公开(公告)号：US07300881B2

公开(公告)日：2007-11-27

申请号：US10935103

申请日：2004-09-08

申请人： Kazuya Kato ,  Katsuhiko Ono ,  Hideki Mizuno ,  Masahiro Ogasawara ,  Akinori Kitamura ,  Noriyuki Kobayashi ,  Yasushi Inata ,  Shin Okamoto

发明人： Kazuya Kato ,  Katsuhiko Ono ,  Hideki Mizuno ,  Masahiro Ogasawara ,  Akinori Kitamura ,  Noriyuki Kobayashi ,  Yasushi Inata ,  Shin Okamoto

IPC分类号： H01L21/302 ,  H01L21/3065

CPC分类号： H01J37/32082 ,  H01L21/31116 ,  H01L21/31138

摘要： A plasma etching is performed on a substrate having a pattern wherein an interval between neighboring openings formed on a resist mask is equal to or less than 200 nm, wherein the etching is performed by converting a processing gas comprising an active species generating gas which includes a compound having carbon and fluorine, and a nonreactive gas which includes xenon gas into a plasma. The nonreactive gas further includes argon gas.

摘要翻译： 在具有图案的基板上进行等离子体蚀刻，其中形成在抗蚀剂掩模上的相邻开口之间的间隔等于或小于200nm，其中通过将包括活性物质产生气体的处理气体转化为包括 具有碳和氟的化合物，以及包含氙气进入等离子体的非反应性气体。 非反应性气体还包括氩气。

公开(公告)号：US20050101137A1

公开(公告)日：2005-05-12

申请号：US10935103

申请日：2004-09-08

申请人： Kazuya Kato ,  Katsuhiko Ono ,  Hideki Mizuno ,  Masahiro Ogasawara ,  Akinori Kitamura ,  Noriyuki Kobayashi ,  Yasushi Inata ,  Shin Okamoto

发明人： Kazuya Kato ,  Katsuhiko Ono ,  Hideki Mizuno ,  Masahiro Ogasawara ,  Akinori Kitamura ,  Noriyuki Kobayashi ,  Yasushi Inata ,  Shin Okamoto

IPC分类号： H01L21/28 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/768 ,  H01L21/302 ,  H01L21/461

CPC分类号： H01J37/32082 ,  H01L21/31116 ,  H01L21/31138

摘要： A plasma etching is performed on a substrate having a pattern wherein an interval between neighboring openings formed on a resist mask is equal to or less than 200 nm, wherein the etching is performed by converting a processing gas comprising an active species generating gas which includes a compound having carbon and fluorine, and a nonreactive gas which includes xenon gas into a plasma. The nonreactive gas further includes argon gas.

摘要翻译： 在具有图案的基板上进行等离子体蚀刻，其中形成在抗蚀剂掩模上的相邻开口之间的间隔等于或小于200nm，其中通过将包括活性物质产生气体的处理气体转化为包括 具有碳和氟的化合物，以及包含氙气进入等离子体的非反应性气体。 非反应性气体还包括氩气。

公开(公告)号：US08922332B2

公开(公告)日：2014-12-30

申请号：US13098704

申请日：2011-05-02

申请人： Keiichi Nakamachi ,  Katsuhiko Ono ,  Akira Kimura ,  Norio Sato ,  Kimiyuki Nishimura ,  Hideki Takedomi ,  Kingo Maeda

发明人： Keiichi Nakamachi ,  Katsuhiko Ono ,  Akira Kimura ,  Norio Sato ,  Kimiyuki Nishimura ,  Hideki Takedomi ,  Kingo Maeda

IPC分类号： G05B23/00 ,  G05B19/418

CPC分类号： G05B19/4188 ,  Y02P90/18 ,  Y02P90/20 ,  Y02P90/24

摘要： Electronic equipment, including a GPS dongle and a PC, compares an acquired current location position of the electronic equipment with an acquired planned installation position of a machine tool to determine whether or not the current location position is within a predetermined range from the planned installation position. Further, the electronic equipment determines, if it is determined that the current location position is within the predetermined range from the planned installation position, whether or not a predetermined condition has been satisfied. The electronic equipment also performs, if it is determined that the predetermined condition has been satisfied, information input processing on the machine tool to remove activation restriction on the machine tool. In this manner, the electronic equipment can prevent illegal removal of activation restriction on the machine tool.

摘要翻译： 包括GPS加密狗和PC的电子设备将所获取的电子设备的当前位置与所获得的机床的计划安装位置进行比较，以确定当前位置位置是否在距预定安装位置的预定范围内 。 此外，如果确定当前位置位置在从预定安装位置起的预定范围内，则电子设备确定是否已经满足预定条件。 如果确定已经满足预定条件，则电子设备还执行对机床的信息输入处理以消除机床上的激活限制。 以这种方式，电子设备可以防止非法移除机床上的激活限制。

公开(公告)号：US08838265B2

公开(公告)日：2014-09-16

申请号：US13332267

申请日：2011-12-20

申请人： Akira Kimura ,  Katsuhiko Ono

发明人： Akira Kimura ,  Katsuhiko Ono

IPC分类号： G06F19/00 ,  G05B13/00 ,  B25J9/16 ,  G05B19/18 ,  G05B19/25 ,  G05B19/23

CPC分类号： G05B19/184 ,  G05B2219/35128 ,  G05B2219/50353 ,  G05B2219/50355

摘要： A work having a non-circular cross-section is machined by relative movement between the work and a tool, as the relative position and angle between the work and tool are changed at least within a plane including the cross-section of the work. In machining along a preset tool path, the difference between the relative angle at a point on the preset tool path which machining is started and that point on the preset tool path at which machining is finished is calculated. Time needed in machining along the preset tool path is equally divided by a preset number at equal time divisions, and positions on the tool path corresponding to equal time divisions are set as tool path points. When the tool moves through each point, the relative angle is continuously changed an angle corresponding to division of the difference of the relative angles by the preset number of equal time divisions.

摘要翻译： 具有非圆形横截面的工件通过工件和工具之间的相对运动来加工，因为工件和工具之间的相对位置和角度至少在包括工件的横截面的平面内改变。 在沿着预设刀具路径进行加工时，计算加工开始的预设刀具路径上的点处的相对角度与加工完成的预设刀具路径上的点之间的差。 沿着预设刀具路径加工所需的时间，以相等的时间间隔除以预设的数字，刀具路径上相当于时间分割的位置设置为刀具路径点。 当工具移动通过每个点时，相对角度连续地改变与相对角度差的除法相等预定数量的相等时间分割的角度。

公开(公告)号：US5622593A

公开(公告)日：1997-04-22

申请号：US658557

申请日：1996-06-05

申请人： Masashi Arasawa ,  Katsuhiko Ono ,  Hiroshi Nishikawa ,  Kazuo Tsuchiya

发明人： Masashi Arasawa ,  Katsuhiko Ono ,  Hiroshi Nishikawa ,  Kazuo Tsuchiya

IPC分类号： H01L21/302 ,  C23C16/458 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065 ,  H01L21/00

CPC分类号： C23C16/466 ,  C23C16/4586 ,  H01J37/32431 ,  H01J2237/2001

摘要： A plasma processing apparatus comprises a first passage opened in a top of suscepter at a peripheral area thereof, a first gas supply source for supplying heat exchange gas into a small clearance between the suscepter and a wafer through the first passage, a first vacuum pump for exhausting the clearance through the first passage, a second passage opened in the top of the suscepter at a center area thereof, a second gas supply source for supplying heat exchange gas into the clearance through the second passage, a second vacuum pump for exhausting the clearance through the second passage, and a controller for controlling the first and second gas supply sources and the first and second vacuum pumps independently of the others in such a way that backpressure caused in the second passage by the second gas supply source and vacuum pump can become lower than backpressure caused in the first passage by the first gas supply source and vacuum pump.

摘要翻译： 一种等离子体处理装置，包括：在其周边区域的开口的顶部开口的第一通路;第一气体供给源，其通过第一通路将热交换气体供给到所述容器和晶片之间的小间隙;第一真空泵， 通过第一通道排出间隙，第二通道在其中心区域处在容器的顶部开口，第二气体供应源，用于通过第二通道将热交换气体供应到间隙中;第二真空泵，用于排出间隙 通过第二通道，以及用于独立于其他方式控制第一和第二气体供给源以及第一和第二真空泵的控制器，使得由第二气体供应源和真空泵在第二通道中产生的背压可以变成 低于由第一气体供应源和真空泵在第一通道中引起的背压。

公开(公告)号：US20120197424A1

公开(公告)日：2012-08-02

申请号：US13332267

申请日：2011-12-20

申请人： Akira Kimura ,  Katsuhiko Ono

发明人： Akira Kimura ,  Katsuhiko Ono

IPC分类号： G05B19/19

CPC分类号： G05B19/184 ,  G05B2219/35128 ,  G05B2219/50353 ,  G05B2219/50355

摘要： A work having a non-circular cross-section is machined by relative movement between the work and a tool, as the relative position and angle between the work and tool are changed at least within a plane including the cross-section of the work. In machining along a preset tool path, the difference between the relative angle at a point on the preset tool path which machining is started and that point on the preset tool path at which machining is finished is calculated. Time needed in machining along the preset tool path is equally divided by a preset number at equal time divisions, and positions on the tool path corresponding to equal time divisions are set as tool path points. When the tool moves through each point, the relative angle is continuously changed an angle corresponding to division of the difference of the relative angles by the preset number of equal time divisions (FIG. 3).

摘要翻译： 具有非圆形横截面的工件通过工件和工具之间的相对运动来加工，因为工件和工具之间的相对位置和角度至少在包括工件的横截面的平面内改变。 在沿着预设刀具路径进行加工时，计算加工开始的预设刀具路径上的点处的相对角度与加工完成的预设刀具路径上的点之间的差。 沿着预设刀具路径加工所需的时间，以相等的时间间隔除以预设的数字，刀具路径上相当于时间分割的位置设置为刀具路径点。 当工具移动通过每个点时，相对角度连续地改变一个对应于相对角度差除以相等时间间隔的预定数量的角度（图3）。

公开(公告)号：US07471096B2

公开(公告)日：2008-12-30

申请号：US11339836

申请日：2006-01-26

申请人： Naohito Kohashi ,  Shigeyuki Maruyama ,  Yoshikazu Arisaka ,  Hiroyuki Murotani ,  Katsuhiko Ono

发明人： Naohito Kohashi ,  Shigeyuki Maruyama ,  Yoshikazu Arisaka ,  Hiroyuki Murotani ,  Katsuhiko Ono

IPC分类号： G01R31/02

CPC分类号： G01R1/0466 ,  G01R1/0483

摘要： A contactor for electronic parts can provide an appropriate and uniform contact with respect to a plurality of electrode terminals in an electronic part such as an IC. Each of a plurality of contact members has a first contact portion on one end thereof and a second contact portion on the other end thereof, the first contract portion having a recessed portion that receives one of the electrode terminals of the electronic part. A base accommodates and supports the plurality of the contact members. The first contact portion is movable in a horizontal direction.

摘要翻译： 用于电子部件的接触器可以提供相对于诸如IC的电子部件中的多个电极端子的适当且均匀的接触。 多个接触构件中的每一个在其一端具有第一接触部分和另一端的第二接触部分，第一接合部分具有容纳电子部件的电极端子之一的凹部。 基座容纳并支撑多个接触构件。 第一接触部分可沿水平方向移动。

公开(公告)号：US20080098914A1

公开(公告)日：2008-05-01

申请号：US11975238

申请日：2007-10-17

申请人： Hiroyuki Sugiyama ,  Katsuhiko Ono

发明人： Hiroyuki Sugiyama ,  Katsuhiko Ono

IPC分类号： B41F33/14

CPC分类号： B41F13/42 ,  B41F33/0018 ,  B41F33/14 ,  B41P2233/20 ,  B65H2402/441 ,  B65H2407/10 ,  F16P3/08 ,  F16P3/125 ,  F16P3/144

摘要： A rotary body protecting apparatus includes first and second rotary bodies, a cover, a cover detection unit, an optical detector, and a control device. The second rotary body is arranged in the same axial direction as that of the first rotary body and rotates while opposing the first rotary body. The cover opens/closes an opposing position of the first second rotary bodies. The cover detection unit detects a closed state of the cover. The optical detector is close to the opposing position of the first and second rotary bodies and arranged in the vicinity of the ends of the first and second rotary bodies. The optical detector includes a light-projecting portion which projects light in the axial directions of the first and second rotary bodies, and a light-receiving portion which receives the light from the light-projecting portion. The control device stops rotation of the first and second rotary bodies when the optical detector detects that the light-receiving portion does not receive the light from the light-projecting portion. The control device performs one of control of disabling the optical detector and control of invalidating a detection output of the optical detector when the cover detection means detects the closed state of the cover.

摘要翻译： 旋转体保护装置包括第一和第二旋转体，盖，盖检测单元，光检测器和控制装置。 第二旋转体与第一旋转体相同的轴向配置，与第一旋转体相对旋转。 盖打开/关闭第一第二旋转体的相对位置。 盖检测单元检测盖的关闭状态。 光学检测器靠近第一和第二旋转体的相对位置，并布置在第一和第二旋转体的端部附近。 光检测器包括在第一和第二旋转体的轴向上突出的光的投光部和从该光投射部接受的光的受光部。 当光检测器检测到光接收部分没有接收到来自光投射部分的光时，控制装置停止第一和第二旋转体的旋转。 当盖检测装置检测到盖的关闭状态时，控制装置执行禁用光学检测器的控制和使光检测器的检测输出无效的控制。

公开(公告)号：US5657113A

公开(公告)日：1997-08-12

申请号：US384373

申请日：1995-02-03

申请人： Katsuhiko Ono ,  Tsuyoshi Seto ,  Yutaka Watanabe

发明人： Katsuhiko Ono ,  Tsuyoshi Seto ,  Yutaka Watanabe

IPC分类号： G03B27/52 ,  G03B27/54 ,  G03G15/00 ,  G03G15/04 ,  G03G15/043 ,  G03G21/00

CPC分类号： G03G15/043 ,  G03G15/605

摘要： A document exposure apparatus includes a glass plate on which a document original is located, a press cover for covering the glass plate, an open/close discriminating unit for discriminating an open state and a close state of the press cover, an exposure unit, disposed under the glass plate, for illuminating the original with light, and a control unit for controlling the illuminating operation of the exposure unit according to an open/close state of the press cover, which is discriminated by the open/close discriminating unit.

摘要翻译： 文件曝光装置包括：文档原稿所在的玻璃板，用于覆盖玻璃板的压盖，用于识别压盖的打开状态和关闭状态的打开/关闭判别单元，设置在曝光单元 在玻璃板下面，用于用光照射原稿;以及控制单元，用于根据由打开/关闭识别单元区分的按压盖的打开/关闭状态来控制曝光单元的照明操作。

公开(公告)号：US09110458B2

公开(公告)日：2015-08-18

申请号：US13349783

申请日：2012-01-13

申请人： Akira Kimura ,  Koji Yamamoto ,  Katsuhiko Ono ,  Kimiyuki Nishimura ,  Kenichiro Ueno ,  Keiichi Nakamachi

发明人： Akira Kimura ,  Koji Yamamoto ,  Katsuhiko Ono ,  Kimiyuki Nishimura ,  Kenichiro Ueno ,  Keiichi Nakamachi

IPC分类号： G05B19/19 ,  G05D3/10 ,  G05B19/404

CPC分类号： G05B19/404 ,  G05B2219/41056

摘要： A positioning control apparatus has a moving body, a feed device having a guide mechanism for guiding the moving body in the direction of its feed axis and a drive mechanism for moving the moving body, a structural body supporting the feed device and a controller for controlling a moving position of the moving body with respect to a reference position on a machine tool by controlling the operation of the drive mechanism, and further has a calculating section calculating displacement of the feed device in the feed-axis direction with respect to the reference position caused by displacement of the structural body and a compensating section receiving the displacement data measured by the calculating section and adding modification data for eliminating the displacement to a control signal in the controller.

摘要翻译： 定位控制装置具有移动体，具有引导机构的进给装置，该引导机构用于沿着其进给轴线的方向引导移动体，以及用于使移动体移动的驱动机构，支撑进给装置的结构体和控制器 通过控制所述驱动机构的动作，使所述移动体相对于机床上的基准位置的移动位置，还具有计算部，计算所述进给装置相对于所述基准位置的进给轴方向的位移 由结构体的位移引起的补偿部分和接收由计算部分测量的位移数据的补偿部分，并将用于消除位移的修改数据添加到控制器中的控制信号。