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公开(公告)号：US20130267081A1
公开(公告)日：2013-10-10
申请号：US13857566
申请日：2013-04-05
IPC分类号： H01L21/324
CPC分类号： H01L21/324 , C23C16/24 , C23C16/56 , H01L27/11582
摘要： The methods and apparatus disclosed herein concern a process that may be referred to as a “soft anneal.” A soft anneal provides various benefits. Fundamentally, it reduces the internal stress in one or more silicon layers of a work piece. Typically, though not necessarily, the internal stress is a compressive stress. A particularly beneficial application of a soft anneal is in reduction of internal stress in a stack containing two or more layers of silicon. Often, the internal stress of a layer or group of layers in a stack is manifest as wafer bow. The soft anneal process can be used to reduce compressive bow in stacks containing silicon. The soft anneal process may be performed without causing the silicon in the stack to become activated.
摘要翻译： 本文公开的方法和装置涉及可被称为“软退火”的方法。 软退火提供了各种好处。 从根本上说，它降低了工件的一个或多个硅层的内应力。 通常，尽管不一定，内应力是压应力。 软退火的特别有益的应用是在包含两层或更多层硅的堆叠中减少内部应力。 通常，堆叠中的一层或多层层的内应力显示为晶片弓。 软退火工艺可用于减少含硅堆叠中的压缩弓。 可以执行软退火工艺，而不会使堆叠中的硅变得活化。
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公开(公告)号：US20130157466A1
公开(公告)日：2013-06-20
申请号：US13766696
申请日：2013-02-13
申请人： Keith Fox , Dong Niu , Joseph L. Womack , Mandyam Sriram , George Andrew Antonelli , Bart J. van Schravendijk , Jennifer O'Loughlin
发明人： Keith Fox , Dong Niu , Joseph L. Womack , Mandyam Sriram , George Andrew Antonelli , Bart J. van Schravendijk , Jennifer O'Loughlin
IPC分类号： H01L21/306
CPC分类号： H01L21/30604 , C23C16/24 , C23C16/345 , C23C16/402 , C23C16/4401 , C23C16/45523 , C23C16/509 , C23C16/54 , H01J37/32082 , H01J2237/3321 , H01L21/02164 , H01L21/0217 , H01L21/022 , H01L21/02274 , H01L21/31111 , H01L21/6719 , H01L21/67201 , H01L21/67207 , H01L28/40
摘要： The embodiments herein relate to plasma-enhanced chemical vapor deposition methods and apparatus for depositing silicon nitride on a substrate. The disclosed methods provide silicon nitride films having wet etch rates (e.g., in dilute hydrofluoric acid or hot phosphoric acid) suitable for certain applications such as vertical memory devices. Further, the methods provide silicon nitride films having defined levels of internal stress suitable for the applications in question. These silicon nitride film characteristics can be set or tuned by controlling, for example, the composition and flow rates of the precursors, as well as the RF power supplied to the plasma and the pressure in the reactor. In certain embodiments, a boron-containing precursor is added.
摘要翻译： 本文的实施方案涉及用于在衬底上沉积氮化硅的等离子体增强化学气相沉积方法和装置。 所公开的方法提供了适用于某些应用例如垂直存储器件的具有湿蚀刻速率（例如，在稀氢氟酸或热磷酸中）的氮化硅膜。 此外，这些方法提供具有适合于所讨论的应用的具有确定的内部应力水平的氮化硅膜。 这些氮化硅膜特性可以通过控制例如前体的组成和流速以及提供给等离子体的RF功率和反应器中的压力来设定或调节。 在某些实施方案中，加入含硼前体。
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公开(公告)号：US06524991B2
公开(公告)日：2003-02-25
申请号：US09966535
申请日：2001-09-26
IPC分类号： B01J2106
CPC分类号： B01J23/50 , B01J23/52 , B01J23/66 , B01J29/89 , C07D301/04 , C07D301/10 , Y02P20/52 , Y02P20/584 , Y02P20/588
摘要： A process and catalyst for the direct oxidation of an olefin having three or more carbon atoms, such as propylene, by oxygen to the corresponding olefin oxide, such as propylene oxide. The process involves contacting the olefin with oxygen under reaction conditions in the presence of hydrogen and in the presence of a catalyst. The catalyst comprises gold on a titanosilicate, preferably a microporous or mesoporous titanosilicate, such as, TS-1, TS-2, Ti-beta, Ti-ZSM-48, or Ti-MCM-41. Selectivity to the olefin oxide is high at good conversions of the olefin. The catalyst is readily regenerated, and the time between catalyst regenerations is long.
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公开(公告)号：US6031116A
公开(公告)日：2000-02-29
申请号：US209700
申请日：1998-12-11
IPC分类号： B01J23/66 , B01J23/50 , B01J23/52 , B01J23/96 , B01J29/89 , C07D301/04 , C07D301/06 , C07D301/10 , C07D303/04
CPC分类号： B01J23/50 , B01J23/52 , B01J23/66 , B01J29/89 , C07D301/04 , C07D301/10 , Y02P20/52 , Y02P20/584 , Y02P20/588
摘要： A process and catalyst for the direct oxidation of an olefin having three or more carbon atoms, such as propylene, by oxygen to the corresponding olefin oxide, such as propylene oxide. The process involves contacting the olefin with oxygen under reaction conditions in the presence of hydrogen and in the presence of a catalyst. The catalyst comprises gold on a titanosilicate, preferably a microporous or mesoporous titanosilicate, such as, TS-1, TS-2, Ti-beta, Ti-ZSM-48, or Ti-MCM-41. Selectivity to the olefin oxide is high at good conversions of the olefin. The catalyst is readily regenerated, and the time between catalyst regenerations is long.
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公开(公告)号：US06309998B1
公开(公告)日：2001-10-30
申请号：US09458559
申请日：1999-12-09
IPC分类号： B01J2106
CPC分类号： B01J23/50 , B01J23/52 , B01J23/66 , B01J29/89 , C07D301/04 , C07D301/10 , Y02P20/52 , Y02P20/584 , Y02P20/588
摘要： A process and catalyst for the direct oxidation of an olefin having three or more carbon atoms, such as propylene, by oxygen to the corresponding olefin oxide, such as propylene oxide. The process involves contacting the olefin with oxygen under reaction conditions in the presence of hydrogen and in the presence of a catalyst. The catalyst comprises gold on a titanosilicate, preferably a microporous or mesoporous titanosilicate, such as, TS-1, TS-2, Ti-beta, Ti-ZSM-48, or Ti-MCM-41. Selectivity to the olefin oxide is high at good conversions of the olefin. The catalyst is readily regenerated, and the time between catalyst regenerations is long.
摘要翻译： 用于将具有三个或更多个碳原子的烯烃（例如丙烯）通过氧直接氧化成相应的烯烃氧化物如环氧丙烷的方法和催化剂。 该方法包括在氢气存在下和催化剂存在下，在反应条件下使烯烃与氧接触。 催化剂包括钛硅酸盐上的金，优选微孔或中孔钛硅酸盐，例如TS-1，TS-2，Ti-β，Ti-ZSM-48或Ti-MCM-41。 烯烃氧化物的选择性高，烯烃转化率高。 催化剂容易再生，催化剂再生之间的时间长。
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