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    Process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas
    4.
    发明授权
    Process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas 失效
    将双极脉冲形式的能量馈入低压等离子体的过程和电路

    公开(公告)号：US06005218A

    公开(公告)日：1999-12-21

    申请号：US836030

    申请日：1997-08-11

    申请人： Hendrik Walde ,  Jonathan Reschke ,  Klaus Goedicke ,  Torsten Winkler ,  Volker Kirchhoff ,  Peter Frach

    发明人： Hendrik Walde ,  Jonathan Reschke ,  Klaus Goedicke ,  Torsten Winkler ,  Volker Kirchhoff ,  Peter Frach

    IPC分类号： H01J37/32 ,  H05H1/46 ,  B23K10/00

    CPC分类号： H01J37/32018 ,  H01J37/32027 ,  H01J37/32064 ,  H05H1/46

    摘要： A process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas is provided. Within an average time period, a power which is to be as high as possible is to be fed into the low pressure discharge. In each polarization, the same power is to be fed although the impedance differs considerably. In a system for plasma and surface treatment techniques having at least two electrodes and one power supply, the outputs of at least two potential-free direct current supplies are switched such that an output of one direct current supply is conductively connected with an output of the same polarity of the other direct current supply. By means of a switch which is connected with each feed line to the electrodes and whose other outputs are led in a combined manner to the other outputs of the direct current source, these switches are operated via a timing generator in synchronism with the pole changing frequency. The switches are opened up in the event of the occurrence of an arcing. The process is used for the bipolar pulse sputtering for depositing electrically insulating layers on workpieces. Preferably, such layers are used for a mechanical protection, protection against wear and the improvement of sliding characteristics.

    摘要翻译： PCT No.PCT / DE95 / 01473 Sec。 371日期1997年8月11日 102（e）日期1997年8月11日PCT 1995年10月19日PCT PCT。 WO96 / 13964 PCT出版物 日期：1996年5月9日提供了将能量双极脉冲馈入低压等离子体的工艺和电路。 在平均时间段内，要将尽可能高的功率送入低压放电。 在每个极化中，尽管阻抗明显不同，但仍要输入相同的功率。 在具有至少两个电极和一个电源的等离子体和表面处理技术的系统中，切换至少两个无电势直流电源的输出，使得一个直流电源的输出与 相同极性的另一个直流电源。 通过与每个馈电线连接到电极并且其另外的输出以直流电源的其他输出的方式被引导的开关，这些开关通过与极点变化频率​​同步的定时发生器来操作 。 发生电弧时，开关被打开。 该工艺用于双极脉冲溅射，用于在工件上沉积电绝缘层。 优选地，这些层用于机械保护，防止磨损和改善滑动特性。

    Process for the stabilization of plasma generation by means of electron beam vaporizer
    5.
    发明授权
    Process for the stabilization of plasma generation by means of electron beam vaporizer 失效
    通过电子束蒸发器稳定等离子体产生的方法

    公开(公告)号：US5780803A

    公开(公告)日：1998-07-14

    申请号：US821030

    申请日：1997-03-20

    申请人： Klaus Goedicke ,  Volker Kirchhoff ,  Christoph Metzner ,  Bert Scheffel

    发明人： Klaus Goedicke ,  Volker Kirchhoff ,  Christoph Metzner ,  Bert Scheffel

    IPC分类号： C23C14/32 ,  H01J37/304 ,  H01J37/305 ,  B23K10/00 ,  B23K15/00

    CPC分类号： H01J37/304 ,  C23C14/32 ,  H01J37/3053

    摘要： The invention relates to a process for stabilizing plasma generation in the coating of large substrate surfaces by means of an electron beam vaporizer. To obtain a stable operation of the apparatus at a high vaporization rate and stable plasma excitation of the vapour cloud without using additional electrodes, according to the invention the vaporization rate of the electron beam vaporizer is initially set so high that at least 10% of the electron beam power is absorbed in the vaporization chamber by the vapour and the optical emission of the resulting plasma is measured. The operating parameters of the electron gun or a process parameter are then controlled in such a way that the optical emission, and therefore the energy absorption, remains constant.

    摘要翻译： 本发明涉及通过电子束蒸发器来稳定大衬底表面涂层中的等离子体产生的方法。 为了以高蒸发速率和蒸气云的稳定等离子体激发而不使用附加电极获得设备的稳定操作，根据本发明，电子束蒸发器的蒸发速率最初设定得高至至少10％ 电子束功率被蒸汽吸收在蒸发室中，并测量所得等离子体的光发射。 然后控制电子枪的操作参数或工艺参数，使得光发射，因此能量吸收保持恒定。

    Process and system for operating magnetron discharges
    6.
    发明授权
    Process and system for operating magnetron discharges 有权
    用于操作磁控管放电的过程和系统

    公开(公告)号：US06340416B1

    公开(公告)日：2002-01-22

    申请号：US09341998

    申请日：1999-07-22

    申请人： Klaus Goedicke ,  Torsten Winkler ,  Michael Junghähnel ,  Fred Fietzke ,  Volker Kirchhoff ,  Jonathan Reschke

    发明人： Klaus Goedicke ,  Torsten Winkler ,  Michael Junghähnel ,  Fred Fietzke ,  Volker Kirchhoff ,  Jonathan Reschke

    IPC分类号： C23C1434

    CPC分类号： H01J37/34

    摘要： Magnetron discharges are pulse-operated to avoid the so-called “arcing”. In the case of magnetron discharges from alternating current-fed magnetrons, the process is limited to the minor power of the energy supply because of the load-carrying capacity of the required electric components. When the magnetron discharges are fed by direct current, their effectiveness deteriorates because of the deposition of layers on the anode surfaces. The new process should enable a high supply power and prevent arcing. In magnetron discharges with at least two magnetron electrodes, the energy is supplied in such a way that at least one magnetron electrode is a cathode or anode and a number n1 of direct current pulses of said polarity is supplied. The poles of at least one magnetron electrode are then reversed and a number n2 of direct currents of this polarity are supplied. The process is carried on in this manner, the frequency of the direct current pulses being higher than that of the polarity reversals. The energy supply effectiveness is thus improved. This process and system enable the production of layers having the most different properties, for example for the glass, packaging, electronic, and machine construction industries.

    摘要翻译： 磁控管放电是脉冲操作的，以避免所谓的“电弧”。 在由交流馈电磁控管放电的磁控管的情况下，由于所需的电气部件的承载能力，该过程被限制在能量供应的次要功率。 当磁控管放电由直流供电时，由于层在阳极表面上的沉积，它们的有效性降低。 新的过程应该能够实现高供电和防止电弧。 在具有至少两个磁控管电极的磁控管放电中，以至少一个磁控管电极为阴极或阳极并且提供所述极性的直流电脉冲数n1的方式提供能量。 然后至少一个磁控管电极的极被反转，并且提供这个极性的直流电的数量n2。 以这种方式进行该过程，直流脉冲的频率高于极性反转的频率。 从而提高能源供应效率。 该方法和系统能够生产具有最不同性质的层，例如用于玻璃，包装，电子和机械制造业。

    Method for plasma-assisted reactive electron beam vaporization
    8.
    发明授权
    Method for plasma-assisted reactive electron beam vaporization 失效
    等离子体辅助反应电子束蒸发的方法

    公开(公告)号：US5614248A

    公开(公告)日：1997-03-25

    申请号：US424418

    申请日：1995-05-30

    申请人： Siegfried Schiller ,  Manfred Neumann ,  Volker Kirchhoff ,  Gerhard Zeissig ,  Nicolas Schiller ,  Klaus Goedicke

    发明人： Siegfried Schiller ,  Manfred Neumann ,  Volker Kirchhoff ,  Gerhard Zeissig ,  Nicolas Schiller ,  Klaus Goedicke

    IPC分类号： C23C14/30 ,  C23C14/00 ,  C23C14/32 ,  C23C14/54 ,  C23C14/56 ,  B05D3/06 ,  H05H1/02

    CPC分类号： C23C14/54 ,  C23C14/0021

    摘要： Certain non-optical characteristics and, in particular, mechanical characteristics are not measurable in situ in the industrial production of layers using plasma-assisted reactive electron beam vaporization, particularly if high demands are made on the hardness, wear resistance and barrier action, so as to be able to reproducibly apply the layers. The values of the optical layer characteristics are to be used as a control signal. In this method, immediately after the substrate has passed through the vaporizing zone, the reflection and/or transmission and absorption capacity are measured in the wavelength range .DELTA..sub.k =150 to 800 nm and from this are determined the refractive index and optical absorption coefficient. These determined values are compared with an experimentally determined desired value. A control signal obtained therefrom, in the case of a constant reactive gas partial pressure, controls the plasma and maintains constant the optical characteristics of the layer. The method is used in the vapor-deposition of wear-resistance, hard layers or barrier layers, e.g. of metal oxide on glass, plastic and other materials, e.g. in the building industry for facade glass and in the packaging industry.

    摘要翻译： PCT No.PCT / DE93 / 00748 Sec。 371日期：1995年5月30日 102（e）日期1995年5月30日PCT提交1993年8月18日PCT公布。 公开号WO94 / 10356 日期1994年5月11日具有非光学特性，特别是在使用等离子体辅助的反应电子束蒸发的工业生产中不能测量机械特性，特别是如果对硬度，耐磨性和阻挡层有高要求 动作，以便能够可重复地应用层。 光层特性的值被用作控制信号。 在该方法中，在基板通过蒸发区之后，在DELTA k = 150〜800nm的波长范围内测定反射和/或透射吸收能力，由此确定折射率和光吸收系数。 将这些确定的值与实验确定的期望值进行比较。 在恒定的反应气体分压的情况下，从其获得的控制信号控制等离子体并保持该层的光学特性恒定。 该方法用于耐磨性，硬质层或阻挡层的气相沉积，例如， 玻璃，塑料和其他材料上的金属氧化物，例如。 在建筑行业的立面玻璃和包装行业。

    Device for applying layers of hard material by dusting
    9.
    发明授权
    Device for applying layers of hard material by dusting 有权
    用于通过除尘施加硬质材料层的装置

    公开(公告)号：US06315877B1

    公开(公告)日：2001-11-13

    申请号：US09485713

    申请日：2000-03-01

    申请人： Klaus Goedicke ,  Fred Fietzke

    发明人： Klaus Goedicke ,  Fred Fietzke

    IPC分类号： C23C1434

    CPC分类号： C23C14/352 ,  C23C14/505 ,  C23C14/541

    摘要： A device for the sputter application of hard material coatings, including an exhaustible vacuum chamber, at least one sputtering source for depositing a coating material, a plurality of fixtures for supporting a plurality parts to be coated, the fixtures being mounted on planet gears which are movable via a planetary drive, a centrally disposed heating device, a reactive gas inlet, and a plurality of movable screens for covering the at least one sputtering source, the screens being arranged to surround the fixtures, wherein the heating device, the screens, and the planetary drive comprise an assembly which is removable from the vacuum chamber.

    摘要翻译： 用于溅射施加硬质材料涂层的装置，包括可抽真空的真空室，至少一个用于沉积涂层材料的溅射源，用于支撑待涂覆的多个部件的多个固定装置，固定装置安装在行星齿轮上 可通过行星驱动器，中央布置的加热装置，反应气体入口和用于覆盖至少一个溅射源的多个可移动屏幕移动，所述屏幕被布置成围绕固定装置，其中加热装置，屏幕和 行星驱动器包括可从真空室移除的组件。

    Plain bearing and method for the production thereof
    10.
    发明授权
    Plain bearing and method for the production thereof 失效
    滑动轴承及其制造方法

    公开(公告)号：US06263575B1

    公开(公告)日：2001-07-24

    申请号：US09584515

    申请日：2000-05-31

    申请人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

    发明人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

    IPC分类号： B21D5310

    CPC分类号： F16C33/12 ,  C23C14/16 ,  C23C14/30 ,  C23C14/541 ,  F16C33/122 ,  F16C33/14 ,  F16C2204/20 ,  Y10S384/912 ,  Y10T29/49647 ,  Y10T29/49705

    摘要： A plain bearing overlay (3) of which exhibits properties which are markedly improved with regard to wear resistance in comparison with overlays applied by electroplating and conventional electron beam vapor deposition methods. The surface of the overlay (3) comprises round raised portions (4) and depressed portions (6), wherein, in relation to the horizontal section plane (7), the raised portions (4) cover a proportion of the surface area amounting to 30% to 50%, based on the entire surface area of the plain bearing, the section plane (7) being at a height at which the total proportion of the surface area consisting of the raised portions (4), and obtained in vertical section, is equal to the total corresponding proportion consisting of the depressed portions (6). The round raised portions exhibit a diameter D of 3 to 8 &mgr;m, in plan view, wherein, in the case of raised portions (4) and depressed portions (6) which in plan view are not circular, this value relates to the maximum diameter. The surface exhibits a roughness of Rz=3 to 7 &mgr;m. The method of producing such plain bearings is based on electron beam vapor deposition, wherein a backing member with a roughness of Rz23 2 &mgr;m is used and vapor deposition of the overlay is effected at a pressure

    摘要翻译： 与通过电镀和常规电子束气相沉积方法施加的覆盖层相比，其滑动轴承覆盖层（3）的性能显着地提高了耐磨性。 覆盖层（3）的表面包括圆形凸起部分（4）和凹陷部分（6），其中相对于水平截面（7），凸起部分（4）覆盖一定比例的表面积 30％至50％，基于滑动轴承的整个表面积，截面（7）处于由凸起部分（4）组成的表面积的总比例并且在垂直截面中获得的高度 等于由凹陷部分（6）组成的总相应比例。 圆形隆起部分在平面图中呈现3至8μm的直径D，其中在俯视图中不是圆形的凸起部分（4）和凹陷部分（6）的情况下，该值涉及最大直径 。 该表面的粗糙度Rz = 3〜7μm。 制造这种滑动轴承的方法是基于电子束气相沉积，其中使用粗糙度为Rz232μm的背衬构件，并且在压力<0.1Pa下进行覆盖层的气相沉积。