Dynamically compensated objective lens-detection device and method
    1.
    发明授权
    Dynamically compensated objective lens-detection device and method 失效
    动态补偿物镜检测装置及方法

    公开(公告)号:US06232601B1

    公开(公告)日:2001-05-15

    申请号:US09274665

    申请日:1999-03-23

    IPC分类号: H01J37145

    CPC分类号: H01J37/21 H01J37/28

    摘要: The invention relates to a charged particle beam device and a method for inspecting a specimen, comprising a source for generating a charged particle beam, an objective lens with an optical axis for focussing said charged particle beam on a specimen, which consists of a magnetic lens and a superimposed electrostatic lens having at least two electrodes, deflection means for deflecting said charged particle beam on said specimen and detector means for detecting charged particles released at said specimen. The invention is further characterized by control means co-acting with said deflection means and one of the electrodes of the electrostatic lens for applying a dynamic voltage to said electrode, the amount of the voltage being dependent on the distance of said charged particle beam from said optical axis at the specimen, in order to increase the efficiency of detecting said charged particles released at image areas being located on the specimen with distance from the optical axis.

    摘要翻译: 本发明涉及一种带电粒子束装置和一种用于检查样本的方法,包括用于产生带电粒子束的源,具有用于将所述带电粒子束聚焦在样本上的光轴的物镜,该物镜由磁性透镜 以及具有至少两个电极的叠加的静电透镜,用于使所述带电粒子束偏转在所述样本上的偏转装置和用于检测在所述样本上释放的带电粒子的检测器装置。 本发明的特征还在于与所述偏转装置和静电透镜的一个电极共同作用的控制装置,用于向所述电极施加动态电压,所述电压的量取决于所述带电粒子束与所述电极的距离 以提高在与光轴的距离处位于样品上的图像区域处释放的带电粒子的检测效率。

    Optical unit
    2.
    发明授权
    Optical unit 失效
    光学单元

    公开(公告)号:US6051838A

    公开(公告)日:2000-04-18

    申请号:US947226

    申请日:1997-10-08

    IPC分类号: G21K1/087 H01J37/12 H01J3/18

    CPC分类号: H01J37/12 H01J2237/1207

    摘要: An optical unit having an electrostatic lens for influencing a particle beam wherein the lens has at least one first and one second electrode downstream of one another in the direction of the particle beam, each of the electrodes being chargeable with a potential and in electrical contact with a high-resistance body having a channel therethrough for the particle beam. A further component is provided for influencing the particle beam in the region of the electrostatic lens.

    摘要翻译: 一种具有用于影响粒子束的静电透镜的光学单元,其中所述透镜在所述粒子束的方向上具有至少一个第一和第二电极,所述至少一个第一和第二电极在所述粒子束的方向上彼此下游,每个所述电极可被充电并且与电接触 具有用于粒子束的通道的高电阻体。 提供了另一个组件来影响静电透镜区域中的粒子束。

    Electron beam lens
    3.
    发明授权
    Electron beam lens 失效
    电子束透镜

    公开(公告)号:US6107633A

    公开(公告)日:2000-08-22

    申请号:US113048

    申请日:1998-07-09

    CPC分类号: H01J37/145 H01J37/141

    摘要: An electron beam lens has a magnetic lens provided with first and second pole pieces for influencing an electron beam and forming a magnetic field between the two pole pieces. A third pole piece is provided, but is not in magnetic contact with the two other pole pieces. The third pole piece is immersed in the magnetic field formed between the first and second pole pieces and extracts a part of such magnetic field. Also disclosed is a cathode lens and an electron beam device for use with such an electron beam lens.

    摘要翻译: 电子束透镜具有设置有用于影响电子束并在两个极片之间形成磁场的第一和第二极片的磁性透镜。 提供第三极靴,但不与另外两个极片磁接触。 第三极片浸入形成在第一和第二极片之间的磁场中,并提取这种磁场的一部分。 还公开了一种用于这种电子束透镜的阴极透镜和电子束装置。

    Charged particle beam device with aperture
    4.
    发明授权
    Charged particle beam device with aperture 有权
    带孔的带电粒子束装置

    公开(公告)号:US07763866B2

    公开(公告)日:2010-07-27

    申请号:US10576547

    申请日:2004-10-19

    IPC分类号: G21K5/00

    CPC分类号: H01J37/09 H01J2237/0455

    摘要: The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

    摘要翻译: 本发明涉及一种用于检查或构造包括带电粒子束源(5)以产生带电粒子束(7)的样本(3)的带电粒子束装置(1),聚焦透镜(9) 带电粒子束(7)到样品(3)上,以及孔径系统(13),用于限定带电粒子束(7)的孔(6)。 孔径系统(13)包括阻挡带电粒子束源(5)和聚焦透镜(9)之间的带电粒子束(7)的第一部分(7a)的第一构件(20),第二构件 30)阻挡带电粒子束源(5)和聚焦透镜(9)之间的带电粒子束(7)的第二部分(7b),第一装置(24)用于移动第一构件(20)以调整 带电粒子束(7)的阻挡的第一部分(7a)的尺寸以及用于独立于第一部分(7b)移动第二部件(30)的第二装置(34)。 利用这种孔径系统(13),可以在操作期间自由地调整孔径(6)的尺寸并将其对准光轴(8)。

    Double Stage Charged Particle Beam Energy Width Reduction System For Charged Particle Beam System
    5.
    发明申请
    Double Stage Charged Particle Beam Energy Width Reduction System For Charged Particle Beam System 有权
    用于带电粒子束系统的双级带电粒子束能量减少系统

    公开(公告)号:US20070200069A1

    公开(公告)日:2007-08-30

    申请号:US10571347

    申请日:2004-09-02

    IPC分类号: G21K1/08

    摘要: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

    摘要翻译: 本发明涉及例如 用于沿着光轴具有z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件(110)的第一和第二平面,第二元件( 112),第一四极元件(410)被定位成使得在操作中,第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠,第二四极元件 四极元件(412)被定位成使得在操作中,第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠,第一带电粒子选择元件(618)被定位成束 方向,在第一元件以聚焦和分散方式作用之前,第二带电粒子选择元件(616; 716)在光束方向上位于第一元件作用于第一元件 聚焦和分散的方式。 因此,可以实现没有固有分散限制的虚拟色散源状位置。

    Objective lens
    6.
    发明授权
    Objective lens 失效
    物镜

    公开(公告)号:US6104034A

    公开(公告)日:2000-08-15

    申请号:US112953

    申请日:1998-07-09

    CPC分类号: H01J37/145

    摘要: The invention relates to an objective lens for influencing a particle beam, particularly an electron beam with a magnetic single-pole lens and an electrostatic lens having a first and a second electrode which can be supplied with different potentials. The objective lens is characterized in that the electrostatic lens is disposed after the magnetic single-pole lens in the direction of the particle beam.

    摘要翻译: 本发明涉及一种用于影响粒子束的物镜,特别是具有磁性单极透镜的电子束和具有可提供不同电位的第一和第二电极的静电透镜。 物镜的特征在于,静电透镜沿着粒子束的方向设置在磁性单极透镜之后。

    Single stage charged particle beam energy width reduction system for charged particle beam system
    8.
    发明申请
    Single stage charged particle beam energy width reduction system for charged particle beam system 有权
    用于带电粒子束系统的单级带电粒子束能量减小系统

    公开(公告)号:US20070158561A1

    公开(公告)日:2007-07-12

    申请号:US10571345

    申请日:2004-09-02

    IPC分类号: G21K7/00

    摘要: The present invention provides a charged particle beam device. The device comprises a first lens (101; 510) generating a crossover a second lens (102; 512) positioned after the crossover and a element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.

    摘要翻译: 本发明提供一种带电粒子束装置。 所述装置包括产生交叉的第一透镜(101; 510),所述第二透镜位于所述交叉之后,所述第二透镜(102; 512)位于所述交叉之后,并且所述元件以聚焦和分散方式作用在xz平面中,所述元件的中心具有基本相同 z位置作为交叉。 此外,提供了作用于x-z平面和y-z平面的多极元件。 第一带电粒子选择元件和第二带电粒子选择元件用于选择一部分带电粒子。 因此,例如 可以减少带电粒子束的能量宽度。

    Double stage charged particle beam energy width reduction system for charged particle beam system
    9.
    发明授权
    Double stage charged particle beam energy width reduction system for charged particle beam system 有权
    用于带电粒子束系统的双级带电粒子束能量减小系统

    公开(公告)号:US07679054B2

    公开(公告)日:2010-03-16

    申请号:US10571347

    申请日:2004-09-02

    IPC分类号: H01J49/00

    摘要: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element acting in a focusing and dispersive manner, a second element acting in a focusing and dispersive manner, a first quadrupole element being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

    摘要翻译: 本发明涉及例如 用于带有沿着光轴的z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件的第一和第二平面, 第一四极元件被定位成使得在操作中,第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠,第二四极元件被定位成使得在操作中 第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠,第一带电粒子选择元件沿光束方向定位在第一元件以聚焦和分散方式作用之前,以及 第二带电粒子选择元件在光束方向上位于第一元件以聚焦和分散方式作用之后。 因此,可以实现没有固有分散限制的虚拟色散源状位置。

    Single stage charged particle beam energy width reduction system for charged particle beam system
    10.
    发明授权
    Single stage charged particle beam energy width reduction system for charged particle beam system 有权
    用于带电粒子束系统的单级带电粒子束能量减小系统

    公开(公告)号:US07468517B2

    公开(公告)日:2008-12-23

    申请号:US10571345

    申请日:2004-09-02

    IPC分类号: G21K1/08 H01J37/21 H01J37/20

    摘要: The present invention provides a charged particle beam device. The device comprises a first lens generating a crossover a second lens positioned after the crossover and an element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.

    摘要翻译: 本发明提供一种带电粒子束装置。 该装置包括产生交叉的第一透镜,位于交叉后的第二透镜和以聚焦和分散方式作用在x-z平面中的元件,其中元件的中心具有与交叉点基本相同的z位置。 此外,提供了作用于x-z平面和y-z平面的多极元件。 第一带电粒子选择元件和第二带电粒子选择元件用于选择一部分带电粒子。 因此,例如 可以减少带电粒子束的能量宽度。