Measuring stresses in multi-layer thin film systems with variable film thickness
    9.
    发明授权
    Measuring stresses in multi-layer thin film systems with variable film thickness 有权
    在具有可变膜厚度的多层薄膜系统中测量应力

    公开(公告)号:US07930113B1

    公开(公告)日:2011-04-19

    申请号:US12105238

    申请日:2008-04-17

    IPC分类号: G01L1/00

    CPC分类号: G01L5/0047 G01L1/24

    摘要: Systems are described that include computer program products that enable data processing apparatus to perform operations to determine stresses for a system including a substrate with a plurality of films layered thereon. The operations include determining film stresses and system curvatures in terms of misfit strains and thicknesses the plurality of films, determining film stresses and interface shear stresses in terms of system curvature and the thicknesses of each film, and transmitting the film stresses and the interface shear stresses to a computer-readable medium.

    摘要翻译: 描述了包括计算机程序产品的系统,使计算机程序产品能够使数据处理设备执行操作以确定包括其上分层有多个膜的基板的系统的应力。 这些操作包括根据多个膜的失配应变和厚度来确定膜应力和系统曲率,根据系统曲率和每个膜的厚度确定膜应力和界面剪切应力,以及传递膜应力和界面剪切 强调计算机可读介质。

    Techniques and devices for characterizing spatially non-uniform curvatures and stresses in thin-film structures on substrates with non-local effects
    10.
    发明授权
    Techniques and devices for characterizing spatially non-uniform curvatures and stresses in thin-film structures on substrates with non-local effects 有权
    用于表征具有非局部效应的衬底上的薄膜结构中的空间不均匀曲率和应力的技术和装置

    公开(公告)号:US07487050B2

    公开(公告)日:2009-02-03

    申请号:US11432663

    申请日:2006-05-10

    IPC分类号: G01L1/00

    CPC分类号: G01L5/0047 Y10S438/936

    摘要: Techniques and devices are described to use spatially-varying curvature information of a layered structure to determine stresses at each location with non-local contributions from other locations of the structure. For example, a local contribution to stresses at a selected location on a layered structure formed on a substrate is determined from curvature changes at the selected location and a non-local contribution to the stresses at the selected location is also determined from curvature changes at all locations across the layered structure. Next, the local contribution and the non-local contribution are combined to determine the total stresses at the selected location. Techniques and devices for determining a misfit strain between a film and a substrate on which the film is deposited are also described.

    摘要翻译: 技术和装置被描述为使用分层结构的空间变化的曲率信息来确定每个位置处的应力,其中非局部贡献来自该结构的其他位置。 例如,根据在所选择的位置处的曲率变化来确定在基板上形成的层状结构上的选定位置处的应力的局部贡献,并且还根据曲率变化确定对所选位置处的应力的非局部贡献 分层结构的位置。 接下来,组合本地贡献和非本地贡献以确定所选位置处的总应力。 还描述了用于确定薄膜和沉积薄膜的基板之间的失配应变的技术和装置。