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公开(公告)号：US5465220A
公开(公告)日：1995-11-07
申请号：US69853
申请日：1993-06-01
申请人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
发明人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
CPC分类号： G03F7/70566 , G03F7/201 , G03F7/70091 , G03F7/701 , G03F7/70125 , G03F7/70241 , G03F7/70283 , G03F7/70583
摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.
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公开(公告)号：US06045976A
公开(公告)日：2000-04-04
申请号：US734790
申请日：1996-10-25
申请人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
发明人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
CPC分类号： G03F7/70566 , G03F7/201 , G03F7/70091 , G03F7/701 , G03F7/70125 , G03F7/70241 , G03F7/70283 , G03F7/70583
摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.
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公开(公告)号：US6093511A
公开(公告)日：2000-07-25
申请号：US944515
申请日：1997-10-06
申请人： Hiroyuki Tanaka , Kenji Nakagawa
发明人： Hiroyuki Tanaka , Kenji Nakagawa
IPC分类号： G03F1/38 , G03F1/00 , G03F1/44 , G03F7/20 , H01L21/027 , H01L21/308 , H01L2/308
CPC分类号： G03F7/70641 , G03F1/44 , H01L21/308
摘要： The present invention relates to a method of manufacturing a semiconductor device including a step of exposing a resist by use of an exposure mask. An object of the present invention is to facilitate a level adjustment of the reticle and thus automatically determine an optimum focus. The present invention has steps of providing a reticle with a plurality of inspection patterns, which are positioned within a dicing line area around a semiconductor integrated circuit forming area on the reticle, and of which each has a size such that their transferred patterns are changed in shape according to an amount of deviation in focus, and exposing a resist by use of the reticle.
摘要翻译： 本发明涉及一种制造半导体器件的方法，该半导体器件包括通过使用曝光掩模使抗蚀剂曝光的步骤。 本发明的一个目的是促进光罩的水平调节，并因此自动地确定最佳聚焦。 本发明具有以下步骤：提供具有多个检查图案的掩模版，所述检查图案位于掩模版上的半导体集成电路形成区域周围的切割线区域内，并且其中的每一个具有使其转印图案改变的尺寸 根据焦点偏离量形成，并通过使用掩模版曝光抗蚀剂。
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公开(公告)号：US5607821A
公开(公告)日：1997-03-04
申请号：US510128
申请日：1995-08-01
申请人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
发明人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
CPC分类号： G03F7/70566 , G03F7/201 , G03F7/70091 , G03F7/701 , G03F7/70125 , G03F7/70241 , G03F7/70283 , G03F7/70583
摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.
摘要翻译： 在制造半导体器件时，用于精密加工的光刻中的光学曝光方法。 光掩模上的图案被投影并暴露在具有包括变形照明系统，光掩模和投影透镜的曝光装置的基板上的寄存器上。 变形照明系统由光源，光阑和聚光透镜组成，隔膜设有直线通孔。 光学曝光方法使用用于照明的线性光线或与图案平行的用于照明的两束线性光。 两条线性光线相对于光轴对称。 当光掩模图案是线和空间图案时，这些光线与图案平行于与曝光装置的光轴分离的位置。
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公开(公告)号：US20180004713A1
公开(公告)日：2018-01-04
申请号：US15669937
申请日：2017-08-06
申请人： Hiroyuki Tanaka
发明人： Hiroyuki Tanaka
CPC分类号： G06F17/2235 , G06F17/212 , G06F17/24
摘要： The electronic file generation apparatus according to the present invention is configured to set up hyperlinks and anchors in setting regions so as to have the same lower level segments of names, and then to change the setting regions in such a manner so as to execute one-round replacements of only higher level segments of names of the anchors and the hyperlinks in different electronic files. During the process of one-round replacements, the lower level segments of names are copied onto, the lower level segments of names of another file. Finally, the anchors and the hyperlinks in different setting region coincide with each other only by simply combining/coupling a plurality of electronic files into one file. Thereby allowing users to make verbatim cross-references among different contents.
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公开(公告)号：US09799903B2
公开(公告)日：2017-10-24
申请号：US13880393
申请日：2011-10-21
申请人： Hiroshi Iden , Atsushi Ohma , Kei Sakai , Kazuyuki Satou , Yoshitaka Ono , Hiroyuki Tanaka , Ken Akizuki
发明人： Hiroshi Iden , Atsushi Ohma , Kei Sakai , Kazuyuki Satou , Yoshitaka Ono , Hiroyuki Tanaka , Ken Akizuki
IPC分类号： H01M4/90 , H01M8/1004 , H01M4/92 , H01M8/1007
CPC分类号： H01M8/1004 , H01M4/9041 , H01M4/9058 , H01M4/9083 , H01M4/92 , H01M4/926 , H01M8/1007
摘要： Provided is an electrocatalyst for solid polymer fuel cells capable of increasing the active surface area for reactions in a catalyst component, increasing the utilization efficiency of the catalyst, and reducing the amount of expensive precious metal catalyst used. Also provided are a membrane electrode assembly that uses this electrocatalyst and a solid polymer fuel cell. An electrocatalyst for a solid polymer fuel cell is provided with a catalyst and solid proton conducting material. A liquid conductive material retention part that retains a liquid proton conducting material that connects the catalyst and solid proton conducting material is provided between the same. The surface area of the catalyst exposed within the liquid conductive material retention part is larger than the surface area of the catalyst in contact with the solid proton conducting material.
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7.发明授权公开(公告)号：US09703723B2
公开(公告)日：2017-07-11
申请号：US13543950
申请日：2012-07-09
申请人： Masanori Mitsugi , Hiroyuki Tanaka
发明人： Masanori Mitsugi , Hiroyuki Tanaka
IPC分类号： G06F12/08 , G06F12/109 , G06F12/14 , G06F12/1018
CPC分类号： G06F12/109 , G06F12/1018 , G06F12/1408 , G06F2212/151
摘要： In an environment in which a processor operates a hypervisor and multiple guest partitions operating under the hypervisor's control, it is desirable to allow a guest partition access to a physical memory device without decreasing system performance. Accordingly, a conversion instruction for converting a logical address to a real address, i.e., an LTOR instruction, executable from a guest partition, is added to the processor. Upon the guest partition's execution of the conversion instruction with the logical address specified, the processor converts the logical address to an encrypted real address, and returns it to the guest partition. The guest partition is then able to pass the encrypted real address to an accelerator that converts the encrypted real address to a real address in order to access the memory device using the real address.
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公开(公告)号：US09644546B2
公开(公告)日：2017-05-09
申请号：US14119622
申请日：2011-11-08
摘要： This internal combustion engine is provided with a variable compression ratio mechanism capable of changing a mechanical compression ratio by changing the volume of the combustion chamber at the top dead center. The pressure and temperature of remaining combusted gas within the combustion chamber at the time when the exhaust valve is closed in the intake stroke is measured or estimated, the pressure and temperature of intake air supplied into the combustion chamber after the exhaust valve is closed in the intake stroke is measured or estimated, and based on the assumption that the pressure and temperature of the remaining combusted gas which saturates the volume of the combustion chamber at the time when the exhaust valve is closed in the air intake stroke become, when the intake air is supplied to the combustion chamber, equal to the pressure and temperature of the intake air, the volume of the remaining combusted gas after the change is calculated.
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公开(公告)号：US09512788B2
公开(公告)日：2016-12-06
申请号：US14421306
申请日：2013-11-13
申请人： Hiroyuki Tanaka
发明人： Hiroyuki Tanaka
CPC分类号： F02D15/04 , F02B5/02 , F02B75/041 , F02D35/023 , F02D35/027 , F02D35/028 , F02D41/0097 , F02D41/1498 , F02D41/22 , F02D2041/1432 , F02D2700/03 , G01L23/225 , Y02T10/40
摘要： A spark ignition internal combustion engine includes: a compression ratio changing mechanism by which a volume of a combustion chamber varies; a cylinder internal pressure sensor that acquires a pressure signal of a pressure vibration inside a cylinder; and an abnormal combustion detector including a filter that passes the pressure signal, of a set frequency band among the pressure signal, and detecting an occurrence of abnormal combustion based on the pressure signal having passed through the filter. The abnormal combustion detector sets a frequency band of the filter based on a crank angle section in which abnormal combustion occurs and on a mechanical compression ratio.
摘要翻译： 火花点火式内燃机包括：燃烧室体积变化的压缩比变化机构; 气缸内部压力传感器，其获取气缸内的压力振动的压力信号; 以及异常燃烧检测器，其包括通过压力信号之间的设定频带的压力信号的过滤器，并且基于已经通过过滤器的压力信号来检测异常燃烧的发生。 异常燃烧检测器基于发生异常燃烧的曲柄角部和机械压缩比来设定过滤器的频带。
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公开(公告)号：US09041487B2
公开(公告)日：2015-05-26
申请号：US13379617
申请日：2010-06-25
申请人： Hiroyuki Tanaka
发明人： Hiroyuki Tanaka
CPC分类号： H03H9/0038 , H03H9/0042 , H03H9/02913 , H03H9/6436 , H03H9/725
摘要： An SAW filter and a duplexer excellent in electrical characteristics will be provided. An SAW filter has a piezoelectric substrate 40, a surface acoustic wave element 10 having a first IDT electrode 1 on the piezoelectric substrate 40, a first signal line 31 electrically connected to the first IDT electrode 1, and a ring-shaped reference potential line 9 which has a first intersecting portion intersecting with the first signal line 31 through an insulation member 41 and surrounds the surface acoustic wave element 10.
摘要翻译： 将提供优异的电气特性的SAW滤波器和双工器。 SAW滤波器具有压电基板40，在压电基板40上具有第一IDT电极1的表面声波元件10，与第一IDT电极1电连接的第一信号线31和环状基准电位线9 其具有通过绝缘构件41与第一信号线31相交的第一相交部分并且包围声表面波元件10。
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