摘要:
The invention relates to a charged particle beam device and a method for inspecting a specimen, comprising a source for generating a charged particle beam, an objective lens with an optical axis for focussing said charged particle beam on a specimen, which consists of a magnetic lens and a superimposed electrostatic lens having at least two electrodes, deflection means for deflecting said charged particle beam on said specimen and detector means for detecting charged particles released at said specimen. The invention is further characterized by control means co-acting with said deflection means and one of the electrodes of the electrostatic lens for applying a dynamic voltage to said electrode, the amount of the voltage being dependent on the distance of said charged particle beam from said optical axis at the specimen, in order to increase the efficiency of detecting said charged particles released at image areas being located on the specimen with distance from the optical axis.
摘要:
An optical unit having an electrostatic lens for influencing a particle beam wherein the lens has at least one first and one second electrode downstream of one another in the direction of the particle beam, each of the electrodes being chargeable with a potential and in electrical contact with a high-resistance body having a channel therethrough for the particle beam. A further component is provided for influencing the particle beam in the region of the electrostatic lens.
摘要:
An electron beam lens has a magnetic lens provided with first and second pole pieces for influencing an electron beam and forming a magnetic field between the two pole pieces. A third pole piece is provided, but is not in magnetic contact with the two other pole pieces. The third pole piece is immersed in the magnetic field formed between the first and second pole pieces and extracts a part of such magnetic field. Also disclosed is a cathode lens and an electron beam device for use with such an electron beam lens.
摘要:
The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.
摘要:
The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.
摘要:
The invention relates to an objective lens for influencing a particle beam, particularly an electron beam with a magnetic single-pole lens and an electrostatic lens having a first and a second electrode which can be supplied with different potentials. The objective lens is characterized in that the electrostatic lens is disposed after the magnetic single-pole lens in the direction of the particle beam.
摘要:
The invention relates to a gun lens for generating a particle beam with a cathode, an extraction electrode, an anode and a condenser lens, wherein a deceleration field is generated between the extraction electrode and the anode and the condenser lens produces a magnetic field which is superimposed on both the cathode, the extraction electrode and the anode.
摘要:
The present invention provides a charged particle beam device. The device comprises a first lens (101; 510) generating a crossover a second lens (102; 512) positioned after the crossover and a element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.
摘要:
The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element acting in a focusing and dispersive manner, a second element acting in a focusing and dispersive manner, a first quadrupole element being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.
摘要:
The present invention provides a charged particle beam device. The device comprises a first lens generating a crossover a second lens positioned after the crossover and an element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.