Method of measuring a voltage with an electron beam apparatus
    1.
    发明授权
    Method of measuring a voltage with an electron beam apparatus 失效
    用电子束装置测量电压的方法

    公开(公告)号:US5300880A

    公开(公告)日:1994-04-05

    申请号:US854531

    申请日:1992-03-19

    CPC分类号: G01R31/305

    摘要: A method of measuring a voltage with an electron beam apparatus considers a change in a convergence factor due to a change in an S curve, as well as an error in a secondary electron signal level with a phase of measurement being scanned at random, to accurately measure the voltage. The method measures the voltage of a voltage measuring spot on a sample, prepares an analytic voltage by superimposing a probe voltage having an average of 0 V and no correlation with the measured voltage on the measured voltage, measures a secondary electron signal level with the analytic voltage, computes a convergence factor around a slice level set on the S curve according to a correlation between the secondary electron signal level and the probe voltage and according to an autocorrelation of the probe voltage, and updates the analytic voltage according to the convergence factor, thereby updating the measured voltage.

    摘要翻译: 用电子束装置测量电压的方法考虑到S曲线的变化引起的会聚因子的变化以及随机扫描测量相位的二次电子信号电平的误差,以准确地 测量电压。 该方法测量样品上的电压测量点的电压,通过将平均值为0 V的探针电压叠加在测量电压上与测量电压无关,准备分析电压,用分析仪测量二次电子信号电平 根据二次电子信号电平和探针电压之间的相关关系,根据探头电压的自相关计算S曲线周围设置的限幅电平周围的收敛系数,并根据收敛因数更新分析电压, 从而更新测量的电压。

    Method of measuring a voltage with an electron beam apparatus
    2.
    发明授权
    Method of measuring a voltage with an electron beam apparatus 失效
    用电子束装置测量电压的方法

    公开(公告)号:US5416426A

    公开(公告)日:1995-05-16

    申请号:US176116

    申请日:1993-12-30

    CPC分类号: G01R31/305

    摘要: A method of measuring a voltage with an electron beam apparatus considers a change in a convergence factor due to a change in an S curve, as well as an error in a secondary electron signal level with a phase of measurement being scanned at random, to accurately measure the voltage. The method measures the voltage of a voltage measuring spot on a sample, prepares an analytic voltage by superimposing a probe voltage having an average of 0 V and no correlation with the measured voltage on the measured voltage, measures a secondary electron signal level with the analytic voltage, computes a convergence factor around a slice level set on the S curve according to a correlation between the secondary electron signal level and the probe voltage and according to an autocorrelation of the probe voltage, and updates the analytic voltage according to the convergence factor, thereby updating the measured voltage.

    摘要翻译: 用电子束装置测量电压的方法考虑到S曲线的变化引起的会聚因子的变化以及随机扫描测量相位的二次电子信号电平的误差,以准确地 测量电压。 该方法测量样品上的电压测量点的电压,通过将平均值为0 V的探针电压叠加在测量电压上与测量电压无关,准备分析电压,用分析仪测量二次电子信号电平 根据二次电子信号电平和探针电压之间的相关关系,根据探头电压的自相关计算S曲线周围设置的限幅电平周围的收敛系数,并根据收敛因数更新分析电压, 从而更新测量的电压。

    Electron beam tester
    3.
    发明授权
    Electron beam tester 失效
    电子束测试仪

    公开(公告)号:US5825912A

    公开(公告)日:1998-10-20

    申请号:US783304

    申请日:1997-01-10

    摘要: An Electron Beam Tester which corrects deformation of a secondary electron image produced from scanning a sample with an electron beam. The secondary electron image is stored in a storage unit. Luminance data of the stored image is accumulated to obtain a projected luminance distribution. The projected luminance distribution data is then analyzed by a parallelism evaluation unit to obtain a rotation angle. Then the rotation angle is used to determine maximum parallelism and correct deformation of the secondary electron image by providing deflection control which transforms the deflectors .

    摘要翻译: 一种电子束测试仪,用于校正用电子束扫描样品产生的二次电子图像的变形。 二次电子图像被存储在存储单元中。 存储的图像的亮度数据被累积以获得投影亮度分布。 然后通过平行度评估单元分析投影亮度分布数据以获得旋转角度。 然后通过提供变换偏转器的偏转控制,旋转角度用于确定二次电子图像的最大平行度和正确变形。

    Electron beam tester
    4.
    发明授权
    Electron beam tester 失效
    电子束测试仪

    公开(公告)号:US5872862A

    公开(公告)日:1999-02-16

    申请号:US810736

    申请日:1997-02-06

    摘要: An electron beam tester scans a sample with an electron beam to provide a secondary electron image, matches wiring patterns of the secondary electron image with wiring patterns prepared from CAD data, measures voltages of the wiring patterns, and corrects deformation of the secondary electron image. The electron beam tester comprises a pattern matching unit, a wiring pattern tester, a secondary electron image corrector, a wiring pattern inspection unit, and a pattern matching processor. The pattern matching unit simply and quickly matches the wiring patterns of the secondary electron image with the wiring patterns prepared from the CAD data. The wiring pattern tester detects slippage between layers of a multilayered semiconductor chip and correctly positions the electron beam on the chip during a pattern matching operation. The secondary electron image corrector accurately and automatically corrects deformation of the secondary electron image. The wiring pattern inspection unit simply and correctly determines a threshold used for preparing a binary image, to correctly carry out a pattern matching operation. The pattern matching processor accurately detects edges out of a blurred image, to correctly carry out a pattern matching operation.

    摘要翻译: 电子束测试仪用电子束扫描样品以提供二次电子图像,使二次电子图像的配线图案与由CAD数据制备的布线图匹配,测量布线图案的电压并校正二次电子图像的变形。 电子束测试器包括图案匹配单元,布线图案测试器,二次电子图像校正器,布线图案检查单元和图案匹配处理器。 图案匹配单元简单快速地将二次电子图像的布线图案与从CAD数据准备的布线图案相匹配。 布线图案测试仪在模式匹配操作期间检测多层半导体芯片的层之间的滑动并且将电子束正确地放置在芯片上。 二次电子图像校正器精确自动地校正二次电子图像的变形。 布线图案检查单元简单且正确地确定用于准备二值图像的阈值,以正确地执行模式匹配操作。 模式匹配处理器准确地检测模糊图像中的边缘,以正确地执行模式匹配操作。

    Electron beam tester
    5.
    发明授权
    Electron beam tester 失效
    电子束测试仪

    公开(公告)号:US5600734A

    公开(公告)日:1997-02-04

    申请号:US357983

    申请日:1994-12-19

    摘要: An electron beam tester scans a sample with an electron beam to provide a secondary electron image, matches wiring patterns of the secondary electron image with wiring patterns prepared from CAD data, measures voltages of the wiring patterns, and corrects deformation of the secondary electron image. The electron beam tester comprises a pattern matching unit, a wiring pattern tester, a secondary electron image corrector, a wiring pattern inspection unit, and a pattern matching processor. The pattern matching unit simply and quickly matches the wiring patterns of the secondary electron image with the wiring patterns prepared from the CAD data. The wiring pattern tester detects slippage between layers of a multilayered semiconductor chip and correctly positions the electron beam on the chip during a pattern matching operation. The secondary electron image corrector accurately and automatically corrects deformation of the secondary electron image. The wiring pattern inspection unit simply and correctly determines a threshold used for preparing a binary image, to correctly carry out a pattern matching operation. The pattern matching processor accurately detects edges out of a blurred image, to correctly carry out a pattern matching operation.

    摘要翻译: 电子束测试仪用电子束扫描样品以提供二次电子图像,使二次电子图像的配线图案与由CAD数据制备的布线图匹配,测量布线图案的电压并校正二次电子图像的变形。 电子束测试器包括图案匹配单元,布线图案测试器,二次电子图像校正器,布线图案检查单元和图案匹配处理器。 图案匹配单元简单快速地将二次电子图像的布线图案与从CAD数据准备的布线图案相匹配。 布线图案测试仪在模式匹配操作期间检测多层半导体芯片的层之间的滑动并且将电子束正确地放置在芯片上。 二次电子图像校正器精确自动地校正二次电子图像的变形。 布线图案检查单元简单且正确地确定用于准备二值图像的阈值,以正确地执行模式匹配操作。 模式匹配处理器准确地检测模糊图像中的边缘,以正确地执行模式匹配操作。

    Electron beam apparatus for measuring a voltage of a sample
    6.
    发明授权
    Electron beam apparatus for measuring a voltage of a sample 失效
    用于测量样品电压的电子束装置

    公开(公告)号:US5517028A

    公开(公告)日:1996-05-14

    申请号:US341103

    申请日:1994-11-18

    CPC分类号: H01J37/268 G01R31/307

    摘要: An electron beam apparatus comprises, inside of an objective lens for focussing a primary electron beam e1 and irradiating it on a sample surface, a secondary electron energy analyzer having a retarding mesh electrode for analyzing the energy of a secondary electron e2 emitted from a point on the sample surface at which the primary electron beam e1 is irradiated. The secondary electron energy analyzer comprises a collimation unit for forming one or more electrostatic lenses by a nonuniform electrical field distribution and for having an electrostatic lens collimate the trajectory of a secondary electron e2 for its injection into a retarding grids (mesh electrode). The collimation unit comprises at least three cylindrical electrodes positioned between the sample surface and the retarding grid (mesh electrode) and numbered first, second and third from the one closest to the sample surface. An external power supply module applies an appropriate voltage to each of these cylindrical electrodes for having each duo of neighboring cylindrical electrodes form an electrostatic lens.

    摘要翻译: 电子束装置包括在用于聚焦一次电子束e1并将其照射在样品表面上的物镜内部的二次电子能量分析器,其具有用于分析从一点上发射的二次电子e2的能量的延迟网孔电极 一次电子束e1被照射的样品表面。 二次电子能量分析仪包括:准直单元,用于通过不均匀的电场分布形成一个或多个静电透镜,并且具有使静电透镜准直二次电子e2的轨迹以将其注入延迟网格(网状电极)。 准直单元包括位于样品表面和延迟格栅(网状电极)之间的至少三个圆柱形电极,并且距离最接近样品表面的第一,第二和第三编号。 外部电源模块对这些圆柱形电极中的每一个施加适当的电压,以使相邻圆柱形电极的每个二极管形成静电透镜。

    Probing device and system for testing an integrated circuit
    7.
    发明授权
    Probing device and system for testing an integrated circuit 失效
    用于测试集成电路的探测装置和系统

    公开(公告)号:US5331275A

    公开(公告)日:1994-07-19

    申请号:US987959

    申请日:1992-12-09

    摘要: A probing device includes a minute probe in which at least an end portion is formed by conductive material, a cantilever having one end to which the probe is attached, and another end fixed to a moving member movable relatively to a sample in each direction of X, Y and Z, a unit for moving the moving member relatively to the sample, a transducing unit for generating information of voltage or current by means of light, a connecting unit having a low electric resistance, for connecting the transducing unit and the end portion of the probe, a detecting unit for detecting a change in a physical amount occurring in the cantilever by a force caused between the probe and the sample by a relative proximity of the moving member to the sample, and a voltage measuring unit for measuring a voltage at a measurement point on the sample, which is determined based on an output of the detecting unit, by way of the transducing unit when the probe is contacted with the measurement point. By the constitution, it is possible to realize a voltage measurement with both an enhanced space resolution and an enhanced time resolution. Also, by using the probing device in an integrated circuit testing apparatus or system, it is possible to realize a stable probing to a minute wiring without increasing an electrical load with respect to the minute wiring and thus contribute to an improvement in the precision of a voltage measurement.

    摘要翻译: 探测装置包括微小探针,其中至少一个端部由导电材料形成,悬臂具有一个连接有探针的端部,另一端固定在可沿着X方向移动相对于样品的移动部件 ,Y和Z,用于相对于样品移动移动部件的单元,用于通过光产生电压或电流的信息的转换单元,具有低电阻的连接单元,用于连接换能单元和端部 的检测单元,用于通过所述移动构件与所述样本的相对接近来检测由所述探针和所述样本之间产生的力而在所述悬臂中产生的物理量的变化的检测单元,以及用于测量所述电极的电压的电压测量单元 在探针与测量点接触时,通过换能单元,基于检测单元的输出确定样本上的测量点。 通过该结构,可以实现具有增强的空间分辨率和增强的时间分辨率的电压测量。 此外,通过在集成电路检测装置或系统中使用探测装置,可以在不增加相对于微小布线的电负载的情况下实现对微小布线的稳定探测,并且因此有助于提高 电压测量。

    IMAGE-FORMING METHOD AND RECORD
    9.
    发明申请
    IMAGE-FORMING METHOD AND RECORD 有权
    图像形成方法和记录

    公开(公告)号:US20100207973A1

    公开(公告)日:2010-08-19

    申请号:US12707045

    申请日:2010-02-17

    IPC分类号: B41J29/38

    摘要: An image-forming method includes a first image-forming step of forming an image on a fabric with a first ink composition and a second image-forming step of forming an image on the fabric with a second ink composition subsequently to the first image-forming step. The first ink composition contains a first colorant. The second ink composition contains a second colorant. The first colorant has an average particle size less than that of the second colorant.

    摘要翻译: 图像形成方法包括:第一图像形成步骤,用第一墨水组合物在织物上形成图像;以及第二图像形成步骤,用第二墨水组合物在第一图像形成之后在织物上形成图像 步。 第一油墨组合物含有第一着色剂。 第二油墨组合物含有第二着色剂。 第一着色剂的平均粒径小于第二着色剂的平均粒径。