公开(公告)号：US08529454B2

公开(公告)日：2013-09-10

申请号：US12747428

申请日：2008-12-10

Applicant: Jingkuang Chen

Inventor： Jingkuang Chen

IPC: A61B8/00 ,  G02B6/30

CPC classification number: A61B5/0095 ,  A61B5/0086 ,  A61B5/02007 ,  A61B8/0833 ,  A61B8/12 ,  A61B8/4472 ,  A61B8/4483 ,  A61B8/483 ,  A61B2562/028 ,  Y10T29/49826

Abstract: A photoacoustic medical imaging device may include a substrate, an array of ultrasonic transducers on the substrate, at least one groove etched on the substrate, at least one optical fiber, and at least one facet. Each optical fiber is disposed in one of the grooves. Each facet is etched in one of the grooves and coated with a layer of metal having high infrared reflectivity. Each optical fiber is configured to guide infrared light from a light source through the fiber and toward the respective facet. The facet is configured to reflect the infrared light toward a target.

公开(公告)号：US07349236B2

公开(公告)日：2008-03-25

申请号：US11166297

申请日：2005-06-24

Applicant: Pinyen Lin ,  Jingkuang Chen ,  Jun Ma

Inventor： Pinyen Lin ,  Jingkuang Chen ,  Jun Ma

IPC: G11C11/00

CPC classification number: G11C23/00 ,  B82Y10/00 ,  G11B9/04 ,  G11B9/06

Abstract: A memory cell uses a pair of cantilevers to store a bit of information. Changing the relative position of the cantilevers determines whether they are electrically conducting or not. The on and off state of this mechanical latch is switched by using, for example, electrostatic, electromagnetic or thermal forces applied sequentially on the two cantilevers to change their relative position. The amount of power required to change the state of the cell is reduced by supporting at least one of the cantilevers with at least one lateral projection that is placed in torsion during cantilever displacement. After a bit of data is written, the cantilevers are locked by mechanical forces inherent in the cantilevers and will not change state unless a sequential electrical writing signal is applied. The sequential nature of the required writing signal makes inadvertent, radiation or noise related data corruption unlikely.

Abstract translation: 存储单元使用一对悬臂来存储一些信息。 改变悬臂的相对位置确定它们是否导电。 通过使用例如依次施加在两个悬臂上的静电，电磁或热力来改变其相对位置来切换该机械闩锁的开和关状态。 通过在至少一个横向突起处支撑至少一个横向突起来减小悬臂状态改变所需的功率量，所述至少一个横向突起在悬臂位移期间处于扭转状态。 在写入一些数据之后，悬臂由悬臂中固有的机械力锁定，除非应用顺序的电气写入信号，否则不会改变状态。 所需写入信号的顺序性质使得无意中，辐射或噪声相关的数据损坏不太可能。

公开(公告)号：US20060114291A1

公开(公告)日：2006-06-01

申请号：US10999210

申请日：2004-11-30

Applicant: Jingkuang Chen ,  Nancy Jia ,  Pinyen Lin

Inventor： Jingkuang Chen ,  Nancy Jia ,  Pinyen Lin

IPC: B41J2/04

CPC classification number: B41J2/1645 ,  B41J2/14314 ,  B41J2/16 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2/1642

Abstract: Fluid ejection devices include a substrate having a cavity, a counter electrode formed on the substrate, a actuator membrane formed on the substrate, a roof layer formed on the substrate and a nozzle formed in the roof layer. Methods for forming fluid ejection devices include forming a cavity in a substrate, forming a counter electrode on the substrate, forming a actuator membrane on the substrate, forming a roof layer on the substrate and forming a nozzle in the roof layer.

Abstract translation: 流体喷射装置包括具有空腔的基板，形成在基板上的对电极，形成在基板上的致动器膜，形成在基板上的顶层和形成在屋顶层中的喷嘴。 用于形成流体喷射装置的方法包括在基板中形成空腔，在基板上形成对电极，在基板上形成致动器膜，在基板上形成屋顶层，并在屋顶层中形成喷嘴。

公开(公告)号：US06362512B1

公开(公告)日：2002-03-26

申请号：US09468423

申请日：1999-12-21

Applicant: Joel A. Kubby ,  Jingkuang Chen ,  Alex T. Tran

Inventor： Joel A. Kubby ,  Jingkuang Chen ,  Alex T. Tran

IPC: H01L2982

CPC classification number: B81B3/0083 ,  B81C2201/0109 ,  B81C2201/019 ,  B81C2201/0191 ,  B81C2201/053 ,  G02B6/4214

Abstract: A device structure is defined in a single-crystal silicon (SCS) layer separated by an insulator layer, such as an oxide layer, from a handle wafer. The SCS can be attached to the insulator by wafer bonding, and is selectively etched, as by photolithographic patterning and dry etching. A sacrificial oxide layer can be deposited on the etched SCS, on which polysilicon can be deposited. A protective oxide layer is deposited, and CMOS circuitry and sensors are integrated. Silicon microstructures with sensors connected to CMOS circuitry are released. In addition, holes can be etched through the sacrificial oxide layer, sacrificial oxide can be deposited on the etched SCS, polysilicon can be deposited on the sacrificial oxide, PSG can be deposited on the polysilicon layer, which both can then be patterned.

Abstract translation: 器件结构被限定在由来自处理晶片的绝缘体层（例如氧化物层）分离的单晶硅（SCS）层中。 SCS可以通过晶片接合连接到绝缘体，并且通过光刻图案和干蚀刻被选择性地蚀刻。 可以在蚀刻的SCS上沉积牺牲氧化物层，在其上沉积多晶硅。 沉积保护性氧化物层，并集成CMOS电路和传感器。 释放了连接到CMOS电路的传感器的硅微结构。 此外，可以通过牺牲氧化物层蚀刻孔，牺牲氧化物可以沉积在蚀刻的SCS上，多晶硅可以沉积在牺牲氧化物上，PSG可以沉积在多晶硅层上，然后可以对其进行图案化。

公开(公告)号：US06249346B1

公开(公告)日：2001-06-19

申请号：US09467185

申请日：1999-12-20

Applicant: Jingkuang Chen ,  Joel A. Kubby

Inventor： Jingkuang Chen ,  Joel A. Kubby

IPC: G01J336

CPC classification number: G01J3/18 ,  G01J3/02 ,  G01J3/0218 ,  G01J3/0256 ,  G01J3/0259 ,  G01J3/2803

Abstract: A micro spectrophotometer is monolithically constructed on a silicon substrate. The spectrophotometer includes a concave grating, which is used for dispersing optical waves as well as focusing reflected light onto a photodiode array sited on a silicon bridge. The silicon bridge is bent 90° from the surface of the silicon substrate in order to orthogonally intersect the output light from the grating. A precision notch is defined in the silicon substrate for coupling to an optical input fiber. Signal processing circuitry is etched on the substrate using conventional CMOS processes for initial processing of information received from the photodiode array.

Abstract translation: 微型分光光度计在硅衬底上单片构造。 分光光度计包括凹光栅，其用于分散光波以及将反射光聚焦到位于硅桥上的光电二极管阵列上。 硅桥从硅衬底的表面弯曲90°，以便与光栅的输出光正交相交。 在硅衬底中限定了用于耦合到光输入光纤的精密凹口。 使用常规CMOS工艺在衬底上蚀刻信号处理电路，用于对从光电二极管阵列接收的信息进行初始处理。

公开(公告)号：US08058182B2

公开(公告)日：2011-11-15

申请号：US12495827

申请日：2009-07-01

Applicant: Chingwen Yeh ,  James B. Boyce ,  Kathleen Boyce, legal representative ,  Jingkuang Chen ,  Feixia Pan ,  Joel A. Kubby

Inventor： Chingwen Yeh ,  James B. Boyce ,  Jingkuang Chen ,  Feixia Pan ,  Joel A. Kubby

IPC: H01L21/469

CPC classification number: B81C1/00158 ,  Y10T29/42

Abstract: Method and device for forming a membrane includes providing a glass substrate, and depositing a thin layer of chromium on the glass substrate. The thin layer of chromium is patterned to form a deflection electrode and interconnect leads. A sacrificial layer of aluminum is deposited on top of the patterned chromium layer, then the sacrificial layer is patterned to define anchor regions. On top of the sacrificial layer, a thick layer of chromium is deposited, and the thick layer of chromium is patterned to form a membrane. The sacrificial layer is then etched to release the membrane.

Abstract translation: 用于形成膜的方法和装置包括提供玻璃基板，以及在玻璃基板上沉积薄层的铬。 图案化薄层的铬以形成偏转电极和互连引线。 在图案化的铬层的顶部上沉积铝的牺牲层，然后将牺牲层图案化以限定锚定区域。 在牺牲层的顶部，沉积厚厚的铬层，并且将厚的铬层图案化以形成膜。 然后蚀刻牺牲层以释放膜。

公开(公告)号：US07226146B2

公开(公告)日：2007-06-05

申请号：US10999210

申请日：2004-11-30

Applicant: Jingkuang Chen ,  Nancy Y Jia ,  Pinyen Lin

Inventor： Jingkuang Chen ,  Nancy Y Jia ,  Pinyen Lin

IPC: B41J2/04

CPC classification number: B41J2/1645 ,  B41J2/14314 ,  B41J2/16 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2/1642

Abstract: Fluid ejection devices include a substrate having a cavity, a counter electrode formed on the substrate, a actuator membrane formed on the substrate, a roof layer formed on the substrate and a nozzle formed in the roof layer. Methods for forming fluid ejection devices include forming a cavity in a substrate, forming a counter electrode on the substrate, forming a actuator membrane on the substrate, forming a roof layer on the substrate and forming a nozzle in the roof layer.

Abstract translation: 流体喷射装置包括具有空腔的基板，形成在基板上的对电极，形成在基板上的致动器膜，形成在基板上的顶层和形成在屋顶层中的喷嘴。 用于形成流体喷射装置的方法包括在基板中形成空腔，在基板上形成对电极，在基板上形成致动器膜，在基板上形成屋顶层，并在屋顶层中形成喷嘴。

公开(公告)号：US20060163680A1

公开(公告)日：2006-07-27

申请号：US11320921

申请日：2005-12-30

Applicant: Jingkuang Chen

Inventor： Jingkuang Chen

IPC: H01L29/84

CPC classification number: A61M37/00

Abstract: A medical device may include a micro-machined substrate, at least one thermo-electric assembly associated with the substrate, and a cooling system configured to configured to remove heat from the a region of the substrate proximal the substrate. According to various aspects, a method of clearing plaque from a blood vessel may include implanting a micro-device in the blood vessel, wherein the micro-device may include at least one ultrasonic transducer, and operably controlling the micro-device to emit high frequency ultrasonic waves for breaking up said plaque.

公开(公告)号：US20050095790A1

公开(公告)日：2005-05-05

申请号：US10990711

申请日：2004-11-17

Applicant: Jingkuang Chen ,  Yi Su

Inventor： Jingkuang Chen ,  Yi Su

IPC: H01L27/14 ,  H01L21/8234 ,  H01L21/8238 ,  H01L21/84 ,  H01L27/06 ,  H01L27/08 ,  H01L27/092 ,  H01L27/12 ,  H01L29/786 ,  H01L49/00 ,  H01L21/00

CPC classification number: B81C1/00246 ,  B81B2201/047 ,  B81C2203/0735 ,  H01L21/823493 ,  H01L21/823892 ,  H01L21/84 ,  H01L27/0617 ,  H01L27/1203

Abstract: A heterogeneous device comprises a substrate and a plurality of heterogeneous circuit devices defined in the substrate. In embodiments, a plurality of heterogeneous circuit devices are integrated by successively masking and ion implanting the substrate. The heterogeneous device may further comprise at least one microelectromechanical system-based element and/or at least one photodiode. In embodiments, the heterogeneous circuit devices comprise at least one CMOS transistor and at least one DMOS transistor. In embodiments, the substrate comprises a layer of silicon or a layer of p-type silicon. In other embodiments, the substrate comprises a silicon-on-insulator wafer comprising a single-crystal-silicon layer or a single-crystal-P-silicon layer, a substrate and an insulator layer therebetween.

公开(公告)号：US06658179B2

公开(公告)日：2003-12-02

申请号：US09986395

申请日：2001-11-08

Applicant: Joel A. Kubby ,  Pinyen Lin ,  Jingkuang Chen ,  Yi Su

Inventor： Joel A. Kubby ,  Pinyen Lin ,  Jingkuang Chen ,  Yi Su

IPC: G02B612

CPC classification number: G02B6/356 ,  G02B6/12021 ,  G02B6/12033 ,  G02B6/2938 ,  G02B6/3508 ,  G02B6/3512 ,  G02B6/3584 ,  G02B6/3596 ,  G02B2006/12061 ,  G02B2006/12097 ,  G02B2006/12107 ,  G02B2006/12145 ,  G02B2006/12164

Abstract: A silicon demultiplexer, a plurality of silicon switches and a silicon multiplexer are monolithically integrated on a single silicon chip. In embodiments, the silicon demultiplexer and the silicon multiplexer each comprise a diffraction grating. In other embodiments, the silicon demultiplexer and the silicon multiplexer each comprise an arrayed waveguide grating. In various exemplary embodiments, the silicon optical switches comprise optical switches, micromachined torsion mirrors, electrostatic micromirrors, and/or tilting micromirrors. In use, an optical signal comprising a multiplexed data stream is input into the monolithic reconfigurable optical multiplexer. An optical signal that comprises a modified multiplexed data stream may be output. In an optical communications system, the silicon demultiplexer communicates with an input optical fiber, the plurality of silicon optical switches communicate between the silicon demultiplexer and the silicon multiplexer, and the silicon multiplexer communicates with an output optical fiber. In various embodiments, the optical switches are fabricated to be self-aligned.

Abstract translation: 硅解复用器，多个硅开关和硅多路复用器单片集成在单个硅芯片上。 在实施例中，硅解复用器和硅多路复用器各自包括衍射光栅。 在其他实施例中，硅解复用器和硅多路复用器均包括阵列波导光栅。 在各种示例性实施例中，硅光开关包括光开关，微机械扭转镜，静电微镜和/或倾斜微镜。 在使用中，包括复用数据流的光信号被输入到单片可重构光复用器。 可以输出包括修改的多路复用数据流的光信号。 在光通信系统中，硅解复用器与输入光纤通信，多个硅光开关在硅解复用器和硅多路复用器之间通信，并且硅复用器与输出光纤通信。 在各种实施例中，光开关被制造成自对准。