Oxide electronic device and method for manufacturing the same
    2.
    发明授权
    Oxide electronic device and method for manufacturing the same 有权
    氧化物电子器件及其制造方法

    公开(公告)号:US08890142B2

    公开(公告)日:2014-11-18

    申请号:US13774722

    申请日:2013-02-22

    Abstract: Provided is an oxide electronic device, including: an oxide substrate; an oxide thin film layer formed on the oxide substrate and containing an oxide that is heterogeneous with respect to the oxide substrate; and a ferroelectric layer formed on the oxide thin film layer and controlling electric conductivity of two-dimensional electron gas (2DEG) generated at an interface between the oxide substrate and the oxide thin film layer. Provided also is a method for manufacturing an oxide electronic device, including: depositing, on an oxide substrate, an oxide that is heterogeneous with respect to the oxide substrate to form an oxide thin film layer; and forming a ferroelectric layer on the oxide thin film layer, wherein the ferroelectric layer controls electric conductivity of 2DEG generated at an interface between the oxide substrate and the oxide thin film layer.

    Abstract translation: 提供一种氧化物电子器件,包括:氧化物衬底; 氧化物薄膜层,其形成在所述氧化物基板上并且含有相对于所述氧化物基板为异质的氧化物; 以及形成在所述氧化物薄膜层上并且控制在所述氧化物衬底和所述氧化物薄膜层之间的界面处产生的二维电子气(2DEG)的导电性的铁电层。 还提供了一种氧化物电子器件的制造方法,包括:在氧化物衬底上沉积相对于氧化物衬底是异质的氧化物以形成氧化物薄膜层; 以及在所述氧化物薄膜层上形成铁电体层,其中所述铁电体层控制在所述氧化物基板和所述氧化物薄膜层之间的界面处产生的2DEG的导电性。

    METHOD OF FABRICATING OXIDE THIN FILM DEVICE USING LASER LIFT-OFF AND OXIDE THIN FILM DEVICE FABRICATED BY THE SAME
    3.
    发明申请
    METHOD OF FABRICATING OXIDE THIN FILM DEVICE USING LASER LIFT-OFF AND OXIDE THIN FILM DEVICE FABRICATED BY THE SAME 有权
    使用激光剥离和氧化物薄膜装置制造氧化物薄膜装置的方法

    公开(公告)号:US20130334522A1

    公开(公告)日:2013-12-19

    申请号:US13713396

    申请日:2012-12-13

    Abstract: Provided is a method of fabricating an oxide thin film device using laser lift-off and an oxide thin film device fabricated by the same. The method includes: forming an oxide thin film on a growth substrate; bonding a temporary substrate on the oxide thin film; irradiating laser onto the growth substrate to separate the oxide thin film on which the temporary substrate has been bonded from the growth substrate; bonding a device substrate on the oxide thin film on which the temporary substrate has been bonded; and forming an upper electrode film on the oxide thin film. Therefore, it is possible to overcome problems caused by a defective layer by transferring an oxide thin film transferred on a polymer-based temporary substrate onto a device substrate, without using an interface on which a defective layer formed due to oxygen diffusion upon laser lift-off is formed.

    Abstract translation: 提供一种使用激光剥离制造氧化物薄膜器件的方法和由其制造的氧化物薄膜器件。 该方法包括:在生长衬底上形成氧化物薄膜; 将临时衬底粘结在氧化物薄膜上; 将激光照射到所述生长衬底上以从所述生长衬底分离其上已经结合有所述临时衬底的氧化物薄膜; 将器件衬底接合在已经结合有临时衬底的氧化物薄膜上; 以及在所述氧化物薄膜上形成上电极膜。 因此,可以通过将在基于聚合物的临时衬底上转移的氧化物薄膜转印到器件衬底上来克服由缺陷层引起的问题,而不使用在激光提升时由于氧扩散而形成的缺陷层的界面, 关闭形成。

    Curved piezoelectric device
    9.
    发明授权

    公开(公告)号:US10217928B2

    公开(公告)日:2019-02-26

    申请号:US15158158

    申请日:2016-05-18

    Abstract: Disclosed is a curved piezoelectric device maximizing an electrical potential of the piezoelectric material corresponding to an external mechanical stress. The curved piezoelectric device includes: a curved substrate; and a piezoelectric material provided on one surface or both surfaces of the curved substrate, wherein when a stress is applied, a neutral plane in which a compressive stress and a tensile stress are balanced is located in the curved substrate, wherein the location of the neutral plane is determined by y1 and y2 of Equation 1 or 2 below, and wherein the location of the neutral plane is controllable by adjusting a thickness (d), a sectional area (A) and a Young's modulus (E) of each of the curved substrate and the piezoelectric material: wherein y 1 = E 2 ⁢ d 2 ⁡ ( d 1 + d 2 ) 2 ⁢ ( E 1 ⁢ d 1 + E 2 ⁢ d 2 ) , y 2 = E 1 ⁢ d 1 ⁡ ( d 1 + d 2 ) 2 ⁢ ( E 1 ⁢ d 1 + E 2 ⁢ d 2 ) ⁢ ⁢ and Equation ⁢ ⁢ 1 y 1 = E 2 ⁢ A 2 ⁡ ( A 1 + A 2 ) 2 ⁢ ( E 1 ⁢ A 1 + E 2 ⁢ A 2 ) , y 2 = E 1 ⁢ A 1 ⁡ ( A 1 + A 2 ) 2 ⁢ ( E 1 ⁢ A 1 + E 2 ⁢ A 2 ) . Equation ⁢ ⁢ 2

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