selectively wet etched to remove selected crystal planes from the exposed portion of the trench, leaving a flat substrate sidewall (324) with a single crystal plane. A single side vertical trench transistor may be formed on the flat sidewall. A vertical gate oxide (e.g. silicon dioxide 330) of the transistor formed on the single crystal plane is substantially uniform across the transistor channel, providing reduced chance of leakage and consistent threshold voltages from device to device. In addition, trench widening is substantially reduced, increasing the device to device isolation distance in a single sided buried strap junction device layout.

    摘要翻译： 一种使用选择性湿蚀刻在集成电路中形成垂直取向器件的方法，以仅去除深沟槽中的一部分侧壁，以及由此形成的器件。 虽然沟槽周边的一部分（例如，隔离环304）被掩模（例如，多晶硅318）保护，但是暴露部分被选择性地湿蚀刻以从沟槽的暴露部分移除所选择的晶面，留下平坦的衬底 侧壁（324）与单晶面。 单侧垂直沟槽晶体管可以形成在平坦侧壁上。 形成在单晶平面上的晶体管的垂直栅极氧化物（例如二氧化硅330）在晶体管沟道上基本上是均匀的，从而降低了泄漏的机会和从器件到器件的一致的阈值电压。 此外，沟槽加宽大大降低，从而在单面掩埋带接合器件布局中将器件增加到器件隔离距离。

    Plasma doping for DRAM with deep trenches and hemispherical grains
    5.
    发明授权
    Plasma doping for DRAM with deep trenches and hemispherical grains 失效
    具有深沟槽和半球形晶粒的DRAM的等离子体掺杂

    公开(公告)号：US06475859B1

    公开(公告)日：2002-11-05

    申请号：US09593287

    申请日：2000-06-13

    申请人： Helmut Horst Tews ,  Brian S. Lee ,  Joachim Hoepfner

    发明人： Helmut Horst Tews ,  Brian S. Lee ,  Joachim Hoepfner

    IPC分类号： H01L218242

    CPC分类号： H01L27/1087 ,  H01L21/2236 ,  H01L28/84

    摘要： A method of doping trench sidewall and hemispherical-grained silicon in deep trench cells to increase surface area and storage capacitance while avoiding deformation of trenches and hemispherical-grained silicon, comprising: a) Etching a deep trench structure by reactive ion etching; b) Forming a LOCOS collar in an upper portion of the trench over a conformal layer of a silicon containing material, the collar leaving a lower portion of the trench exposed; c) Depositing a film of hemispherical-grained silicon (HSG-Si) at sidewalls of the deep trench; d) Plasma doping the hemispherical-grained silicon; and e) Depositing a node dielectric and filling the trench with polysilicon.

    摘要翻译： 一种在深沟槽单元中掺杂沟槽侧壁和半球晶硅的方法，以增加表面面积和存储电容，同时避免沟槽和半球晶硅的变形，包括：a）通过反应离子蚀刻蚀刻深沟槽结构; b）形成 在包含硅的材料的保形层上的沟槽上部的LOCOS环，所述套环暴露出沟槽的下部; c）在半导体衬底的侧壁处沉积半球形硅（HSG-Si）的膜 深沟槽; d）等离子体掺杂半球形硅; 安装）沉积节点电介质并用多晶硅填充沟槽。

    DRAM cell arrangement with vertical MOS transistors, and method for its fabrication
    8.
    发明授权
    DRAM cell arrangement with vertical MOS transistors, and method for its fabrication 失效
    具有垂直MOS晶体管的DRAM单元布置及其制造方法

    公开(公告)号：US06939763B2

    公开(公告)日：2005-09-06

    申请号：US10720730

    申请日：2003-11-24

    申请人： Till Schlösser ,  Brian S. Lee

    发明人： Till Schlösser ,  Brian S. Lee

    IPC分类号： H01L21/02 ,  H01L21/336 ,  H01L21/8242 ,  H01L27/108 ,  H01L27/12 ,  H01L29/786

    CPC分类号： H01L27/10858 ,  H01L27/10852 ,  H01L27/10876

    摘要： DRAM cell arrangement with vertical MOS transistors, and method for its fabrication. Channel regions arranged along one of the columns of a memory cell matrix are parts of a rib which is surrounded by a gate dielectric layer. Gate electrodes of the MOS transistors belonging to one row are parts of a strip-like word line, so that at each crossing point of the memory cell matrix there is a vertical dual-gate MOS transistor with gate electrodes of the associated word line formed in the trenches on both sides of the associated rib.

    摘要翻译： 具有垂直MOS晶体管的DRAM单元布置及其制造方法。 沿着存储单元矩阵的一列排列的通道区域是由栅介质层包围的肋的部分。 属于一行的MOS晶体管的栅电极是条状字线的一部分，因此在存储单元矩阵的每个交叉点存在垂直双栅极MOS晶体管，其中形成相关联的字线的栅电极 相关肋骨两侧的沟槽。

    Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same
    10.
    发明授权
    Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same 有权
    具有环线图案结构的半导体器件，用于制造其的交替相移掩模

    公开(公告)号：US07087947B2

    公开(公告)日：2006-08-08

    申请号：US10957688

    申请日：2004-10-05

    申请人： Brian S. Lee ,  Chih-Yu Lee

    发明人： Brian S. Lee ,  Chih-Yu Lee

    IPC分类号： H01L27/108

    CPC分类号： H01L21/32139 ,  G03F1/30 ,  H01L27/10861 ,  H01L27/10891

    摘要： An alternating phase shift mask with dark loops thereon, a memory array fabricated with the alternating phase shift mask, and a method of fabricating the memory. The dark loops in the mask always separate first regions with 180° phase difference from second regions with 0° phase difference to define active areas or gate-lines in a DRAM chip. By using the alternating phase shift mask to pattern gate-lines or active areas in a DRAM array, no unwanted image is created in the DRAM array and only one exposure is needed to achieve high resolution requirement.

    摘要翻译： 具有暗环的交替相移掩模，用交替相移掩模制造的存储器阵列，以及制造存储器的方法。 掩模中的暗环总是将具有180°相位差的第一区域与具有0°相位差的第二区域分开，以限定DRAM芯片中的有源区域或栅极线。 通过使用交替相移掩模来对DRAM阵列中的栅极线或有源区进行图案化，在DRAM阵列中不产生不需要的图像，并且仅需要一次曝光来实现高分辨率要求。