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公开(公告)号：US06340416B1
公开(公告)日：2002-01-22
申请号：US09341998
申请日：1999-07-22
申请人： Klaus Goedicke , Torsten Winkler , Michael Junghähnel , Fred Fietzke , Volker Kirchhoff , Jonathan Reschke
发明人： Klaus Goedicke , Torsten Winkler , Michael Junghähnel , Fred Fietzke , Volker Kirchhoff , Jonathan Reschke
IPC分类号： C23C1434
CPC分类号： H01J37/34
摘要： Magnetron discharges are pulse-operated to avoid the so-called “arcing”. In the case of magnetron discharges from alternating current-fed magnetrons, the process is limited to the minor power of the energy supply because of the load-carrying capacity of the required electric components. When the magnetron discharges are fed by direct current, their effectiveness deteriorates because of the deposition of layers on the anode surfaces. The new process should enable a high supply power and prevent arcing. In magnetron discharges with at least two magnetron electrodes, the energy is supplied in such a way that at least one magnetron electrode is a cathode or anode and a number n1 of direct current pulses of said polarity is supplied. The poles of at least one magnetron electrode are then reversed and a number n2 of direct currents of this polarity are supplied. The process is carried on in this manner, the frequency of the direct current pulses being higher than that of the polarity reversals. The energy supply effectiveness is thus improved. This process and system enable the production of layers having the most different properties, for example for the glass, packaging, electronic, and machine construction industries.
摘要翻译： 磁控管放电是脉冲操作的，以避免所谓的“电弧”。 在由交流馈电磁控管放电的磁控管的情况下，由于所需的电气部件的承载能力，该过程被限制在能量供应的次要功率。 当磁控管放电由直流供电时，由于层在阳极表面上的沉积，它们的有效性降低。 新的过程应该能够实现高供电和防止电弧。 在具有至少两个磁控管电极的磁控管放电中，以至少一个磁控管电极为阴极或阳极并且提供所述极性的直流电脉冲数n1的方式提供能量。 然后至少一个磁控管电极的极被反转，并且提供这个极性的直流电的数量n2。 以这种方式进行该过程，直流脉冲的频率高于极性反转的频率。 从而提高能源供应效率。 该方法和系统能够生产具有最不同性质的层，例如用于玻璃，包装，电子和机械制造业。
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2.发明授权Process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas 失效将双极脉冲形式的能量馈入低压等离子体的过程和电路
公开(公告)号：US06005218A
公开(公告)日：1999-12-21
申请号：US836030
申请日：1997-08-11
申请人： Hendrik Walde , Jonathan Reschke , Klaus Goedicke , Torsten Winkler , Volker Kirchhoff , Peter Frach
发明人： Hendrik Walde , Jonathan Reschke , Klaus Goedicke , Torsten Winkler , Volker Kirchhoff , Peter Frach
CPC分类号： H01J37/32018 , H01J37/32027 , H01J37/32064 , H05H1/46
摘要： A process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas is provided. Within an average time period, a power which is to be as high as possible is to be fed into the low pressure discharge. In each polarization, the same power is to be fed although the impedance differs considerably. In a system for plasma and surface treatment techniques having at least two electrodes and one power supply, the outputs of at least two potential-free direct current supplies are switched such that an output of one direct current supply is conductively connected with an output of the same polarity of the other direct current supply. By means of a switch which is connected with each feed line to the electrodes and whose other outputs are led in a combined manner to the other outputs of the direct current source, these switches are operated via a timing generator in synchronism with the pole changing frequency. The switches are opened up in the event of the occurrence of an arcing. The process is used for the bipolar pulse sputtering for depositing electrically insulating layers on workpieces. Preferably, such layers are used for a mechanical protection, protection against wear and the improvement of sliding characteristics.
摘要翻译： PCT No.PCT / DE95 / 01473 Sec。 371日期1997年8月11日 102（e）日期1997年8月11日PCT 1995年10月19日PCT PCT。 WO96 / 13964 PCT出版物 日期：1996年5月9日提供了将能量双极脉冲馈入低压等离子体的工艺和电路。 在平均时间段内，要将尽可能高的功率送入低压放电。 在每个极化中，尽管阻抗明显不同，但仍要输入相同的功率。 在具有至少两个电极和一个电源的等离子体和表面处理技术的系统中，切换至少两个无电势直流电源的输出，使得一个直流电源的输出与 相同极性的另一个直流电源。 通过与每个馈电线连接到电极并且其另外的输出以直流电源的其他输出的方式被引导的开关，这些开关通过与极点变化频率同步的定时发生器来操作 。 发生电弧时，开关被打开。 该工艺用于双极脉冲溅射，用于在工件上沉积电绝缘层。 优选地，这些层用于机械保护，防止磨损和改善滑动特性。
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公开(公告)号：US06605312B2
公开(公告)日：2003-08-12
申请号：US09962212
申请日：2001-09-26
申请人： Torsten Winkler , Ralf Blüthner , Klaus Goedicke , Michael Junghähnel , Hans Buchberger , Manfred Müller , Arno Hebgen , Hans-Hermann Schneider
发明人： Torsten Winkler , Ralf Blüthner , Klaus Goedicke , Michael Junghähnel , Hans Buchberger , Manfred Müller , Arno Hebgen , Hans-Hermann Schneider
IPC分类号： B05D100
CPC分类号： C23C14/35 , C23C16/515
摘要： Production of a thin-film system containing at least one ultra-thin film, preferentially in the film thickness range from 1 to 10 nm, which is deposited by plasma-aided chemical or physical vapor-phase deposition using magnetron discharges. The method is characterized in that in the course of deposition of the ultra-thin film the power output is introduced into the plasma in the form of a controlled number of power pulses and that the average power output during the pulse-on time is set higher by a factor of at least 3 than the averaged power output over the entire coating time during deposition of the ultra-thin film.
摘要翻译： 生产含有至少一种超薄膜的薄膜系统，优选在1至10nm的膜厚度范围内，其通过使用磁控管放电的等离子体辅助化学或物理气相沉积来沉积。 该方法的特征在于，在沉积超薄膜的过程中，功率输出以受控数量的功率脉冲的形式被引入到等离子体中，并且将脉冲接通时间期间的平均功率输出设置得更高 比在超薄膜沉积期间的整个涂布时间的平均功率输出至少3倍。
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4.发明授权
公开(公告)号：US6063245A
公开(公告)日：2000-05-16
申请号：US989246
申请日：1997-12-12
申请人： Peter Frach , Klaus Goedicke , Michael Junghahnel , Torsten Winkler , Friedel Haese , Dieter W. Meyer , Manfred Muller , Harald Strecker
发明人： Peter Frach , Klaus Goedicke , Michael Junghahnel , Torsten Winkler , Friedel Haese , Dieter W. Meyer , Manfred Muller , Harald Strecker
CPC分类号： C23C14/352 , C23C14/0036 , C23C14/0605
摘要： A procedure and apparatus for the application of carbon layers using reactive magnetron sputtering is described. The process includes sputtering of at least two targets made of carbon in a reactive atmosphere with a pulsed energy feed. During a pattern period of the pulses all targets (magnetrons) are once switched on as an anode and at least one target is switched as an anode at all times Various embodiments include detection and limitation of the "microarcs"; executing of regeneration processes according to fixed predetermined time intervals for at least 5 seconds. In one embodiment a microarc is detected on a magnetron and if a next pulse-off time is more than a selected time period away, then the magnetron is connected to a positive pole of the power supply. In another embodiment of the invention a pulsed negative voltage is applied to a substrate being sputtered by connecting the substrate to a negative pole of a pulsed power supply having a positive pole connected to a positive pole of a power supply for a magnetron. In another embodiment of the invention there is an electrode insulated from an installation mass which is connected to at least one positive pole of a power supply during the periodic pausing sputtering of substrates for regeneration.
摘要翻译： 描述了使用反应性磁控溅射应用碳层的方法和装置。 该方法包括在反应性气氛中用脉冲能量进料溅射由碳制成的至少两个靶。 在脉冲的图案周期期间，所有目标（磁控管）一次作为阳极接通，并且至少一个目标始终作为阳极切换。各种实施例包括检测和限制“微型”; 根据固定的预定时间间隔执行至少5秒的再生处理。 在一个实施例中，在磁控管上检测到微弧，并且如果下一个脉冲关闭时间大于所选择的时间段，则磁控管连接到电源的正极。 在本发明的另一个实施例中，通过将衬底连接到具有连接到用于磁控管的电源的正极的正极的脉冲电源的负极来将脉冲负电压施加到正在溅射的衬底上。 在本发明的另一个实施例中，存在与在用于再生的衬底的周期性暂停溅射期间连接到电源的至少一个正极的安装质量绝缘的电极。
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5.发明授权公开(公告)号：US06420863B1
公开(公告)日：2002-07-16
申请号：US09581208
申请日：2000-06-21
IPC分类号： G01R1716
CPC分类号： H01J37/3444 , H01J37/3405 , H05H1/0081
摘要： Process for monitoring an alternating-voltage discharge between the electrodes of a double electrode and an apparatus. The process includes measuring values of at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period, determining a difference between the measured values of a second half-wave and the measured values of the first half-wave, and comparing the determined differences to specific tolerance values. When the specific tolerance values are exceeded by the determined differences, a power supply is reduced, whereby the discharge is at least briefly suppressed. The apparatus includes a double magnetron including first and second targets arranged to form a double electrode, and a power supply coupled to supply power to the first and second targets. The power supply includes a measurement unit for measuring values of at least one of discharge current and discharge voltage, such that at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period is measured. A device for determining a difference between the measured values of a second half-wave and the measured values of the first half-wave is provided, as well as a device for comparing the determined differences to specific tolerance values, and a device for at least briefly suppressing the discharge when the specific tolerance values are exceeded by the determined differences.
摘要翻译： 用于监视双电极的电极与装置之间的交流电压放电的方法。 该过程包括在交流电压放电周期内测量每个半波的放电电流和放电电压中的至少一个的值，确定第二半波的测量值与第一半波的测量值之间的差值 半波，并将确定的差异与特定容差值进行比较。 当通过所确定的差异超过特定公差值时，电源减少，从而至少简化了放电。 该装置包括双重磁控管，其包括布置成形成双电极的第一和第二靶，以及耦合以向第一和第二靶提供电力的电源。 电源包括测量单元，用于测量放电电流和放电电压中的至少一个的值，以便测量交流电压放电周期内的每个半波的放电电流和放电电压中的至少一个。 提供了一种用于确定第二半波的测量值与第一半波的测量值之间的差异的装置，以及用于将确定的差异与特定公差值进行比较的装置，以及用于至少 当确定的差异超过特定公差值时，暂时抑制放电。
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6.发明授权Process and switching arrangement for pulsing energy introduction into magnetron discharges 失效脉冲能量引入磁控管放电的过程和开关布置公开(公告)号：US06522076B2
公开(公告)日：2003-02-18
申请号：US09817346
申请日：2001-03-27
申请人： Klaus Goedicke , Torsten Winkler , Michael Jungh{overscore (a)}hnel , Karsten Handt , Henry Güldner , Henrik Wolf , Frank Eckholz
发明人： Klaus Goedicke , Torsten Winkler , Michael Jungh{overscore (a)}hnel , Karsten Handt , Henry Güldner , Henrik Wolf , Frank Eckholz
IPC分类号： H05B3126
CPC分类号： H01J37/3444 , H01J37/3405 , H05H1/46
摘要： Process and control arrangement for introducing pulsing energy introduction into magnetron discharges. The process includes feeding a charge to the electrodes of a magnetron arrangement via a ignition source at a time t0, and, after the feeding of the electric charge, determining an ignition of the magnetron discharge. The process also includes introducing a current, having a predetermined value, from a boost source at a time t1, and, at a time t2, separating the ignition source from the electrodes of the magnetron arrangement. The introduction of the current by the boost source continues for a certain duration tEIN. The process also includes interrupting the introduction of the electric energy for a predetermined time tAUS.
摘要翻译： 将脉冲能量引入磁控管放电的过程和控制布置。 该过程包括在时间t0经由点火源将电荷馈送到磁控管装置的电极，并且在馈送电荷之后，确定磁控管放电的点火。 该过程还包括在时间t1从升压源引入具有预定值的电流，并且在时间t2将点火源与磁控管装置的电极分开。 升压源引入的电流持续一段时间tEIN。 该过程还包括中断电能在预定时间tAUS的引入。
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公开(公告)号：US06436248B1
公开(公告)日：2002-08-20
申请号：US09434590
申请日：1999-11-05
申请人： Heinz Baur , Ralf Bluethner , Hans Buchberger , Klaus Goedicke , Michael Junghaehnel , Karl-Heinz Lehnert , Manfred Mueller , Hans-Herrman Schneider , Torsten Winkler
发明人： Heinz Baur , Ralf Bluethner , Hans Buchberger , Klaus Goedicke , Michael Junghaehnel , Karl-Heinz Lehnert , Manfred Mueller , Hans-Herrman Schneider , Torsten Winkler
IPC分类号： C23C1434
CPC分类号： G11B5/7325 , C23C14/165 , C23C14/34
摘要： A method of coating of thin film coated magnetic disks and thin film magnetic disks made thereby is described. In accordance with the invention, a barrier layer is deposited on the substrate before the underlayer film(s) to increase the corrosion resistance of metallic substrate magnetic disks and, in the case of nonmetallic substrates, to reduce the diffusion of water to the substrate and of freely moveable ions from the substrate. Preferably the barrier layer is deposited by medium frequency pulsed sputtering at a frequency of 10 to 200 kHz and a pulse length to pulse pause ratio from 5:1 to 1:10. Aluminum or chromium are the preferred materials for the barrier layer. Additional improvements may be achieved where the sputtering process gas contains a proportion of oxygen and/or nitrogen.
摘要翻译： 描述了由此制成的薄膜涂覆磁盘和薄膜磁盘的涂覆方法。 根据本发明，在下层膜之前在衬底上沉积阻挡层以提高金属基底磁盘的耐腐蚀性，并且在非金属基底的情况下，减少水向衬底的扩散， 可自由移动的离子。 优选地，阻挡层通过中频脉冲溅射以10至200kHz的频率和脉冲长度与脉冲间隔比从5:1沉积到1:10。 铝或铬是阻挡层的优选材料。 当溅射工艺气体含有一部分氧和/或氮时，可以实现另外的改进。
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公开(公告)号：US6019876A
公开(公告)日：2000-02-01
申请号：US80088
申请日：1998-05-15
申请人： Klaus Goedicke , Michael Junghahnel , Torsten Winkler , Artur Lang , Dieter Meyer , Manfred Muller , Hans-Herrmann Schneider , Rainer C. Schneider
发明人： Klaus Goedicke , Michael Junghahnel , Torsten Winkler , Artur Lang , Dieter Meyer , Manfred Muller , Hans-Herrmann Schneider , Rainer C. Schneider
CPC分类号： G11B5/851 , G11B5/8404
摘要： A method and apparatus for depositing an underlayer and/or a magnetic thin film layer on a data storage disk are described. The sputtering power is supplied in the form of pulses during the application of the underlayer and/or magnetic storage to periodically ignite the plasma and increase the charge-carrier density in the sputtering chamber. The repetition frequency and parameters for the pulses and pauses between pulses are adjusted to achieve a desired nominal value for the coercive field strength of the magnetic layer. Preferably the repetition frequency of the power switching is from 10 to 80 kHz and the ratio of pulse length to pulse pause is within 5:1 to 1:5.
摘要翻译： 描述了用于在数据存储盘上沉积底层和/或磁性薄膜层的方法和装置。 在施加底层和/或磁性存储器期间以脉冲的形式提供溅射功率以周期性地点燃等离子体并且增加溅射室中的电荷 - 载流子密度。 脉冲之间的脉冲和重复频率的重复频率和参数被调整以达到磁层的矫顽磁场强度的期望标称值。 优选地，功率切换的重复频率为10至80kHz，并且脉冲长度与脉冲暂停的比率在5:1至1:5之间。
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公开(公告)号：US20110068544A1
公开(公告)日：2011-03-24
申请号：US12873081
申请日：2010-08-31
CPC分类号： B23B31/16287 , B23B31/16275 , B23B31/16291 , B23B2215/08 , Y10S409/903 , Y10T279/12 , Y10T279/1208 , Y10T279/26 , Y10T279/33 , Y10T279/3493 , Y10T408/03 , Y10T408/5614 , Y10T408/5634 , Y10T408/6771 , Y10T409/305824 , Y10T409/30868
摘要： The present invention relates to a machine tool for machining of workpieces, having a workpiece support for mounting the workpiece, a tool holder, which can be moved at least along one axis, for holding a tool for machining the workpiece, and workpiece holding units for fixing the workpiece during the machining, the workpiece holding units being arranged outside the workpiece support surface of the workpiece support, which is covered by the workpiece in the mounted state, and each having a holding element for fixing the workpiece. In order that also workpieces of greater diameter can be machined, the machine tool otherwise being of the same dimensions, it is provided according to the invention that the holding elements can each be moved, substantially parallel to the workpiece support surface, in the direction of the workpiece, in particular in the direction of a central workpiece axis, which runs perpendicular to the workpiece support surface, for the purpose of centering and fixing the workpiece. The holding elements comprise a clamping surface that is arranged obliquely in relation to the workpiece support surface and that is, in the mounted state, pressed against the workpiece for fixing and centering the workpiece to be machined, thereby exerting a pressure both in the direction of the workpiece support surface and in the direction of the central workpiece axis.
摘要翻译： 本发明涉及一种用于加工工件的机床，具有用于安装工件的工件支撑件，可至少沿着一个轴线移动的工具架，用于保持用于加工工件的工具，以及用于 在加工期间固定工件，工件保持单元布置在工件支撑件的工件支撑表面的外侧，工件支撑表面在安装状态下被工件覆盖，并且每个具有用于固定工件的保持元件。 为了也可以加工更大直径的工件，机床具有相同的尺寸，根据本发明，提供了保持元件可以基本上平行于工件支撑表面沿着 工件，特别是在垂直于工件支撑表面延伸的中心工件轴线的方向上，用于定心和固定工件。 保持元件包括相对于工件支撑表面倾斜地布置的夹紧表面，即处于安装状态的夹紧表面被压靠在工件上，用于固定和对准待加工的工件，从而在 工件支撑表面和中心工件轴线的方向。
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公开(公告)号：US08172489B2
公开(公告)日：2012-05-08
申请号：US12873081
申请日：2010-08-31
CPC分类号： B23B31/16287 , B23B31/16275 , B23B31/16291 , B23B2215/08 , Y10S409/903 , Y10T279/12 , Y10T279/1208 , Y10T279/26 , Y10T279/33 , Y10T279/3493 , Y10T408/03 , Y10T408/5614 , Y10T408/5634 , Y10T408/6771 , Y10T409/305824 , Y10T409/30868
摘要： The present invention relates to a machine tool for machining of workpieces, having a workpiece support for mounting the workpiece, a tool holder, which can be moved at least along one axis, for holding a tool for machining the workpiece, and workpiece holding units for fixing the workpiece during the machining, the workpiece holding units being arranged outside the workpiece support surface of the workpiece support, which is covered by the workpiece in the mounted state, and each having a holding element for fixing the workpiece. In order that also workpieces of greater diameter can be machined, the machine tool otherwise being of the same dimensions, it is provided according to the invention that the holding elements can each be moved, substantially parallel to the workpiece support surface, in the direction of the workpiece, in particular in the direction of a central workpiece axis, which runs perpendicular to the workpiece support surface, for the purpose of centering and fixing the workpiece. The holding elements comprise a clamping surface that is arranged obliquely in relation to the workpiece support surface and that is, in the mounted state, pressed against the workpiece for fixing and centering the workpiece to be machined, thereby exerting a pressure both in the direction of the workpiece support surface and in the direction of the central workpiece axis.
摘要翻译： 本发明涉及一种用于加工工件的机床，具有用于安装工件的工件支撑件，可至少沿着一个轴线移动的工具架，用于保持用于加工工件的工具，以及用于 在加工期间固定工件，工件保持单元布置在工件支撑件的工件支撑表面的外侧，工件支撑表面在安装状态下被工件覆盖，并且每个具有用于固定工件的保持元件。 为了也可以加工更大直径的工件，机床具有相同的尺寸，根据本发明，提供了保持元件可以基本上平行于工件支撑表面沿着 工件，特别是在垂直于工件支撑表面延伸的中心工件轴线的方向上，用于定心和固定工件。 保持元件包括相对于工件支撑表面倾斜地布置的夹紧表面，即处于安装状态的夹紧表面被压靠在工件上，用于固定和对准待加工的工件，从而在 工件支撑表面和中心工件轴线的方向。
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