Optical Metrology Tool Equipped with Modulated Illumination Sources
    1.
    发明申请
    Optical Metrology Tool Equipped with Modulated Illumination Sources 审中-公开
    配有调制照明源的光学计量工具

    公开(公告)号:US20170016815A1

    公开(公告)日:2017-01-19

    申请号:US15217549

    申请日:2016-07-22

    Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.

    Abstract translation: 该系统包括被配置为照亮设置在样品台上的样品的表面的可调制照明源,被配置为检测从样品表面发出的照射的检测器,被配置为将来自可调节照明源的照明引导到 所述样品,集合光学器件被配置为将样品的表面的照射引导到所述检测器;以及调制控制系统,其通信地耦合到所述可调节照明源,其中所述调制控制系统被配置为调制所述可调节照明源的驱动电流 选择的调制频率,其适于产生具有选定的相干特征长度的照明。 此外,本发明包括多个光源的输出的时间顺序交错以产生用于多波长时间顺序光学测量的周期性脉冲串。

    MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS
    2.
    发明申请
    MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 有权
    多个角度的半导体计量系统和方法

    公开(公告)号:US20140375981A1

    公开(公告)日:2014-12-25

    申请号:US14043783

    申请日:2013-10-01

    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

    Abstract translation: 一种装置包括(i)用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源,(ii)照明光学器件,用于将照明光束以可选择的角度集合 (AOI)或方位角(AZ)和极化状态以提供光谱椭偏仪,其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器,(iii )收集光学器件,用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束,以及(v) 控制器,用于基于输出信号或图像来表征样本的特征。

    MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS
    3.
    发明申请
    MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 有权
    多个角度的半导体计量系统和方法

    公开(公告)号:US20150285735A1

    公开(公告)日:2015-10-08

    申请号:US14745047

    申请日:2015-06-19

    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

    Abstract translation: 一种装置包括(i)用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源,(ii)照明光学器件,用于将照明光束以可选择的角度集合 (AOI)或方位角(AZ)和极化状态以提供光谱椭偏仪,其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器,(iii )收集光学器件,用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束,以及(v) 控制器,用于基于输出信号或图像来表征样本的特征。

    Apparatus and method of measuring roughness and other parameters of a structure
    4.
    发明授权
    Apparatus and method of measuring roughness and other parameters of a structure 有权
    测量结构的粗糙度和其他参数的装置和方法

    公开(公告)号:US08982358B2

    公开(公告)日:2015-03-17

    申请号:US13740464

    申请日:2013-01-14

    CPC classification number: G01B9/02 G01B11/24 G01B2210/56

    Abstract: Systems and methods are presented to enhance and isolate residual signals indicative of the speckle field based on measurements taken by optically based metrology systems. Structural irregularities such as roughness and topographical errors give rise to light scattered outside of the specularly reflected component of the diffracted light. The scattered light interferes constructively or destructively with the specular component in a high numerical aperture illumination and detection system to form a speckle field. Various methods of determining residual signals indicative of the speckle field are presented. Furthermore, various methods of determining structural irregularities based on analysis of the residual signals are presented. In various embodiments, illumination with a high degree of spatial coherence is provided over any of a wide range of angles of incidence, multiple polarization channels, and multiple wavelength channels. In addition, diffracted light is collected over a wide range of angles of detection.

    Abstract translation: 提出了系统和方法,以基于光学测量系统所采取的测量来增强和分离指示散斑场的残留信号。 诸如粗糙度和形貌错误的结构不规则导致散射在衍射光的镜面反射分量之外的光。 散射光在高数值孔径照明和检测系统中与镜面分量建设性或破坏性地干涉以形成斑点。 提出了确定表示斑点的残余信号的各种方法。 此外,提出了基于剩余信号分析确定结构不规则性的各种方法。 在各种实施例中,在宽范围的入射角,多个极化通道和多个波长通道中的任何一个上提供具有高度空间相干性的照明。 另外,在宽范围的检测角度收集衍射光。

    Apparatus And Method Of Measuring Roughness And Other Parameters Of A Structure
    5.
    发明申请
    Apparatus And Method Of Measuring Roughness And Other Parameters Of A Structure 有权
    测量结构的粗糙度和其他参数的装置和方法

    公开(公告)号:US20130182263A1

    公开(公告)日:2013-07-18

    申请号:US13740464

    申请日:2013-01-14

    CPC classification number: G01B9/02 G01B11/24 G01B2210/56

    Abstract: Systems and methods are presented to enhance and isolate residual signals indicative of the speckle field based on measurements taken by optically based metrology systems. Structural irregularities such as roughness and topographical errors give rise to light scattered outside of the specularly reflected component of the diffracted light. The scattered light interferes constructively or destructively with the specular component in a high numerical aperture illumination and detection system to form a speckle field. Various methods of determining residual signals indicative of the speckle field are presented. Furthermore, various methods of determining structural irregularities based on analysis of the residual signals are presented. In various embodiments, illumination with a high degree of spatial coherence is provided over any of a wide range of angles of incidence, multiple polarization channels, and multiple wavelength channels. In addition, diffracted light is collected over a wide range of angles of detection.

    Abstract translation: 提出了系统和方法,以基于光学测量系统所采取的测量来增强和分离指示散斑场的残留信号。 诸如粗糙度和形貌错误的结构不规则导致散射在衍射光的镜面反射分量之外的光。 散射光在高数值孔径照明和检测系统中与镜面分量建设性或破坏性地干涉以形成斑点。 提出了确定表示斑点的残余信号的各种方法。 此外,提出了基于剩余信号分析确定结构不规则性的各种方法。 在各种实施例中,在宽范围的入射角,多个极化通道和多个波长通道中的任何一个上提供具有高度空间相干性的照明。 另外,在宽范围的检测角度收集衍射光。

    Optical metrology tool equipped with modulated illumination sources

    公开(公告)号:US10969328B2

    公开(公告)日:2021-04-06

    申请号:US16284950

    申请日:2019-02-25

    Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.

    Optical metrology tool equipped with modulated illumination sources

    公开(公告)号:US10215688B2

    公开(公告)日:2019-02-26

    申请号:US15217549

    申请日:2016-07-22

    Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.

    Optical metrology tool equipped with modulated illumination sources
    8.
    发明授权
    Optical metrology tool equipped with modulated illumination sources 有权
    配有调制照明光源的光学计量工具

    公开(公告)号:US09400246B2

    公开(公告)日:2016-07-26

    申请号:US13648768

    申请日:2012-10-10

    Abstract: The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.

    Abstract translation: 本发明可以包括被配置为照亮设置在样品台上的样品的表面的可调节照明源,被配置为检测从样品的表面发出的照明的检测器,被配置为将来自可调节照明源的照明引导到 样品的表面,被配置为将样品的表面的照射引导到检测器的收集光学器件,以及通信地耦合到可调节照明源的调制控制系统,其中调制控制系统被配置为调制可调节照明的驱动电流 源,其以适于产生具有选定的相干特征长度的照明的选定调制频率。 此外,本发明包括多个光源的输出的时间顺序交错以产生用于多波长时间顺序光学测量的周期性脉冲串。

    Metrology system optimization for parameter tracking
    10.
    发明授权
    Metrology system optimization for parameter tracking 有权
    用于参数跟踪的计量系统优化

    公开(公告)号:US09255877B2

    公开(公告)日:2016-02-09

    申请号:US14278224

    申请日:2014-05-15

    Abstract: Methods and systems for evaluating the capability of a measurement system to track measurement parameters through a given process window are presented herein. Performance evaluations include random perturbations, systematic perturbations, or both to effectively characterize the impact of model errors, metrology system imperfections, and calibration errors, among others. In some examples, metrology target parameters are predetermined as part of a Design of Experiments (DOE). Estimated values of the metrology target parameters are compared to the known DOE parameter values to determine the tracking capability of the particular measurement. In some examples, the measurement model is parameterized by principal components to reduce the number of degrees of freedom of the measurement model. In addition, exemplary methods and systems for optimizing the measurement capability of semiconductor metrology systems for metrology applications subject to process variations are presented.

    Abstract translation: 本文介绍了用于评估测量系统通过给定过程窗口跟踪测量参数的能力的方法和系统。 性能评估包括随机扰动,系统扰动或两者,以有效表征模型误差,计量系统缺陷和校准误差等的影响。 在一些示例中,度量目标参数被预先确定为实验设计(DOE)的一部分。 将度量目标参数的估计值与已知的DOE参数值进行比较,以确定特定测量的跟踪能力。 在一些示例中,测量模型由主要组件参数化,以减少测量模型的自由度数。 此外,提出了用于优化用于受过程变化的度量应用的半导体测量系统的测量能力的示例性方法和系统。

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