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    Copolymer for resist comprising novel acryl based monomer and resin composition for resist comprising the same
    6.
    发明授权
    Copolymer for resist comprising novel acryl based monomer and resin composition for resist comprising the same 失效
    用于抗蚀剂的共聚物，其包含新颖的基于丙烯酸的单体和包含其的抗蚀剂的树脂组合物

    公开(公告)号：US08771922B2

    公开(公告)日：2014-07-08

    申请号：US13432218

    申请日：2012-03-28

    申请人： Jin Bong Shin ,  Jin Ho Kim ,  Dae Hyeon Shin ,  Seung Jae Lee

    发明人： Jin Bong Shin ,  Jin Ho Kim ,  Dae Hyeon Shin ,  Seung Jae Lee

    IPC分类号： G03F7/00 ,  C08F236/20 ,  C08F118/02

    CPC分类号： C08F220/18 ,  C08F220/28 ,  C08F220/40 ,  C08F222/14 ,  C08F222/26 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： A resist resin composition includes 100 parts by weight of a copolymer represented by Formula 3 below; 0.5 to 1.5 parts by weight of a photoacid generator and 700 to 1,500 parts by weight of a solvent: wherein R1, R2, and R3 are each independently a C1-30 alkyl group, a C3-30 cycloalkyl group, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group, or an aldehyde group, R4, R5, and R6 are each independently hydrogen or a methyl group, and l, m, n, and o each independently refer to the number of repeating units in a main backbone and satisfy the conditions: l+m+n+o=1, 0≦l/(l+m+n+o)

    摘要翻译： 抗蚀剂树脂组合物包含100重量份由下式3表示的共聚物; 0.5〜1.5重量份的光酸产生剂和700〜1500重量份的溶剂：其中R1，R2和R3各自独立地为C1-30烷基，C3-30环烷基，醚基， 酯基，羰基，缩醛基，环氧基，腈基或醛基，R 4，R 5和R 6各自独立地为氢或甲基，l，m，n和o各自独立地为 是指主骨架中的重复单元数，满足条件：l + m + n + o = 1，0＆nlE; l /（1 + m + n + o）<0.4,0

    METHOD FOR MANUFACTURING A FLUORESCENT RESIN FILM AND FLUORESCENT RESIN FILM MANUFACTURED THEREBY
    7.
    发明申请
    METHOD FOR MANUFACTURING A FLUORESCENT RESIN FILM AND FLUORESCENT RESIN FILM MANUFACTURED THEREBY 审中-公开
    制造荧光树脂膜和荧光树脂薄膜制造方法

    公开(公告)号：US20140141283A1

    公开(公告)日：2014-05-22

    申请号：US14127878

    申请日：2011-08-12

    申请人： Seung Jae Lee ,  Na Na Park ,  Gyeong Seon Seon Park ,  Bo Kyoung Kim ,  Jong Rak Sohn ,  Chang Hoon Kwak

    发明人： Seung Jae Lee ,  Na Na Park ,  Gyeong Seon Seon Park ,  Bo Kyoung Kim ,  Jong Rak Sohn ,  Chang Hoon Kwak

    IPC分类号： C09K11/02 ,  B05D5/06

    CPC分类号： C09K11/025 ,  B05D5/06 ,  C08J7/06 ,  C09K11/08

    摘要： A method of manufacturing a phosphor resin film and a phosphor resin film manufactured thereby are provided. The method of manufacturing a phosphor resin film includes preparing a polymer slurry by mixing a polymer resin and a latent curing agent in a solvent, spreading the polymer slurry such that it has a film shape, drying the spread polymer slurry to form a semi-hardened resin film, and providing phosphor powder to the semi-hardened resin film. A phosphor resin film includes semi-hardened resin film including a polymer resin and a latent curing agent and phosphors uniformly formed on one surface of the semi-hardened resin film.

    摘要翻译： 提供了制造荧光体树脂膜的方法和由此制造的荧光体树脂膜。 制造荧光体树脂膜的方法包括通过在溶剂中混合聚合物树脂和潜在性固化剂来制备聚合物浆料，将聚合物浆料铺展成膜形状，干燥扩展聚合物浆料以形成半硬化 树脂膜，并向半硬化树脂膜提供荧光体粉末。 荧光体树脂膜包括半固化树脂膜，其包含聚合物树脂和潜在性固化剂以及均匀地形成在半硬化树脂膜的一个表面上的荧光体。

    MULTI-LUMINOUS ELEMENT AND METHOD FOR MANUFACTURING SAME
    8.
    发明申请
    MULTI-LUMINOUS ELEMENT AND METHOD FOR MANUFACTURING SAME 有权
    多元件元件及其制造方法

    公开(公告)号：US20120319081A1

    公开(公告)日：2012-12-20

    申请号：US13581399

    申请日：2011-03-15

    申请人： Seong Ran Jeon ,  Jae Bum Kim ,  Seung Jae Lee

    发明人： Seong Ran Jeon ,  Jae Bum Kim ,  Seung Jae Lee

    IPC分类号： H01L33/06 ,  H01L33/32

    CPC分类号： H01L33/08 ,  H01L33/06 ,  H01L33/32

    摘要： The present invention relates to a multi-luminous element and a method for manufacturing the same. The present invention provides the multi-luminous element comprising: a buffer layer disposed on a substrate; a first type semiconductor layer disposed on the buffer layer; a first active layer which is disposed on the first type semiconductor layer and is patterned to expose a part of the first type semiconductor layer; a second active layer disposed on the first type semiconductor layer which is exposed by the first active layer; and a second type semiconductor layer disposed on the first active layer and the second active layer, the first and second active layers being repeatedly disposed in the horizontal direction, and the method for manufacturing the same.

    摘要翻译： 多发光元件及其制造方法技术领域本发明涉及多发光元件及其制造方法。 本发明提供了一种多发光元件，包括：设置在基板上的缓冲层; 设置在缓冲层上的第一类型半导体层; 第一有源层，其设置在所述第一类型半导体层上并被图案化以暴露所述第一类型半导体层的一部分; 设置在由所述第一有源层曝光的所述第一类型半导体层上的第二有源层; 以及设置在第一有源层和第二有源层上的第二类型半导体层，第一和第二有源层在水平方向上重复设置，及其制造方法。

    APPARATUS FOR PRODUCING U3O8 POWDER
    9.
    发明申请
    APPARATUS FOR PRODUCING U3O8 POWDER 有权
    用于生产U3O8粉末的装置

    公开(公告)号：US20120063964A1

    公开(公告)日：2012-03-15

    申请号：US12972471

    申请日：2010-12-18

    申请人： DONG HYUN JUNG ,  Seung Jae Lee ,  Joon Ro Lee ,  Beom Jae Lee ,  Kyeong Lak Jeon ,  Jung Min Suh ,  Keun Min Kim ,  Myoung Ho Oh ,  Doo Lae Jeong ,  Nam Kyu Joo

    发明人： DONG HYUN JUNG ,  Seung Jae Lee ,  Joon Ro Lee ,  Beom Jae Lee ,  Kyeong Lak Jeon ,  Jung Min Suh ,  Keun Min Kim ,  Myoung Ho Oh ,  Doo Lae Jeong ,  Nam Kyu Joo

    IPC分类号： G21C1/00

    CPC分类号： C01G43/01 ,  F27B17/0016 ,  F27D5/0031

    摘要： In an apparatus for producing U3O8 powder, the apparatus has an oxidation reactor including an interior space, a scrap box loaded with UO2 sintered pellets to be oxidized and introduced into the interior space of the oxidation reactor, an impact generating unit applying an impact to the scrap box to dissipate heat generated by the oxidation of the UO2 sintered pellets in the oxidation reactor, and a control unit controlling an oxidation process. The apparatus for producing U3O8 powder allows the heat generated by the oxidation of the UO2 sintered pellets in the oxidation reactor to be uniformly dissipated by the impact generating unit, thus producing U3O8 powder having a larger specific surface area which can be used to obtain a sintered UO2 pellet with a larger and more stable grain size of increased quality.

    摘要翻译： 在用于生产U3O8粉末的装置中，该装置具有包括内部空间的氧化反应器，装载有待氧化并引入氧化反应器的内部空间的UO2烧结颗粒的废料箱，对冲击产生单元施加冲击 废气箱以消散由氧化反应器中的UO2烧结颗粒氧化产生的热量，以及控制氧化过程的控制单元。 用于制造U3O8粉末的装置允许由氧化反应器中的UO2烧结颗粒的氧化产生的热量被冲击产生单元均匀地消散，从而产生具有较大比表面积的U3O8粉末，其可用于获得烧结 UO2颗粒具有更大更稳定的粒度提高的质量。