EXTRUDED MEMBER OF ALUMINUM ALLOY EXCELLING IN FLEXURAL CRUSHING PERFORMANCE AND CORROSION RESISTANCE AND METHOD FOR PRODUCTION THEREOF
    1.
    发明申请
    EXTRUDED MEMBER OF ALUMINUM ALLOY EXCELLING IN FLEXURAL CRUSHING PERFORMANCE AND CORROSION RESISTANCE AND METHOD FOR PRODUCTION THEREOF 审中-公开
    弹性破碎性能和耐腐蚀性的铝合金挤压成型及其生产方法

    公开(公告)号:US20090242087A1

    公开(公告)日:2009-10-01

    申请号:US12396710

    申请日:2009-03-03

    IPC分类号: C22F1/047 C22C21/16

    CPC分类号: C22C21/06 C22F1/047

    摘要: An extruded member of Al—Mg—Si aluminum alloy specially composed of Mg, Si, Fe, Cu, Zn, Ti, etc. which has the equiaxed re-crystallized grain structure in which intergranular precipitates 1 μm or lager are separate from one another at large average intervals and there are many cube orientations over the entire thickness region thereof so that it excels in both flexural crushing performance and corrosion resistance. The extruded member is suitable for use as automotive body reinforcement members which need outstanding lateral crushing performance under severe collision conditions as well as good corrosion resistance.

    摘要翻译: 特别由Mg,Si,Fe,Cu,Zn,Ti等组成的Al-Mg-Si铝合金的挤压构件,其具有1μm或更大的晶间析出物的等轴再结晶晶粒结构彼此分离 平均间隔较大,并且在其整个厚度区域上具有许多立方体取向,因此其在弯曲破碎性能和耐腐蚀性方面均优异。 挤出部件适用于在严酷的碰撞条件下需要优异的侧向破碎性能以及良好的耐腐蚀性的汽车车身增强件。

    Method for manufacturing an extruded material of heat treatment type Al—Zn—Mg series aluminum alloy
    6.
    发明授权
    Method for manufacturing an extruded material of heat treatment type Al—Zn—Mg series aluminum alloy 有权
    热处理型Al-Zn-Mg系铝合金挤压材料的制造方法

    公开(公告)号:US08876993B2

    公开(公告)日:2014-11-04

    申请号:US13419798

    申请日:2012-03-14

    IPC分类号: C22F1/053

    CPC分类号: C22F1/053 C21D1/673 C22C21/10

    摘要: A casted ingot of a heat treatment type Al—Zn—Mg series aluminum alloy comprising Zn: 4.0-8.0% by mass, Mg: 0.5-2.0% by mass, Cu: 0.05-0.5% by mass, Ti: 0.01-0.1% by mass, and any one or more of Mn: 0.1-0.7% by mass, Cr: 0.1-0.5% by mass and Zr: 0.05-0.3% by mass, and the balance being aluminum and incidental impurities is extruded at a homogenization treatment temperature after a homogenization treatment without cooled, and a resulted extruded material is die quenched at a cooling rate equal to or more than 100° C./min and then subjected to an artificial aging treatment, wherein the homogenization treatment is carried out by heating to the homogenization treatment temperature as 430-500° C. at a heating rate less than 750° C./hr or by heating to the homogenization treatment temperature and held the homogenization treatment temperature for 3 hours.

    摘要翻译: 含有Zn:4.0〜8.0质量%,Mg:0.5〜2.0质量%,Cu:0.05〜0.5质量%,Ti:0.01-0.1质量%的热处理型Al-Zn-Mg系铝合金铸造锭, ,Mn:0.1-0.7质量%,Cr:0.1-0.5质量%,Zr:0.05〜0.3质量%中的任一种或以上,余量由铝和附带杂质在均化处理中挤出 未冷却均质处理后的温度,所得到的挤出材料以等于或大于100℃/分钟的冷却速度进行猝熄,然后进行人造时效处理,其中均化处理通过加热至 均质处理温度为430-500℃,加热速率小于750℃/小时或通过加热至均化处理温度并保持均化处理温度3小时。

    HIGH STRENGTH ALUMINUM ALLOY EXTRUDED MATERIAL EXCELLENT IN STRESS CORROSION CRACKING RESISTANCE
    7.
    发明申请
    HIGH STRENGTH ALUMINUM ALLOY EXTRUDED MATERIAL EXCELLENT IN STRESS CORROSION CRACKING RESISTANCE 审中-公开
    高强度铝合金挤压材料应力腐蚀抗裂性优异

    公开(公告)号:US20130146183A1

    公开(公告)日:2013-06-13

    申请号:US13323056

    申请日:2011-12-12

    IPC分类号: C22C21/10 C22C21/06

    摘要: An aluminum alloy extruded material in relation with the present invention is with high strength by die quench air cooling and excellent in SCC resistance. The aluminum alloy extruded material is an Al—Zn—Mg-based aluminum alloy extruded material for structural member for automobiles such as a bumper reinforce, a door guard bar and the like which satisfies three expressions of 5.0≦[Zn]7.0, [Zn]/5.38

    摘要翻译: 与本发明相关的铝合金挤压材料通过模淬气冷却具有高强度,并且具有优异的耐SCC性。 铝合金挤压材料是用于汽车结构件的Al-Zn-Mg基铝合金挤压材料,例如保险杠加强件,门防护棒等,其满足5.0 @ [Zn] 7.0,[Zn ] /5.38 [[Mg] @ [Zn] /5.38+0.7和[Zn] +4.7 [Mg] @14,其中[Mg]表示Mg的质量%,[Zn]表示Zn的质量%,并且包含 Cu中的至少一种元素:0.1-0.6质量%,Ag:0.01-0.15质量%,Ti:0.005-0.05质量%,Mn中至少一种元素:0.1-0.3质量%,Cr:0.05-0.2质量% %,Zr:0.05〜0.2质量%。

    Semiconductor dynamic quantity sensor
    8.
    发明授权
    Semiconductor dynamic quantity sensor 有权
    半导体动量传感器

    公开(公告)号:US06658948B2

    公开(公告)日:2003-12-09

    申请号:US10053705

    申请日:2002-01-24

    IPC分类号: G01L122

    CPC分类号: G01L9/06 G01L9/0054

    摘要: A bridge circuit includes four gage resistors. Each gage resistor is divided into two division gage resistors. A couple of division gage resistors. The junction points between division gage resistors outputting the same potential when no pressure is applied are used for diagnostic. Four gage resistors out of the eight gage resistors are arranged near the center of diaphragm 14, and the other four division resistors are arranged near the peripheral edge portion of the diaphragm 14 to make the stress distribution even.

    摘要翻译: 桥接电路包括四个量规电阻。 每个量规电阻分为两个分压计电阻。 一对分压计电阻。 在不施加压力时输出相同电位的分压计电阻之间的接点用于诊断。 八个量具电阻器中的四个量规电阻器布置在隔膜14的中心附近,另外四个除法电阻器布置在隔膜14的周缘部分附近,使应力分布均匀。

    Method for manufacturing semiconductor device
    10.
    发明授权
    Method for manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US06277756B1

    公开(公告)日:2001-08-21

    申请号:US09501762

    申请日:2000-02-10

    IPC分类号: H01L21311

    摘要: A method of manufacturing a semiconductor device, which can effectively form a trench having a high aspect ratio with relatively simple steps. An initial trench is formed in a silicon substrate by a reactive ion etching using an oxide film mask as an etching mask. After forming a protection oxide film on an inside surface of the trench, a part of the protection oxide film at which positions at a bottom surface of the trench is removed by a reactive ion etching, so that an etching of the silicon substrate is advanced through the bottom surface of the trench. Furthermore, the step for forming the protection oxide film and the step for re-etching the bottom surface of the trench are repeatedly performed, so that a depth of the trench becomes a predetermined depth. These steps are performed in a common chamber by using plasma processed with switching gases to be introduced to the chamber.

    摘要翻译: 一种制造半导体器件的方法,其可以通过相对简单的步骤有效地形成具有高纵横比的沟槽。 通过使用氧化物膜掩模作为蚀刻掩模的反应离子蚀刻在硅衬底中形成初始沟槽。 在沟槽的内表面上形成保护氧化膜之后,通过反应离子蚀刻去除沟槽底面的位置的保护氧化膜的一部分,使得硅衬底的蚀刻通过 沟槽的底面。 此外,重复执行用于形成保护氧化膜的步骤和重新蚀刻沟槽的底表面的步骤,使得沟槽的深度变为预定深度。 这些步骤通过使用等离子体处理的切换气体被引入腔室在公共室中进行。