摘要:
A charged particle beam generating apparatus of multi-stage acceleration type includes a charged particle beam source and a multi-stage acceleration tube having a plurality of acceleration electrodes arranged in cascade over a plurality of stages within the tube. A plurality of outer shield electrodes are disposed in concentrical relation on the radially outer side of the multi-stage acceleration tube over the plural stages to be applied with the same potentials as those of the associated acceleration electrodes respectively. Finally, a plurality of dividing resistors are disposed outside of the multi-stage acceleration tube or between the outer shield electrodes and the multi-stage acceleration tube so as to apply predetermined potentials to the acceleration electrodes, respectively.
摘要:
In a field emission electron gun system with a multi-stage acceleration tube comprising a field emission electron source, a field emission electrode for extracting the electrons, a magnetic lens having a magnetic gap between the field emission electron source and the field emission electrode or a magnetic lens having a magnetic pole which also serves as the field emission electrode, and at least two-stages of acceleration electrodes for accelerating the electrons, a magnetization current I for the magnetic lens is changed interlocking with a field emission voltage V.sub.1 applied between the field emission electron source and the field emission electrode so that IN/.sqroot.V.sub.1 (N: the number of windings of the magnetic lens) takes a predetermined value and a first acceleration voltage V.sub.2 applied between the field emission electron source and the first-stage acceleration electrode is changed interlocking with the field emission voltage V.sub.1 so that V.sub.2 /V.sub.1 takes a predetermined value.
摘要:
An exhaust manifold is covered by a manifold heat shield cover and an exhaust pipe is directed downward from the exhaust manifold. In such an engine, a cooling fan is disposed on a front portion of the engine and the exhaust pipe is positioned on the air flow path of the cooling fan. An auxiliary component heat shielding plate is directed from the manifold heat shield cover along a back side of the exhaust pipe. An auxiliary engine component is disposed beneath the manifold heat shield cover on a back side of the auxiliary component heat shielding plate. Between the exhaust pipe and a cylinder block, an air flow guide plate provides an air flow space between the air flow guide plate and the cylinder block. A cooling air flow passing through the air flow space is thus supplied to the auxiliary engine component.
摘要:
There is provided a charged particle radiation device provided with an aberration corrector capable of correcting aberration with high precision in a short time by automatically setting an aberration coefficient measuring condition to thereby realize measurement with high precision. The charged particle radiation device has a feature that a value of defocus and a value of astigma, occurring owing to aberration at the time of the beam tilting, are estimated on the basis of results of aberration measurement, thereby adjusting an electron optical system on the basis of these values.
摘要:
A semiconductor device includes a mask layer having openings on a substrate, a GaN-based semiconductor layer selectively formed on the substrate with the mask layer that serves as a mask, a gate electrode and either a source electrode or an emitter electrode formed on the GaN-based semiconductor layer, and a drain electrode or a collector electrode connected on a surface of the first semiconductor layer that faces the GaN-based semiconductor layer or an opposite side of the first semiconductor layer.
摘要:
The present invention provides a stable charged particle beam apparatus to enable high-resolution observation by reducing the influence of the noise of a large number of power supplies used in an aberration corrector. The charged particle beam apparatus that has: an SEM column for irradiating an electron beam onto a specimen and making the electron beam scan it; a specimen chamber for housing a specimen stage on which the specimen is placed and held; a detector for detecting secondary electrons generated by the scanning of the electron beam; display means for displaying an output signal of the detector as an SEM image; and a control unit for controlling component parts including the SEM column, the specimen chamber, and the display means. The SEM column has a pair of accelerating electrodes and an aberration corrector that is placed between the pair of accelerating electrodes and corrects aberration of the electron beam, and accelerates the electron beam during a period when being transmitted through the aberration corrector by a high voltage being impressed across the pair of accelerating electrodes.
摘要:
A tilted illumination observation method and observation device with easy adjustment, high speed, good reproducibility and low cost is provided. A high resolution tilt image of a specimen is obtained by extracting the blurring on the scanning spot occurring during beam tilt from the image (step 6) captured by the tilted beam, and the image (step 4) captured from directly above the standard specimen; and then deconvoluting (step 11, 12) the tilted image of the target specimen (step 10) using the extracted scanning spot from the oblique beam.
摘要:
A focused charged particle beam apparatus including an aberration corrector, capable of finding the absolute value of the aberration coefficient at high speed, and capable of making high-accuracy adjustments at high speed. A deflection coil tilts the input beam relative to the object point, and measures the defocus data and aberration quantity at high speed while the beam is tilted from one image, and perform least squares fitting on these results to find the absolute value of the aberration coefficient prior to tilting the beam, and to adjust the aberration corrector.
摘要:
A scanning charged particle microscope which facilitates adjustment, has a deep focal depth, and is provided with an aberration correction means. The state of aberration correction is judged from a SEM image by using a stop having plural openings and the judgment result is fed back to the adjustment of the aberration correction means. A stop of a nearly orbicular zone shape is used in combination with the aberration correction means.
摘要:
A semiconductor device includes a substrate, a GaN-based semiconductor layer formed on the substrate, a gate electrode embedded in the GaN-based semiconductor layer, a source electrode and a drain electrode formed on both sides of the gate electrode, a first recess portion formed between the gate electrode and the source electrode, and a second recess portion formed between the gate electrode and the drain electrode. The first recess portion has a depth deeper than that of the second recess portion.