公开(公告)号：US20090303468A1

公开(公告)日：2009-12-10

申请号：US12308241

申请日：2007-06-12

申请人： Kenji Itoh ,  Tamon Iden ,  Takeshi Murakami

发明人： Kenji Itoh ,  Tamon Iden ,  Takeshi Murakami

IPC分类号： G01N21/88 ,  G06F19/00

CPC分类号： G01N21/8901 ,  G01B11/306 ,  G01N2021/556 ,  G01N2021/9513

摘要： An undulation inspection device of the present invention includes: illumination means (line light source 2) that subjects, to illumination, an object to be inspected; light intensity acquisition means (area sensor 3) that acquires light intensity distribution of light that comes, in response to the illumination, from a surface of the object to be inspected; image capturing means (line sensor 4) that obtains only predetermined light out of light that comes from the surface of the object to be inspected; adjustment means (image processing section 20 and light source drive controlling section 21) that adjusts the illumination means (line light source 2), based on the light intensity distribution that is obtained from the light intensity acquisition means; and determination means (defect determination processing means 23) that determines a state of undulation that is formed on the surface of the object to be inspected, based on a result of capturing an image by the image capturing means after adjustment of the illumination means. This makes it possible to provide an undulation inspection device capable of inspecting simply and at a high precision a state of undulation (a difference in film thickness) on a surface of a large substrate (e.g., color filter substrate).

摘要翻译： 本发明的起伏检查装置包括：照明装置（线光源2），照明要被检查的物体; 光强度获取装置（区域传感器3），其从待检查对象的表面获取响应于照明的光的光强度分布; 仅从待检查物体的表面获得来自光的预定光的图像捕获装置（线传感器4） 基于从光强度获取装置获得的光强度分布来调节照明装置（线光源2）的调整装置（图像处理部分20和光源驱动控制部分21） 以及基于在调整照明装置之后由图像捕获装置捕获图像的结果来确定形成在待检查对象的表面上的起伏状态的确定装置（缺陷确定处理装置23）。 这使得可以提供能够简单且高精度地检查大基板（例如滤色器基板）的表面上的波动状态（膜厚度差）的波峰检查装置。

公开(公告)号：US08822919B2

公开(公告)日：2014-09-02

申请号：US12985827

申请日：2011-01-06

申请人： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

发明人： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC分类号： G01N23/00

CPC分类号： H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

摘要： A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

摘要翻译： 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到检查室23-1中; 在所述检查室中保持真空; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US20130225618A1

公开(公告)日：2013-08-29

申请号：US13824782

申请日：2011-10-03

申请人： Kimiyuki Shibuya ,  Tadaaki Ohgiya ,  Takeshi Murakami

发明人： Kimiyuki Shibuya ,  Tadaaki Ohgiya ,  Takeshi Murakami

IPC分类号： A61K31/505

CPC分类号： A61K31/505 ,  C07D239/47

摘要： The present invention is intended to provide a pharmaceutical product for inhibiting expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, the present invention is also intended to provide a preventive and/or therapeutic agent for various diseases based on inhibition of expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, and the present invention relates to an agent for inhibiting expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, and relates also to a preventive and/or therapeutic agent for various diseases based on the inhibition of the expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, the agent comprising a compound represented by Formula (I), its salt, or a solvate of any of them as an active ingredient: wherein the symbols are the same as those given in the description.

公开(公告)号：US08390121B2

公开(公告)日：2013-03-05

申请号：US13025633

申请日：2011-02-11

申请人： Mika Okumura ,  Yasuo Yamaguchi ,  Takeshi Murakami

发明人： Mika Okumura ,  Yasuo Yamaguchi ,  Takeshi Murakami

IPC分类号： H01L23/482

CPC分类号： B81B7/0051 ,  B81B2201/0235 ,  B81C2203/0154 ,  G01P1/023 ,  G01P15/0802 ,  G01P15/125 ,  H01L21/56 ,  H01L23/3107 ,  H01L23/562 ,  H01L24/05 ,  H01L24/06 ,  H01L2924/01019

摘要： A semiconductor device includes a substrate, an element formed on the substrate, a nitride film formed on the substrate, a anti-peel film formed on the nitride film, and a molded resin covering the anti-peel film and the element. The anti-peel film has residual compressive stress.

摘要翻译： 半导体器件包括基板，形成在基板上的元件，在基板上形成的氮化物膜，形成在氮化物膜上的抗剥离膜，以及覆盖抗剥离膜和元件的模制树脂。 抗剥离膜具有残余压应力。

公开(公告)号：US08218646B2

公开(公告)日：2012-07-10

申请号：US12192275

申请日：2008-08-15

申请人： Takeshi Murakami ,  Ryuichi Kanda

发明人： Takeshi Murakami ,  Ryuichi Kanda

IPC分类号： H04N11/02

CPC分类号： H04N19/124 ,  H04N19/149 ,  H04N19/15 ,  H04N19/159 ,  H04N19/172 ,  H04N19/194 ,  H04N19/61

摘要： A moving image encoding apparatus includes a first-step encoding section for executing a plurality of times first-step encoding by use of different quantization control variables; a code-amount estimation section for estimating, for all the quantization control variables, an amount of codes generated for each frame by making use of a plurality of results of the encoding; a code-amount allocation section for allocating an amount of codes for each frame on the basis of results of the estimation; and a second-step encoding section for executing second-step encoding on the basis of the amount of codes allocated to each frame. The first-step encoding section changes the number of times of execution of the encoding in accordance with the attribute of each frame, and omits a portion of processes contained in the coding process in the second and subsequent executions of the encoding process.

摘要翻译： 运动图像编码装置包括：第一步编码部分，用于通过使用不同的量化控制变量执行多次第一步编码; 码量估计部分，用于通过利用所述编码的多个结果，针对所有的量化控制变量来估计针对每一帧产生的代码量; 码量分配部分，用于根据估计结果分配每帧的码量; 以及第二步编码部分，用于基于分配给每个帧的代码量来执行第二步编码。 第一步编码单元根据每帧的属性改变编码的执行次数，并且在编码处理的第二次和随后的执行中省略包含在编码处理中的处理的一部分。

公开(公告)号：US20110234090A1

公开(公告)日：2011-09-29

申请号：US13153687

申请日：2011-06-06

申请人： Toshihiro ISE ,  Tatsuya Igarashi ,  Ikuo Kinoshita ,  Takeshi Murakami

发明人： Toshihiro ISE ,  Tatsuya Igarashi ,  Ikuo Kinoshita ,  Takeshi Murakami

IPC分类号： H01J1/63 ,  C07F15/00

CPC分类号： H01L51/0087 ,  C07D401/14 ,  C07D403/14 ,  C07F15/0086 ,  C09K11/06 ,  C09K2211/1022 ,  C09K2211/1029 ,  C09K2211/1044 ,  C09K2211/1059 ,  C09K2211/185 ,  C09K2211/186 ,  C09K2211/188 ,  H01L51/0054 ,  H01L51/0058 ,  H01L51/006 ,  H01L51/0071 ,  H01L51/0078 ,  H01L51/0081 ,  H01L51/0085 ,  H01L51/5016 ,  H05B33/14 ,  Y10S428/917

摘要： An organic electroluminescent device is provided and has at least one organic layer between a pair of electrodes. The organic compound contains a compound represented by the following formula (I): Z1 and Z2 each represents a nitrogen-containing aromatic 6-membered ring coordinating to platinum atom at the nitrogen atom, Q represents a nitrogen-containing aromatic 5-membered ring having one or two nitrogen atoms, L1 and L2 each represents a single bond or a divalent group, and n represents 0 or 1.

摘要翻译： 提供有机电致发光器件，并且在一对电极之间具有至少一个有机层。 有机化合物含有下式（I）表示的化合物：Z1和Z2各自表示与氮原子上的铂原子配位的含氮芳香族6元环，Q表示含氮芳香族五元环， 一个或两个氮原子，L1和L2各自表示单键或二价基团，n表示0或1。

公开(公告)号：US07952071B2

公开(公告)日：2011-05-31

申请号：US12162071

申请日：2007-01-24

申请人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Masahiro Hatakeyama ,  Kenji Terao ,  Takeshi Murakami ,  Katsuya Okumura ,  Tatsuhiko Higashiki

发明人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Masahiro Hatakeyama ,  Kenji Terao ,  Takeshi Murakami ,  Katsuya Okumura ,  Tatsuhiko Higashiki

IPC分类号： G01N23/00

CPC分类号： H01J37/29 ,  H01J37/045 ,  H01J2237/2446

摘要： Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device.Provided is a method for inspecting a sample surface with a projection type electron beam inspection apparatus, comprising the steps of: forming such an irradiation area on the sample surface by an electron beam generated from an electron gun 21 that has approximately a circular or elliptical shape of a size larger than a pattern on the sample surface; irradiating the electron beam substantially onto a center of the pattern on the sample surface; and forming an image on an electron detection plane of a detector from secondary electrons emanating from the sample surface in response to the irradiation of the electron beam for inspecting the sample surface.

摘要翻译： 提供了在半导体器件的制造工艺中使用的缺陷检查装置中，现有技术不能提供高精度的缺陷检查装置和检查（或评价）方法。 提供一种用投影型电子束检查装置检查样品表面的方法，包括以下步骤：通过由具有大致圆形或椭圆形的电子枪21产生的电子束在样品表面上形成这样的照射区域 尺寸大于样品表面上的图案; 将电子束基本上照射到样品表面上的图案的中心; 以及响应于用于检查样品表面的电子束的照射，从从样品表面发射的二次电子在检测器的电子检测平面上形成图像。

公开(公告)号：US20100237243A1

公开(公告)日：2010-09-23

申请号：US12789070

申请日：2010-05-27

申请人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G01N23/22

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

公开(公告)号：US07771845B2

公开(公告)日：2010-08-10

申请号：US11374148

申请日：2006-03-14

申请人： Satoshi Sano ,  Tatsuya Igarashi ,  Toshihiro Ise ,  Takeshi Murakami ,  Seiji Ichijima

发明人： Satoshi Sano ,  Tatsuya Igarashi ,  Toshihiro Ise ,  Takeshi Murakami ,  Seiji Ichijima

IPC分类号： H01L51/54 ,  C09K11/06

CPC分类号： H01L51/5012 ,  H01L51/0081 ,  H01L51/0087 ,  H01L51/5016 ,  Y10S428/917

摘要： An organic electroluminescent device contains: a pair of electrodes; and an organic compound layer containing a light-emitting layer, the organic compound layer being between the electrodes, wherein the organic compound layer contains a platinum complex including specific structure.

摘要翻译： 有机电致发光器件包括：一对电极; 和含有发光层的有机化合物层，有机化合物层在电极之间，其中有机化合物层含有具有特定结构的铂络合物。

公开(公告)号：US07758971B2

公开(公告)日：2010-07-20

申请号：US11410000

申请日：2006-04-25

申请人： Tatsuya Igarashi ,  Takeshi Murakami ,  Ikuo Kinoshita

发明人： Tatsuya Igarashi ,  Takeshi Murakami ,  Ikuo Kinoshita

IPC分类号： H01L51/54

CPC分类号： H01L51/5016 ,  C09K11/06 ,  C09K2211/1011 ,  C09K2211/1014 ,  C09K2211/1029 ,  C09K2211/1044 ,  C09K2211/1059 ,  C09K2211/185 ,  C09K2211/186 ,  C09K2211/188 ,  H01L51/0085 ,  H01L51/0087 ,  H05B33/14 ,  Y10S428/917

摘要： An organic electroluminescent device comprising: a pair of electrodes comprising a positive electrode and a negative electrode; and a plurality of organic compound layers including a light emitting layer between the pair of electrodes, wherein at least one layer containing a metal complex having a tridentate or more ligand is provided between the light emitting layer and the negative electrode.

摘要翻译： 一种有机电致发光器件，包括：一对电极，包括正极和负极; 以及在所述一对电极之间包括发光层的多个有机化合物层，其中在所述发光层和所述负极之间设置至少一层含有具有三齿或更多配位体的金属络合物的层。